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    • 11. 发明授权
    • 열경화성 잉크젯 잉크 조성물 및 이를 이용한 칼라필터
    • 열경화성잉크젯잉크조성물및이를이용한칼라필터
    • KR100742121B1
    • 2007-07-24
    • KR1020060009325
    • 2006-01-31
    • 주식회사 동진쎄미켐
    • 김길래김경아박찬석
    • C09D11/30C09D11/101G02B5/20
    • Provided is a thermosetting ink-jet ink composition, which has a superior jetting property upon printing in a piezoelectric element manner, produces color filters in a simpler process than the light-curable ink composition, and is superior in membrane hardness and uniformity in pixels. The thermosetting ink-jet ink composition comprises (a) 5-50 parts by weight of a copolymer having a weight average molecular weight of 10,000-80,000 of (1) a monomer having an epoxy group in the molecule or a polymer having an epoxy group in the chain and (2) a monomer having an ethylenic double bond except an epoxy group, (b) 0.1-5.0 parts by weight of an unsaturated carboxylic acid, (c) 5-60 parts by weight of a pigment, and (d) 20-80 parts by weight of an organic solvent.
    • 本发明提供热固性喷墨油墨组合物,其以压电元件方式印刷时具有优异的喷射特性,以比光固化油墨组合物更简单的工艺制造滤色器,并且膜硬度和像素均匀性优异。 该热固性喷墨油墨组合物包含:(a)5-50重量份的重均分子量为10,000-80,000的共聚物,其(1)分子中具有环氧基团的单体或具有环氧基团的聚合物 (2)具有除环氧基以外的烯属双键的单体,(b)0.1〜5.0重量份的不饱和羧酸,(c)5〜60重量份的颜料和(d) )20-80重量份的有机溶剂。
    • 12. 发明公开
    • 포토레지스트 현상액 조성물
    • 光电开发商组合
    • KR1020040043620A
    • 2004-05-24
    • KR1020020071987
    • 2002-11-19
    • 주식회사 동진쎄미켐
    • 박찬석김길래박춘호김경아
    • G03F7/32
    • PURPOSE: A photoresist developer composition is provided, to improve miscibility and to suppress or minimize the generation of residue after development, thereby enhancing the precision of photoresist pattern. CONSTITUTION: The photoresist developer composition comprises 1-10 wt% of an inorganic alkali; 0.1-3.0 wt% of an organic solvent; 1.0-20.0 wt% of a surfactant; and 67-97.9 wt% of water. Preferably the inorganic alkali is selected from the group consisting of KOH, NaOH, sodium phosphate, sodium silicate, sodium carbonate, sodium bicarbonate and their mixtures; the organic solvent is selected from the group consisting of methanol, ethanol, 1-propanol, 2-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropyl glycol monomethyl ether, dipropyl glycol monoethyl ether and their mixtures; and the surfactant is a mixture of a nonionic surfactant and an anionic surfactant.
    • 目的:提供光致抗蚀剂显影剂组合物,以改善混溶性并抑制或最小化显影后残留物的产生,从而提高光致抗蚀剂图案的精度。 构成:光致抗蚀剂显影剂组合物包含1-10重量%的无机碱; 0.1-3.0重量%的有机溶剂; 1.0-20.0重量%的表面活性剂; 和67-97.9重量%的水。 优选地,无机碱选自KOH,NaOH,磷酸钠,硅酸钠,碳酸钠,碳酸氢钠及其混合物; 有机溶剂选自甲醇,乙醇,1-丙醇,2-丙醇,丁醇,双丙酮醇,乙二醇单甲醚,乙二醇单乙醚,乙二醇单丁醚,二甘醇单甲醚,二甘醇单甲醚 醚,二丙二醇单甲醚,二丙二醇单乙醚及其混合物; 并且表面活性剂是非离子表面活性剂和阴离子表面活性剂的混合物。
    • 16. 发明公开
    • 레지스트 제거용 신너 조성물
    • 用于去除电阻的薄膜组合物
    • KR1020030043190A
    • 2003-06-02
    • KR1020010074243
    • 2001-11-27
    • 주식회사 동진쎄미켐
    • 김길래박춘호김경아
    • G03F7/32
    • G03F7/322C11D3/044G03F7/063G03F7/30G03F7/34G03F7/425
    • PURPOSE: A thinner composition for removing resist is provided, which is used to remove the edge part of resist film coated on a substrate or an unnecessary film component formed on the back face of a substrate in manufacturing process of a TFT-LCD device or a semiconductor device. CONSTITUTION: The thinner composition comprises 0.1-10 wt% of an inorganic and/or organic alkali; 0.1-30 wt% of an organic solvent; 0.01-10 wt% of a nonionic surfactant; 50-99 wt% of water; and optionally 0.01-5 wt% of an anionic surfactant and/or 0.01-1.0 wt% of an antifoaming agent. Preferably the organic solvent is an organic amine-based solvent, an alcohol ether-based organic solvent, a nitrogen-containing organic solvent or a sulfur-containing organic solvent; the nonionic surfactant is selected from the group consisting of polyoxy ethyl ether, polyoxy propyl ether, polyoxy ethyl propyl ether, polyoxy ethyl alkyl phenyl ether, polyoxy propyl alkyl phenyl ether, polyoxy ethyl oxypropyl alkyl phenyl ether and their mixtures; and the anionic surfactant is selected from the group consisting of alkyl ether sulfate, alkyl sulfate, alkyl benzenesulfonic acid, alkyl benzenesulfonate, alkyl naphthalene sulfonate and their mixtures.
    • 目的:提供用于去除抗蚀剂的较薄组合物,其用于在TFT-LCD装置的制造过程中除去涂覆在基板上的抗蚀剂膜的边缘部分或形成在基板背面上的不需要的膜部件 半导体器件。 构成:较薄的组成包含0.1-10重量%的无机和/或有机碱; 0.1-30重量%的有机溶剂; 0.01-10重量%的非离子表面活性剂; 50-99重量%的水; 和0.01-5重量%的阴离子表面活性剂和/或0.01-1.0重量%的消泡剂。 优选有机溶剂是有机胺类溶剂,醇醚类有机溶剂,含氮有机溶剂或含硫有机溶剂; 非离子表面活性剂选自聚氧乙基醚,聚氧丙基醚,聚氧乙基丙基醚,聚氧乙基烷基苯基醚,聚氧丙基烷基苯基醚,聚氧乙基氧丙基烷基苯基醚及其混合物; 阴离子表面活性剂选自烷基醚硫酸盐,烷基硫酸盐,烷基苯磺酸,烷基苯磺酸盐,烷基萘磺酸盐及其混合物。