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121. 发明公开

KR1020010050905A 기판세정방법 및 그 장치 有权
标题翻译：清洗基板的方法和装置
公开(公告)号：KR1020010050905A
公开(公告)日：2001-06-25
申请号：KR1020000058926
申请日：2000-10-06
申请人： 가부시키가이샤 에바라 세이사꾸쇼
发明人： 가타카베이치로 , 모리사와신야 , 오노하루코 , 기하라사치코 , 후쿠나가아키라
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , Y10S134/902
摘要： PURPOSE: A method for cleaning a substrate is provided to eliminate the need to remove again a native oxide layer grown on the surface of the substrate, by using an acid solution to remove the native oxide layer when the native oxide layer is formed in a circuit formation part of the substrate and by using the acid solution to etch copper adhered to the edge of the substrate. CONSTITUTION: An acid solution is consecutively supplied to the center of the surface of the substrate(W) while the substrate is rotated, and an oxidant solution is intermittently and consecutively supplied to the edge of the substrate. An oxidant solution and an acid solution are simultaneously and alternately supplied to the back surface of the substrate.
摘要翻译：目的：提供一种清洁基底的方法，以消除在自然氧化物层形成于电路中时，通过使用酸溶液去除天然氧化物层，再次除去生长在基底表面上的天然氧化物层并且通过使用酸溶液来蚀刻附着在基底边缘上的铜。构成：在基板旋转的同时，将酸溶液连续地供给到基板（W）的表面的中心，并且将氧化剂溶液间歇地连续地供给到基板的边缘。氧化剂溶液和酸溶液同时且交替地供给到基板的背面。

122. 发明公开

KR1020010049738A 에지 비드 제거/회전형 세척 건조(EBR/SRD)모듈 失效
标题翻译：边缘珠去除/旋转干燥模块
公开(公告)号：KR1020010049738A
公开(公告)日：2001-06-15
申请号：KR1020000038869
申请日：2000-07-07
申请人： 어플라이드 머티어리얼스, 인코포레이티드
发明人： 스티븐스,조이 , 올가도,도날드 , 코,알렉산더에스. , 목크,예크-화이에드윈
IPC分类号： H01L21/304
CPC分类号： H01L21/6708 , Y10S134/902
摘要： PURPOSE: An edge bead removal/spin rinse dry module is provided to remove deposition at the edge of a wafer without damaging the devices formed on the wafer surface. CONSTITUTION: The edge bead removal/spin rinse dry module includes a case(102), a rotating actuator mounted on the support member, a liquid feeder assembly(106) disposed in the case so as to feed etching solution to the periphery of the substrate on the substrate support member. Preferably, the substrate support member has a vacuum chuck(124), and the liquid feeder assembly is provided with one or more nozzles(150). The etching method includes a step for rotating the substrate(122) on the rotatable substrate support member, and a step for feeding the etching solution to a periphery(126) of the substrate. More preferably, the substrate is rotated at the speed of approximately 100 or 1000 rpm, and the etching solution is fed to the periphery of the substrate substantially in the tangential direction and in the incident direction of 0 to 45 deg.C from he surface of the substrate.
摘要翻译：目的：提供边缘珠去除/旋转漂洗干燥模块以去除晶片边缘处的沉积，而不会损坏晶片表面上形成的器件。构成：边缘珠去除/旋转冲洗干燥模块包括壳体（102），安装在支撑构件上的旋转致动器，设置在壳体中的液体供给器组件（106），以将蚀刻溶液供给到基板的周边在基板支撑构件上。优选地，衬底支撑构件具有真空吸盘（124），并且液体供给组件设置有一个或多个喷嘴（150）。蚀刻方法包括用于使基板（122）旋转在可旋转的基板支撑构件上的步骤，以及用于将蚀刻溶液供给到基板的周边（126）的步骤。更优选地，基板以大约100或1000rpm的速度旋转，并且蚀刻溶液基本上沿切线方向和从0到45度的入射方向从其表面供给到基板的周边底物。

123. 发明公开

KR1020010041334A 반도체 웨이퍼 세정 장치 및 방법 无效
公开(公告)号：KR1020010041334A
公开(公告)日：2001-05-15
申请号：KR1020007009447
申请日：1999-02-23
申请人： 감마 프리시젼 테크날러지, 인크.
发明人： 도시마,마사또
IPC分类号： H01L21/304
CPC分类号： H01L21/67057 , B08B3/00 , H01L21/67051 , Y10S134/902
摘要： 본발명은극순도드라이증기를사용하여포스트 - 에치반도체웨이퍼(230)를세정하기위한장치및 방법에관한것이다.

124. 发明公开

KR1020010039947A 표면 부착 오염 물질의 제거방법 및 이에 사용되는 장치 有权
标题翻译：消除附着在表面上的污染物质的方法及使用其的装置
公开(公告)号：KR1020010039947A
公开(公告)日：2001-05-15
申请号：KR1020000057308
申请日：2000-09-29
申请人： 노무라 마이크로 싸이언스 가부시키가이샤 , 유겐가이샤 유에무에스
发明人： 무라오카히사시
IPC分类号： H01L21/304
CPC分类号： B08B3/08 , C11D3/3947 , C11D7/265 , C11D7/30 , C11D11/0023 , Y10S134/902
摘要： PURPOSE: A method for eliminating a contamination material adhered to a surface is provided to remove the contamination material adhered to the surface of various articles such as a semiconductor substrate or glass substrate for a liquid crystal, by processing the contamination material at a room temperature within a short interval of time. CONSTITUTION: Ozone is melted in an organic solvent which has a partition coefficient higher than 0.6 regarding ozone in gas, to make process liquid. The process liquid becomes in contact with the surface of a process target to which the contamination material is adhered, so that the contamination material is removed.
摘要翻译：目的：提供一种消除附着在表面上的污染物质的方法，通过在室温下处理污染物质，除去附着在液晶的半导体基板或玻璃基板等各种物品的表面上的污染物质一段短暂的时间。构成：臭氧在有机溶剂中熔化，其分配系数高于0.6，关于气体中的臭氧，以制备工艺液体。处理液体与被污染物质附着的处理对象的表面接触，从而去除污染物质。

125. 发明公开

KR1020010039817A 화학 기계 연마용 수계 분산체 失效
标题翻译：用于化学和机械抛光的水基分散材料
公开(公告)号：KR1020010039817A
公开(公告)日：2001-05-15
申请号：KR1020000047368
申请日：2000-08-17
申请人： 제이에스알 가부시끼가이샤
发明人： 모또나리,마사유끼 , 하또리,마사유끼 , 가와하시,노부오
IPC分类号： C09K3/14
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/3212 , Y10S134/902
摘要： PURPOSE: Provided is a water based-dispersing material for chemical and mechanical polishing, which is capable of polishing copper or the like at a high speed without making scratches on the surface to be polished. CONSTITUTION: The water based-dispersing material contains polymer particles and water, wherein the polymer particles have crosslinked structure and functional groups capable of being reacted with the metal surface to be polished and forming cations. Also, the polymer particles are produced by using a polymerization initiator having the functional groups, wherein the functional groups are amino, pyridyl, and/or acrylamide.
摘要翻译：目的：提供用于化学和机械抛光的水基分散材料，其能够高速抛光铜等，而不会在要抛光的表面上产生划痕。构成：水基分散材料含有聚合物颗粒和水，其中聚合物颗粒具有交联结构和能够与要抛光的金属表面反应并形成阳离子的官能团。而且，通过使用具有官能团的聚合引发剂制备聚合物颗粒，其中官能团是氨基，吡啶基和/或丙烯酰胺。

126. 发明公开

KR1020010039627A 판형상시료의 유체처리장치 및 판형상시료의 유체처리방법 无效
标题翻译：用流化床处理板状样品的方法和装置
公开(公告)号：KR1020010039627A
公开(公告)日：2001-05-15
申请号：KR1020000029211
申请日：2000-05-30
申请人： 가부시키가이샤 히다치 고쿠사이 덴키 , 가부시끼가이샤 히다치 세이사꾸쇼
发明人： 모리따후미오 , 후지끼마사따까 , 오까히또시 , 오로꾸노리유끼 , 다나까유이찌로
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , B08B3/04 , Y10S134/902
摘要： PURPOSE: To control the curtailment of a cleaning time, the reduction of a cleaning solution, and the nonuniformity of cleaning. CONSTITUTION: Circulating pipes 24 are installed spirally on the backs of upper and lower Bernoulli plates 12, 14 through metal plates installed over the whole backs respectively, a heating medium and a cooling medium are circulated through the pipes 24 so that the plates 12, 14 can be heated/cooled rapidly, and during cooling, the plates 12, 14 are arranged so that a gap of 0.2-2 mm between the plates 12, 14 is formed and the gaps between the plates 12, 14 and a wafer 16 are of the same size.
摘要翻译：目的：控制清洁时间的削减，清洁液的减少以及清洁的不均匀性。构成：循环管24通过分别安装在整个背部的金属板螺旋地安装在上部和下部伯努利板12,14的背部上，加热介质和冷却介质通过管24循环，使得板12,14 可以快速加热/冷却，并且在冷却期间，板12,14被布置成使得在板12,14之间形成0.2-2mm的间隙，并且板12,14和晶片16之间的间隙为相同的大小。

127. 发明公开

KR1020010031585A 액체내 용해되는 기체량을 증가시키고 사용시까지 이증가된 양을 유지하기 위한 방법 및 시스템 失效
标题翻译：用于增加液体中溶解气体量并维持该量直到使用的方法和系统
公开(公告)号：KR1020010031585A
公开(公告)日：2001-04-16
申请号：KR1020007004635
申请日：1998-10-27
申请人： 에프에스아이 인터내쇼날 인크.
发明人： 넬슨스티븐엘 , 크리스텐슨컬트케이
IPC分类号： C02F1/78
CPC分类号： C02F1/78 , B08B3/02 , C02F2201/782 , Y10S134/902 , Y10S210/90 , Y10S261/42 , Y10S261/65
摘要： 초순수탈이온수와같은액체내에용해되는오존과같은기체량을증가시키기위한방법및 시스템이제공된다. 용존기체(10)는가압하에서액체(31)에투입되고생성된혼합물은가압(40)하에서원하는사용단계로운반된다. 원하는사용단계에서, 액체및 용존기체를포함하는혼합물은조절되어분배된다. 따라서본 발명의방법및 시스템은오존수와같은것을제공할수 있고, 계속하여효율적으로냉각단계없이도높은농도의오존수를제조하는단순하고경제적으로효율적인방법을제공한다.

128. 发明公开

KR1020010030537A 세정 장치 라인 구성 및 그 설계 방법 无效
标题翻译：清洁装置的线路配置及其制造方法
公开(公告)号：KR1020010030537A
公开(公告)日：2001-04-16
申请号：KR1020000057255
申请日：2000-09-29
申请人： 르네사스 일렉트로닉스 가부시키가이샤
发明人： 와께도모꼬
IPC分类号： H01L21/304
CPC分类号： H01L21/67253 , H01L21/02063 , Y10S134/902 , Y10S438/906
摘要： PURPOSE: To provide a method, capable of rationally selecting a wet processing treatment, where chemicals can be shared, in a short time resting on a minimum preliminary test when utilization of common chemicals is promoted eliminating cross contamination caused, by newly adopted materials in a cleaning device line configuration in a silicon semiconductor device manufacturing process. CONSTITUTION: An element possible for causing cross contamination is added previously to chemicals which are used in a wet processing treatment, a silicon substrate is dipped into the chemicals and then cleaned, correlation between the element condensation attached to and left on the surface of the substrate and the concentration of the element dissolved in the chemicals is obtained, and when chemicals are shared based on the above result, the upper limit of the concentration of the element left in chemicals due to cross contamination is estimated, and it is determined whether the element deteriorates a semiconductor device in characteristics at its upper limit of concentration and whether chemicals can be shared.
摘要翻译：目的：提供一种方法，能够合理选择可以共享化学品的湿法处理，在短时间内，在促进普通化学品利用的同时进行最低限度的初步试验，消除由新采用的材料引起的交叉污染清洁器件线路配置在硅半导体器件制造过程中。构成：可以将用于引起交叉污染的元素添加到用于湿处理处理的化学品中，将硅衬底浸入化学品中，然后清洗，附着到衬底和留在衬底表面上的元件冷凝水之间的相关性并且获得溶解在化学品中的元素的浓度，并且当基于上述结果共享化学品时，估计由于交叉污染而留在化学品中的元素的浓度的上限，并且确定元素劣化半导体器件的特性在其浓度上限以及是否可以共享化学药品。

129. 发明公开

KR1020010015426A 기판세정구, 기판세정장치 및 기판세정방법 失效
标题翻译：基板清洁装置，基板清洁系统及其相关方法
公开(公告)号：KR1020010015426A
公开(公告)日：2001-02-26
申请号：KR1020000042704
申请日：2000-07-25
申请人： 도쿄엘렉트론가부시키가이샤
发明人： 히로세게이조 , 세키구치겐지 , 이노우에도모히데 , 미야자키다카노리 , 우에노긴야
IPC分类号： H01L21/304
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/04 , B08B2203/0288 , Y10S134/902
摘要： PURPOSE: A substrate cleaning device, a substrate cleaning system, and a method for the same are provided to protect a substrate from a friction or a scratch and clean efficiently the substrate by maintaining an initial contact pressure. CONSTITUTION: A core material(68) for supplying pure water from a pure water supply path(60) is installed at a head(66) of a cleaning device(24). A plane portion(72) is formed at a lower portion of the core material(68). An outer face of the core material(68) is coated by a porous resin sheet(69). A rod(31) presses the cleaning device(24) to a substrate. An air bearing cylinder(30) is installed to transmit power to the rod(31). The pure water supply path(60) is formed inside the rod(31). The pure water supplied from the pure water supply path(60) is passed through the core material(68) and the porous resin sheet(69). A floating layer of the pure water is formed between the head(66) and the substrate.
摘要翻译：目的：提供基板清洁装置，基板清洁系统及其方法，以保护基板免受摩擦或划痕，并通过维持初始接触压力有效地清洁基板。构成：用于从纯净水供应路径（60）供应纯净水的芯材（68）安装在清洁装置（24）的头部（66）上。在芯材（68）的下部形成有平面部（72）。芯材（68）的外表面被多孔树脂片（69）涂覆。杆（31）将清洁装置（24）按压到基板。安装空气轴承缸（30）以将动力传递到杆（31）。纯水供给路径（60）形成在杆（31）的内部。从纯水供给路径（60）供给的纯水通过芯材（68）和多孔树脂片（69）。在头部（66）和基底之间形成有纯水的漂浮层。

130. 发明公开

KR1020010006404A 다단계유량식세정방법 및 다단계유량식세정장치 无效
标题翻译：多级流量型清洗方法和多级流量型清洗装置
公开(公告)号：KR1020010006404A
公开(公告)日：2001-01-26
申请号：KR1019997009491
申请日：1998-12-18
申请人： 에스피씨 일렉트로닉스 코포레이션
发明人： 히로카와마사토시 , 소노다하루키 , 아베유스케 , 오이시테쓰지 , 오모리마사시 , 타나카히로시
IPC分类号： B08B3/10
CPC分类号： B08B3/10 , Y10S134/902
摘要： 피세정물을세정액의액류에의해효과적으로세정함과동시에피세정물의표면에부착되는이물질의증가를억제하는다단계유량식세정방법및 다단계유량식세정장치를제공한다. 피세정물을수납하는세정조(10)를설치하고, 이세정조의저면으로부터순수등의세정액을공급하는공급라인(14)을구비하여, 이공급라인(14)의도중에세정액의유량을조절하는밸브(12)를배설한다. 이밸브(12)에는, 공급라인(14)을개폐하여세정액의유출을제어하는개폐부(12a)와, 이개폐부(12a)를통과하여세정액을공급하는바이패스(12b)를구비한다. 또한밸브(12)는, 바이패스(12b)로부터의공급유량과, 개폐부(12a)로부터의공급유량에의해세정조(10)에공급하는세정액의공급유량을 2단계로조절할수 있도록설치한다.

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