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    • 125. 发明公开
    • 상담업무 지원시스템, 상담업무단말, 상담업무 지원단말,서버 및 프로그램
    • 系统,终端,服务器和程序,支持咨询业务,咨询业务支持终端提供适用于客户的咨询屏幕
    • KR1020040042824A
    • 2004-05-20
    • KR1020030076597
    • 2003-10-31
    • 오끼 덴끼 고오교 가부시끼가이샤
    • 요시다토시유키
    • G06Q10/00
    • G06Q30/016G06Q30/02G06Q30/0281
    • PURPOSE: A system, a terminal, a server, and a program for supporting a consultation business, and a consultation business supporting terminal are provided to support the consultation business with a customer by outputting additional data, which is explaining contents of a past or present display image on the consultation business terminal, to the consultation business terminal. CONSTITUTION: The consultation business terminal(7) is equipped with a display tool, and performs the consultation with the customer by displaying the screen fit to a consultation case of the customer, while the consultation is processed. Consultation business supporting terminals(17-1¯17-n) support the consultation business by outputting the data assisting the consultation business. Servers(5-1¯5-n) are connected to the consultation business terminal and the consultation business supporting terminal through a communication network(3), store applications operable to both terminals, and execute the application based on operations by both terminals.
    • 目的:提供一种用于支持咨询业务的系统,终端,服务器和程序,以及咨询业务支持终端,以通过输出附加数据来支持与客户的咨询业务,该数据解释过去或现在的内容 在咨询业务终端上显示图像,到咨询业务终端。 规定:咨询业务终端(7)配有显示工具,并在咨询处理的同时,通过显示符合客户咨询情况的屏幕,与客户进行协商。 咨询业务支持终端(17-1〜17-n)通过输出协助咨询业务的数据支持咨询业务。 服务器(5-1〜5-n)通过通信网络(3)连接到咨询业务终端和咨询业务支持终端,存储可操作到两个终端的应用,并且基于两个终端的操作来执行应用。
    • 128. 发明授权
    • 반도체장치의제조방법
    • KR100403886B1
    • 2004-02-11
    • KR1019980021528
    • 1998-06-10
    • 오끼 덴끼 고오교 가부시끼가이샤
    • 하까마다신이치
    • H01L21/28
    • H01L28/87H01L27/10852
    • The method according to this invention, of manufacturing a semiconductor device includes forming a polysilicon layer on a silicon substrate, forming a first resist pattern on the polysilicon layer, introducing impurity ions into the polysilicon layer with the first resist pattern used as a mask to form a high density impurity layer within the polysilicon layer, forming a second resist pattern on the polysilicon layer at a region where the first resist pattern is formed, the second resist pattern being greater than the first resist pattern so that the region where the first resist pattern is formed and a peripheral region thereof is covered by the second resist pattern, and etching the polysilicon layer including the high density impurity layer using the second resist pattern as a mask. From the above method, a portion of the polysilicon layer located at a region not covered by the second resist layer and the high density impurity layer are etched.
    • 根据本发明的制造半导体器件的方法包括在硅衬底上形成多晶硅层,在多晶硅层上形成第一抗蚀剂图案,用第一抗蚀剂图案作为掩模向多晶硅层中引入杂质离子以形成 在所述多晶硅层内的高浓度杂质层,在形成所述第一抗蚀剂图案的区域处的所述多晶硅层上形成第二抗蚀剂图案,所述第二抗蚀剂图案大于所述第一抗蚀剂图案,使得所述第一抗蚀剂图案 并且其周边区域被第二抗蚀剂图案覆盖,并且使用第二抗蚀剂图案作为掩模来蚀刻包括高浓度杂质层的多晶硅层。 根据上述方法,蚀刻位于未被第二抗蚀剂层和高密度杂质层覆盖的区域处的多晶硅层的一部分。