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91. 发明公开

KR1020040027908A 고압 처리 방법 失效
标题翻译：高压处理方法
公开(公告)号：KR1020040027908A
公开(公告)日：2004-04-01
申请号：KR1020047002403
申请日：2002-11-21
申请人： 가부시키가이샤 고베 세이코쇼
发明人： 이노우에요이찌 , 마스다가오루 , 이이지마가쯔유끼
IPC分类号： H01L21/304
CPC分类号： H01L21/02063 , B08B7/0021 , H01L21/31133 , Y10S134/902
摘要： 고압 처리실 내에서 피처리체에 초임계 이산화탄소와 약액을 접촉시킴으로써 피처리체 상의 불필요 물질의 제거를 행하기 위한 고압 처리 방법이며, 피처리체 상의 불필요 물질의 제거 처리를 행하는 공정과, 제1 린스 공정과, 제2 린스 공정을 초임계 이산화탄소를 연속적으로 유통시키면서 거의 동일한 압력으로 행하는 것이다.

92. 发明授权

KR100421038B1 표면으로부터 오염물을 제거하는 세정 장비 및 이를이용한 세정 방법 失效
标题翻译： 표면으로부터오염물을제거하는세정장비및이를이용한세정방표
公开(公告)号：KR100421038B1
公开(公告)日：2004-03-03
申请号：KR1020010016327
申请日：2001-03-28
申请人： 삼성전자주식회사
发明人： 이문희 , 이근택 , 심우관 , 정종호
IPC分类号： H01L21/304
CPC分类号： H01L21/67028 , B08B7/0057 , B08B7/02 , B24C1/003 , Y10S134/902
摘要： A cleaning apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants from the surface by physical force, and another part in which a fluid including a gaseous reactant is directed onto the surface of the substrate while the surface is irradiated to cause a chemical reaction between the reactant and organic contaminants on the surface, to chemically removing the organic contaminants. In the method of cleaning the substrate, the physical and chemical cleaning processes are carried out in a separate manner from one another so that the frozen particles of the aerosol are not exposed to the effects of the light used in irradiating the surface of the substrate. Therefore, the effectiveness of the aerosol in cleaning the substrate is maximized.
摘要翻译：用于从基底表面去除污染物的清洁设备包括两部分：一部分产生包括冷冻颗粒的气溶胶并将气溶胶引导到基底表面上以通过物理力从表面除去污染物，另一部分是其中包括气态反应物的流体被引导到基底的表面上，同时辐照表面以引起反应物和表面上的有机污染物之间的化学反应，从而化学除去有机污染物。在清洁基板的方法中，物理和化学清洁过程以彼此分离的方式进行，以使气溶胶的冷冻颗粒不暴露于照射基板表面所使用的光的作用。因此，气雾剂在清洁基材上的效果被最大化。

93. 发明公开

KR1020040011829A 웨이퍼 세정 장치 失效
标题翻译：装置清洁
公开(公告)号：KR1020040011829A
公开(公告)日：2004-02-11
申请号：KR1020020044976
申请日：2002-07-30
申请人： 삼성전자주식회사
发明人： 김동현 , 이상호
IPC分类号： H01L21/302
CPC分类号： H01L21/67051 , B08B3/02 , Y10S134/902
摘要： PURPOSE: An apparatus for cleaning a wafer is provided to remove fully the remaining particles by injecting the cleaning solution on the surface of a rotating wafer. CONSTITUTION: An apparatus for cleaning a wafer includes a plurality of holders(250), the first plate(210), and the second plate(220). The holders(250) are used for gripping a circumference of a wafer and rotating the wafer. The first plate(210) is opposite to the first side of the wafer. The first plate(210) includes the first nozzles(212) to inject the first cleaning solution. The second plate(220) is opposite to the second side of the wafer. The second plate(220) includes the second nozzles(222) to inject the second cleaning solution.
摘要翻译：目的：提供一种用于清洁晶片的设备，通过将清洁溶液注入旋转晶片的表面来完全去除剩余的颗粒。构成：用于清洁晶片的装置包括多个保持器（250），第一板（210）和第二板（220）。保持器（250）用于夹紧晶片的圆周并旋转晶片。第一板（210）与晶片的第一侧相对。第一板（210）包括用于喷射第一清洁溶液的第一喷嘴（212）。第二板（220）与晶片的第二侧相对。第二板（220）包括用于喷射第二清洁溶液的第二喷嘴（222）。

94. 发明授权

KR100416590B1 반도체 웨이퍼 세정장치 및 이를 이용한 웨이퍼 세정방법 失效
标题翻译： 반도체웨이퍼세정장치및이를이용한웨이퍼세정방반
公开(公告)号：KR100416590B1
公开(公告)日：2004-02-05
申请号：KR1020010002065
申请日：2001-01-13
申请人： 삼성전자주식회사
发明人： 박임수 , 이근택 , 한용필 , 하상록
IPC分类号： H01L21/304
CPC分类号： H01L21/67115 , B08B3/04 , B08B7/0071 , H01L21/67051 , Y10S134/902
摘要： An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying cleaning solution onto the wafer, a cover for covering an upper part of the chamber, and a light source. The cleaning solution, preferably one of ozone water, hydrogen water, or electrolytic-ionized water, may be heated for a short time and used to clean the wafer.
摘要翻译：一种用于清洁半导体晶片的设备和使用该设备清洁晶片的方法，其中，该设备包括其上安装有晶片的腔室，安装在腔室中用于支撑和固定晶片的旋转卡盘，用于喷射清洁溶液的喷嘴到晶片上，用于覆盖腔室上部的盖和光源。清洁溶液，优选臭氧水，氢气水或电解离子水中的一种可以短时间加热并用于清洁晶片。

95. 发明公开

KR1020040006407A 웨이퍼 처리 장치 失效
标题翻译：加工过程的装置
公开(公告)号：KR1020040006407A
公开(公告)日：2004-01-24
申请号：KR1020020040683
申请日：2002-07-12
申请人： 삼성전자주식회사
发明人： 박종철
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , B08B3/12 , Y10S134/902
摘要： PURPOSE: An apparatus for processing a wafer is provided to enhance the cleaning efficiency by supplying the processing fluid having the ultrasonic vibration to a wafer. CONSTITUTION: An apparatus for processing a wafer includes a rotation chuck(210), a processing fluid supply unit(220), and an ultrasonic vibrator(230). The rotation chuck(210) is used for supporting and rotating a wafer(W). The processing fluid supply unit(220) includes the first storage part(220a) for storing the first processing fluid and the first slit connected to the first storage part(220a). The processing fluid supply unit(220) is installed on an upper part of the rotation chuck(210) in order to supplying the first processing fluid to a surface of the wafer(W). The ultrasonic vibrator(230) is installed in the first storage part(220a) in order to transmit the ultrasonic vibration to the first storage part(220a).
摘要翻译：目的：提供一种用于处理晶片的装置，以通过将具有超声波振动的处理流体供应到晶片来提高清洁效率。构成：用于处理晶片的装置包括旋转卡盘（210），处理流体供应单元（220）和超声波振动器（230）。旋转卡盘（210）用于支撑和旋转晶片（W）。处理液供给单元（220）包括用于存储第一处理流体的第一存储部（220a）和与第一存储部（220a）连接的第一狭缝。处理液供给单元（220）安装在旋转卡盘（210）的上部，以将第一处理流体供给到晶片（W）的表面。超声波振动器（230）安装在第一存储部（220a）中，以将超声波振动传递到第一存储部（220a）。

96. 发明公开

KR1020040001332A 반도체 기판의 건조장비 失效
标题翻译：半导体基片干燥设备
公开(公告)号：KR1020040001332A
公开(公告)日：2004-01-07
申请号：KR1020020036489
申请日：2002-06-27
申请人： 삼성전자주식회사
发明人： 권영민 , 남창현 , 박상오 , 명영광 , 안덕민
IPC分类号： H01L21/304
CPC分类号： H01L21/67057 , B08B3/102 , H01L21/67028 , Y10S134/902
摘要： PURPOSE: A semiconductor substrate drying equipment using the marangoni effect is provided to prevent IPA(Isopropyl Alcohol) condensate forming at the outlet of a dry gas nozzle from falling into a wafer holding chamber. CONSTITUTION: In a semiconductor substrate drying equipment, a chamber(100) includes a bath(140) containing semiconductor substrates and a cover(120) which opens and shuts the bath. Also included is a bubbler(200) having a steam generator(220) that generates an alcohol steam for drying the semiconductor substrate and an injector(240) which injects the chamber(100) with the alcohol steam and a carrier gas that carries the alcohol steam. The injector(240) is provided with a guide device which leads the IPA(Isopropyl Alcohol) condensate at the outlet of the injector(240) to flow inside the injector.
摘要翻译：目的：提供使用马拉贡尼效应的半导体基板干燥设备，以防止在干燥气体喷嘴出口处形成的IPA（异丙醇）冷凝物落入晶片保持室。构成：在半导体衬底干燥设备中，室（100）包括含有半导体衬底的浴（140）和打开和关闭浴的盖（120）。还包括具有产生用于干燥半导体衬底的醇蒸汽的蒸汽发生器（220）的起泡器（200）和向醇室（100）注入醇蒸汽和携带醇的载气的注射器（240）蒸汽。注射器（240）设置有引导装置，其引导在喷射器（240）的出口处的IPA（异丙醇）冷凝物在喷射器内部流动。

97. 发明授权

KR100414540B1 초음파처리장치 및 이를 사용한 전자부품의 제조방법 失效
标题翻译： 초음파처리장치및이를사용한전자부품의제조방초
公开(公告)号：KR100414540B1
公开(公告)日：2004-01-07
申请号：KR1020000077445
申请日：2000-12-16
申请人： 샤프 가부시키가이샤
发明人： 고바야시가즈키 , 오노히토시 , 타구사야스노브 , 히키다토모미 , 마이다유이치
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , B08B3/123 , G03F7/428 , H05K3/0085 , H05K3/26 , Y10S134/902
摘要： To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region. The foregoing arrangement causes ultrasonic-projected regions of the ultrasonic oscillation elements to partly overlap each other on a surface of the glass substrate when the glass substrate is transported by transport rollers in the transport direction, thereby enabling ultrasonic projection over the complete entirety of the ultrasonic processing target region.
摘要翻译：本发明提供一种超声波处理装置，该超声波处理装置能够利用超声波振动元件将超声波均匀地投射到整个超声波处理对象区域，从而能够有效地执行清洁操作，抗蚀剂剥离操作等，所述超声波振动元件的宽度小于处理对象物的超声波加工对象部位，以及使用该装置的电子部件的制造方法，多个超声波振动元件配置成在玻璃基板的输送方向和玻璃基板的宽度方向并且通过将所述超声波振荡元件投影到垂直于玻璃基板传送方向的平面而获得的投影图形成宽度超过超声波处理目标区域的宽度的单个带状区域。根据上述结构，通过输送辊在输送方向上输送玻璃基板时，超声波振动元件的超声波投射区域在玻璃基板的表面上一部分重叠，能够超声波投射到整个超声波处理目标区域。

98. 发明授权

KR100392828B1 브러시를통한화학약품공급방법및장치 失效
公开(公告)号：KR100392828B1
公开(公告)日：2003-10-17
申请号：KR1019980702707
申请日：1996-10-11
申请人： 램 리서치 코포레이션
发明人： 델라리오스존엠. , 래브킨미카일 , 가드너도글라스지.
IPC分类号： B08B1/00 , A46B11/00 , C23G1/00
CPC分类号： H01L21/02052 , A46B11/06 , B08B1/007 , B08B1/04 , B08B3/08 , H01L21/31111 , H01L21/67046 , Y10S134/902
摘要： A method and apparatus for chemical delivery through the brush (240) used in semiconductor substrate cleaning processes. The chemical solutions (210, 220) are delivered to the core (230) of a brush (240) where the solution is absorbed by the brush (240) and then applied by the brush (240) onto the substrate. This delivery system applies the chemical solutions (210, 220) uniformly to the semiconductor substrate, reduces the volumes of chemical solutions (210, 220) used in a scrubbing process, and helps maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a scrubber that scrubs both sides of a semiconductor substrate.
摘要翻译：一种用于通过半导体衬底清洁工艺中使用的刷子（240）进行化学物质输送的方法和装置。将化学溶液（210,220）输送到刷子（240）的核心（230），其中溶液被刷子（240）吸收，然后通过刷子（240）施加到基底上。该输送系统将化学溶液（210,220）均匀地施加到半导体衬底上，减少了洗涤过程中使用的化学溶液（210,220）的体积，并有助于保持控制衬底的pH分布。该系统以与擦洗半导体衬底两侧的擦洗器结合使用的方式进行描述和说明。＆lt;图像＆GT;

99. 发明授权

KR100401354B1 화학 기계 연마 후 반도체 웨이퍼의 보관 방법 失效
标题翻译： 화학기계연마후반도체웨이퍼의보관방법
公开(公告)号：KR100401354B1
公开(公告)日：2003-10-11
申请号：KR1020000015039
申请日：2000-03-24
申请人： 르네사스 일렉트로닉스 가부시키가이샤
发明人： 아오키히데미츠 , 야마사키신야
IPC分类号： H01L21/302
CPC分类号： H01L21/02074 , H01L21/67057 , Y10S134/902
摘要： Wafer storage during time between completion of CMP and start of cleaning process comprises exposing the polished wafer to water which is treated to reduce oxidation effects on the wafer, caused by oxidizing agent contained in an abrasive used during CMP. Independent claims are also included for: (a) an apparatus (40) to store the polished wafer (20) which comprises a water tank (42), a pure water supply pipe (44), a recycling apparatus with return pipe (52), pump (49) and filter (50), and a discharge drain (48); and (b) a process storage of the wafer by keeping it immersed in pure water, to which an anticorrosion agent is added, preventing chemical attack of the metallic wiring of the wafer.
摘要翻译：在完成CMP和开始清洁过程之间的时间期间的晶片存储包括将抛光的晶片暴露于水中，该水被处理以减少由在CMP期间使用的研磨剂中包含的氧化剂引起的对晶片的氧化作用。独立权利要求还包括：（a）储存抛光晶片（20）的设备（40），该抛光晶片包括水箱（42），纯水供应管（44），具有回流管（52）的回收装置，，泵（49）和过滤器（50）以及排放排水管（48）; 和（b）通过将晶片保持在添加有防腐蚀剂的纯水中来保存晶片的过程，从而防止晶片的金属布线的化学侵蚀。

100. 发明授权

KR100390545B1 기판세정건조장치,기판세정방법및기판세정장치 失效
标题翻译： 기판세정건조장치，기판세정방법및기판세정장치
公开(公告)号：KR100390545B1
公开(公告)日：2003-09-26
申请号：KR1019960062257
申请日：1996-12-06
申请人： 도쿄엘렉트론가부시키가이샤
发明人： 신도나오키 , 가미카와유지 , 모쿠오쇼리 , 구마가이요시오
IPC分类号： H01L21/304
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.
摘要翻译： 1。一种基板清洗干燥装置，其特征在于，具备：导入晶片的处理部，其导入清洗处理液和干燥晶片的蒸气;供给排出口，用于向处理部导入溶液;排出处理部的溶液，用于从多种溶液中选择一种溶液的溶液供应机构，具有用于产生干燥用蒸气的加热器的干燥蒸气产生部，具有用于从处理部快速排出溶液的开口的排出溶液机构，电阻率检测部件用于检测处理溶液的电阻率值;以及控制器，用于基于由电阻率检测装置检测的电阻率值来控制向处理部分的溶液供应。

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