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1. 发明授权

KR101693900B1 광경화성 수지 조성물, 그의 드라이 필름 및 경화물, 및 이들을 이용한 인쇄 배선판 有权
标题翻译：光固化树脂组合物干燥膜和光固化树脂组合物的固化产物和印刷线路板使用光刻胶树脂组合物干膜和固化产品
公开(公告)号：KR101693900B1
公开(公告)日：2017-01-06
申请号：KR1020117010397
申请日：2009-06-30
申请人： 다이요 홀딩스 가부시키가이샤
发明人： 아끼야마,마나부 , 미네기시,쇼지 , 아리마,마사오
IPC分类号： G03F7/038 , C08F290/14 , G03F7/004 , H05K3/28
CPC分类号： G03F7/0388 , C08F299/024 , G03F7/161 , H05K3/287
摘要： 본발명은건조도막의지촉건조성이우수하고, 고감도이고유연하며, 특히고온가습시절연저항이높은경화피막을형성할수 있는광경화성수지조성물, 그의드라이필름및 경화물및 이들에의해솔더레지스트등의경화피막이형성되어이루어지는인쇄배선판을제공한다. 알칼리현상성의광경화성수지조성물은, 하기화학식 I로표시되는구조를포함하는감광성수지와, 카르복실기함유수지와, 광중합개시제를함유한다. 바람직하게는추가로열경화성성분을함유하고, 바람직하게는추가로착색제를함유한다. 식중, R은수소원자, 탄소수 1 내지 20의유기기이며, 동일하거나상이할수도있고, R는탄소수 1 내지 10의알킬기, 탄소수 1 내지 10의알킬렌기및 페닐렌기로이루어지는군에서선택되는적어도 1종의관능기를나타내고, R은수소원자또는탄소수 1 내지 4의알킬기를나타내고, R는수소원자또는탄소수 1 내지 4의알킬기를나타내고, R는수소원자또는메틸기를나타내고, p는 1 내지 5의정수를나타내고, q는 3 이상의정수를나타내고, m은 1 내지 4의정수를나타내고, n은 1 내지 10의정수를나타낸다.
摘要翻译：公开了一种能够形成干燥的涂膜的可光固化树脂组合物，其具有高度的干燥性，具有高灵敏度，并且可以在高温和加湿条件下形成柔软的，特别是具有高绝缘电阻的固化膜。还公开了干燥膜和光固化树脂组合物的固化产物，以及包含使用光固化树脂组合物，干膜和固化产物形成的阻焊剂等固化膜的印刷布线板。可光固化树脂组合物是碱显影剂，并且包含具有由通式（I）表示的结构的光敏树脂，含羧基的树脂和光聚合引发剂。优选地，光固化树脂组合物还包含可热固化组分，更优选还包含着色剂。在通式（I）中，可以相同或不同的R 1表示氢原子和碳原子数1〜20的有机基团。 R2表示选自碳原子数1〜10的烷基，碳原子数1〜10的亚烷基和亚苯基中的至少一种官能团。 R3表示氢原子或碳原子数1〜4的烷基。 R4表示氢原子或碳原子数1〜4的烷基。 R5表示氢原子或甲基; p为1〜5的整数， q为3以上的整数， m为1〜4的整数。 n为1〜10的整数。

2. 发明授权

KR101436757B1 원통형 스템프 제조용 감광제 도포장치 有权
标题翻译：用于制造圆柱印花的光电喷雾装置
公开(公告)号：KR101436757B1
公开(公告)日：2014-09-02
申请号：KR1020130130041
申请日：2013-10-30
申请人： 주식회사 상진미크론
发明人： 이창린 , 성춘식 , 이준호 , 우동휘 , 김경동 , 황정진
IPC分类号： G03F7/16 , H01L21/027 , H01L21/30
CPC分类号： G03F7/161 , G03F7/162 , H01L21/0273 , H01L21/3006
摘要： The present invention relates to a photoresist applying apparatus for manufacturing a cylindrical stamp, which can uniformly apply various photoresists at a predetermined thickness on a surface of a cylindrical mold for manufacturing the cylindrical stamp used in a roll to roll process. A photoresist applying apparatus for manufacturing a cylindrical stamp according to the present invention comprises: a first clamp coupled to a first supporter and to which one end of a cylindrical mold is coupled; a second clamp rotatably coupled to a second supporter so as to face the first clamp such that the other end of the cylindrical mold is coupled thereto; a rotation device providing a rotational force to the first clamp; at least one heater disposed on at least one of the first clamp and the second clamp so as to heat the cylindrical mold; a nozzle having a jet orifice that is directed toward an outer circumference of the cylindrical mold in order to spray a photoresist on the outer circumference of the cylindrical mold that is coupled to the first clamp and the second clamp; a nozzle supporter supporting the nozzle; and a moving device moving the nozzle supporter in a longitudinal direction of the cylindrical mold.
摘要翻译：本发明涉及一种用于制造圆柱形印模的光致抗蚀剂施加装置，其可以在圆柱形模具的表面上均匀地施加预定厚度的各种光致抗蚀剂，以制造用于卷绕工艺的圆柱形印模。根据本发明的用于制造圆柱形印模的光致抗蚀剂施加装置包括：联接到第一支撑件并且联接圆柱形模具的一端的第一夹具; 第二夹具，其可旋转地联接到第二支撑件，以便面对第一夹具，使得圆柱形模具的另一端与其连接; 向第一夹具提供旋转力的旋转装置; 设置在所述第一夹具和所述第二夹具中的至少一个上的至少一个加热器，以加热所述圆柱形模具; 喷嘴，其具有朝向圆柱形模具的外圆周的喷射孔，以便喷射耦合到第一夹具和第二夹具的圆柱形模具的外周上的光致抗蚀剂; 支撑喷嘴的喷嘴支撑件; 以及沿圆柱形模具的纵向方向移动喷嘴支撑件的移动装置。

3. 发明授权

KR101411328B1 마찰 마모 저감을 위한 탄성 표면 구조 및 그 제조 방법 有权
标题翻译：用于磨损和摩擦减少的弹性表面结构及其方法
公开(公告)号：KR101411328B1
公开(公告)日：2014-06-25
申请号：KR1020130005309
申请日：2013-01-17
申请人： 연세대학교 산학협력단
发明人： 김대은 , 유신성 , 올릭세이펜코브
IPC分类号： C09D5/00 , G03F7/26
CPC分类号： G03F1/0007 , G03F1/74 , G03F1/80 , G03F7/161 , G03F7/70991 , H01L21/02274 , H01L21/0274 , H01L21/0337 , H01L21/7624 , H01L2924/1461
摘要： The present invention relates to an elastic surface structure for reducing wear and friction between two structures which relatively move while being in contact with each other and a manufacturing method thereof. For this, the elastic surface structure for reducing wear and friction between two structures which relatively move while being in contact with each other comprises: a plurality of pillar units which have a pillar shape, are arranged at intervals on the surface of the structure, are deformed within an inherent elasticity range when a load is applied from the structure, and are restored to its initial shape when the load is removed; and a plurality of plate units which have a plate shape, are fixed to the top of the pillar units, and move by linking with the pillar units while being in contact with the surface of the structure when the pillar units are elastically deformed due to the load from the structure.
摘要翻译：本发明涉及一种用于减少相互接触地相对移动的两个结构之间的磨损和摩擦的弹性表面结构及其制造方法。为此，用于减少彼此相对移动而相互移动的两个结构之间的磨损和摩擦的弹性表面结构包括：在结构表面上间隔布置有具有柱状的多个柱单元，在从结构施加载荷时在固有的弹性范围内变形，并且当负载被去除时恢复到其初始形状; 并且具有板状的多个板单元被固定到柱单元的顶部，并且当柱单元由于该柱单元弹性变形而与柱单元连动时与该结构的表面接触而移动从结构加载。

4. 发明授权

KR101192624B1 외부층들 사이에 개재된 감광조사층을 이미지 전사함으로써 미세구조를 제조하는 시스템 및 방법과 이를 이용하여 제조된 미세구조 失效
标题翻译：通过对夹在外层之间的辐射敏感层进行成像制造微结构的系统和方法，以及由此制造的微结构
公开(公告)号：KR101192624B1
公开(公告)日：2012-10-18
申请号：KR1020067004898
申请日：2004-08-20
申请人： 브라이트 뷰 테크놀로지즈 코포레이션
发明人： 프리즈로버트피. , 라인하트토마스에이. , 우드로버트엘.
IPC分类号： G03F7/09 , G03F7/16
CPC分类号： G03F7/0015 , G02B3/0025 , G02B3/0031 , G02B5/1852 , G02B5/1857 , G03F7/0005 , G03F7/161 , Y10S430/146
摘要： 이미지 전사 플랫폼 상에서 한쌍의 외부층 사이에 개재된 감광조사층을 포함하는 미세구조 마스터 블랭크를 이미지 전사하여 감광조사층 내에 미세구조를 한정함으로써 미세구조가 제조된다. 이 후, 적어도 하나 이상의 외부층이 제거된다. 감광조사층에 한정된 미세구조는 현상된다. 한쌍의 외부층 사이에 개재된 감광조사층은 미세구조 마스터 블랭크를 제공하기 위하여 웹으로서 제조될 수 있다.
포토레지스트, 마스터링(mastering), 스탬퍼(stamper), 미세렌즈(micro-lenses), 광학격자(optical grating), 미세반사기(micro-reflector)

5. 发明公开

KR1020120089855A 접착물 도포장치 및 접착물 도포방법 有权
标题翻译：手术装置和方法
公开(公告)号：KR1020120089855A
公开(公告)日：2012-08-14
申请号：KR1020127009736
申请日：2011-04-19
申请人： 베이징 비오이 옵토일렉트로닉스 테크놀로지 컴퍼니 리미티드
发明人： 저우웨이펑 , 구오지안 , 밍싱
IPC分类号： B05C5/02 , B05C9/06 , H01L21/027 , G03F7/16
CPC分类号： B05C5/027 , B05C9/06 , G03F7/16 , H01L21/6715 , G03F7/161 , H01L21/0273
摘要： A gumming device and method can reduce or avoid generation of air bubbles between layers thereby improving quality and manufacturing efficiency of TFT LCD. The gumming device comprises a nozzle, a gum feeding mechanism connected with the nozzle and a nozzle moving mechanism. Wherein at least two rows of gum injection holes are included in the nozzle, and the two adjacent rows of gum injection holes are separated by a spacer. The gumming method comprises that the nozzle is moved on the substrate by the nozzle moving mechanism, and each row of gum injection holes in the nozzle is successively opened in a direction opposite to the moving direction of nozzle for applying gum. The gumming device is used for applying multilayer gum.

6. 发明公开

KR1020120032424A 레지스트 조성물 및 반도체 장치의 제조 방법 无效
标题翻译：电阻组合物和生产半导体器件的方法
公开(公告)号：KR1020120032424A
公开(公告)日：2012-04-05
申请号：KR1020110094567
申请日：2011-09-20
申请人： 소니 주식회사
发明人： 아리미츠코지 , 마츠자와노부유키 , 미타이사오
IPC分类号： G03F7/004 , G03F7/039 , G03F7/16
CPC分类号： G03F7/40 , G03F7/30 , H01L21/0273 , G03F7/0045 , G03F7/0047 , G03F7/0392 , G03F7/16 , G03F7/161
摘要： PURPOSE: A resist composition and a method for manufacturing a semiconductor device are provided to miniaturize the openings of resist patterns by containing a cross-linking material, an acid amplifying agent, and a solvent. CONSTITUTION: A resist composition includes a cross-linking material, an acid amplifying agent, and a solvent. The cross-linking material implements a cross-linking operation under the existence of acid. A method for manufacturing a semiconductor device includes the following: a first resist pattern(13) supplying acid is formed on a semiconductor substrate using a first resist composition; a second resist layer(14) is formed on the first resist pattern by applying a second resist composition; a cross-linked part is formed on the second resist layer by dispersing acid from the first resist pattern to the second resist layer; and the non-cross-linked part of the second resist layer is eliminated.
摘要翻译：目的：提供抗蚀剂组合物和半导体装置的制造方法，通过含有交联材料，酸化剂和溶剂来使抗蚀剂图案的开口小型化。构成：抗蚀剂组合物包括交联材料，酸扩增剂和溶剂。交联材料在酸存在下进行交联操作。一种制造半导体器件的方法包括：使用第一抗蚀剂组合物在半导体衬底上形成提供酸的第一抗蚀剂图案（13）; 通过施加第二抗蚀剂组合物在第一抗蚀剂图案上形成第二抗蚀剂层（14）通过将酸从第一抗蚀剂图案分散到第二抗蚀剂层而在第二抗蚀剂层上形成交联部分; 并且消除了第二抗蚀剂层的非交联部分。

7. 发明公开

KR1020120032397A 패턴 형성 방법 및 패턴 형성 장치 无效
标题翻译：图案形成方法和图案形成装置
公开(公告)号：KR1020120032397A
公开(公告)日：2012-04-05
申请号：KR1020110044550
申请日：2011-05-12
申请人： 가부시키가이샤 스크린 홀딩스
发明人： 이와시마마사노부 , 사나다마사카즈 , 후루이치고지
IPC分类号： B05D1/02 , B05C5/02 , G03F7/16 , H01L21/027
CPC分类号： H05K3/1241 , H01L31/18 , H05K2203/0126 , B05D1/025 , B05C5/0216 , G03F7/161 , G03F7/2041 , H01L21/0274
摘要： PURPOSE: A pattern formation method and a pattern forming device are provided to stable a starting and end location of the pattern by returning and moving a nozzle while discharging the coating solutions. CONSTITUTION: A pattern formation method comprises next steps: relatively transferring a nozzle along the surface of a substrate to an injection moving direction; successively discharging coating liquid including materials for developing pattern from an outlet of nozzle; forming a line shaped pattern on the substrate surface; A relative position of the nozzle compare to the substrate surface reaches to an end point of a predetermined pattern(X3); transferring the nozzle along the surface of substrate to opposite direction of the injection moving direction; stopping discharge of the coating solutions from the outlet. Gradually reducing vent amount before relative position of the nozzle compare to the substrate surface reaches to end point of the pattern; discharging the coating solution from the outlet by pressurizing the coating solutions within the nozzle; reducing discharging rate by stop pressurizing the coating solutions; and transferring the nozzle to the pattern end site.
摘要翻译：目的：提供图案形成方法和图案形成装置，以通过在排出涂布溶液的同时返回和移动喷嘴来稳定图案的起始和终止位置。构成：图案形成方法包括以下步骤：将喷嘴沿衬底的表面相对转移到注射移动方向; 从喷嘴的出口依次排出包括显影图案的材料的涂布液; 在基板表面上形成线状图案; 与基板表面相比，喷嘴的相对位置达到预定图案（X3）的终点; 沿着喷射移动方向的相反方向将喷嘴沿基板的表面传送; 停止从出口排出涂层溶液。在喷嘴相对于基板表面的相对位置之前逐渐减小排气量到达图案的终点; 通过对喷嘴内的涂层溶液进行加压，从出口排出涂布溶液; 通过停止对涂层溶液加压来降低排放速率; 并将喷嘴传送到图案末端部位。

8. 发明公开

KR1020110073249A 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 有权
标题翻译： IMPRINT APPARATUS，IMPRINT METHOD，AND ARTICLE MANUFACTURING METHOD
公开(公告)号：KR1020110073249A
公开(公告)日：2011-06-29
申请号：KR1020100115521
申请日：2010-11-19
申请人： 캐논 가부시끼가이샤
发明人： 이나히데끼
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B29C59/02 , B41J25/001 , B82Y10/00 , B82Y40/00 , H01L21/0274 , G03F7/161
摘要： PURPOSE: An imprint apparatus, imprint method, and article manufacturing method are provided to perform an imprint operation between sets of discharging holes, thereby saving running costs. CONSTITUTION: A resin is coated on an imprint area of a substrate(S605). The resin coated is molded by a mold(S606). A discharging unit has an array of a discharging hole which discharges a resin. A dispenser coats a resin on the imprint area. A controller controls the dispenser. A driving machine changes the relative location of the substrate. The controller controls the driving machine.
摘要翻译：目的：提供压印装置，压印方法和制品制造方法，以在排出孔组之间进行压印操作，从而节省运行成本。构成：将树脂涂布在基板的印刷区域上（S605）。涂布的树脂通过模具成型（S606）。排出单元具有排出树脂的排出孔的阵列。分配器在印记区域上涂覆树脂。控制器控制分配器。驱动机器改变基板的相对位置。控制器控制驱动机。

9. 发明公开

KR1020110064409A 박막 패턴의 제조 장치 및 방법 无效
标题翻译：制作薄膜图案的装置和方法
公开(公告)号：KR1020110064409A
公开(公告)日：2011-06-15
申请号：KR1020090121011
申请日：2009-12-08
申请人： 엘지디스플레이 주식회사
发明人： 김병걸 , 김성희
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B29C59/022 , G03F7/161 , G03F7/2012 , G03F7/2018
摘要： PURPOSE: A device and method for manufacturing a thin film pattern are provided to add trimethylated silica to a printing mold, thereby the adhesive strength between organic liquid and a printing mold. CONSTITUTION: An organic liquid supply unit supplies organic liquid. A printing board includes a groove and a protrusion part for patterning the organic liquid. A blanket receives organic liquid supplied through the organic liquid supply unit. The blanket includes a printing mold formed by trimethylated silica to have an adhesive property. The printing roller rotates on the printing board and a substrate.
摘要翻译：目的：提供用于制造薄膜图案的装置和方法，以将三甲基化二氧化硅加入到印刷模具中，由此有机液体和印刷模具之间的粘合强度。构成：有机液体供应单元提供有机液体。印刷板包括凹槽和用于图案化有机液体的突出部分。毯子接收通过有机液体供应单元供应的有机液体。毛毯包括由三甲基化二氧化硅形成的具有粘合性质的印刷模具。印刷辊在印刷板和基板上旋转。

10. 发明公开

KR1020100009535A 감광성 수지 조성물 및 적층체 有权
标题翻译：感光树脂组合物和层状产品
公开(公告)号：KR1020100009535A
公开(公告)日：2010-01-27
申请号：KR1020097018908
申请日：2008-03-06
申请人： 아사히 가세이 이-매터리얼즈 가부시키가이샤
发明人： 하타요스케
IPC分类号： G03F7/031 , G03F7/027
CPC分类号： G03F7/033 , G03F7/031 , G03F7/161
摘要： A photosensitive resin composition which has satisfactory compatibility in dry-film formation, has sensitivity equally to two lights of i-line and h-line, is excellent in resolution and adhesion, and can be developed with an alkaline aqueous solution. Also provided are: a layered photosensitive-resin product including the photosensitive resin composition; a method of forming a resist pattern on a substrate with the layered photosensitive-resin product; and a use of the resist pattern. The photosensitive resin composition comprises: (a) 20-90 mass% thermoplastic copolymer which includes comonomer units derived from an α, β-unsaturated monomer having a carboxy group and which has an acid equivalent of 100-600 and a weight-average molecular weight of 5,000-500,000; (b) 5-75 mass% addition-polymerizable monomer having at least one ethylenically unsaturated terminal group; (c) 0.01-30 mass% photopolymerization initiator comprising a triarylimidazolyl dimer; and (d) 0.001-10 mass% pyrazoline compound represented by a specific general formula.
摘要翻译：在干膜形成中具有令人满意的相容性的感光性树脂组合物具有与i线和h线的两个光线相同的灵敏度，分辨率和粘附性优异，可以用碱性水溶液显影。还提供：包含感光性树脂组合物的层状感光性树脂制品; 使用层状感光性树脂制品在基板上形成抗蚀剂图案的方法; 和抗蚀剂图案的使用。感光性树脂组合物包含：（a）20-90质量％的热塑性共聚物，其包含衍生自具有羧基的α，β-不饱和单体的共聚单体单元，其酸当量为100-600，重均分子量 5000-500,000; （b）5-75质量％的具有至少一个烯键式不饱和端基的可加成聚合单体; （c）含有三芳基咪唑基二聚体的0.01-30质量％光聚合引发剂; 和（d）0.001-10质量％的由具体通式表示的吡唑啉化合物。

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