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    • 3. 发明公开
    • 세정기능이 구비된 스크린 인쇄장치
    • 具有清洁功能的画面打印装置
    • KR1020130029834A
    • 2013-03-26
    • KR1020110093178
    • 2011-09-16
    • 엘지디스플레이 주식회사
    • 정경만임대승
    • B41F15/08B41F35/00B41F15/14
    • B41F15/08B41F15/14B41F35/00B41F35/003
    • PURPOSE: A screen printing device with a cleaning function is provided to automatically clean a screen mask and to improve the quality of a pattern printed on objects by maintaining a cleaned level of the screen mask over a predetermined level. CONSTITUTION: A screen printing device with a cleaning function comprises a support tool(2), a printing tool(3), a screen mask(4), a main body(5), and a cleaning part. The support tool supports objects. The printing tool prints a pattern on the objects. The screen mask has multiple pattern holes corresponding to the pattern to be printed on the objects and is positioned between the support tool and the printing tool. The support tool and the screen mask are installed in the main body. The cleaning part is positioned in a work area where a printing work is implemented to move between a cleaning position and a standby position.
    • 目的:提供具有清洁功能的丝网印刷装置,以通过将屏幕掩模的清洁水平维持在预定水平上来自动清洁屏幕掩模并且提高印刷在对象上的图案的质量。 构成:具有清洁功能的丝网印刷装置包括支撑工具(2),印刷工具(3),屏幕掩模(4),主体(5)和清洁部分。 支持工具支持对象。 打印工具在对象上打印图案。 屏幕掩模具有对应于要打印在物体上的图案的多个图案孔,并且位于支撑工具和打印工具之间。 支撑工具和屏幕面罩安装在主体上。 清洁部件定位在工作区域中,其中执行打印作业以在清洁位置和待机位置之间移动。
    • 5. 发明公开
    • 건조 장치
    • 干燥基材的装置
    • KR1020140018496A
    • 2014-02-13
    • KR1020120084599
    • 2012-08-01
    • 엘지디스플레이 주식회사
    • 임대승
    • G02F1/13H01L51/56B65G49/06
    • G02F1/1303B65G49/061F26B15/10F26B21/004
    • In one embodiment of the present invention, disclosed is a drying apparatus which includes a station for drying a substrate and a transfer unit which transfers the substrate from the station in a transfer direction. The transfer unit includes a stage which includes a pocket part which is composed of pins which are fixed on the stage and support the substrate, and a shuttle which receives the substrate loaded on the pocket part, loads the substrate on another pocket part which is adjacent in the transfer direction, and includes a receiving unit which is composed of the pins. [Reference numerals] (AA) First station; (BB) Second station; (CC) Third station
    • 在本发明的一个实施例中,公开了一种干燥装置,其包括用于干燥基板的站和在传送方向上从站传送基板的传送单元。 传送单元包括:台架,其包括由固定在台架上并支撑基板的销组成的袋部;以及容纳加载在袋部上的基板的梭子,将基板装载在相邻的另一袋部上 并且包括由销构成的接收单元。 (附图标记)(AA)第一站; (BB)二站; (CC)第三站
    • 6. 发明授权
    • 건식 세정 장치
    • 干洗店
    • KR101791197B1
    • 2017-10-31
    • KR1020110050536
    • 2011-05-27
    • 엘지디스플레이 주식회사(주)비테크
    • 정경만최종률임대승민지호
    • B08B5/02B08B11/04B08B1/00B08B5/04
    • 본발명은건식세정장치에관한것으로서, 특히, 정전기에의해이물질이붙어있는기판을건조상태에서세정하기위해이오나이저와, 롤브러쉬를이용하고있는, 건식세정장치를제공하는것을기술적과제로한다. 이를위해본 발명에따른건식세정장치는, 세정대상인기판이투입되는투입부; 상기기판이정전기로대전되는것을방지하고, 상기기판의표면을브러쉬를이용하여세정하기위한제1세정부; 및상기제1세정부를통해세정된상기기판을배출하기위한배출부를포함한다.
    • 本发明涉及一种干式清洁设备,特别是,清洁该衬底,以将外源物质通过静电在干燥状态下使用的离子发生器安装,辊刷,和零,以提供干式清洁设备和技术。 为此,根据本发明的干洗设备包括:输入单元,其中输入待清洁的常用板; 第一清洁器,用于防止基板被静电充电并且使用刷子清洁基板的表面; 以及用于排出通过第一清洁单元清洁的基板的排出单元。
    • 8. 发明公开
    • 기판 처리 장치 및 방법과 이를 이용한 표시장치 제조방법
    • 用于处理基板的装置,用于处理基板的方法及使用其制造显示装置的方法
    • KR1020140052485A
    • 2014-05-07
    • KR1020120118606
    • 2012-10-24
    • 엘지디스플레이 주식회사
    • 정경만임대승
    • H01L21/677H01L31/18G02F1/13
    • Y02P70/521H01L21/67745G02F1/1303H01L21/6838H01L31/1876Y02E10/50
    • The present invention relates to a device and method for treating a substrate and a method for manufacturing a display device using the same. The disclosed composition is composed of a first upper layer unit which horizontally transfers a substrate being inputted; a lower layer unit which includes a substrate treating unit cleaning and drying the substrate; a second upper layer unit which horizontally transfers the substrate vertically transferred via the substrate treating unit of the lower layer to discharge the substrate to the outside; a second substrate transferring unit which vertically transfers the substrate transferred via a first substrate transferring unit formed on the first upper layer; a third substrate transferring unit which horizontally transfers the substrate supplied from the second substrate transferring unit to the substrate treating unit of the lower layer; a fourth substrate transferring unit which horizontally transfers the substrate penetrated through the substrate treating unit of the lower layer; a fifth substrate transferring unit which vertically transfers the substrate transferred via the fourth substrate transferring unit; and a sixth substrate transferring unit which horizontally transfers the substrate supplied from the fifth substrate transferring unit to discharge the substrate to the outside.
    • 本发明涉及一种用于处理基板的装置和方法以及使用该基板的显示装置的制造方法。 所公开的组合物由水平传送正被输入的基板的第一上层单元组成; 下层单元,其包括清洗并干燥所述基板的基板处理单元; 第二上层单元,其水平地传送经由下层的基板处理单元垂直转印的基板,以将基板排出到外部; 第二基板转印单元,其垂直地转印经由形成在第一上层上的第一基板转印单元转印的基板; 第三基板传送单元,其将从第二基板传送单元供应的基板水平地传送到下层的基板处理单元; 水平传送穿过下层的基板处理单元的基板的第四基板转印单元; 第五基板传送单元,其垂直地传送经由第四基板传送单元传送的基板; 以及第六基板传送单元,其水平地传送从第五基板传送单元提供的基板以将基板排出到外部。
    • 9. 发明公开
    • 건식 세정 장치
    • 干洗店
    • KR1020120131994A
    • 2012-12-05
    • KR1020110050536
    • 2011-05-27
    • 엘지디스플레이 주식회사(주)비테크
    • 정경만최종률임대승민지호
    • B08B5/02B08B11/04B08B1/00B08B5/04
    • B08B5/02B08B1/00B08B5/04B08B11/04
    • PURPOSE: A dry cleaning apparatus is provided to simply remove foreign materials from a substrate using an ionizer and a roll brush. CONSTITUTION: A dry cleaning apparatus comprises an input unit(10), a first cleaning unit(20), and a discharge unit(50). A substrate(90) is put into the input unit. The first cleaning unit prevents the substrate from being electrified with static electricity and cleans the surface of the substrate. The first cleaning unit comprises a front ionizer and a roll brush. The front ionizer jets ionized air to the substrate. The roll brush cleans the surface of the substrate with the ionized air. The discharge unit discharges the cleaned substrate to the outside.
    • 目的:提供一种干洗设备,使用离子发生器和辊刷从基板中简单地除去异物。 构成:干洗设备包括输入单元(10),第一清洁单元(20)和排出单元(50)。 将基板(90)放入输入单元中。 第一清洁单元防止基板被静电带电并且清洁基板的表面。 第一清洁单元包括前离子发生器和辊刷。 前离子发生器将电离空气喷射到基底。 辊刷用电离空气清洁基板的表面。 放电单元将清洁的基板排出到外部。