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    • 1. 发明授权
    • 분산제
    • KR100459963B1
    • 2004-12-04
    • KR1020010019259
    • 2001-04-11
    • 에보니크 데구사 게엠베하
    • 샤르페토마스골체르트라이너망골트헬무트
    • C01B33/14
    • B41M5/5218C01B33/1417C09D17/007
    • Dispersions (0.001-80 wt.%) consist of a liquid phase (e.g. water) and a solid phase comprising an aerosol-doped pyrogenic oxide of BET surface area 5-600m /g, the oxide being silica obtained by flame-hydrolysis or -oxidation and being conventionally doped with e.g. an Al oxide in an amount of 1-200,000ppm, with the dopant having been introduced as a salt or salt mixture. An Independent claim is also included for production of the dispersion by introducing 0.001-80 wt.% of the aerosol-doped pyrogenic oxide into a liquid (e.g. water) and then milling in a ball-, pearl- or high pressure-mill or in other known mills such as rotor-stator (Ultra Turrax) mills.
    • 分散体(0.001-80%(重量))组成的液相(例如水)和包含BET表面积5-600m&LT的掺杂气雾热解氧化物的固相的2 /克,而二氧化硅通过火焰得到的氧化物 水解或氧化并常规掺杂例如 一种量为1-200,000ppm的Al氧化物,掺杂剂以盐或盐混合物的形式引入。 独立权利要求还通过引入0.001-80重量%的所述掺杂气雾热解法氧化的%转化为液体(例如水)中,然后在研磨一个球 - ,pearl-或高压磨或在包括用于生产分散体的 其他已知的磨机如转子 - 定子(Ultra Turrax)磨机。
    • 2. 发明公开
    • 수성 분산액, 이의 제조방법 및 용도
    • 水性分散溶液,制备方法及其用途
    • KR1020020068960A
    • 2002-08-28
    • KR1020020009289
    • 2002-02-21
    • 에보니크 데구사 게엠베하
    • 멘첼프랑크로르츠볼프강망골트헬무트
    • C09K3/14
    • B82Y30/00C01F7/02C01P2002/50C01P2004/62C01P2004/64C01P2006/12C09G1/02C09K3/1436C09K3/1463Y10T428/2991Y10T428/2993
    • PURPOSE: An aqueous dispersion solution, its preparation method and its use are provided, which dispersion solution is used for the chemical mechanical polishing of a semiconductor substrate. CONSTITUTION: The aqueous dispersion solution comprises a silicon-aluminum mixed oxide powder which contains 0.1-99.9 wt% of Al2O3, and has the structure containing a Si-O-Al bond and the amorphous and/or crystalline silicon dioxide part and the crystalline aluminum oxide part. The crystalline aluminum oxide comprises α-, γ-, δ-, θ- and κ-aluminum oxide, the aluminum oxide formed by pyrolysis and their mixtures. Optionally the aqueous dispersion solution comprises further an oxidizing agent selected from the group consisting of peroxide, peroxide additive, organic and inorganic peracid, imino peracid, persulfate, perborate, percarbonate, metal oxide salt and their mixtures; and/or a salt of metal of Ag, Co, Cr, Cu, Fe, Mo, Mn, Ni, Os, Pd, Ru, Sn, Ti and V, and/or an oxidation activator selected from the group consisting of carboxylic acid, nitrile, urea, imide and/or ester.
    • 目的:提供一种水性分散液及其制备方法及其用途,该分散液用于半导体基板的化学机械抛光。 构成:水分散液包含含有0.1-99.9重量%的Al 2 O 3的硅铝混合氧化物粉末,并且具有包含Si-O-Al键的结构和无定形和/或结晶二氧化硅部分和结晶铝 氧化物部分。 结晶性氧化铝包括α-,γ-,δ-,β-和κ-氧化铝,通过热解形成的氧化铝及其混合物。 任选地,水分散液还包含选自过氧化物,过氧化物添加剂,有机和无机过酸,亚氨基过酸,过硫酸盐,过硼酸盐,过碳酸盐,金属氧化物盐及其混合物的氧化剂; 和/或Ag,Co,Cr,Cu,Fe,Mo,Mn,Ni,Os,Pd,Ru,Sn,Ti和V的金属盐,和/或选自羧酸 腈,脲,酰亚胺和/或酯。