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1. 发明公开

KR1020030047753A 광학 부재용 석영 유리 블랭크, 그 제조 방법 및 이용 방법 无效
标题翻译：用于光学部件的QUARTZ玻璃棉，制造程序及其用途
公开(公告)号：KR1020030047753A
公开(公告)日：2003-06-18
申请号：KR1020020076625
申请日：2002-12-04
申请人： 신에쯔 세끼에이 가부시키가이샤 , 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지
发明人： 큔보도 , 위빙브르노 , 트로머마르틴 , 오크스슈테판 , 피셔게로 , 홀스트울라
IPC分类号： C03C4/00
CPC分类号： C03B19/1469 , C03B19/1415 , C03B19/1453 , C03B2201/07 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： PURPOSE: A quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter, and a procedure for manufacture of the quartz glass blank are provided. CONSTITUTION: In a quartz glass blank for an optical component for transmission of ultraviolet radiation with a wavelength of 250 nm or shorter, the quartz glass blank is characterized by a glass structure that is essentially free of oxygen defect sites, an H2-content in the range of 0.1x10¬16 molecules/cm¬3 to 4.0x10¬16 molecules/cm¬3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5x10¬16 molecules/cm¬3, a refractive index inhomogeneity, Δn, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. The procedure for the manufacture of a quartz glass blank comprises the manufacture of a first and a second quartz glass by flame hydrolysis of a Si-containing compound, wherein the first and second quartz glass differ in their OH-contents, characterized in that a mixed quartz glass with a mean OH-content in the range of 125 wt-ppm to 450 wt-ppm is generated by mixing the first quartz glass and the second quartz glass. The use of a quartz glass blank for the manufacture of a component for use in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter is characterized in that a quartz glass with an OH-content is selected for use with ultraviolet radiation of a given pulse energy density, ε, of at least 0.005 mJ/cm¬2, the OH-content complying with the following dimensioning rule: C(oh)£wt-ppm|=1,7x10¬3xε¬0.4±50.
摘要翻译：目的：用于传输波长为250nm或更短波长的紫外线辐射的光学部件的石英玻璃坯料，微波平版印刷中的石英玻璃毛坯与波长为250nm或更短的紫外线辐射的组合以及程序提供石英玻璃坯料的制造。构成：在用于透射波长为250nm或更短的紫外线辐射的光学部件的石英玻璃坯料中，石英玻璃坯料的特征在于基本上不含氧缺陷部位的玻璃结构，范围为0.1×10 16分子/ cm 3至4.0×10 16分子/ cm 3，OH含量为125重量ppm至450重量ppm，SiH基含量小于5×101- 16分子/ cm 3，折射率不均匀性Δn小于2ppm，应力双折射小于2nm / cm。制造石英玻璃坯料的方法包括通过含Si化合物的火焰水解制造第一和第二石英玻璃，其中第一和第二石英玻璃的OH含量不同，其特征在于混合通过混合第一石英玻璃和第二石英玻璃产生平均OH含量在125重量ppm至450重量ppm范围内的石英玻璃。使用石英玻璃坯料制造用于微光刻的组件与波长为250nm或更短的紫外线辐射的组合的特征在于，选择具有OH-含量的石英玻璃用于紫外线辐射给定的脉冲能量密度ε至少为0.005mJ / cm 2，符合以下尺寸规则的OH-含量：C（oh）£wt-ppm | = 1,7×10-3×ε-0.4±50。

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