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1. 发明专利

JP2008287284A Positive photosensitive composition 有权
标题翻译：正性感光组合物
公开(公告)号：JP2008287284A
公开(公告)日：2008-11-27
申请号：JP2008198286
申请日：2008-07-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUJIMORI TORU
IPC分类号： G03F7/039 , C08F220/62 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which has high sensitivity and is improved in edge roughness of a pattern. SOLUTION: The positive photosensitive composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure, also has a repeating unit having a lactone structure represented by general formula (IV), (AI) or (VI), and decomposes by an action of an acid to increase its solubility in an alkali developer; and (C) a basic compound containing a ≥8C substituted or unsubstituted aliphatic hydrocarbon group within a molecule. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有高灵敏度并改善图案的边缘粗糙度的正性感光组合物。正光敏组合物包含：（A）能够在光化射线或辐射照射时能产生酸的化合物; （B）具有单环或多环脂环烃结构的树脂，也具有由通式（IV），（AI）或（VI）表示的内酯结构的重复单元，并通过酸的作用分解以增加其在碱性显影剂中的溶解度; 和（C）在分子内含有≥8C取代或未取代的脂族烃基的碱性化合物。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2000319525A NATURALLY CURABLE TYPE AQUEOUS COPOLYMER, AND ITS PRODUCTION 失效
公开(公告)号：JP2000319525A
公开(公告)日：2000-11-21
申请号：JP2000115884
申请日：2000-04-12
申请人： MICHIGAN MOLECULAR INST
发明人： SAAM JOHN C
IPC分类号： C08L101/00 , C08F2/22 , C08F2/38 , C08F2/44 , C08F4/40 , C08F220/62 , C08F289/00 , C08K5/10 , C08K5/103 , C09D5/00 , C09D109/00 , C09D123/02 , C09D125/04 , C09D127/02 , C09D133/02 , C09D133/04 , C09D133/06 , C09D133/24
摘要： PROBLEM TO BE SOLVED: To provide an aqueous dispersion, useful for an aqueous coating composition containing no volatile melting aid and curable by autoxidation under the ambient conditions. SOLUTION: This aqueous dispersion contains a copolymer of vinyl monomer and approximately 0.5 to 50 wt.%, based on the copolymer, of a hydrophobic ester or partial ester, wherein the approximately 5 to 90 wt.% of the vinyl monomer is selected from the group consisting of mixed esters of drying oil acid/polyol and unsaturated α,β-polymerizable unsaturated carboxylic acid/polyol, and the hydrophobic ester or partial ester is that of drying oil acid/polyol.

3. 发明专利

KR102235392B1 KR102235392B1 - Thermosetting resin compositions and the cured films 有权
公开(公告)号：KR102235392B1
公开(公告)日：2021-04-01
申请号：KR1020150008139A
申请日：2015-01-16
申请人： 제이엔씨 주식회사
发明人： 유스케 가메이 , 요시타카 고바야시 , 유우키 기무라
IPC分类号： C08F265/04 , C08F220/62 , C08F290/06 , C08G77/442
CPC分类号： C08F265/04 , C08F220/62 , C08F290/068 , C08G77/442 , C08F2810/20
摘要： 본 발명은 3관능 이상의 (메타)아크릴레이트(a)를 포함하는 원료를 반응시켜 얻어지는 마크로 모노머(A) 및 중합성 이중 결합을 가지는 화합물(B)을 반응시켜 얻거나, 또는 3관능 이상의 (메타)아크릴레이트(a)를 포함하는 원료를 반응시켜 얻어지는 마크로 모노머(A), 중합성 이중 결합을 가지는 화합물(B) 및 3관능 이상의 (메타)아크릴레이트(a)를 반응시켜 얻어지는, 공중합체(C)를 포함하는 열경화성 수지 조성물, 및 이것을 사용한 경화막이다. 본 발명의 열경화성 수지 조성물은 열경화에 의해 고경도의 막을 부여할 수 있다. 이 막은 보호막으로서의 특성이 우수하다.

5. 发明专利

JP2008545892A Their use in the manufacture of hydrophobic polymers, and Serorusu fiber composition 审中-公开
公开(公告)号：JP2008545892A
公开(公告)日：2008-12-18
申请号：JP2008513448
申请日：2005-12-23
申请人：ハーキュリーズ・インコーポレーテッドHercules Incorporated
发明人：ドハーティ，エリン・エイ・エス
IPC分类号： D21H21/10 , C08F220/62 , C08L101/12 , D21H17/36 , D21H17/45
CPC分类号： D21H21/10 , D21H17/375 , D21H17/42
摘要：水と混和性の疎水性コポリマーを製紙用スラリーに加えることを含む、歩留りと濾水性を改良する方法が開示されている。水と混和性の疎水性コポリマーを含んだ組成物が開示されている。

6. 发明专利

JP6166479B2 高い屈折率および最小限のグリスニングを有する軟質アクリル材料有权
公开(公告)号：JP6166479B2
公开(公告)日：2017-07-19
申请号：JP2016535698
申请日：2014-12-02
申请人：ノバルティスアーゲー
发明人：ジアーンシュイウエイ , ダグラスシュルーター , ウォルターラレド
IPC分类号： A61L27/18 , C08F220/62 , A61F2/16 , A61F2/18 , A61L27/16
CPC分类号： A61L27/16 , A61L27/18 , A61L27/50 , A61F2/14 , A61F2/16 , A61F2/18 , A61L2430/16 , C08F220/30 , C08F2220/286 , C08F236/02

8. 发明专利

JP3343528B2 失效
公开(公告)号：JP3343528B2
公开(公告)日：2002-11-11
申请号：JP12245299
申请日：1999-04-28
IPC分类号： C09J7/02 , C08F2/44 , C08F220/62 , C08F265/06 , C08F291/00 , C09J151/06

9. 发明专利

JP2000313864A AQUEOUS PRESSURE-SENSITIVE ADHESIVE COMPOSITION 失效
公开(公告)号：JP2000313864A
公开(公告)日：2000-11-14
申请号：JP12245399
申请日：1999-04-28
申请人： TOYO INK MFG CO
发明人： ISHIKAWA YOSHINOBU , DOI YASUHIRO , SAKUTA TOSHITAKA , SHIBA KENICHI
IPC分类号： C09J7/02 , C08F2/00 , C08F220/62 , C09J133/06
摘要： PROBLEM TO BE SOLVED: To obtain an aqueous pressure-sensitive adhesive composition having a good adhesion performance and water resistance, and an adhesive product using the same. SOLUTION: This aqueous pressure-sensitive adhesive composition contains a polymer emulsion obtained by polymerizing a monomer mixture containing (a) 50 wt.% or more alkyl (meth)acrylate wherein the carbon number of the alkyl group is from 9 to 14 and (b) from 0.2 to 2.5 wt.% α,β-unsaturated carboxylic acid in an aqueous system in the presence of from 10 to 500 ppm radical chain transfer agent based on the total monomer and using from 500 to 5,000 ppm organic peroxide initiator and from 50 to 1,000 ppm water-soluble initiator based on the total monomers. An adhesive product is prepared by forming an adhesive layer from this aqueous pressure-sensitive adhesive composition on one or both sides of a base material.

10. 发明专利

JPH08157524A PRODUCTION OF CROSS-LINKED RESIN 失效
公开(公告)号：JPH08157524A
公开(公告)日：1996-06-18
申请号：JP30498694
申请日：1994-12-08
申请人： MITSUBISHI CHEM CORP
发明人： TANAKA TAKESHI , TAKUMA YUUKI
IPC分类号： C08L33/12 , C08F8/00 , C08F20/10 , C08F20/52 , C08F212/00 , C08F212/06 , C08F220/14 , C08F220/56 , C08F220/62 , C08L33/04 , C08L33/24 , C08L33/26 , C09D125/00 , C09D125/08 , C09D133/02 , C09D133/04 , C09D133/12 , C09D133/26
摘要： PURPOSE: To obtain a cured product having excellent acid resistane and toughness by the cross-linking reaction between an acrylic resin obtained by copolymerizing an acrylic monomer having an enol ester group with another vinyl monomer and an active hydrogen compound. CONSTITUTION: The cured resin is prepared by the cross-linking reaction between an acrylic resin [A] obtained by copolymerizing 1-20wt.% acrylic monomer (a) represented by the formula (wherein R is hydrogen or methyl; R and R are each hydrogen, 1-20C alkyl or 6-20C aryl) with 35-95wt.% hard monomer (b) selected from among a styrene monomer, acrylamide, metharylamide and methyl metharylate and 0-40wt.% ethylenically unsaturated monomer (c) other than components (a) and (b), and a polyhydroxy compound [B] (a compound having at least two active hydrogen atoms).

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