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1. 发明专利

JP2010232405A Support device and support program for analyzing operating history of substrate processing device, and recording medium 审中-公开
标题翻译：支持设备和支持程序，用于分析基板处理设备的运行历史和记录介质
公开(公告)号：JP2010232405A
公开(公告)日：2010-10-14
申请号：JP2009077969
申请日：2009-03-27
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： KOBAYASHI KENICHI
IPC分类号： H01L21/02 , G05B19/418
CPC分类号： Y02P90/26
摘要： PROBLEM TO BE SOLVED: To facilitate the analysis of operating history in a substrate processing device applying a predetermined treatment to a substrate with a plurality of continuous operations. SOLUTION: In a support device 100 for analyzing operating history of a substrate processing device, a log showing operating history formed by the substrate processing device is acquired by a log acquisition means 151, the history of states of the substrate processing device, the states having changed in time sequence, is specified based on the log by a means 152 for creating state history information, and the state history information showing the history of the states of the substrate processing device in accordance with time in a predetermined period is created. A plurality of simulated images are displayed on a display device as moving images in time sequence by a display control means 154 based on the state history information, wherein the simulated images correspond to a plurality of states of the substrate processing device in a period after a specific time specified by specified information acquired by a means 153 for acquiring specified information. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了便于对具有多个连续操作对基板进行预定处理的基板处理装置中的操作历史的分析。解决方案：在用于分析基板处理装置的运行历史的支撑装置100中，由对数获取装置151获取由基板处理装置形成的运行历史的日志，基板处理装置的状态历史，通过用于创建状态历史信息的装置152基于日志指定已经改变了时间顺序的状态，并且创建了根据预定时间段中的时间显示基板处理装置的状态历史的状态历史信息。基于状态历史信息，通过显示控制装置154将多个模拟图像作为运动图像以时间顺序显示在显示装置上，其中模拟图像在基板处理装置的一段时间后对应于多个状态由用于获取指定信息的装置153获取的指定信息指定的特定时间。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2009158626A Processing system, control method of processing system, and version upgrading method of software 有权
标题翻译：处理系统，处理系统的控制方法和软件的版本升级方法
公开(公告)号：JP2009158626A
公开(公告)日：2009-07-16
申请号：JP2007333438
申请日：2007-12-26
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： KOBAYASHI KENICHI , NAKAYAMA YOICHI , SHIKI KEIICHIRO
IPC分类号： H01L21/02 , C23C16/44 , H01L21/205
CPC分类号： G05B19/4148 , G05B2219/31418 , G05B2219/34306 , G05B2219/45031 , H01L21/67276 , Y02P70/163 , Y02P70/605
摘要： PROBLEM TO BE SOLVED: To reduce a preparatory time required until a substrate processing device is operated again as much as possible even when a reason to shutdown a computer arises. SOLUTION: In this processing system, if instructions to perform a hot shutdown processing is input, I/O information about each end device 201 in the standby state of processing chambers 1a-1d is written in an non-volatile memory part 407 serving as the I/O information storage portion of a MC 401. Flag information indicating that the hot shutdown processing has been selected is preserved in the flag resister 403a of the CPU 403 of the MC 401. When the hot shutdown processing is selected, the respective end devices 201 of the processing chambers 1a-1d are maintained in a standby state. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：即使当关闭计算机的原因出现时，为了减少直到基板处理装置再次操作所需的准备时间。解决方案：在该处理系统中，如果输入执行热关机处理的指令，则处理室1a-1d的待机状态下关于每个终端设备201的I / O信息被写入非易失性存储器部分407 作为MC 401的I / O信息存储部分。指示已经选择了热关机处理的标志信息被保留在MC 401的CPU 403的标志寄存器403a中。当选择热关机处理时，处理室1a-1d的各个终端装置201保持在待机状态。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2010073727A Method of reducing temperature of substrate placing table, computer-readable storage medium, and substrate processing system 有权
标题翻译：降低基板配置表温度，计算机可读存储介质和基板处理系统的方法
公开(公告)号：JP2010073727A
公开(公告)日：2010-04-02
申请号：JP2008236340
申请日：2008-09-16
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： KOBAYASHI KENICHI , NAKAYAMA YOICHI , KAI SENZO , SHIRASAKA KENJI
IPC分类号： H01L21/683 , C23C16/44 , H01L21/3065
CPC分类号： H01L21/67745 , C23C16/46 , H01L21/67103 , H01L21/67109
摘要： PROBLEM TO BE SOLVED: To provide a method of improving the efficiency of heat reduction in a placing table in a processing chamber and shortening heat reduction time. SOLUTION: A vacuum side conveying device 31 is used to convey a wafer W cooled in a load locking chamber 5a to the processing chamber 1b, and then transfer it to a processing stage 2b. In the processing chamber 1b, heat reduction of the processing stage 2b is promoted by cleaning gas from a shower head 20 and heat adsorption by the wafer W. The vacuum side conveying device 31 returns the wafer W in the processing chamber 1b to the load locking chamber 5a and places it on a standby stage 6a so as to cool it after a prescribed time elapses. The cycle is repeated for a plurality of times. Thus, heat reduction speed of the processing stage 2b in the processing chamber 1b is accelerated. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种提高处理室中的放置台的减热效率的方法，缩短减热时间。解决方案：真空侧传送装置31用于将在负载锁定室5a中冷却的晶片W输送到处理室1b，然后将其传送到处理台2b。在处理室1b中，通过清洗喷头20的气体和由晶片W进行的热吸附来促进加工台2b的热还原。真空侧输送装置31将处理室1b中的晶片W返回到负载锁定并将其放置在备用台6a上，以便在经过规定时间后将其冷却。循环重复多次。因此，处理室1b中的处理台2b的减速速度加快。版权所有（C）2010，JPO＆INPIT

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