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1. 发明专利

JPH0560080B2 失效
公开(公告)号：JPH0560080B2
公开(公告)日：1993-09-01
申请号：JP13994583
申请日：1983-07-29
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI
IPC分类号： G02B5/18 , G02B5/32 , G21K1/06

2. 发明专利

JPH0366604B2 失效
公开(公告)号：JPH0366604B2
公开(公告)日：1991-10-18
申请号：JP3362383
申请日：1983-02-28
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI , IMAI SATORU , MIZUKAMI HARUO
IPC分类号： G01J3/18 , G01J3/427 , G01N21/31

3. 发明专利

JPH01252923A LASER BEAM EXPANDER 失效
公开(公告)号：JPH01252923A
公开(公告)日：1989-10-09
申请号：JP8091688
申请日：1988-03-31
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI
IPC分类号： G02B27/09 , G02B27/00
摘要： PURPOSE:To convert laser beams into a highly accurate plane wave of an large area by arranging a 1st lens system and a 2nd lens system with a specific relation. CONSTITUTION:The 1st lens system consists of a 0.000mm-convex lens 2 which is provided a prescribed distance L1 away from an pin hole 1 and possesses a thickness of 5.5mm and a curvature radius of 512.000mm, and a glass plate 3, 60mm in thickness, spaced 5mm away from the convex lens 2. The 2nd lens system consists of a -2,000.600mm-concave lens 4 which is spaced 266.534mm away from the 1st lens system and possesses a thickness of 10mm and a curvature radius of 436.520mm, a -2,000.600mm-convex lens 5 which is spaced 3.5mm away from the concave lens 4 and possesses a thickness of 23.600mm and a curvature radius of 245.600mm, and a 0.000mm-convex lens 6 which is spaced 3mm away from the lens 5 and possesses a thickness of 17.000mm and a curvature radius of 533.800mm. An ideal plate wave made of laser beams with 100-160-magnified radius can be obtained.

4. 发明专利

JPS63240502A PREPARATION OF AU TRANSMISSION TYPE GRATING 失效
公开(公告)号：JPS63240502A
公开(公告)日：1988-10-06
申请号：JP7570287
申请日：1987-03-27
申请人： SHIMADZU CORP
发明人： KOEDA MASARU , IWAHASHI KENJI , ARITOME HIROAKI , NANBA SUSUMU
IPC分类号： G02B5/18 , G21K1/06
摘要： PURPOSE:To obtain a transmission type grating for soft X-rays having a large aperture diameter, sufficient thickness of Au and excellent spectral characteristics by executing a holographic exposing method, reactive ion beam etching, Au electroplating and back etching to allow the peripheral part of a substrate to remain as a supporting frame. CONSTITUTION:SiO2 5 is interposed as an intermediate layer between a photoresist 6 and polyimide 4 by using the holographic exposing method so as to apply the section of a sufficient thickness and comb shape to Au 3 which is an absorption band. The fluoroform reactive ion etching or reactive ion beam etching is executed for patterning from the photoresist 6 to the SiO2 5 and the oxygen reactive ion etching or the like is executed for patterning from the SiO2 5 to the polyimide 4. The Au electroplating is executed with the polyimide pattern of the formed perpendicular side wall as a stencil for plating and the back etching is executed with the peripherals part of the substrate as the supporting frame in order to provide adequate tension to the prepd. Au transmission type grating pattern. The transmission type grating for soft X-rays having the large aperture and excellent spectral characteristics is thereby obtd.

5. 发明专利

JPS6318124B2 失效
公开(公告)号：JPS6318124B2
公开(公告)日：1988-04-16
申请号：JP12365379
申请日：1979-09-25
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI , KOIKE MASAHITO , OOKUBO KUNIHIKO
IPC分类号： G01J3/04 , G01J3/18

6. 发明专利

JPS62230022A X-RAY PROJECTION EXPOSURE DEVICE 失效
公开(公告)号：JPS62230022A
公开(公告)日：1987-10-08
申请号：JP7469586
申请日：1986-03-31
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI
IPC分类号： G21K1/06 , G03F7/20 , G21K3/00 , H01L21/027
摘要： PURPOSE:To form a highly precise pattern by composing the title device out of a diffraction board having a focusing ability to converge an incident X-ray with predetermined inclination on a point on a normal passing the center of its surface, an X-ray absorbing mask formed on said board, and an X-ray imaging element arranged on a focusing point of the diffraction board. CONSTITUTION:After an X-ray emitted from an X-ray source S is incident on a boarde, only the X-ray irradiating a mask M patterned on a mask board K is diffracted by a crystal lattice of the mask board K. Because the crystal lattice is cuved, the Xrays are converged on an X-ray imaging element F. Accordingly, the all diffracted X-rays on the points on the mask surface pass the imaging element effectively. An image of an X-ray mask is formed on a wafer W by the X-ray imaging element F. At that time, because an optical axis A is predetermined to be vertical to a surface of the mask K, the image formed on the wafer is a reduction of the X-ray mask. Then, reduction transfer of a mask pattern becomes possible and a highly precise pattern can be formd.

7. 发明专利

JPS6148863B2 失效
公开(公告)号：JPS6148863B2
公开(公告)日：1986-10-27
申请号：JP4242280
申请日：1980-03-31
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI
IPC分类号： G01P3/36 , G01N21/27 , G01N21/53 , G01N21/64 , G01N27/26 , G01N27/447 , G01P5/00 , G01P5/26

8. 发明专利

JPS6032814B2 失效
公开(公告)号：JPS6032814B2
公开(公告)日：1985-07-30
申请号：JP16089077
申请日：1977-12-29
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI
IPC分类号： G01J3/18

9. 发明专利

JPS6029049B2 失效
公开(公告)号：JPS6029049B2
公开(公告)日：1985-07-08
申请号：JP3713577
申请日：1977-03-31
申请人： SHIMADZU CORP
发明人： IWAHASHI KENJI
IPC分类号： G01J3/427 , G01J3/04 , G01J3/28

10. 发明专利

JPS5924808A Device for forming diffraction grating by holography 失效
$Device for forming diffraction grating by holography$
标题翻译：通过全息图形成衍射衍射的装置
公开(公告)号：JPS5924808A
公开(公告)日：1984-02-08
申请号：JP13426482
申请日：1982-07-30
申请人： Shimadzu Corp
发明人： IWAHASHI KENJI
IPC分类号： G02B5/18 , G02B5/32 , G03H1/04
CPC分类号： G02B5/32
摘要： PURPOSE:To simplify the positional adjustment of mirrors and to make a titled device compact by changing the position of one of two pieces of mirrors which are respectively inserted between two pieces of parabolic mirrors and a base material thereby changing the intersection angle of the two parallel luminous fluxes on the fixed base material. CONSTITUTION:Respectively two pieces of plane mirrors 51, 52 and 51', 52' are inserted between parabolic mirrors 4, 4' which change diversion luminous fluxes to parallel luminous fluxes F, F' and a fixed base material. The mirrors 52, 52' are so constituted as to be moved on a line Y-Y and a line Y'-Y', whereby the intersection of two luminous fluxes at an optional angle on the material 6 is made possible. Respectively a pair of the mirrors 51, 52 and 51', 52' are used and mirror pairs to be used respectively exclusively for various gratings are beforehand prepared for the number of various gratings so that the mirror pairs can be exchanged according to the request for the number of gratings. Then the need for the fine adjustment of the position of the mirrors is eliminated and the device is made compact.
摘要翻译：目的：为了简化镜子的位置调整，通过改变分别插入两块抛物面反射镜和基材之间的两片反射镜之一的位置，使标题装置紧凑，从而改变两个平行的交叉角固定基材上的光通量。构成：分别将两个平面镜51,52和51'，52'插入到将分支光束转换成平行光束F，F'和固定基底材料的抛物面镜4,4'之间。反射镜52,52'被构造成在线Y-Y和线Y'-Y'上移动，由此在材料6上以任意角度的两个光束的交点成为可能。分别使用一对反射镜51,52和51'，52'，预先为各种光栅专门使用用于各种光栅的镜对，以便可以根据要求对镜对进行更换光栅的数量。然后，消除了对镜子位置的微调的需要，并且使得该装置紧凑。

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