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    • 1. 发明专利
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • JP2008153533A
    • 2008-07-03
    • JP2006341646
    • 2006-12-19
    • Seiko Epson Corpセイコーエプソン株式会社
    • KATO JURIOKA HIDEAKIUEHARA MASAMITSU
    • H01L21/306
    • H01L21/3141H01L21/187H01L21/2007H01L21/823481H01L21/84
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of suppressing deterioration in the etching selection ratio of SiGe to Si when etching the SiGe formed on the Si.
      SOLUTION: An SiGe layer 11 is formed on an Si substrate 1 and an Si layer 13 is formed on the SiGe layer 11. The Si layer 13 and an SiGe layer 11 are etched partially, a groove H exposing the side of the SiGe layer 11 is formed, and a dummy pattern DP, which exposes at least one surface of the Si substrate 1 and the Si layer 13 from a part under the SiGe layer 11, is formed. After that, the SiGe layer 11 is wet-etched via the groove H, thus forming a cavity 25 between the Si substrate 1 and an Si layer 13. In the process for forming the cavity 25, the SiGe layer 11 is etched while etchant is in contact with the dummy pattern DP.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 解决的问题:提供一种制造半导体器件的方法,当蚀刻形成在Si上的SiGe时,能够抑制SiGe与Si的蚀刻选择比的劣化。 解决方案:在Si衬底1上形成SiGe层11,并且在SiGe层11上形成Si层13. Si层13和SiGe层11被部分蚀刻,暴露在 形成SiGe层11,并且形成从SiGe层11下面的部分露出Si衬底1和Si层13的至少一个表面的虚拟图案DP。 之后,通过槽H对SiGe层11进行湿蚀刻,从而在Si衬底1和Si层13之间形成空腔25.在形成空腔25的工艺中,刻蚀SiGe层11,蚀刻剂为 与虚拟图案DP接触。 版权所有(C)2008,JPO&INPIT
    • 4. 发明专利
    • LIGHT IRRADIATION DEVICE
    • JPH0580272A
    • 1993-04-02
    • JP24363491
    • 1991-09-24
    • SEIKO EPSON CORP
    • UEHARA MASAMITSU
    • G02B27/09G02B27/00H01S3/101H04N1/04H04N1/113
    • PURPOSE:To provide the light irradiation device which requires none of a special rotary mechanism, a rotation control mechanism, and a linear light source and converges light without scattering with simple constitution by splitting and reflecting a laser light beam by using plural light reflecting means. CONSTITUTION:The light emitted by a laser light beam emission body 1 consisting of a semiconductor laser is expanded linearly at right angles to its emission direction. Then this light is further expanded thin and long by using a concave lens group and its length in the lengthwise direction is set a little bit longer than required length. Then the light beam which is expanded thin and long in parallel by using a convex lens group is passed through a slit to obtain a flat parallel light beam 5', which is guided out of a light shaping unit 8 and made to irradiate a fine reflecting mirror group 10 of plural light reflecting means arranged in a staircase shape. The parallel light beam group 5' is split and reflected to generate a group 5 of plural nearly parallel light beams, which irradiates the surface of a body to be irradiated.
    • 5. 发明专利
    • DISPLAY DEVICE
    • JPH04278658A
    • 1992-10-05
    • JP4038591
    • 1991-03-07
    • SEIKO EPSON CORP
    • UEHARA MASAMITSU
    • G06F1/16G06F3/147G06F15/02
    • PURPOSE:To attain plural display operations with use of a simple display element by enabling the display element to turn over the pages. CONSTITUTION:An each of plural display element is provided with a reception circuit 2 to receive an electric or optical signal which contains partly a display signal therein. The circuit 2 is connected to a connection terminal 3 provided at the edge of the element 1, and the terminal 3 is connected to a connector 8 in a single body. The connector 8 is attached to a main body 9. The main body 9 transfers the signals and the information and at the same time processes these signals and information through a group of terminals that perform the connection among the elements 1, various keyboard groups, and the external electronic equipments. Furthermore another display element 101 containing the auxiliary input elements 14 is provided in the main body 9 so that the information can be inputted on a screen. The flexible elements 1 can display the different types of information and also can easily grasp the total information as if they turned over the pages of a book.
    • 10. 发明专利
    • IMAGE FORMATION DEVICE
    • JPH0499625A
    • 1992-03-31
    • JP21840690
    • 1990-08-20
    • SEIKO EPSON CORP
    • TANIGUCHI MAKOTOUEHARA MASAMITSUKITAMURA KAZUHIKOISHII ISAOMIZUMA ISAO
    • B41C1/10G03C5/56
    • PURPOSE:To ensure that ink is transferred smoothly from a development roller to an image formation element and defective printing due to irregular ink deposition or ink run on a recording medium is prevented by specifying the unevenness of a coated surface of an optically reversible isomerized material. CONSTITUTION:An optically reversible isomerized layer 102 indicates such a phenomenon that the structure of a cis element is isomerized by a trans element due to light/exposure 105. Therefore, a latent image is formed on an image formation element 103 by selective light exposure. To allow migration of ink from the surface of an inked latent image formation element to a medium for image transfer 111, both have to be allowed to come in contact with each other and then have to be peeled off the other. However, if the surface unevenness is tolerated to 0.01mum or lower, their mutual adhesive power increases resulting in an unstabe peeloff position fixing. Subsequently, image quality deteriorates significantly due to delicate differences in transfer parameters such as temperature, humidity and the rotary speed of an image formation element. On the other hand, if the accuracy of unevenness on the coated surface of the optically reversible isomerized material is adjusted to a tolerance of 0.01mum or higher to 1mm or lower, stable transfer and peeloff processes are ensured, resulting in the mentioned transfer parameters causing no change leading to any problems. Thus a satisfactory print image is obtained on the medium for transfer 111.