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1. 发明专利

JPH0528252B2 失效
公开(公告)号：JPH0528252B2
公开(公告)日：1993-04-23
申请号：JP23197585
申请日：1985-10-17
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KAYAMA TOSHITAKA , KOBAYASHI AKIO , IIZUKA HIROSHI , SHIIKI YOSHA
IPC分类号： B29B15/12 , B29C47/00 , B29C51/12 , B29K81/00 , B29K105/12 , B29L7/00 , C08G75/02 , C08G75/0209 , C08G75/0245 , C08G75/06 , C08J5/04 , C08J5/18

2. 发明专利

JPS6150001B2 失效
公开(公告)号：JPS6150001B2
公开(公告)日：1986-11-01
申请号：JP17259879
申请日：1979-12-29
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KOBAYASHI AKIO
IPC分类号： B01D9/02

3. 发明专利

JPS6015375B2 失效
公开(公告)号：JPS6015375B2
公开(公告)日：1985-04-19
申请号：JP6654577
申请日：1977-06-06
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KOBAYASHI AKIO , YAGUCHI KUNIHIDE , NEZU JUJI , TAKAIWA MASAKAZU
IPC分类号： B01D53/50 , B01D53/14 , B01D53/34 , B01D53/77 , C01F11/46

4. 发明专利

JPS56163702A CRYSTAL DEPOSITING METHOD 失效
公开(公告)号：JPS56163702A
公开(公告)日：1981-12-16
申请号：JP6832780
申请日：1980-05-22
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KOBAYASHI AKIO
IPC分类号： B01D9/02 , B01D9/00
摘要： PURPOSE:To realize growth of crystallization, by once solidifying the stock solution and then utilizing the latent heat for melt of an impurity and a fine crystal. CONSTITUTION:The solution containing the component to be crystallized is stuck on the surface of a rotary drum 3 cooled, and this stuck substance is taken off by a scratch-off blade 4 and then crushed by a crusher 5 to be supplied to a growing tank 6. The stock solution same as that to be supplied to a sticking solution tank 1 is filled in the tank 6, and a cold temperature is kept in the tank 6 so as to treat the supplied crystal as a slurry. To keep the said temperature constant, a part of the stock solution is supplied also to the tank 6 through a supply pipe 7. A stirrer 8 is provided in the tank 6 to cause a rising flow sufficient to float up the fine crystal. The solidified substance of the stock solution which is stuck to the drum surface and then peeled off and crushed circulates in the tank 6, and meanwhile a crystal of a low-melting point containing a fine crystal and the impurity is melted. The slurry solution is cooled by the latent heat produced when the crystal is melted to deposit a crystal having a high-mleting point and high purity.

5. 发明专利

JPS56120751A ANTISTATIC RESIN COMPOSITION 失效
公开(公告)号：JPS56120751A
公开(公告)日：1981-09-22
申请号：JP17696880
申请日：1980-12-15
申请人： KUREHA CHEMICAL IND CO LTD
发明人： OOYA MASAKI , KOBAYASHI AKIO , OGIWARA TAKEO , SATAKE YOSHIKATSU
IPC分类号： C08L101/00 , C08F265/00 , C08F279/00 , C08F279/02 , C08L1/00 , C08L7/00 , C08L21/00 , C08L23/00 , C08L27/00 , C08L33/00 , C08L33/02 , C08L51/00 , C08L51/02 , C08L51/04 , C08L51/06 , C08L67/00 , C08L77/00
摘要： PURPOSE:To prepare a resin composition free from lowering of antistaticity with washing, and having permanent antistatic effect, by blending a specific graft copolymer and a thermoplastic resin compatible with said copolymer. CONSTITUTION:The titled composition is prepared by mixing (A) 10-99pts.wt. of a graft copolymer obtained by grafting (a) 20-95wt% of one or more vinyl monomers or vinylidene monomers to (b) 5-80wt% of a rubber backbone polymer consisting of (i) 50-90wt% of a conjugated diene or an acrylic acid ester, (ii) 10-50wt% of a monomer having 4-500, pref. 9-50 alkylene oxide groups, and (iii) 0-49wt% of one or more copolymerizable vinyl monomers or vinylidene monomers, with (B) 90-1pts.wt. of a thermoplastic resin compatible with (A). The ratio of the rubber backbone polymer is 5-80wt%.

6. 发明专利

JPS5691824A ABSORBENT FOR HYDROGEN CHLORIDE 失效
公开(公告)号：JPS5691824A
公开(公告)日：1981-07-25
申请号：JP17225479
申请日：1979-12-27
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KOBAYASHI AKIO
IPC分类号： B01D53/68 , B01J20/04
摘要： PURPOSE:To selectively absorb and remove hydrogen chloride present in exhaust gas by using calcium carbonate particles whose surface is covered with hydrated calcium chloride as an absorbent for hydrogen chloride coexisting with sulfurous acid gas. CONSTITUTION:As an absorbent by which hydrogen chloride can be effectively absorbed and removed from exhaust gas containing sulfurous acid gas and hydrogen chloride, e.g., combustion exhaust gas, etc., calcium carbonate particles whose surface is covered with hydrated calcium chloride are employed. The absorbent can absorb and remove selectively only hydrogen chloride and therefore, no trouble with waste water treatment such as desulfurization, etc., takes place.

7. 发明专利

JPS5536237A ANTISTATIC RESIN COMPOSITION 失效
公开(公告)号：JPS5536237A
公开(公告)日：1980-03-13
申请号：JP10928478
申请日：1978-09-06
申请人： KUREHA CHEMICAL IND CO LTD
发明人： OOYA MASAKI , KOBAYASHI AKIO , OGIWARA TAKEO , SATAKE YOSHIKATSU
IPC分类号： C08F265/00 , C08F279/00 , C08L7/00 , C08L21/00 , C08L33/00 , C08L33/02 , C08L51/00 , C08L51/04
摘要： PURPOSE:To prepare the title composition which keeps its antistaticity even after washing, by blending a copolymer obtained by grafting a vinyl monomer to a backbone polymer having specific structure and containing alkylene oxide, etc., and a thermoplastic resin compatible with said copolymer. CONSTITUTION:A polymer blend composed of (A) a copolymer obtained by grafting (a) 5-80wt% of a rubber-like backbone polymer consisting of 50-99wt% of a conjugated diene and/or an acrylic acid ester and 50-1wt% of a monomer containing 4-500 alkylene oxide groups [e.g. the formula I or II (R1-3, R7-9, X, Y are H, alkyl, etc.; m+n is 4-500)], with (b) 20-95wt% of a vinyl or vinylidene monomer, and (B) a thermoplastic resin which is compatible with the component (A). The weight ratio of (A) to (B) is 10:90-100:0. The backbone polymer may contain 0-49wt% of vinyl or vinylidene monomer as a copolymerization unit.

8. 发明专利

JPS54145371A GASSLIQUID CONTACT DEVICE 失效
公开(公告)号：JPS54145371A
公开(公告)日：1979-11-13
申请号：JP5263878
申请日：1978-05-04
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KOBAYASHI AKIO , YAGUCHI KUNIHIDE , TAKAIWA MASAKAZU
IPC分类号： B01D3/22 , B01D1/04 , B01D3/26 , B01D47/12 , B01D47/14 , B01D53/18 , F28F25/08
摘要： PURPOSE:Rod type fillers with diameters of less than 50mm are filled in a gas-liquid contact device in parallel and horizontal direction in a range of 2 to 30% packing ratio, whereby gas phase material transfer coefficient is increased by contact area increase and pressure loss decrease. CONSTITUTION:Rod type fillers 2 with diameters of less than 50mm are filled inside the gas-liquid contact device 1 in parallel and horizontal direction in a range of 2 to 30% packing ratio. Alternatively, the fillers may be arranged in parallel cross. Gas and liquid are introduced through the inlets 3 and 4, respectively. The liquid is caused to renew its surface on the rods 2 and vigorously splashed by gas flow, increasing gas-liquid contact area. At the same time, pressure loss is drastically reduced. The process is further effective in that foreign material is not blocked and gas phase material transfer coefficient is greatly enhanced.

9. 发明专利

JPS54117554A RESIN COMPOSITION 失效
公开(公告)号：JPS54117554A
公开(公告)日：1979-09-12
申请号：JP2422178
申请日：1978-03-03
申请人： KUREHA CHEMICAL IND CO LTD
发明人： OOYA MASAKI , KOBAYASHI AKIO , OGIWARA TAKEO , SATAKE YOSHIKATSU
IPC分类号： C08L33/00 , C08K5/52 , C08L7/00 , C08L21/00 , C08L33/02 , C08L33/18 , C08L51/00 , C08L51/02
摘要： PURPOSE:The title composition having improved antistatic properties, transparency, workability, obtained by adding a specific phosphate surfactant to a nitrile copolymer. CONSTITUTION:A) 100 part by wt. of a copolymer consisting of a) 40-90 wt.% of an unsaturated nitrile (preferably acrylonitrile, etc.) and b) 60-10 wt.% of a monomer copolymerizable with the component a) or its blend (preferably a resin composition containing rubber phases) is blended with B) 0.02-5 parts by wt., preferably 0.05-3 parts by wt. of one or more compounds selected from the group consisting of polyoxyethylene alkyl(aryl) ether, a monoester of polyoxyethylene and phosphoric acid shown by the formula I; (R1 is 1-30C alkyl or alkylaryl; n is 1- 20), a diester shown by the formula II; (R2 and R3 are 1-30C alkyl or alkylaryl; m and l are 1-20), and their esters.

10. 发明专利

JPS54111175A FILTER 失效
公开(公告)号：JPS54111175A
公开(公告)日：1979-08-31
申请号：JP1809278
申请日：1978-02-21
申请人： KUREHA CHEMICAL IND CO LTD
发明人： KOBAYASHI AKIO
IPC分类号： B01D33/04 , B01D24/38 , B01D33/70

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