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    • 4. 发明专利
    • POSITIONING CONTROLLER
    • JPS61260309A
    • 1986-11-18
    • JP10199685
    • 1985-05-14
    • HITACHI LTD
    • MASAKI RYOZOOMAE TSUTOMUFUJII KENSAITOU TSUTOMU
    • G05D3/12G05D3/14
    • PURPOSE:To perform positioning operation while suppressing vibration at any time by inputting the output of a positioning circuit to a limiter so that a value close to the drive input limit value of a motor is a limit value and determining an input to be supplied to the motor by using the output of the limiter and the output of a speed vibration suppressing circuit. CONSTITUTION:A driving shaft 2 is rotated by driving the motor 1 to position an XY stage 3, whose position thetaS and speed omegaS are detected by a stage detector 4. Further, the position thetaM and speed omegaM of the motor are detected by a motor detector 5 and those values thetaS and omegaS, and thetaM and omegaM detected by those detectors 4 and 5 are fed back to a positioning control circuit 6. The positioning control circuit 6 uses the position command thetaS supplied from a position command circuit 7 and the detected values thetaS and omegaS, and thetaM and omegaM which are fed back to perform positioning control arithmetic, thereby determining electric power ia to be inputted to the motor 1. Namely, the motor current ia is regarded as a manipulated variable.
    • 5. 发明专利
    • REDUCTION PROJECTION EXPOSURE EQUIPMENT
    • JPS61220327A
    • 1986-09-30
    • JP6167185
    • 1985-03-26
    • HITACHI LTD
    • SHIROKIBARA MANABUFUJII KENTSUYUKI HISAMASASAITOU TSUTOMU
    • G03F7/20G03F9/00G05D3/12H01L21/027H01L21/30
    • PURPOSE:To increase the alignment accuracy of the stage without dependence on the friction force, by amplifying the deviation between the present position and the desired position, driving the servo-motor, setting the position of stage to the desired position, operating the correction values to be added according to the contents of the memory, and adding them to the designation values. CONSTITUTION:The stage 1 is driven by the DC servo-motor 2 and the ball screw 3. The position of the stage is laser interferometer. The electronic computer 5 sends out the desired position designation signal 6, and indicates the desired position of the stage 1. The deviation between the designation signal and the present position signal 7 as the output of the measuring machine 4 applying the laser interferometer is digitally operated by the operating circuit 8, and the position deviation signal 9 is delivered to the DC servo-motor 2 through the adder 10, the D-A converter 11, the operational amplifier 12 and the servo-amplifier 13. When the position deviation signal 9 is inputted, the electronic computer 5 sends the command signal 16 to store the alignment error data to the microprocessor 15, which stores them in the memory 17. When the command signal 18 to make correction is outputted, the microprocessor 15 reads out the previous alignment error data, and calculates the correction values, which are outputted to the adder 10.
    • 6. 发明专利
    • Gas laser device
    • 气体激光器件
    • JPS59214283A
    • 1984-12-04
    • JP8771983
    • 1983-05-20
    • Hitachi Ltd
    • FUJII KENKURAMOCHI YOSHINORIKIHANA HIROMITSUKUGAYA TAKASHI
    • H01S3/097H01S3/104H01S3/10H01S3/223
    • H01S3/097
    • PURPOSE:To lower the power loss at the starting of discharge by mounting an auxiliary anode between an anode and a cathode and generating seed discharge between the auxiliary anode and the cathode. CONSTITUTION:An anode 4 and a cathode 5 are mounted into a laser tube 1, and connected to a constant-current high-voltage pulse source 11 through a ballast resistor 10. An auxiliary anode 21 is set up between the anode 4 and the cathode 5, and a capacitor C and a resistor R are connected in series between the auxiliary anode and the anode 4. When pulses are transmitted from a pulse generator 12, output voltage from the constant-current light-voltage pulse power supply 11 begins to rise. The potential of the anode 4 and auxiliary anode 21 rises at the same value, seed discharge is formed between the auxiliary anode 21 and the cathode 5 first, and main discharge is generated between the anode 4 and the cathode 5 when output voltage from the power supply 11 further rises. Beakdown voltage can be lowered by mounting the auxiliary anode 21.
    • 目的:通过在阳极和阴极之间安装辅助阳极并在辅助阳极和阴极之间产生种子放电来降低放电开始时的功率损耗。 构成:将阳极4和阴极5安装到激光管1中,并通过镇流电阻器10连接到恒流高压脉冲源11.辅助阳极21设置在阳极4和阴极之间 5,电容器C和电阻R串联在辅助阳极和阳极4之间。当脉冲从脉冲发生器12传输时,来自恒流电压脉冲电源11的输出电压开始上升 。 阳极4和辅助阳极21的电位上升到相同的值,首先在辅助阳极21和阴极5之间形成种子放电,并且当来自电源的输出电压时阳极4和阴极5之间产生主放电 供应11个进一步上涨。 可以通过安装辅助阳极21来降低击穿电压。
    • 8. 发明专利
    • SURFACE CONFIGURATION DETECTION METHOD AND PROJECTION EXPOSURE DEVICE
    • JPH06244081A
    • 1994-09-02
    • JP2806493
    • 1993-02-17
    • HITACHI LTD
    • NAKAYAMA YASUHIKOWATANABE MASAHIROOSHIDA YOSHITADAYOSHIDA MINORUFUJII KEN
    • G03F7/207G03F9/00H01L21/027H01L21/30
    • PURPOSE:To improve detection accuracy of tilt, height, etc., of a sample surface by imaging reflection light from a sample surface at a position of conjugate with a sample surface and by detecting tilt, height, etc., of a sample surface by casting the imaged light on the sample surface again to guide its reflection light to a photodetector and by detecting tilt, height, etc., of the sample surface based on information of interference fringes on the photodetector. CONSTITUTION:A reticle 9 is illuminated by an exposure illumination system 81 and its circuit pattern is imaged on a surface of a wafer (detection object) 4 on a stage 7 by a reduction lens 8. A surface detection system 2 detects and processes surface configuration information of a wafer. Object light 16 is cast on the wafer 4 at an incidence angle of 88 deg. and its reflection light and reference beam 17 are reflected by a mirror 19, reflected again by a mirror 22 through lenses 20, 21 to make them move reversely in the original optical path and reflected by a beam splitter 14 in a direction of prisms 23, 23'. The prisms 23, 23' enlarge a beam interval and provide a specified angle simultaneously to inject beam to a lens 24. Two beams projected from the lens 24 cross each other at a position A which is conjugate with a reflection surface of the wafer 4 and interfere there.