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1. 发明专利

JPS61130343A Photochemical vapor deposition of heterocyclic polymer 失效
标题翻译：杂环聚合物的光化学气相沉积
公开(公告)号：JPS61130343A
公开(公告)日：1986-06-18
申请号：JP26596785
申请日：1985-11-26
申请人： Hughes Aircraft Co
发明人： JIEEMUSU TEII HOORU , RICHIYAADO ENU REIDEN
IPC分类号： C08G73/00 , B05D3/06 , B05D7/24 , C08G65/00 , C08G73/02 , C08G75/00 , C08G75/02 , C08G75/06 , C08G85/00 , H01L21/312
CPC分类号： B05D1/60 , B05D3/06 , C08G75/0272 , H01L21/312
摘要： A low temperature photochemical vapor deposition process for the deposition of a layer of a chosen polymer on the surface of a substrate. The polymer comprises repeating hydrocarbon units linked through oxygen, nitrogen, or sulfur atoms and is formed by reacting a vapor phase monomer precursor containing the hydrocarbon units and a vapor phase precursor containing the oxygen, nitrogen, or sulfur under radiation inducement. The low temperature of the process avoids thermal damage to the substrate. Specifically disclosed polymers are polyphenylether and polyxyleneamine, which are useful, respectively, as insulator or passivation layers in semiconductor devices and circuits, and as adhesives.

2. 发明专利

JPH03149501A FILTER WITH A PLURALITY OF NOTCH WRINCLE AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH03149501A
公开(公告)日：1991-06-26
申请号：JP21447190
申请日：1990-08-15
申请人： HUGHES AIRCRAFT CO
发明人： JIEEMUSU TEII HOORU
IPC分类号： C23C16/52 , G02B5/28
摘要： PURPOSE: To correct an error based on an algorithm operation by optical monitoring signals at the time of filter sticking by maintaining the product of an average refractive index and the thickness of the sine cycle of a component so as to accurately achieve Bragg reflection conditions. CONSTITUTION: A dotted line 200 is corrected by a correcting action performed by algorithm to a refractive index profile (solid line 202) provided with the error. The correction of vertical (V of 104) and horizontal (H of 102) index profiles is continuously optically monitored, plural medium profiles generated in terms of a sine measure the increase of optical thickness and completely and accurately match it with the increase of the optical thickness of an ideal target. A processing during continuation is adjusted corresponding to an alternative sequence (algorithm) incorporated in a program beforehand and the optical thickness signals make the sine sticking of an optical medium be accurate. Thus, horizontal H and vertical V index profile correction treatments are both performed.

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