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    • 7. 发明专利
    • GAS SUPPLY OF TWOOFLUID NOZZLE
    • JPS5573363A
    • 1980-06-03
    • JP14656378
    • 1978-11-29
    • HITACHI LTDBABCOCK HITACHI KK
    • KAJI RIYUUICHIHISHINUMA TAKAO
    • B05B7/04B05B7/06
    • PURPOSE:To reduce the running cost of an apparatus and to carry out effectively the atomization of absorbed liquid in th apparatus for treating high temperature gas by atomizing the liquid with vapor of a liquid having lower boiling point than the temperature of the gas. CONSTITUTION:The structure of nozzle used is the same as that of conventional two-fluid nozzle. A pipe 3 through which absorbed liquid 5 is transferred to a nozzle 3, is a double-pipe. The internal pipe 2 is used for transporting the absorbed liquid. Cooling water flows through the external pipe 1, thereby the boiling of the absorbed liquid within the pipe and the nozzle 3 is prevented. As the cooling water flowing through the external pipe 1 approaches the nozzle 3 within an absorption tower 4, the temperature rises, because the cooling water is contacted with high temperature gas. The cooling water boils, evaporates and turns into gas. As a result, volume is greatly increased, velocity at the tip of the nozzle is increased and the adsorbed liquid is atomized at the jetting port.