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1. 发明专利

JP2014198826A ケテンイミン化合物、ポリエステルフィルム、太陽電池モジュール用バックシートおよび太陽電池モジュール有权
标题翻译：凯特姆化合物，聚酯薄膜，太阳能电池模块的背板和太阳能电池模块
公开(公告)号：JP2014198826A
公开(公告)日：2014-10-23
申请号：JP2014008327
申请日：2014-01-21
申请人：富士フイルム株式会社 , Fujifilm Corp
发明人： FUKUDA MAKOTO , MAKINO MASAOMI , KAMIHIRA SHIGEO , MIZUMURA MASATOSHI , OGAWA TSUNEHIRO
IPC分类号： C08L67/00 , C07C251/16 , C08K3/22 , C08K5/29 , H01L31/042
CPC分类号： C07C251/16 , C08J5/18 , C08J2367/02 , C08J2367/03 , C08K3/22 , C08K5/29 , C08K2003/2241 , H01L31/02327 , H01L31/049 , Y02E10/50 , C08L67/00
摘要：【課題】耐加水分解性を向上させることに加え、黄着色が低減されたポリエステルフィルムを提供する。【解決手段】式(1)のケテンイミン化合物とポリエステルを含む。Rは特定の有機基。【選択図】なし
摘要翻译：要解决的问题：提供具有改善的耐水解性和降低黄色着色的聚酯膜。溶解性：聚酯树脂组合物含有：由式（1）表示的酮亚胺化合物; 和聚酯，其中R s表示特定的有机基团。

2. 发明专利

JP2013092706A Method for producing polymer film, and polymer film 有权
标题翻译：生产聚合物薄膜的方法和聚合物薄膜
公开(公告)号：JP2013092706A
公开(公告)日：2013-05-16
申请号：JP2011235667
申请日：2011-10-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MAKINO MASAOMI , AOSHIMA TOSHIE , INAGAKI YOSHIO
IPC分类号： G03F7/039 , C08F8/00 , C08F220/02 , G03F7/004 , H01L21/027
CPC分类号： C08F212/14 , C08K5/19 , C08K5/34 , C08F2220/1825
摘要： PROBLEM TO BE SOLVED: To provide a polymer film which is obtained by dissolving and removing a specific part thereof with an alkali solution without using a photoacid generator.SOLUTION: A method for producing a polymer film comprises: a process where a film is formed by applying a composition, which contains (A) an onium salt having nitrogen cations and (B) a poorly alkali-soluble resin, onto a supporting body; and a process where a part or the entire of the surface of the film is irradiated with plasma, and the part irradiated with the plasma is dissolved and removed with an alkali solution.
摘要翻译：要解决的问题：提供通过在不使用光酸产生剂的情况下用碱溶液溶解除去其特定部分而获得的聚合物膜。解决方案：一种制备聚合物膜的方法包括：通过将组合物（其包含（A）具有氮阳离子的鎓盐和（B）弱碱溶性树脂）的组合物施加到支撑体以及用等离子体照射薄膜的一部分或全部表面，用碱溶液溶解除去被等离子体照射的部分的工序。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2011227295A Polymerizable composition cured film, color filter, manufacturing method of color filter, solid-state image sensor and novel compound 有权
标题翻译：可聚合组合物固化膜，彩色滤光片，彩色滤光片，固态图像传感器和新型化合物的制造方法
公开(公告)号：JP2011227295A
公开(公告)日：2011-11-10
申请号：JP2010097056
申请日：2010-04-20
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MAKINO MASAOMI
IPC分类号： G03F7/031 , C08F2/50 , G02B5/20 , G03F7/004 , G03F7/029 , H01L27/14
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable composition which cures with high sensitivity to exposed light in the short wavelength region in the vicinity of exposure wavelength of 365 nm and has excellent storage stability and reduced decrease in the curing sensitivity with lapse of time, to provide a color filter in which the coloring patterns formed by using the polymerizable composition has a smooth surface shape and a coloring region in which the generation of development residue at an unexposed portion after forming the patterns is suppressed, to provide a manufacturing method of the color filter, and to provide a solid-state image sensor.SOLUTION: A polymerizable composition includes (A) a composition of the general formula (1) and (B) a polymerizable compound.
摘要翻译：要解决的问题：提供一种聚合性组合物，其在365nm的曝光波长附近的短波长区域中以高灵敏度固化，并且具有优异的储存稳定性，并且随着经过而降低了固化灵敏度时间，提供一种滤色器，其中通过使用可聚合组合物形成的着色图案具有光滑的表面形状和在形成图案之后在未曝光部分产生显影残余物的着色区域，以提供制造方法并提供固态图像传感器。解决方案：可聚合组合物包括（A）通式（1）和（B）的组合物可聚合化合物。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2011209655A Polymerizable composition, color filter, method of producing color filter, solid-state imaging device, and new compound 审中-公开
标题翻译：可聚合组合物，彩色滤光片，生产彩色滤光片的方法，固态成像装置和新化合物
公开(公告)号：JP2011209655A
公开(公告)日：2011-10-20
申请号：JP2010079814
申请日：2010-03-30
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MAKINO MASAOMI
IPC分类号： G03F7/031 , C07D209/86 , C07D491/044 , C07D491/048 , C07D495/04 , C09B47/04 , C09D11/00 , G02B5/20 , G02B5/22 , G03F7/004 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable composition which is cured at high sensitivity for exposure to a short-wavelength range around an exposure wavelength of 365 nm, has excellent storage stability, and prevents a reduction in curing sensitivity with lapse of time.SOLUTION: The polymerizable composition contains (A) a compound represented by general formula (I), and (B) a polymerizable compound. In general formula (I), Rrepresents a hydrogen atom, an alkyl group or an aryl group; Rrepresents a halogen atom or an alkyl carbonyl group; R, Reach independently represents a hydrogen atom, an alkyl group, an alkoxy group or an alkylthio group. Rand R, and Rand Rmay be bonded respectively to form a ring. Rrepresents an alkyl group. n represents an integer of 0 to 3.
摘要翻译：要解决的问题：为了提供在365nm的曝光波长周围的短波长范围内以高灵敏度固化的可聚合组合物，具有优异的储存稳定性，并且防止随着时间的流逝而降低固化灵敏度。：聚合性组合物含有（A）通式（I）表示的化合物和（B）可聚合化合物。在通式（I）中，R表示氢原子，烷基或芳基; R表示卤素原子或烷基羰基; R，Reach独立地表示氢原子，烷基，烷氧基或烷硫基。 Rand R和Rand Rmay分别结合形成环。 R表示烷基。 n表示0〜3的整数。

5. 发明专利

JP2010204213A Photopolymerizable composition, photopolymerizable composition for color filter, color filter and production method thereof, solid-state image pickup device, and lithographic printing plate precursor 审中-公开
标题翻译：光聚合组合物，用于彩色滤光片的可光聚合组合物，彩色滤光片及其制备方法，固态图像拾取装置和光刻印刷前驱体
公开(公告)号：JP2010204213A
公开(公告)日：2010-09-16
申请号：JP2009047299
申请日：2009-02-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： INADA HIROSHI , MAKINO MASAOMI , TSUCHIMURA TOMOTAKA , OKABE KOTARO
IPC分类号： G03F7/031 , C08F2/50 , G02B5/20 , G03F7/004 , H01L27/14
摘要： PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having high sensitivity to light at a wavelength of 365 nm or 405 nm and excellent properties of a coating surface and capable of giving a cured film having a smooth surface, and to provide a color filter and a lithographic printing plate precursor using the composition. SOLUTION: The photopolymerizable composition contains photopolymerizable initiators expressed by general formula (1) and general formula (2). In the general formulae (1) and (2), B 1 , B 2 , R 1 , X 1 and X 2 each represents a monovalent substituent; A represents a divalent organic group; Ar 1 represents an aryl group; Y represents a monovalent substituent including a partial structure having a polymerization initiating ability; and m and n each represents an integer of 0 to 5. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供对波长365nm或405nm的光具有高灵敏度的光聚合性组合物，并且具有优异的涂层表面性能并且能够得到具有光滑表面的固化膜，并提供一种滤色器和使用该组合物的平版印刷版原版。光聚合性组合物含有由通式（1）和通式（2）表示的光聚合引发剂。在通式（1）和（2）中，B 1 ，B 2 ，R 1 ，X 1 2 各自表示一价取代基; A表示二价有机基团; Ar 1 表示芳基; Y表示包含具有聚合引发能力的部分结构的一价取代基; 并且m和n各自表示0至5的整数。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2009029952A Pigment dispersion composition, curable composition and color filter, and manufacturing method therefor 审中-公开
标题翻译：颜料分散组合物，可固化组合物和颜色过滤器及其制造方法
公开(公告)号：JP2009029952A
公开(公告)日：2009-02-12
申请号：JP2007196109
申请日：2007-07-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MAKINO MASAOMI , SHIMADA KAZUTO
IPC分类号： C09D17/00 , C09B45/14 , C09B45/22 , C09B47/10 , C09B67/20 , C09B67/46 , G02B5/20 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a pigment composition having high dispersion property and high dispersion stability, even when using any of an acidic dispersion resin and a basic dispersion resin, a curable composition using the same, a color filter making compatible high dispersion property, high dispersion stability and high developability, by using the curable composition of the present invention, and a manufacturing method therefor. SOLUTION: This pigment composition contains (A) a resin having a basic group or an acidic group, (B) a pigment derivative having a pigment partial skeleton or a pigment-analogous skeleton, and a basic group and an acidic group in the same molecule, (C) a pigment, and (D) a solvent. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决问题：为了提供具有高分散性和高分散稳定性的颜料组合物，即使使用任何一种酸性分散树脂和碱性分散树脂，也可以使用使用该颜料组合物的可固化组合物，分散性，高分散稳定性和高显影性，通过使用本发明的固化性组合物及其制造方法。解决方案：该颜料组合物含有（A）具有碱性基团或酸性基团的树脂，（B）具有颜料部分骨架或颜料 - 类似骨架的颜料衍生物，碱性基团和酸性基团相同的分子，（C）颜料和（D）溶剂。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2007316515A Positive resist composition and pattern forming method using it 审中-公开
标题翻译：使用它的积极抵抗组合物和图案形成方法
公开(公告)号：JP2007316515A
公开(公告)日：2007-12-06
申请号：JP2006148209
申请日：2006-05-29
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MAKINO MASAOMI
IPC分类号： G03F7/039 , C08F20/12 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition capable of giving a pattern profile of high sensitivity and high resolution, and excellent in rectangular geometry, and of which PEB temperature dependency is small, in order to solve the problem in the performance improvement technology in the microfabrication of semiconductor elements using active ray or radiation, particularly KrF excimer laser, ArF excimer laser, electron ray, or EUV ray, and a pattern forming method using it. SOLUTION: The positive resist composition contains (A) a resin having a cyclopropylethyl group which is insoluble or hardly-soluble in an alkaline developer, and is decomposed by the action of an acid increasing the dissolution rate to an alkaline developer, and (B) a compound which generates an acid by the irradiation of active ray or radiation. The pattern forming method uses the positive resist composition. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够提供高灵敏度和高分辨率，矩形几何形状优异且PEB温度依赖性小的正型抗蚀剂组合物，为了解决上述问题，使用活性射线或辐射，特别是KrF准分子激光，ArF准分子激光，电子射线或EUV射线的半导体元件的微细加工中的性能改进技术以及使用它的图案形成方法。正型抗蚀剂组合物含有（A）具有在碱性显影剂中不溶或难溶的环丙基乙基的树脂，并且通过将溶解速率提高至碱性显影剂的酸分解，以及（B）通过活性射线或辐射的照射产生酸的化合物。图案形成方法使用正性抗蚀剂组合物。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007256639A Positive resist composition and pattern forming method using the same 审中-公开
标题翻译：正极性组合物和使用其的图案形成方法
公开(公告)号：JP2007256639A
公开(公告)日：2007-10-04
申请号：JP2006081053
申请日：2006-03-23
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MIZUTANI KAZUYOSHI , MAKINO MASAOMI
IPC分类号： G03F7/039 , C08F12/22 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To solve problems in techniques to improve performances in microprocessing of semiconductor elements using active rays or radiation, particularly, KrF excimer laser light, electron beams or EUV light, and to provide a positive resist composition having high sensitivity, reduced roughness and pattern density dependence and showing excellent sensitivity and dissolution contrast even in exposure to EUV light, and to provide a pattern forming method using the composition. SOLUTION: The resist composition comprises a resin having a styrene repeating unit having a specified aromatic ring-containing substituent, and a compound which generates an acid by irradiation with active rays or radiation. The pattern forming method is carried out by using the above composition. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：为了解决使用活性射线或辐射，特别是KrF准分子激光，电子束或EUV光提高半导体元件的微处理性能的技术中的问题，并提供具有高灵敏度的正性抗蚀剂组合物，降低粗糙度和图案密度依赖性，并且即使在暴露于EUV光下也显示出优异的灵敏度和溶解对比度，并且提供使用该组合物的图案形成方法。解决方案：抗蚀剂组合物包含具有特定的含芳环取代基的苯乙烯重复单元的树脂和通过用活性射线或辐射照射产生酸的化合物。图案形成方法通过使用上述组成进行。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2013035271A Non-resonant two-photon absorption recording material, non-resonant polymer two-photon absorption optical information recording medium, and recording/playback method 有权
标题翻译：非共振双光子吸收记录材料，非共振聚合物两光子吸收光学信息记录介质和记录/回放方法
公开(公告)号：JP2013035271A
公开(公告)日：2013-02-21
申请号：JP2012108951
申请日：2012-05-10
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TSUYAMA HIROAKI , SASAKI TOSHIHISA , KENJO TATSUO , MAKINO MASAOMI , MOCHIZUKI HIDEHIRO
IPC分类号： B41M5/26 , G11B7/0045 , G11B7/1263 , G11B7/1267 , G11B7/24 , G11B7/24035 , G11B7/24047 , G11B7/2407 , G11B7/24097 , G11B7/244
CPC分类号： G11B7/245 , B82Y10/00 , C07C69/76 , G02B1/04 , G11B7/24044 , G11B7/2405 , G11B2007/00457
摘要： PROBLEM TO BE SOLVED: To provide a non-resonant two-photon absorption recording material having sufficient recording/playback characteristics and having high resistance to moist heat, and to provide a non-resonant polymer two-photon absorption compound that can be used for the non-resonant two-photon absorption recording material.SOLUTION: Provided is the non-resonant two-photon absorption recording material containing the non-resonant polymer two-photon absorption compound.

10. 发明专利

JP2012159689A Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, patterned film, low refractive index film, optical device, and solid-state image sensing device using the same 有权
$Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, patterned film, low refractive index film, optical device, and solid-state image sensing device using the same$
标题翻译：光敏组合物，图案形成材料和感光膜，图案形成方法，图案薄膜，低折射指数膜，光学装置和使用其的固态图像感测装置
公开(公告)号：JP2012159689A
公开(公告)日：2012-08-23
申请号：JP2011019328
申请日：2011-01-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MAKINO MASAOMI , SAIE TOSHIYUKI , WADA KENJI
IPC分类号： G03F7/038 , C08F220/34 , G02B1/11 , G02B5/26 , G02B5/28 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive composition and a pattern forming material capable of forming a pattern having high appropriate sensitivity, a low refractive index, little pattern chipping or residue after development, and little change in the refractive index under a high temperature and high humidity, and an excellent weather resistance property, and to provide a photosensitive film, a pattern forming method, a patterned film, a low refractive index film, an optical device, and a solid-state image sensing device using the same.SOLUTION: A photosensitive composition and a pattern forming material containing (A) hollow or porous particles, (B) a compound adapted to generate an active species by irradiation of active rays or radiation, and (C) a resin containing at least one selected from partial structures shown by the following Group A and a carboxylic acid group and whose solubility in a developer is changed by an action of the active species, and a photosensitive film, a pattern forming method, a patterned film, a low refractive index film, an optical device, and a solid-state image sensing device using the same are provided, where Group A includes a hydroxyl group, an amino group, an amide group, an urea bond, an ester bond, a sulfonate group, a phosphate group, a phosphonate group, a polyethylene glycol chain, and a polypropylene glycol chain.
摘要翻译：要解决的问题：为了提供能够形成具有高适当灵敏度，低折射率，小图案切片或显影后残留物的图案的光敏组合物和图案形成材料，并且在下述条件下的折射率几乎没有变化高温高湿度，耐候性优异，并且提供感光膜，图案形成方法，图案化膜，低折射率膜，光学器件和使用该感光膜的固体摄像装置。解决方案：一种感光组合物和含有（A）中空或多孔颗粒的图案形成材料，（B）适于通过照射活性射线或辐射产生活性物质的化合物，和（C）至少含有选自以下A组所示的部分结构和羧酸基，其在显影剂中的溶解度通过活性种的作用而变化的光敏膜，图案形成方法，图案化膜，低折射率提供了一种使用它们的薄膜，光学装置和固体摄像装置，其中A组包括羟基，氨基，酰胺基，脲键，酯键，磺酸酯基，磷酸酯基团，膦酸酯基，聚乙二醇链和聚丙二醇链。版权所有（C）2012，JPO＆INPIT

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