专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2002296774A ORIGINAL PLATE FOR PLANOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JP2002296774A
公开(公告)日：2002-10-09
申请号：JP2001100299
申请日：2001-03-30
申请人： FUJI PHOTO FILM CO LTD
发明人： TAN SHIRO , FUJITA KAZUO , NISHIOKA AKIRA
IPC分类号： B41C1/10 , B41N1/14 , C08F290/06 , C09D5/00 , C09D133/06 , C09D133/14 , G03F7/00 , G03F7/004 , G03F7/023 , G03F7/033
摘要： PROBLEM TO BE SOLVED: To provide an original plate for a planographic printing plate having an image forming layer whose uniformity, solubility in a developing solution and dispersibility have been improved and having a high-contrast image forming property without lowering sensitivity. SOLUTION: The original plate for a planographic printing plate has an image forming layer containing a copolymer obtained by copolymerizing a specified fluoroaliphatic group-containing monomer and a poly(oxyalkylene) acrylate and/or a poly(oxyalkylene) methacrylate on the base.

2. 发明专利

JPH11231477A DEVELOPING SOLUTION FOR SILVER HALIDE PHOTOSENSITIVE MATERIAL USING ALUMINUM SUPPORT AND MANUFACTURE OF IMAGE DISPLAY MATERIAL USING THE SAME 失效
公开(公告)号：JPH11231477A
公开(公告)日：1999-08-27
申请号：JP3320798
申请日：1998-02-16
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA , KASHIWABARA AKIRA
IPC分类号： G03C5/305 , G03C1/77 , G09F7/16
摘要： PROBLEM TO BE SOLVED: To provide a rapid developing solution for a silver halide photosensitive material with an aluminum support, containing no thiocyanate having a danger in environmental safety and capable of a high speed short time development. SOLUTION: This developing solution contains at least an alkyl-thiosulfonate, a developing agent, a preservative, and an alkaline agent and it is used for the photosensitive material using the anodized aluminum support. This developing solution contains the thiosulfonate in a content of 1-50 (molar ratio) times that of the alkylthiosulfonate, thus permitting the silver halide photosensitive material with the aluminum support to be developed in a speed high enough without usint any thiocyanate having a danger of environmental safety.

3. 发明专利

JPH0519471A PHOTOSENSITIVE COMPOSITION 失效
公开(公告)号：JPH0519471A
公开(公告)日：1993-01-29
申请号：JP17137591
申请日：1991-07-11
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA , NAKANISHI HARUO
IPC分类号： C08F2/50 , G03F7/00 , G03F7/027 , G03F7/029
摘要： PURPOSE:To obtain the photosensitive compsn. having a high sensitivity and excellent tone reproducibility by incorporating a specific photosensitive S triazine compd. therein. CONSTITUTION:This compsn. contains (a) a compd. having at least one piece of ethylenic unsatd. double bonds which can be addition polymerized and the compd. which is the photosensitive S-triazine compd. expressed by formula I and (b) the compd. in which both of R3 and R4 are a hydrogen atom, and (c) the compd. in which at least either of the R3 and R4 are a hydrogen atom and the weight ratio of (b) and (c) is in a 20/80 to 80/20 ratio. In the formula, R1, R2 may be the same or different from each other and denote a hydrogen atom, alkyl group, etc., or R1, R2 may form a heterocyclic ring consisting of a nonmetal atom together with the nitrogen atom to which these groups are bonded. R5 denotes an alkyl group, substd. alkyl group, etc.,' R , R may be the same or different from each other and denote a hydrogen atom, alkyl group, etc., R , R denote a hydrogen atom, halogen atom, etc.; X may be the same as or different from each other and denote a chlorine atom or bromine atom; (m), (n) denote 0, 1 or 2.

4. 发明专利

JPH0290163A PHOTOSENSITIVE COMPOSITION 失效
公开(公告)号：JPH0290163A
公开(公告)日：1990-03-29
申请号：JP24193488
申请日：1988-09-27
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA
IPC分类号： G03F7/004 , G03F7/016
摘要： PURPOSE:To obtain a photosensitive planographic plate superior in storage stability by incorporating a specified compound in a photosensitive composition composed essentially of a negative type diazo resin and an organic solvent- soluble high polymer. CONSTITUTION:The photosensitive composition composed essentially of the negative type diazo resin and the organic solvent-soluble high polymer contains the aromatic compound or its salt having one sulfonic acid group and at least 2 carboxy groups in an amount of 0.1-20wt.% of the total weight of the photosensitive layer, and if 20wt.%, the photosensitive layer becomes liable to discolor, and image lines after forming a printing plate, swell, and become easily scratchable, inking and printing resistance deteriorate, thus permitting the photosensitive planographic plate superior in storage stability to be obtained.

5. 发明专利

JPS62194249A POSITIVE TYPE PHOTOSENSITIVE COMPOSITION 失效
公开(公告)号：JPS62194249A
公开(公告)日：1987-08-26
申请号：JP3641786
申请日：1986-02-20
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA , HIRANO TOSHIMI
IPC分类号： G03C1/72 , G03F7/004 , G03F7/022
摘要： PURPOSE:To obtain a photosensitive composition capable of forming a photosensitive lithographic plate (PS plate) good in development processability, film strength, and ink receptivity by dissolving or dispersing the photosensitive composition in a specified mixture of organic solvents, applying and drying it. CONSTITUTION:The positive type photosensitive composition to be applied on a support contains a mixture of each at least one of an organic solvent having a boiling point of 40-100 deg.C, an organic solvent having a boiling point of 100-140 deg.C, and an organic solvent having a boiling point of 140-210 deg.C. As said photosensitive composition, compositions made of o-quinonediazide compounds, preferably, the ones composed of o-quinonediazide and phenolic resin are enumerated. The composition is dried with air heated, preferably, to a temperature of 30-200 deg.C, especially, 40-140 deg.C.

6. 发明专利

JPS62169163A PRODUCTION OF PHOTOSENSITIVE LITHOGRAPHIC PLATE 失效
公开(公告)号：JPS62169163A
公开(公告)日：1987-07-25
申请号：JP1124486
申请日：1986-01-22
申请人： FUJI PHOTO FILM CO LTD
发明人： NAGASHIMA AKIRA , NISHIOKA AKIRA
IPC分类号： G03C1/00 , G03F7/00 , G03F7/004 , G03F7/02
摘要： PURPOSE:To obtain the lithographic plate having a less residual color and a less tendency for generating coming by incorporating a specific amount of at least one of a solvent selected from propylene glycol monoethylether and diacetone alcohol, etc. CONSTITUTION:The solvent contains at least 10wt% of one or more solvent selected from propylene glycol monoethylether, propylene glycol mono-n- propylether, propylene glycol monoisopropylether, propylene glycol monoacetate, propylene glycol and diacetone alcohol. The total amount of propylene glycol monoethylether and diacetone alcohol contd. in the solvent of the coating solution is 10-100%, preferably 40-100%, more preferably 60-100% on the weight basis of the solution contd. in the coating solution. As to the substrate, the anodic oxidized aluminium plate after giving a rough surface thereto is used.

7. 发明专利

JPS60205544A PRODUCTION OF PHOTOSENSITIVE PRINTING PLATE 失效
公开(公告)号：JPS60205544A
公开(公告)日：1985-10-17
申请号：JP6296584
申请日：1984-03-30
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA
IPC分类号： G03F7/00 , G03F7/115 , G03F7/02
摘要： PURPOSE:To prevent the decrease in vacuum adhesion owing to a decrease in the height in the projecting part of a matte layer in the stage of vacuum adhesion by subjecting the matte layer to a pressurizing treatment. CONSTITUTION:A matte layer is formed on the surface of a photosensitive printing plate and thereafter the matte layer is exerted with 0.8-10kg/cm pressure to decrease and level off the height in the projecting part of the matte layer. The matte layer is formed by fixing pulverous resin powder to the photosensitive layer by air spray, electrostatic air spray or the like. The pressure is exerted by a method of vacuum adhesion to glass, pressing with a metallic plate, press welding by rolls, etc. The pressurization is executed at

8. 发明专利

JPS6072794A SUPPORTER FOR LITHOGRAPHIC PRINT PLATE 失效
公开(公告)号：JPS6072794A
公开(公告)日：1985-04-24
申请号：JP18166583
申请日：1983-09-29
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA , SAKAKI HIROKAZU
IPC分类号： C25D11/04 , B41N1/08 , B41N3/00 , B41N3/03
摘要： PURPOSE:To obtain a positive type lithographic print plate having sufficient point reducing effect by providing an anodized film having a branched pore cross sectional structure on the surface of an aluminium plate subjected to a sand blasting and/or chemical etching treatment as needed. CONSTITUTION:An anodized film having a branched pore cross sectional structure is provided on the surface of an aluminium plate subjected to an etching treatment. The surface reflectivity of the aluminium plate after provided with the anodized film should preferably be 50% or less at absorption wave length (350-450nm) of ultraviolet rays for the photo-sensitive substance coated on the upper layer. To attain such a reflectivity, the amount of the anodized film is controlled preferably to 1.0g/m or more.

9. 发明专利

JPS59225998A MANUFACTURE OF BASE FOR PLANOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JPS59225998A
公开(公告)日：1984-12-19
申请号：JP10146083
申请日：1983-06-07
申请人： FUJI PHOTO FILM CO LTD
发明人： NISHIOKA AKIRA , KITA NOBUYUKI
IPC分类号： B41N3/00 , B41N3/04 , C23F1/00
摘要： PURPOSE:To obtain a base for a planographic printing plate free from contamination of non-image parts or ground contamination while retaining durability to printing, by a method wherein an aluminum plate is sanded, is then subjected to anodic oxidation, and is treated in a specified solution. CONSTITUTION:The aluminum plate used as a blank material of the base for the planographic printing plate is subjected to sanding, and then to anodic oxidation. The aluminum plate is then treated in a diluted aqueous solution of a salt of a divalent metal and phytic acid or a salt thereof at a temperature of 60- 100 deg.C. The aluminum plate thus treated is washed with water to remove excess treating solution, is dried, and then a photosensitive layer is provided thereon by coating. A photosensitive composition for constituting the photosenstive layer preferably comprises o-quinonediazide compound. A photosensitive planographic printing plate thus manufactured has high adhesive strength between the aluminum plate as the base and the photosensitive layer provided thereon, has excellent durability to printing, and a printed matter obtained thereby is completely free from ground contamination.

10. 发明专利

JPS58224351A Photosensitive printing plate 失效
标题翻译：感光印版
公开(公告)号：JPS58224351A
公开(公告)日：1983-12-26
申请号：JP10799682
申请日：1982-06-23
申请人： Fuji Photo Film Co Ltd
发明人： NISHIOKA AKIRA , AOTANI NORIMASA , YAMASUE KOUTAROU
IPC分类号： G03C1/00 , G03C1/72 , G03F7/00 , G03F7/004 , G03F7/105
CPC分类号： G03F7/105
摘要： PURPOSE: To obtain an image small in coloring due to remaining dyes after development and high in contrast, by adding an oxonol dye.
CONSTITUTION: An aluminum support grained in advance and anodized is coated with a layer of a positive type photosensitive compsn. prepd. by adding to a photosolubilizable compsn. consisting of an o-quinonediazide compd. and a phenolic resin an oxonol dye represented by the general formula in which R
1 and R
2 are each optionally substd. monovalent group selected from aryl, lower alkyl, and alkoxycarbonyl, and they can be different from each other, and n is 1 or 2. After the layer is exposed, it is developed with an aq. alkaline soln. The o- quinonediazide compd. contained in the positive type photosensitive compsn. is photodecomposed by the exposure to produce an acidic product, and a visible image having sufficient contrast is obtained by change of tone caused by mutual action of said acidic product and the oxonol dye. The use of said dye reduces residual coloring indifferent of using a fresh or fatigued developing soln. and causes no uneven development.
COPYRIGHT: (C)1983,JPO&Japio
摘要翻译：目的：为了获得由于显影后残留的染料而造成的着色少，对比度高，通过加入氧杂菁染料。构成：预先提供并经阳极氧化处理的铝支架涂有一层正型光敏组合物。准备通过添加到photoolubilizable compsn。由o-醌二叠氮化合物组成。和酚醛树脂，由通式表示的氧杂菁染料，其中R 1和R 2各自任意取代。选自芳基，低级烷基和烷氧基羰基的一价基团，它们可以彼此不同，n为1或2.在该层暴露后，用aq。碱性溶胶邻醌二叠氮化合物包含在正型光敏组合物中。通过曝光光分解以产生酸性产物，并且通过由所述酸性产物和氧杂菁染料的相互作用引起的色调的改变来获得具有足够对比度的可见图像。所述染料的使用降低了使用新鲜或疲劳的显影剂溶液的残留着色。不发展不均衡。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式