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1. 发明专利

JP2008022026A Reliable, modular, production-quality narrow-band high repetition-rate f2 laser 审中-公开
标题翻译：可靠，模块化，生产质量窄带高反射率F2激光
公开(公告)号：JP2008022026A
公开(公告)日：2008-01-31
申请号：JP2007236405
申请日：2007-09-12
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： H01S3/03 , H01S3/097 , G03F7/20 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a reliable, modular, production-quality narrow-band high repetition-rate F 2 laser. SOLUTION: A reliable, modular, production-quality excimer laser capable of producing 10 mJ laser pulses in the range of 1,000 Hz to 2,000 Hz or greater is provided. Replaceable modules include a laser chamber, a pulse power system including three modules, an optical resonator comprised of a line narrowing module and an output coupler module, a wavemeter module, an electrical control module, a cooling water module, and a gas control module. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可靠的模块化生产质量窄带高重复率F 2 激光器。
解决方案：提供了一种可靠，模块化，生产质量准分子激光器，能够产生1,000 Hz至2,000 Hz或更大范围内的10 mJ激光脉冲。可替代模块包括激光室，包括三个模块的脉冲电力系统，包括线路窄化模块和输出耦合器模块的光学谐振器，波形计模块，电气控制模块，冷却水模块和气体控制模块。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007281517A F2 laser with visible red and ir control 审中-公开
标题翻译： F2激光与可见的红色和红外控制
公开(公告)号：JP2007281517A
公开(公告)日：2007-10-25
申请号：JP2007181874
申请日：2007-07-11
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： ECKHARDT D ONKERUSU , SANDSTROM RICHARD L , THOMAS P DAFFY
IPC分类号： H01S3/097 , H01S3/225 , H01L21/027 , H01S3/036
摘要： PROBLEM TO BE SOLVED: To provide an F2 excimer laser capable of producing laser pulses with pulse energies greater than 10 mJ at wavelength in the range of 157 nm, at repetition rates in the range of 1,000 to 2,000 Hz. SOLUTION: Using a laser, which is operated in the range of 1000 to 4000 Hz with energies, or pulse energies in the range of 10 to 5 mJ, as an illumination source, a stepper or a scanner equipment can produce integrated circuit resolution of 0.1 μm or less. In a preferred embodiment, the laser was tuned to the Fluorine 157.6 nm line using a set of two external prisms. In a second preferred embodiment, the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a preferred embodiment, a line width of 0.2 pm is provided using injection seeding. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够产生在157nm范围内的波长下具有大于10mJ的脉冲能量的激光脉冲的F2准分子激光器，其重复率在1,000至2,000Hz的范围内。解决方案：使用在能量范围为1000至4000Hz范围内的激光器或10至5mJ范围内的脉冲能量作为照明源，步进器或扫描仪设备可以产生集成电路分辨率为0.1μm以下。在优选实施例中，使用一组两个外部棱镜将激光器调谐到氟157.6nm线。在第二优选实施例中，激光器被操作为宽带，并且157.6nm线选择在谐振腔外部。在优选实施例中，使用注射接种提供0.2μm的线宽。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2006261689A Extremely narrow band two-chamber type high-repetition rate gas discharging laser system 审中-公开
标题翻译：极致窄带双层高速重启速率排气激光系统
公开(公告)号：JP2006261689A
公开(公告)日：2006-09-28
申请号：JP2006129553
申请日：2006-05-08
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： MYERS DAVID W , BESAUCELE HERVE A , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PALASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , PAN XIAOJIANG J , ONKELS ECKEHARD D , NESS RICHARD M , BROWN DANIEL J W
IPC分类号： H01S3/03 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To generate high quality pulsed laser beams at a pulse rate of about 4,000 Hz or greater and at a pulse energy of about 5 mJ or greater. SOLUTION: Two individual discharge chambers are provided and one of which is a part of a master oscillator producing a very narrow-band seed beam which is amplified in the second discharge chamber. The chambers can be controlled individually permitting individual optimization of wavelength parameters in the master oscillator and the optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system is configured as a MOPA (Master Oscillator Power Amplifier) and specifically designed for use as a light source for integrated-circuit pattern lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing a sufficient gas flow to permit operation at a pulse rate of 4,000 Hz or greater by clearing debris from a discharging region in a time shorter than approximately 0.25 milliseconds between pulses. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。解决方案：提供两个单独的放电室，其中一个是主振荡器的一部分，产生在第二放电室中放大的非常窄带子光束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中脉冲能量参数的优化。 ArF准分子激光器系统中的优选实施例被配置为MOPA（主振荡器功率放大器），并被专门设计为用作集成电路图案光刻的光源。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在短于脉冲之间的大约0.25毫秒的时间内从放电区域清除碎屑，从而提供足够的气流以允许以4,000Hz或更高的脉冲速率运行。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2008034871A Lithography laser light source with beam delivery 有权
标题翻译：光束激光光源与光束交付
公开(公告)号：JP2008034871A
公开(公告)日：2008-02-14
申请号：JP2007260176
申请日：2007-10-03
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KLENE BRIAN C , DAS PALASH P , GROVE STEVEN L , ERSHOV ALEXANDER I , SMITH SCOTT T , PAN XIAOJIANG J , SANDSTROM RICHARD L
IPC分类号： H01L21/027 , H01S3/10 , G03F7/20 , H01S3/00 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a modular high repetition rate ultraviolet gas discharge laser (4) for a production line machine. SOLUTION: A system includes an enclosed and purged beam path for providing the laser beam to a desired location such as an entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separated discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam amplified in a second discharge chamber. A MOPA system allows outputting pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. The preferred embodiment allows providing illumination approximately constant throughout the operating life of the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产线机器的模块化高重复率紫外线气体放电激光器（4）。解决方案：系统包括用于将激光束提供到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个分离的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体光束。 MOPA系统允许输出脉冲能量大约是可比较的单室激光系统的两倍，具有极大改善的光束质量。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。优选实施例允许在光刻系统的整个使用寿命期间提供近似恒定的照明。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2008294477A Super narrow band, two-chamber, high repetition rate gas discharge laser system 审中-公开
标题翻译：超级窄带，双室，高重复率排气激光系统
公开(公告)号：JP2008294477A
公开(公告)日：2008-12-04
申请号：JP2008215610
申请日：2008-08-25
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KNOWLES DAVID S , BROWN DANIEL J W , BESAUCELE HERVE A , MYERS DAVID W , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PLASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , ONKELS ECKEHARD D , NESS RICHARD M , SMITH SCOTT T , HULBURD WILLIAM G , OICLES JEFFREY
IPC分类号： H01S3/225 , H01L21/027 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/038 , H01S3/134 , H01S3/23
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2258
摘要： PROBLEM TO BE SOLVED: To provide a seed light injection module gas discharge laser system capable of generating a high quality-pulse laser beam with about 4,000 Hz of pulse repetition rate or more and a pulse energy of about 5 mJ or more. SOLUTION: The system is provided with two separate discharge chambers, and one is a part of a master oscillator that generates a super narrow band seed beam amplified in a second discharge chamber. The two discharge chambers can be separately controlled, and enable the system to optimize a wavelength parameter in the master oscillator and a pulse energy parameter in an amplifying chamber. A preferable embodiment of an ArF excimer laser system is configured as a MOPA, and is particularly designed to be used as a light source of an integrated circuit lithography. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种种子光注入模块气体放电激光系统，其能够产生具有大约4,000Hz的脉冲重复率或更大的脉冲能量和大约5mJ以上的脉冲能量的高质量脉冲激光束。解决方案：该系统设置有两个分开的放电室，一个是主振荡器的一部分，其产生在第二放电室中放大的超窄带种子光束。两个放电室可以单独控制，并且使系统能够优化主振荡器中的波长参数和放大室中的脉冲能量参数。 ArF准分子激光器系统的优选实施例被配置为MOPA，并且被特别设计为用作集成电路光刻的光源。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2011176358A Laser system 有权
标题翻译：激光系统
公开(公告)号：JP2011176358A
公开(公告)日：2011-09-08
申请号：JP2011106816
申请日：2011-05-12
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： ERSHOV ALEXANDER I , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BERGSTEDT ROBERT A , SANDSTROM RICHARD L , LALOVIC IVAN
IPC分类号： H01S3/23 , H01S3/225
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To provide a high electric power gas discharge laser system for a DUV light source. SOLUTION: A method and apparatus may include a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may include a seed laser oscillator producing an output including a pulsed laser output light beam and which may include a first gas discharge excimer or a molecular fluorine laser chamber and a line narrowing module within a first oscillator cavity; and a laser amplification stage which contains an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output including a pulsed laser output light beam, and which may include a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为DUV光源提供高功率气体放电激光系统。解决方案：方法和装置可以包括线变窄的脉冲准分子或分子氟气体放电激光系统，其可以包括产生包括脉冲激光输出光束的输出的种子激光振荡器，并且可以包括第一气体放电准分子或分子氟激光室和第一振荡器腔内的线窄模块; 以及激光放大级，其在第二气体放电准分子或分子氟激光室中含有放大增益介质，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成包括脉冲激光输出的激光系统输出光束，并且其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质每循环至少两次。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2000077762A HIGH-RELIABILITY MODULAR PRODUCTION HIGH-QUALITY NARROW- BAND HIGH-REPETITION RATE ArF EXCIMER LASER 审中-公开
标题翻译：高可靠性模块化生产高品质窄带高回复率ArF EXCIMER激光
公开(公告)号：JP2000077762A
公开(公告)日：2000-03-14
申请号：JP17729499
申请日：1999-05-20
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： C23C14/06 , C23C14/16 , C23C14/22 , C23C14/24 , G01J9/00 , G02B1/10 , G02B5/18 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/223 , H01S3/225 , H03K3/57 , H03K17/80
CPC分类号： G03F7/70025 , C23C14/0694 , C23C14/16 , C23C14/225 , C23C14/24 , G01J9/00 , G02B1/105 , G02B5/1852 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/09713 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H03K3/57 , H03K17/80
摘要： PROBLEM TO BE SOLVED: To obtain a laser pulse provided with a specified pulse energy for an exchange of a laser chamber, a modular pulse power system and a line band narrowing module at the repair of an excimer laser by a method wherein modules, which can be exchanged for the chamber, the power system and the module, are formed. SOLUTION: A pulse power system is formed into four separate modules of a high-voltage power supply module 20, a rectifier module 40, a compression head module 60 and a laser chamber module 80, each of the modules is used as the important parts of an excimer laser system, and on the occurrence of a breakdown of some parts of the parts of the system, each of the modules can be rapidly with the broken parts. An optical resonance chamber is constituted of an output coupler 88 along with two prism wavelength selectors and an R-max mirror. The laser pulse of the excimer laser system is a narrow-band laser pulse, is a pulse of 20 to 50 ns, a pulse of 157 nm of about 10 mJ and a pulse of a hertz ending 2000 pulse/second, and an excimer laser can produce a laser pulse provided with a pulse energy larger than a pulse energy of 5 mJ provided with a half width of a wavelength stability.
摘要翻译：要解决的问题：为了获得具有指定脉冲能量的激光脉冲，用于交换激光室，模拟脉冲电源系统和线频带变窄模块，通过一种方法修复准分子激光器，其中模块可以形成了房间，电力系统和模块的交换。解决方案：脉冲电力系统形成为高压电源模块20，整流模块40，压缩头模块60和激光室模块80的四个独立模块，每个模块用作重要部件准分子激光系统，并且在发生系统部件的某些部件的故障的情况下，每个模块可以迅速地与破碎的部件一起。光共振室由输出耦合器88以及两个棱镜波长选择器和R-max镜组成。准分子激光系统的激光脉冲是窄带激光脉冲，是20至50ns的脉冲，157nm的脉冲为约10mJ，脉冲为2000Hz脉冲/秒的赫兹，准分子激光可以产生具有大于具有波长稳定性的一半宽度的5mJ的脉冲能量的脉冲能量的激光脉冲。

8. 发明专利

JP2008085364A Super narrow band two-chamber type high repetition rate gas discharge laser system 有权
标题翻译：超级窄带双层式高重复率气体放电激光系统
公开(公告)号：JP2008085364A
公开(公告)日：2008-04-10
申请号：JP2007310433
申请日：2007-11-30
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KNOWLES DAVID S , BROWN DANIEL J W , BESAUCELE HERVE A , MYERS DAVID W , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PLASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , ONKELS ECKEHARD D , NESS RICHARD M , SMITH SCOTT T , HULBURD WILLIAM G , OICLES JEFFREY
IPC分类号： H01S1/00 , H01S3/0943 , G01J1/42 , G01J9/00 , G03F7/20 , H01L21/027 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a seeded light injection module gas discharge laser system capable of generating a high quality-pulse laser beam with about 4,000 Hz of pulse repetition rate or more and pulse energy of about 5 mJ or more. SOLUTION: The system is provided with two separate discharge chambers, and one is a part of a master oscillator that generates a super narrow band seeded beam amplified in a second discharge chamber. The two discharge chambers can be separately controlled, and enable the system to optimize a wavelength parameter in the master oscillator and a pulse energy parameter in an amplifying chamber. An ArF excimer laser system is configured as a MOPA, and is particularly designed to be used as a light source of an integrated circuit lithography. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够产生大约4000Hz的脉冲重复率或更大的脉冲能量约5mJ或更大的高质量脉冲激光束的种子光注入模块气体放电激光系统。解决方案：该系统设有两个独立的放电室，一个是主振荡器的一部分，其产生在第二放电室中放大的超窄带种子光束。两个放电室可以单独控制，并且使系统能够优化主振荡器中的波长参数和放大室中的脉冲能量参数。 ArF准分子激光器系统被配置为MOPA，并且被特别设计为用作集成电路光刻的光源。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2002198603A METHOD AND SYSTEM FOR REPLENISHING GAS FOR EXCIMER LASER 审中-公开
公开(公告)号：JP2002198603A
公开(公告)日：2002-07-12
申请号：JP2001377049
申请日：2001-12-11
申请人： CYMER INC
发明人： SANDSTROM RICHARD L
IPC分类号： H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide an improved method and system for replenishing a gas mixture in a fluorine/krypton excimer laser having the gas mixture comprising fluorine, krypton, and neon. SOLUTION: This excimer laser has a gas source (32) of individual fluorine/ neon used for replenishing the gas mixture, and a gas source (34) of the krypton/ neon. To remove one portion of the gas mixture from the excimer laser, a take-out mechanism (36) is provided. To selectively change the gas mixture for generally maintaining optimum laser efficiency, a control mechanism (44) controls the gas source (32) of the fluorine/neon, the gas source (34) of the krypton/neon, and the take-out mechanism (36). The control system (44) preferably monitors the operation parameters of the excimer laser including gain, wavelength, bandwidth, and the number of pulse repetition to measure whether the gas mixture is different from an optimum mixture or not.

10. 发明专利

JP2002057391A HIGH REPETITION RATE GAS DISCHARGE LASER 审中-公开
公开(公告)号：JP2002057391A
公开(公告)日：2002-02-22
申请号：JP2001200986
申请日：2001-07-02
申请人： CYMER INC
发明人： OLIVER I ROGER , PARTLO WILLIAM N , NESS RICHARD M , SANDSTROM RICHARD L , ANDERSON STUART L , IVASCHENKO ALEX P , HOWEY JAMES K , KULGEYKO VLADIMIR , HUEBER JEAN-MARC , BIRX DANIEL L
IPC分类号： H01S3/097 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/134 , H01S3/22 , H01S3/225 , H03K3/57 , H03K17/80
摘要： PROBLEM TO BE SOLVED: To provide a high repetition rate gas discharge laser capable of operating at a pulse repetition rate of a range of 4 kHz to 6 kHz of a pulse energy of a range of 5 mJ to 10 mJ or more. SOLUTION: In order to improve important factors as compared with prior art design, the gas discharge laser comprises (1) a laser chamber having a gas flow passage with a gradually increasing section at a downstream flow of discharge electrodes, (2) a cage shape fan capable of generating a gas speed exceeding 67 m/s through a discharge region and continuously operating without fault for several months, (3) a heat exchanger system capable of removing a heat energy from a laser gas, (4) a pulse power system capable of supplying accurately controlled electric pulses to the electrodes, and (5) a laser beam measuring and control unit capable of measuring the pulse energy, a wavelength and a bandwidth.

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