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1. 发明专利

JP2011053687A Reflective optical element for use in euv system 有权
标题翻译：在EUV系统中使用的反射光学元件
公开(公告)号：JP2011053687A
公开(公告)日：2011-03-17
申请号：JP2010192235
申请日：2010-08-30
申请人： Carl Zeiss Laser Optics Gmbh , カールツァイスレーザーオプティクスゲーエムベーハー
发明人： KIEREY HOLGER , MAIRE MICHEL LE , ANDERL WILLI , HOLDERER HUBERT , LENGEL ANTON
IPC分类号： G02B5/08 , H01L21/027
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： PROBLEM TO BE SOLVED: To provide a reflective optical element suitable for use in an EUV wavelength region in a high heat load state. SOLUTION: A reflective optical element (10) for use in an EUV system includes a base body (1) which is produced at least partly from a substrate material, and at least one cooling channel (6) disposed in the base body (1), through which a cooling medium (7) flows. A material having a thermal conductivity of 50 W/mK or greater is provided as the substrate material. The reflective optical element also includes a polishing layer which is applied to the substrate material and includes an amorphous material which can be processed via polishing. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供适用于高热负荷状态的EUV波长区域的反射型光学元件。解决方案：用于EUV系统的反射光学元件（10）包括至少部分地由基底材料制成的基体（1）和设置在基体中的至少一个冷却通道（6）（1），冷却介质（7）通过其流动。提供具有50W / mK以上的导热率的材料作为基板材料。反射光学元件还包括施加到基板材料上的抛光层，并且包括可通过抛光加工的非晶材料。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2010085408A Method of measuring spectrum of narrow band light source and spectrometer arrangement 有权
标题翻译：测量窄带光源和光谱仪布置的方法
公开(公告)号：JP2010085408A
公开(公告)日：2010-04-15
申请号：JP2009224922
申请日：2009-09-29
申请人： Carl Zeiss Laser Optics Gmbh , カールツァイスレーザーオプティクスゲーエムベーハー
发明人： CLAUS JOHANNES , HERKOMMER ALOIS , WEIGL BERNHARD , MAIRE MICHEL LE , MUENZ HOLGER
IPC分类号： G01J3/26
CPC分类号： G01J3/26 , G01J3/36
摘要： PROBLEM TO BE SOLVED: To measure a spectrum of a narrowband light source, particularly a narrow bandwidth laser device in a high resolution. SOLUTION: This spectrometer arrangement (10) for measuring a spectrum of a light beam (64) emitted from a narrow bandwidth laser device includes: a single etalon (16); a beam splitter (18) for splitting the light beam (64) into a first partial beam (66) and a second partial beam (68); and an optical directing element (20) for directing the first partial beam (66) n times and the second partial beam (68) (n+k) times through the etalon (16), wherein n and k are integers of one or more. This spectrometer arrangement (10) further includes: a light sensitive detector (22); and a spectrum evaluation device (28) that evaluates the spectra, recorded by the detector (22), of the first partial beam that has passed through the etalon (16) n times and of the second partial beam that has passed through the etalon (16) (n+k) times so as to determine the light spectrum corrected with respect to a device function of the etalon (16). COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：以高分辨率测量窄带光源，特别是窄带宽激光器件的光谱。解决方案：用于测量从窄带激光器件发射的光束（64）的光谱的该光谱仪装置（10）包括：单个标准具（16）; 用于将光束（64）分裂成第一部分光束（66）和第二部分光束（68）的分束器（18）; 以及用于将所述第一部分光束（66）n次和所述第二部分光束（68）（n + k）引导通过所述标准具（16）的光导向元件（20），其中n和k是一个或多个。该光谱仪装置（10）还包括：光敏检测器（22）; 以及光谱评估装置（28），其评估由检测器（22）记录的已经通过标准具（16）的第一部分光束的光谱和经过标准具的第二部分光束的光谱（28） 16）（n + k）倍，以便确定相对于标准具（16）的器件功能校正的光谱。版权所有（C）2010，JPO＆INPIT

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