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1. 发明专利

JP2013101898A Energy beam irradiation device and workpiece transfer mechanism 有权
标题翻译：能源光束辐射装置和工作传输机制
公开(公告)号：JP2013101898A
公开(公告)日：2013-05-23
申请号：JP2011276058
申请日：2011-12-16
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： ONODA MASATOSHI , TATEMICHI JUNICHI , MATSUMOTO TAKESHI
IPC分类号： H01J37/317 , B65G49/06 , H01J37/20 , H01L21/677
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/201 , H01J2237/20221 , H01L21/67213 , H01L21/67718 , H01L21/67736 , H01L21/67754
摘要： PROBLEM TO BE SOLVED: To achieve a compact and low cost transfer mechanism capable of efficiently irradiating an energy beam on workpieces having different sizes, in an energy beam irradiation system.SOLUTION: A transfer mechanism includes: first and second workpiece holders 31a, 32a on which workpieces W1, W2 having different sizes are mounted, respectively; an advancing/retracting mechanism 33 moving each workpiece holder to advance or retract between each workpiece transfer region and an energy beam irradiation region AR1; first and second workpieces housing part 21a, 22a provided at positions different with each other; a first transfer arm transferring the workpiece W1 between the first workpiece holder 31a in the first workpiece transfer region and the first workpiece housing part 21a; and a second transfer arm transferring the workpiece between the second workpiece holder 32a in the second workpiece transfer region and the second workpiece housing part 22a.
摘要翻译：要解决的问题：为了实现能量束照射系统中能够有效地将能量束照射到具有不同尺寸的工件上的紧凑且低成本的转移机构。解决方案：传送机构包括：分别安装有不同尺寸的工件W1，W2的第一和第二工件保持器31a，32a; 每个工件保持器移动到每个工件传送区域和能量束照射区域AR1之间的前进/后退机构33; 设置在彼此不同的位置的第一和第二工件容纳部分21a，22a; 在第一工件传送区域中的第一工件保持器31a和第一工件容纳部21a之间传送工件W1的第一传送臂; 以及第二传送臂，其在第二工件传送区域中的第二工件保持器32a和第二工件容纳部22a之间传送工件。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2013089427A Energy beam irradiation device and work conveyance mechanism 有权
标题翻译：能源光束辐射装置和工作传输机制
公开(公告)号：JP2013089427A
公开(公告)日：2013-05-13
申请号：JP2011228383
申请日：2011-10-17
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： ONODA MASATOSHI
IPC分类号： H01J37/317 , C23C14/48 , H01L21/265
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/201 , H01J2237/20221 , H01L21/67213 , H01L21/67712 , H01L21/67718 , H01L21/6776
摘要： PROBLEM TO BE SOLVED: To make an energy beam irradiation system greatly compact while making it possible to irradiate a work with an energy beam.SOLUTION: An energy beam irradiation device includes an energy beam emission mechanism emitting an energy beam IB toward a predetermined irradiated region P, a first revolution mechanism 1 which revolves a first work W1 as an object to be irradiated with the energy beam IB along a first revolution track O1 including the irradiated region P, and a second revolution mechanism 2 which revolves a second work W2 as an object to be irradiated with the energy beam along a second revolution track O2 including an irradiated region P1, a region enclosed with the first revolution track O1 and a region enclosed with the second revolution track O2 overlapping with each other at least partially when viewed from a direction perpendicular to a virtual revolution surface formed by respective revolution tracks.
摘要翻译：要解决的问题：使能量束照射系统大大地紧凑化，同时能够用能量束照射工件。解决方案：能量束照射装置包括朝向预定照射区域P发射能量束IB的能量束发射机构，将作为待照射物体的第一工件W1作为能量束IB旋转的第一转动机构1 沿着包括照射区域P的第一转动轨道O1和第二转动机构2，第二转动机构2沿着包括照射区域P1的第二转动轨道O2旋转作为要照射能量束的物体的第二工件W2，当从与各个旋转轨道形成的虚拟旋转表面垂直的方向观察时，第一旋转轨道O1和由第二旋转轨道O 2包围的区域至少部分地彼此重叠。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2011181433A Ion beam irradiation device 审中-公开
标题翻译：离子束辐照器件
公开(公告)号：JP2011181433A
公开(公告)日：2011-09-15
申请号：JP2010046325
申请日：2010-03-03
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： NAITO KATSUO , TATEMICHI JUNICHI , ONODA MASATOSHI
IPC分类号： H01J37/317 , H01L21/265
摘要： PROBLEM TO BE SOLVED: To provide an ion beam irradiation device capable of performing maintenance without having an adverse effect on other processing chambers when performing maintenance of an ion beam supply device in use corresponding to an in-line method.
SOLUTION: The ion beam irradiation device respectively supplies ribbon-shaped ion beams to a plurality of processing chambers mutually connected in series, and includes a plurality of ion beam supply devices for respectively irradiating ion beams to all surfaces of respective substrates in cooperation with transport of the substrates. A plurality of vacuum valves are arranged between the plurality of processing chambers and beam lines.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种离子束照射装置，其能够在对应于在线方式进行使用的离子束供给装置的维护时，对其他处理室产生不利影响而进行维护。解决方案：离子束照射装置分别向串联连接的多个处理室提供带状离子束，并且包括多个离子束供给装置，用于在合作中分别将各离子束照射到各个基板的所有表面与底物的运输。多个真空阀布置在多个处理室和射束之间。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2014203713A エネルギー線照射システム及びワーク搬送機構有权
标题翻译：能源光束辐射系统和工作转移机制
公开(公告)号：JP2014203713A
公开(公告)日：2014-10-27
申请号：JP2013079779
申请日：2013-04-05
申请人：日新イオン機器株式会社 , Nissin Ion Equipment Co Ltd
发明人： ONODA MASATOSHI , TATEMICHI JUNICHI , MATSUMOTO TAKESHI
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01J37/20 , H01L21/67718 , H01L21/67754 , H01L21/67757
摘要：【課題】エネルギー線照射システムにおいて、スループットを飛躍的に改善するとともに、エネルギー線の効率的な利用に資する。【解決手段】エネルギー線射出機構と、前記エネルギー線が照射されるワークWを所定のワーク授受領域とエネルギー線の照射領域ARとの間で搬送するワークホルダ21とを具備したものであって、前記ワーク授受領域を、前記照射領域ARを通る仮想直線Cを挟んで相対する2箇所に設けるとともに、前記ワークホルダ21として、一方のワーク授受領域と前記照射領域ARとの間を移動する第1ワークホルダ21(1)と、他方のワーク授受領域と前記照射領域ARとの間を移動する第2ワークホルダ21(2)とを設けた。【選択図】図1
摘要翻译：要解决的问题：在能量束照射系统中，有效地提高吞吐量并有效利用能量束。解决方案：能量束照射系统包括能量束注入机构和用于传送工件W的工件保持器21 在规定的工件传送区域和能量束照射区域AR之间被能量束照射。工件传送区域设置在彼此相对的两个点处，同时保持通过照射区域AR的虚拟直线C. 作为工件保持器21，设置在一个工件传送区域和照射区域AR之间移动的第一工件保持件21（1）和在另一个工件传送区域和照射区域AR之间移动的第二工件保持器21（2）。

5. 发明专利

JP2013251240A Ion beam irradiation device 有权
标题翻译：离子束辐照器件
公开(公告)号：JP2013251240A
公开(公告)日：2013-12-12
申请号：JP2012127538
申请日：2012-06-04
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： NAKAZAWA YOSHIYUKI , ONODA MASATOSHI
IPC分类号： H01J37/317 , H01L21/265
摘要： PROBLEM TO BE SOLVED: To allow cable to be wired without limiting the internal space of a vacuum chamber, and to prevent a cable from being caught up by an ion beam irradiation device and thereby broken, as well as prevent the cable from being deteriorated by irradiation of an ion beam and gases from being generated from the cable.SOLUTION: In an ion beam irradiation device, a substrate holding member 2 changes the direction of the substrate from a horizontal to a vertical direction and vice versa and also moves the substrate along a rail 18 between a region where an ion beam is irradiated and a region where no ion beam is irradiated. The substrate holding member 2 is connected to a vacuum chamber side by a link 4 which is rotatably connected at one end to the vacuum chamber side and connected at the other end to the substrate holding member 2. The link 4 has a cable for supplying power to a drive device installed on the substrate holding member 2 side wired along the surface thereof and is provided therein with a passage to send a fluid for cooling the substrate holding member 2 or the drive device.
摘要翻译：要解决的问题：为了允许电缆在不限制真空室的内部空间的情况下进行布线，并且防止电缆被离子束照射装置卡住并因此被破坏，并且防止电缆劣化离子束的照射和从电缆产生的气体。解决方案：在离子束照射装置中，衬底保持构件2将衬底的方向从水平方向改变到垂直方向，反之亦然，并且使衬底沿着在照射离子束的区域和不照射离子束的区域之间的轨道18。基板保持构件2通过连杆4连接到真空室侧，连杆4的一端可旋转地连接到真空室侧，并且在另一端连接到基板保持构件2.连杆4具有用于供电的电缆涉及安装在沿其表面布线的基板保持构件2侧的驱动装置，并且在其中设置有用于发送用于冷却基板保持构件2或驱动装置的流体的通道。

6. 发明专利

JP2015057789A エネルギー線照射システム有权
标题翻译：能量束辐射系统
公开(公告)号：JP2015057789A
公开(公告)日：2015-03-26
申请号：JP2014233203
申请日：2014-11-18
申请人：日新イオン機器株式会社 , Nissin Ion Equipment Co Ltd
发明人： ONODA MASATOSHI , TATEMICHI JUNICHI , MATSUMOTO TAKESHI
IPC分类号： H01J37/317
摘要：【課題】エネルギー線照射システムにおいて、スループットを飛躍的に改善するとともに、エネルギー線の効率的な利用に資する。【解決手段】エネルギー線射出機構と、ワークを所定のワーク授受領域と照射領域との間で搬送するワークホルダとを具備し、イオンビームを挟んで2箇所に設けてあるワーク授受領域と、一方のワーク授受領域と照射領域との間でワークを搬送する第1ワークホルダと、他方のワーク授受領域と照射領域との間でワークを搬送する第2ワークホルダとが設けてあり、各ワークホルダは、複数のワークを保持でき、イオンビームを挟んで第1ワーク載置部及び第2ワーク載置部とさらに各ワーク載置部間に第3ワーク載置部を設け、一方のワーク授受領域と第1、第3ワーク載置部との間でワークを搬送する第1、第3の搬送部材と、他方のワーク授受領域と第2、第3ワーク載置部との間でワークを搬送する第2、第4の搬送部材とを設けた。【選択図】図7
摘要翻译：要解决的问题：提供能够显着提高吞吐量并有效利用能量束的能量束照射系统。解决方案：能量束照射系统包括：能量束发射机构; 以及用于在预定的工件传送区域和照射区域之间传送工件的工件保持器。工件传送区域设置在插入离子束的两个位置。用于输送工件的第一工件保持器设置在一个工件传送区域和照射区域之间，并且在另一个工件传送区域和照射区域之间设置用于传送工件的第二工件保持器。每个工件保持器可以容纳多个工件。提供第一工件放置部分和第二工件放置部分以插入离子束，并且第三工件放置部分设置在相应的工件放置部分之间。第一和第三传送工件的输送部件设置在一个工件传送区域中的第一和第三工件放置部件之间，并且用于传送工件的第二和第四传送部件设置在第二和第三工件放置部件之间其他工件传送区域。

7. 发明专利

JP2010287416A Ion implanter 有权
标题翻译：离子植入物
公开(公告)号：JP2010287416A
公开(公告)日：2010-12-24
申请号：JP2009139924
申请日：2009-06-11
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： TATEMICHI JUNICHI , ONODA MASATOSHI , ORIHIRA KOICHI
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01L21/67213 , H01J37/20 , H01J2237/2007 , H01J2237/201 , H01J2237/204 , H01J2237/31701 , H01L21/68764 , H01L21/68771
摘要： PROBLEM TO BE SOLVED: To provide an ion implanter capable of implanting ions to a plurality of substrates at one time and improving uniformity of implantation volume distribution in a surface of each substrate.
SOLUTION: The ion implanter is provided with an implanting chamber 8 with ion beam 4 introduced, a holder 12 for holding substrates 10 in an X direction in two columns of a first column and a second column, and a holder driving unit 16 having a function of positioning the holder 12 in a horizontal state at a substrate exchanging position 48 and a function to drive reciprocally and linearly the holder 12 in a standing state along the X-direction in an irradiation area of the ion beam 4. Further, the ion implanter is provided with two load lock mechanisms 20a, 20b and two substrate carrying units 30a, 30b each having two arms 32a-32d for carrying the substrates 10 between each of the load lock mechanisms 20a, 20b and the substrate exchanging position 48.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够一次将离子注入多个基板的离子注入机，并提高每个基板的表面中的注入体积分布的均匀性。解决方案：离子注入机设置有引入离子束4的注入室8，用于将基板10沿X方向保持在第一列和第二列的两列中的保持器12和保持器驱动单元16 具有将保持件12定位在基板更换位置48处于水平状态的功能，并且具有在离子束4的照射区域中沿着X方向的立起状态来使保持件12往复且直线地驱动的功能。此外，离子注入机设置有两个负载锁定机构20a，20b和两个基板承载单元30a，30b，每个具有两个臂32a-32d，用于在每个负载锁定机构20a，20b和基板交换位置48之间承载基板10。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2013175670A Substrate transport device and semiconductor manufacturing apparatus using the same 有权
标题翻译：基板运输装置及其半导体制造装置
公开(公告)号：JP2013175670A
公开(公告)日：2013-09-05
申请号：JP2012040458
申请日：2012-02-27
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： ONODA MASATOSHI
IPC分类号： H01L21/677 , C23C14/50 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide: a semiconductor transport device that can prevent dust or the like from being scattered in a vacuum chamber by operating rods for moving a substrate transport table, and also facilitates fine adjustment and maintenance; and a semiconductor manufacturing apparatus using the semiconductor transport device.SOLUTION: A substrate transport device includes: a substrate transport table 4; a toggle link mechanism 1; and a plurality of rods 21 that connect between the substrate transport table 4 and the toggle link mechanism 1 by passing through a wall body forming a vacuum chamber 9 or a vacuum spare chamber 8. The toggle link mechanism 1 is configured as follows: The substrate transport table 4 is moved by the rods 21 moved forward and backward by bending and stretching of a toggle link 11, and the substrate transport table 4 is located at a closed position in a state that the toggle link 1 is stretched. The toggle link mechanism 1 includes a seal structure 3 that air-tightly seals a clearance between the rods 21 and the wall body.
摘要翻译：要解决的问题：提供：通过操作用于移动基板输送台的杆，可以防止灰尘等在真空室中散射的半导体输送装置，并且还有利于微调和维护; 以及使用该半导体输送装置的半导体制造装置。解决方案：基板输送装置包括：基板输送台4; 肘节连杆机构1; 以及多个杆21，其通过穿过形成真空室9或真空备用室8的壁体而连接在基板输送台4和肘杆连杆机构1之间。肘杆连杆机构1构造如下：基板运输台4通过肘节连杆11的弯曲和拉伸而被前后移动的杆21移动，并且基板传送台4在肘节连杆1被拉伸的状态下位于关闭位置。肘节连杆机构1包括密封结构3，气密地密封杆21和壁体之间的间隙。

9. 发明专利

JP2006352010A VACUUM PROCESSING APPARATUS AND ITS OPERATING METHOD 审中-公开
公开(公告)号：JP2006352010A
公开(公告)日：2006-12-28
申请号：JP2005179270
申请日：2005-06-20
申请人： NISSIN ION EQUIPMENT CO LTD
发明人： ANDO YASUNORI , ONODA MASATOSHI
IPC分类号： H01L21/677 , B65G49/00 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To decrease an installation area of a vacuum processing apparatus having a plurality of vacuum chambers. SOLUTION: The apparatus is equipped with a fixed processing chamber 24 and two movable vacuum spare rooms 28a, 28b. A gate valve 26 is provided in the processing chamber 24, and gate valves 30 are respectively provided in the vacuum spare rooms 28a, 28b. Each of the vacuum spare rooms 28a, 28b is moved in the Y direction by a spare room shifting mechanism 34. In periphery of the processing chamber gate valve 26, there is provided a vacuum seal body 54 which carries out a vacuum seal of a clearance G between the gate valves 26, 30 which are expandable and contractible and are mutually approached during expansion. Further, there is provided a substrate conveyance mechanism which conveys a substrate 2 between the processing chamber 24 and the vacuum spare rooms 28a, 28b approaching the processing chamber 24. COPYRIGHT: (C)2007,JPO&INPIT

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