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    • 1. 发明专利
    • Method of manufacturing semiconductor device, and semiconductor device
    • 制造半导体器件的方法和半导体器件
    • JP2013118270A
    • 2013-06-13
    • JP2011264732
    • 2011-12-02
    • Renesas Electronics Corpルネサスエレクトロニクス株式会社
    • KIYOHARA TOSHINORI
    • H01L23/50
    • H01L2224/48091H01L2224/48247H01L2924/13091H01L2924/00014H01L2924/00
    • PROBLEM TO BE SOLVED: To reduce occurrence of erroneous determination in solder appearance inspection after a semiconductor device is mounted.SOLUTION: The method of manufacturing a semiconductor device includes a step of forming a step surface (half-punching region 25) oriented to a tip end side of a lead 20 on a mounting surface side of the lead 20 by half-punching the lead 20 of the semiconductor device 100 from the mounting surface side of the semiconductor device 100 toward an opposite surface thereof. The manufacturing method further includes steps of: forming a plating film 30 that covers the lead 20; and removing a portion on a tip end side beyond the step surface of the lead 20 by cutting the lead 20 along the extension surface of the step surface. The manufacturing method further includes a step of rolling out the plating film 30 on the surface opposite to the mounting surface of the lead 20 toward the tip end surface side of the lead 20.
    • 要解决的问题:为了减少在安装半导体器件之后的焊料外观检查中的错误确定的发生。 解决方案:半导体器件的制造方法包括以下步骤:通过半冲压形成在引线20的安装表面侧上定向到引线20的前端侧的台阶表面(半冲压区域25) 半导体器件100的引线20从半导体器件100的安装表面侧朝向其相对表面。 该制造方法还包括以下步骤:形成覆盖引线20的镀膜30; 并且通过沿着台阶表面的延伸表面切割引线20,将前端侧的部分移除超过引线20的台阶表面。 该制造方法还包括在与引线20的安装面相反的表面上朝向引线20的前端面侧推出电镀膜30的步骤。(C)2013,JPO&INPIT