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1. 发明专利

JP4334261B2 Exposure for the two-stage laser system 有权
公开(公告)号：JP4334261B2
公开(公告)日：2009-09-30
申请号：JP2003104032
申请日：2003-04-08
申请人：ウシオ電機株式会社 , ギガフォトン株式会社 , 株式会社小松製作所
发明人：弘司柿崎 , 英典渡邊 , 理若林
IPC分类号： G03F7/20 , H01S3/10 , H01L21/027 , H01S3/137 , H01S3/225 , H01S3/23

2. 发明专利

JP4229275B2 Exposure for the two-stage ArF excimer laser device 有权
公开(公告)号：JP4229275B2
公开(公告)日：2009-02-25
申请号：JP2003359522
申请日：2003-10-20
申请人：ギガフォトン株式会社 , 株式会社小松製作所
发明人：弘司柿崎 , 隆之藪
IPC分类号： H01L21/027 , H01S3/225 , H01S3/00 , H01S3/10 , H01S3/23

3. 发明专利

JP4223887B2 2 pulse energy control device of stage laser and two-stage laser system 有权
公开(公告)号：JP4223887B2
公开(公告)日：2009-02-12
申请号：JP2003291463
申请日：2003-08-11
申请人：ギガフォトン株式会社 , 株式会社小松製作所
发明人：達也有我 , 弘司柿崎 , 理若林
IPC分类号： G03F7/20 , H01S3/134 , H01L21/027 , H01S3/097 , H01S3/10 , H01S3/23
CPC分类号： G03F7/70041 , H01S3/097 , H01S3/09702 , H01S3/10007 , H01S3/104 , H01S3/1301 , H01S3/134

4. 发明专利

JP5493030B2 Discharge excitation type pulse oscillation gas laser device 有权
公开(公告)号：JP5493030B2
公开(公告)日：2014-05-14
申请号：JP2013086894
申请日：2013-04-17
申请人：株式会社小松製作所 , ウシオ電機株式会社
发明人：隆之藪 , 隆之渡邊 , 司堀 , 弘司柿崎
IPC分类号： H01S3/038

5. 发明专利

JP5358645B2 Laser device 有权
公开(公告)号：JP5358645B2
公开(公告)日：2013-12-04
申请号：JP2011232544
申请日：2011-10-24
申请人：株式会社小松製作所 , ウシオ電機株式会社
发明人：隆之薮 , 弘司柿崎 , 司堀
IPC分类号： H01S3/03
摘要： PROBLEM TO BE SOLVED: To provide a laser apparatus performing high repetition rate pulse oscillation of 2 KHz and over provided with a pair of main electrodes facing one another in a laser chamber including laser gas, which excites the laser gas to oscillate laser light by pulsed main discharge caused in a discharge space between the main electrodes and can reduce a harm effect on laser performance due to acoustic waves generated by the main discharge. SOLUTION: The laser apparatus comprises a laser chamber having a gap formed on the inner face and portions lying next to each other across the gap. One portion on the far side from a discharge space has a face facing the center of the laser chamber caves to a greater extent than a face facing the center of the laser chamber of another portion on the nearer side to the discharge space thereby forming a step across the gap. COPYRIGHT: (C)2012,JPO&INPIT

6. 发明专利

JP4845094B2 Discharge excitation type pulse oscillation gas laser device 有权
公开(公告)号：JP4845094B2
公开(公告)日：2011-12-28
申请号：JP2005290867
申请日：2005-10-04
申请人：ウシオ電機株式会社 , 株式会社小松製作所
发明人：司堀 , 弘司柿崎 , 隆之渡邊 , 隆之藪
IPC分类号： H01S3/038

7. 发明专利

JP4364757B2 Two-stage laser energy control device and two-stage laser system 有权
公开(公告)号：JP4364757B2
公开(公告)日：2009-11-18
申请号：JP2004262313
申请日：2004-09-09
申请人：ウシオ電機株式会社 , 株式会社小松製作所
发明人：弘司柿崎 , 貴仁熊崎 , 理若林 , 徹阿部
IPC分类号： H01S3/134 , H01S3/23

8. 发明专利

JP4845538B2 Exposure for the two-stage excimer laser device 有权
标题翻译：空值
公开(公告)号：JP4845538B2
公开(公告)日：2011-12-28
申请号：JP2006069583
申请日：2006-03-14
申请人：ウシオ電機株式会社 , 株式会社小松製作所
发明人：司堀 , 弘司柿崎 , 隆之薮
IPC分类号： H01S3/22 , H01S3/23

9. 发明专利

JP4484144B2 Discharge excitation gas laser device 有权
公开(公告)号：JP4484144B2
公开(公告)日：2010-06-16
申请号：JP2004198921
申请日：2004-07-06
申请人：ウシオ電機株式会社 , 株式会社小松製作所
发明人：司堀 , 弘司柿崎
IPC分类号： H01S3/038 , H01S3/097

10. 发明专利

JP5331858B2 Discharge excitation type pulse oscillation gas laser device 有权
公开(公告)号：JP5331858B2
公开(公告)日：2013-10-30
申请号：JP2011192295
申请日：2011-09-05
申请人：株式会社小松製作所 , ウシオ電機株式会社
发明人：隆之藪 , 隆之渡邊 , 司堀 , 弘司柿崎
IPC分类号： H01S3/038
摘要： PROBLEM TO BE SOLVED: To provide a discharge excitation-type pulse oscillation gas laser apparatus enabling further highly repeating operation equal to or more than 4 kHz and use in long term by suppressing increase of a required gas flow rate and increase of supply power to a fan. SOLUTION: In the discharge excitation-type pulse oscillation gas laser apparatus, discharge surface shapes of an anode and a cathode in slender shapes are convex curve shapes in a cross section perpendicular to the longitudinal direction of the electrodes. A width We of the electrode at a ground potential and a minimum distance g between the discharge electrodes satisfy the relation of g/We>3. A power supply supplying power with density equal to or more than 50 mJ/cm 3 to the discharge electrodes at a pulse repetition number equal to or more than 4 kHz is provided. The convex curve shape of the discharge surface is any one of the shapes which are oval, hyperbolic, and a higher order function expressed by x N /(We/2) N +y N /h N =1, where h is an electrode curve part height, x is a coordinate at a position in the electrode width direction, y is a coordinate in the electrode convex direction, and N is an integer equal to or greater than 3. A ratio ΔE/Eave is equal to or less than 35%, where ΔE=difference of electric field intensities, and Eave=electric field intensity average value, within the electrode width. COPYRIGHT: (C)2012,JPO&INPIT

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