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1. 发明专利

JP2003262595A FOREIGN-SUBSTANCE INSPECTION APPARATUS 审中-公开
公开(公告)号：JP2003262595A
公开(公告)日：2003-09-19
申请号：JP2002062757
申请日：2002-03-07
申请人： HITACHI ELECTR ENG
发明人： SUZUKI SHINICHI , USUDA KATSUTOSHI
IPC分类号： G01N21/956 , G02B26/02 , G02B27/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To enhance the detection accuracy of a foreign-substance inspection apparatus for scanning a light beam by using an acoustooptical deflector. SOLUTION: The acoustooptical deflector 22 is controlled by a scanning circuit 40 so as to scan the light beam generated by a laser device 20 and converged by a lens group 21. A wavelength-plate loading and unloading mechanism 60 is controlled by a control circuit 50 so that a wavelength plate 23 is inserted and pulled out between the acoustooptical deflector 22 and a polarizing plate 24. When the wavelength plate 23 is inserted and pulled out, P- polarized irradiation or S-polarized irradiation is changed over. A polarizing- plate rotating mechanism 70 is controlled by the control circuit 50 so as to turn the polarizing plate 24. The polarizing plate 24 cuts off zero-order light emitted by the acoustooptical deflector 22, and it transmits first-order light. COPYRIGHT: (C)2003,JPO

2. 发明专利

JP2003257829A GAP MEASURING METHOD, GAP MEASURING DEVICE, AND ALIGNER 有权
公开(公告)号：JP2003257829A
公开(公告)日：2003-09-12
申请号：JP2002056462
申请日：2002-03-01
申请人： HITACHI ELECTR ENG
发明人： NEMOTO RYOJI , SATO EIJI
IPC分类号： G01B11/14 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To measure a proximity gap between surface of a substrate and a pattern surface of a mask through a glass plate from outside a negative pressure chamber. SOLUTION: The glass plate 2 forming the negative pressure chamber is irradiated with light at an angle of incidence 50° or so. Light projected from the glass plate 2 as it is reflected from the pattern surface 1a of the mask 1 and another light projected from the glass plate 2 as it is reflected from the surface of the substrate 3 are detected, and a proximity gap between the surface of the substrate 3 and the pattern surface 1a of the mask 1 is measured. When an angle of incidence θ is around 50°, light projected from the glass plate 2 as reflected from the surface of the substrate 3 attains its maximum intensity. COPYRIGHT: (C)2003,JPO

3. 发明专利

JP2003257017A SPIN DRIER FOR DISK 审中-公开
公开(公告)号：JP2003257017A
公开(公告)日：2003-09-12
申请号：JP2002054056
申请日：2002-02-28
申请人： HITACHI ELECTR ENG
发明人： KATO TAKAYUKI , YANAGISAWA KOICHI
IPC分类号： G11B5/84 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To efficiently remove a cleaning liquid stagnating at a chuck member after cleaning a disk, such as an optical disk or magnetic disk. SOLUTION: The approximately central segment of the chuck member 2 is provided with a non-contact section 23 consisting of a vent groove configurating a recessed shape having a prescribed width and depth. An air stream is generated in this vent groove during rotation of the disk and the cleaning liquid stagnating near the contact portion between the disk 1 and the chuck member 2 is surely removed by a negative pressure suction force. An elastic member is used for the segment where the chuck member 2 touches the disk 1, by which the dent or crack and chip by the force to chuck the disk 1 by the chuck member 2 are prevented. COPYRIGHT: (C)2003,JPO

4. 发明专利

JP2003243272A LOCAL CLEANING SEMICONDUCTOR TREATMENT EQUIPMENT 审中-公开
公开(公告)号：JP2003243272A
公开(公告)日：2003-08-29
申请号：JP2002042716
申请日：2002-02-20
申请人： HITACHI ELECTR ENG
发明人： HIBIYA TAKASHI , KUSHIDA MINORU
IPC分类号： F24F7/06 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To provide a local cleaning semiconductor treatment equipment for preventing occurrence of inferior wafers by monitoring the cleanliness of the equipment. SOLUTION: External pressure of the circumference of the equipment and internal pressure of the equipment of a mini-engineering system are detected with each detector. When the difference goes to below a prescribed value, an alarm is issued, so that the cleanliness of the equipment can be always monitored without incorporating a particle counter. COPYRIGHT: (C)2003,JPO

5. 发明专利

JP2003241396A ALIGNER AND METHOD FOR ALIGNMENT 审中-公开
公开(公告)号：JP2003241396A
公开(公告)日：2003-08-27
申请号：JP2002041923
申请日：2002-02-19
申请人： HITACHI ELECTR ENG
发明人： NEMOTO RYOJI , KOMATSU NOBUHISA , TAKAHASHI SATOSHI , SATO RIYUUGO
IPC分类号： G03F7/22 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To realize high throughput by speeding up alignment. SOLUTION: In an aligner, detecting means 6A-6D to detect a positioning mark provided at the outside of the pattern area of a mask M and a positioning mark provided at an exposure object substrate P at the step moving position of the substrate and moving means 7A-7D to move the detecting means to a mark detecting position are moved to the mark detecting position by a controlling means during the step movement of the substrate or during exposure. COPYRIGHT: (C)2003,JPO

6. 发明专利

JP2003228077A APPARATUS AND METHOD FOR GAP FORMATION 审中-公开
公开(公告)号：JP2003228077A
公开(公告)日：2003-08-15
申请号：JP2002027546
申请日：2002-02-05
申请人： HITACHI ELECTR ENG
发明人： YUMIBA KENJI , ICHIKAWA HISAYOSHI , SUGIZAKI SHINJI , NAKAMURA SHIGERU
IPC分类号： G02F1/13 , B30B15/02 , B30B15/34 , G02F1/1339 , G09F9/00
摘要： PROBLEM TO BE SOLVED: To perform accurate gap formation by a single substrate press device even for a two-layered substrate using a seal material differing in solvent mixing ratio, etc., without causing any seal pass, etc. SOLUTION: Upper and lower press units 10 and 11 of the substrate press device 8 have press plates 13 and 14 which are heated in a high-temperature state and substrate preheating members 15 and 16 which have metallic thin heat conduction plates 15a and 16a on which plate heaters 15b and 16b are stuck. The substrate preheating members 15 and 16 are attachable/detachable to/from the press plates 13 and 14; and the substrate preheating member 15 moves down from a standby position where both the substrate preheating members 15 and 16 are detached from the two-layered substrate 4 together with the press plate 13 and the members 15 and 16 clamp the two-layered substrate 4 to preheat and pressurize it and the press plate 13 is further moved down by a pressuring means 18 to press the two-layered substrate 4 by both the press plates 13 and 14 in a high-temperature state. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2003224107A MECHANISM FOR DETECTING TREATMENT STATE OF SUBSTRATE TREATMENT DEVICE 审中-公开
公开(公告)号：JP2003224107A
公开(公告)日：2003-08-08
申请号：JP2002021820
申请日：2002-01-30
申请人： HITACHI ELECTR ENG
发明人： UMETSU HIROSHI , KENMORI KAZUHIKO , MORIGUCHI YASUYUKI , NOMOTO HIDEKI , SAKAMOTO MANABU
IPC分类号： G01B11/06 , H01L21/306
摘要： PROBLEM TO BE SOLVED: To detect that the film thickness of a thin film is in a specified state accurately even if a substrate is inclining slightly while facilitating the adjustment of an optical axis between an illuminating side and a light receiving side. SOLUTION: In order to chemically polish the metal thin film 4 of an article 3 being treated comprising a substrate 5 of transparent glass having the metal thin film 4 formed on the surface, the article 3 is held in a horizontal state on carrying rollers 2 provided in a treatment liquid tank 1 and reciprocated by a specified stroke thus forming a relative flow between the surface of the article 3 and treatment liquid. A mechanism for detecting the treatment state of the article 3 comprises a light projecting means 10 composed of a light source 12 and a light projecting lens 13, and a light receiving means 11 having a light receiving face 11a which receives only a part of reflected light from the article 3 with regard to the cross-section of the optical path thereof in order to make the light receiving conditions of the light receiving means 11 substantially invariant even if the article 3 vibrates. COPYRIGHT: (C)2003,JPO

8. 发明专利

JP2003186201A EXPOSURE DEVICE EQUIPPED WITH FOREIGN MATTER INSPECTING FUNCTION AND FOREIGN MATTER INSPECTING METHOD OF THE SAME DEVICE 审中-公开
公开(公告)号：JP2003186201A
公开(公告)日：2003-07-03
申请号：JP2001384999
申请日：2001-12-18
申请人： HITACHI ELECTR ENG
发明人： NEMOTO RYOJI , KOMATSU NOBUHISA , TAKAHASHI SATOSHI , SATO RIYUUGO
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To inspect whether a foreign matter is present on a pattern surface of a mask and an exposure surface of a substrate to be exposed before the pattern surface and exposure surface are put closer to each other. SOLUTION: The exposure device which performs exposure while putting the pattern surface Ma of the mask M held by a mask holder 1 and the exposure surface Pa of the substrate P to be exposed held by an exposure chuck 2 closer to each other is equipped with a driving means D which drives at least one of the mask holder and exposure chuck so as to relatively move the mask and substrate to be exposed before the pattern surface of the mask and the exposure surface of the substrate to be exposed are put closer to each other and detecting means 6 and 7 which optically detect the state of the pattern surface and the state of the exposure surface when at least one of the mask holder and exposure chuck is driven to relatively move the mask and substrate to be exposed. A control means decides whether or not there is a foreign matter on the pattern surface according to the output of the detecting means corresponding to the pattern surface and also decides whether there is a foreign matter on the exposure surface according to the output of the detecting means corresponding to the exposure surface. COPYRIGHT: (C)2003,JPO

9. 发明专利

JP2003168271A APPARATUS FOR WRITING SERVO INFORMATION OF MAGNETIC DISK 审中-公开
公开(公告)号：JP2003168271A
公开(公告)日：2003-06-13
申请号：JP2001364205
申请日：2001-11-29
申请人： HITACHI ELECTR ENG
发明人： TODA KUNIAKI , HIDA AKIRA
IPC分类号： G11B17/038 , G11B21/10 , G11B25/04
摘要： PROBLEM TO BE SOLVED: To provide a servo track writer which can efficiently write servo information in a magnetic disk of a single plate disk HDD, suppress the height of a spindle and reduce an amount of asynchronous deflection even when many disks are stacked, and improve the manufacturing efficiency of the HDD of the single plate disk. SOLUTION: The outside diameter of the spindle of the servo track writer is smaller than the inside diameter of the magnetic disk. The servo track writer includes a hollow cylinder part into which the magnetic disk is inserted along the side face of the outside diameter, and a plurality of spacer rings with predetermined thickness which loosely fit to the side face of the outside diameter of the cylinder part and have an outside diameter somewhat larger than the inside diameter of the magnetic disk. The magnetic disks are inserted and stacked on the cylinder part through the spacer rings. Air blow holes which correspond to the position of each stacked magnetic disk and spacer ring and communicate with the hollow part of the cylinder part is substantially provided radially relative to the center of the cylinder part, and pressurized air is introduced into the hollow part. COPYRIGHT: (C)2003,JPO

10. 发明专利

JP2003121114A APPARATUS FOR MEASURING TRACK WIDTH OF MAGNETIC HEAD BY MEASURED IMAGE OF OPTICAL SYSTEM 审中-公开
公开(公告)号：JP2003121114A
公开(公告)日：2003-04-23
申请号：JP2001316298
申请日：2001-10-15
申请人： HITACHI ELECTR ENG
发明人： NAKAGOME TSUNEO , KATAYANAGI HIRONORI , TOYODA NAO
IPC分类号： G01B11/02 , G11B5/455
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for measuring the track width of a magnetic head by a measured image of an optical system and capable of measuring the width of a track from luminance data obtained from the image of the measuring optical system, even at a magnifying level close to the limit of its resolution or below it. SOLUTION: The apparatus for measuring the track width of the magnetic head is provided with both a converting means for obtaining the width of the track from a luminance level, when the luminance level of a peak for obtaining the width of the track is equal to a measurable level or less determined by the resolution of the measured image of the optical system; and a determining means for determining whether the luminance level of the peak is higher than the measurable level or lower. When the luminance level of the peak is equal to the measurable level or less at the determination of the determining means, the width of the track is computed by performing conversion by the converting means.

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