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    • 83. 发明专利
    • MICROFABRICATION PROCESS
    • JPH02103052A
    • 1990-04-16
    • JP25649688
    • 1988-10-12
    • SHOWA DENKO KK
    • MOTOYAMA TAKUHIKOMATSUI FUMIOOWAKI YUKARI
    • G03F7/075C08G77/42C08G77/44G03F7/26H01L21/302H01L21/3065
    • PURPOSE:To prepare a semiconductor device having high reliability with improved rate of microfabrication by using a cured film of a specified organopolysiloxane as insulating film. CONSTITUTION:To execute fine processing of a semiconductor device by performing successively a stage for forming a cured organopolysiloxane film obtd. by cocondensing silicone-based oligomers or polymers of a component (A) and (B) on a specified semiconductor substrate, a stage for coating the cured film with a photoresist and forming a desired pattern, a stage for etching the organopolysiloxane cured film using the resist as protective film and forming the desired pattern, and a stage for processing the semiconductor substrate to the desired shape using the cured organopolysiloxane film as protective film by etching, etc. The component (A) is a ladder type silicone oligomer or polymer having a specified mol.wt. of a specified wt.% OH group and alkoxy group. The component (B) is a silicone oligomer or polymer having a specified mol.wt. obtd. by the condensation of a silicone compd. expressed by the general formula I and a silicone compd. expressed by the general formula II.
    • 90. 发明专利
    • Soluble polyimidesiloxane precursor and its production
    • 可溶性聚酰胺硅氧烷前体及其生产
    • JPS61108627A
    • 1986-05-27
    • JP23042884
    • 1984-11-02
    • Chisso Corp
    • KUNIMUNE KOICHIKUTSUZAWA KICHIYAKONOTSUNE SHIRO
    • C08G73/00C08G73/10C08G77/42C08G77/44C08G77/455
    • C08G73/106C08G77/455
    • PURPOSE: The titled precursor which has low viscosity in solution, can be easily cured by baking and can be suitably used for the surface protection, insulation, etc., of electronic parts, comprising specified imide/amic acid chain segments connected with each other through a bonding structure and having specified terminal groups.
      CONSTITUTION: A soluble polyimidesiloxane precursor comprising imide/amic acid chain segments of formula I connected with each other through a bonding structure of formula II and having a group of formula III as a terminal group [degree of imidation of 50W100%, a ratio of the number of R
      2 's and R
      3 's ≥0.1, intrinsic viscosity (in N-methyl-2-pyrolidone at a concentration of 0.5g/dl and a temperature of 30°C) of 0.05W5g/dl]. Examples of I are formulas IV and V, R
      1 is a tetravalent carboxylic aromatic group, R
      2 is a 2W12C aliphatic group or the like, R
      3 is -(CH
      2 )
      1W4 - or the like, R
      4 is a 1W6C alkyl or the like, Y
      1 and Y
      2 are each alkoxy or the like, and m is 1W3.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:在溶液​​中具有低粘度的标题前体可以通过烘烤容易地固化,并且可以适用于电子部件的表面保护,绝缘等,其包括通过相互连接的指定的酰亚胺/酰胺链段 结合结构并具有特定的端基。 构成:包含式I的酰亚胺/酰胺酸链段的可溶性聚酰亚胺硅氧烷前体通过式II的键合结构彼此连接并具有作为末端基团的式III基团[酰亚胺化度为50-100%,比例 的R 2和R 3'= 0.1的数量,特性粘度(在N-甲基-2-吡咯烷酮中的浓度为0.5g / dl,温度为30℃)为 0.05-5g / dl]。 I的实例是式IV和V,R 1是四价羧酸芳族基团,R 2是2-12C脂族基团等,R 3是 - (CH 2)1-4 - 或者 R 4为1-6C烷基等,Y 1和Y 2分别为烷氧基等,m为1-3。