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    • 90. 发明专利
    • Oxide sintered compact, sputtering target and transparent electrically conductive thin film
    • 氧化物烧结紧凑型,溅射目标和透明电导电薄膜
    • JP2005298306A
    • 2005-10-27
    • JP2004120516
    • 2004-04-15
    • Sumitomo Metal Mining Co Ltd住友金属鉱山株式会社
    • OBARA TAKESHI
    • C04B35/00C01G41/00C04B35/495C04B35/645C23C14/08C23C14/34H01B5/14
    • PROBLEM TO BE SOLVED: To provide an oxide sintered compact capable of stably forming a transparent electrically conductive thin film having a high surface smoothness and a low specific resistance, a sputtering target and the transparent electrically conductive thin film obtained by using it. SOLUTION: The oxide sintered compact is produced by hot-pressing an indium oxide powder comprising by mass tungsten of 0.3-3%, titanium of 0.05-2% and the practical residue consisting of indium and oxygen and being supplied in a carbon vessel at the conditions of a sintering temperature of 750-900°C, a sintering pressure of 9.8 MPa or more and in Ar atmosphere where Ar pressure is 0.05 MPa or higher and below atmospheric pressure. The transparent electrically conductive thin film having the high surface smoothness and the low specific resistance can be obtained by a sputtering method using the obtained oxide sintered compact as the sputtering target. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种能够稳定地形成具有高表面平滑度和低电阻率的透明导电薄膜的氧化物烧结体,溅射靶和使用它得到的透明导电薄膜。 解决方案:氧化物烧结体通过热压氧化铟粉末来制造,所述氧化铟粉末由质量分数为0.3-3%的钨,0.05-2%的钛和由铟和氧组成的实际残留物,并以碳 在750-900℃的烧结温度,9.8MPa或更高的烧结压力和Ar压力为0.05MPa或更高且低于大气压的Ar气氛中进行烧结。 通过使用所得到的氧化物烧结体作为溅射靶的溅射法,可以获得具有高表面平滑性和低电阻率的透明导电性薄膜。 版权所有(C)2006,JPO&NCIPI