专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明专利

JPS61107168A Probe for low temperature 失效
标题翻译：低温探头
公开(公告)号：JPS61107168A
公开(公告)日：1986-05-26
申请号：JP22771484
申请日：1984-10-31
申请人： Hitachi Ltd
发明人： ISHINO MASAKAZU , TANAKA MINORU
IPC分类号： G01R31/26 , G01R1/067 , H01L21/66
摘要： PURPOSE: To measure the electrical characteristics of high frequency with high accuracy by removing the freezing of humidity on the surface of a specimen by preventing air leaked to the surface of the specimen from directly impinging to the specimen, by providing an air vent hold to the shield material of a coaxial probe.
CONSTITUTION: A low temp. bath 3 and a specimen 4 are arranged on the stage stand 1 of a low temp. probe 6 and the probe 6 is attached to a lid 5 and a core wire 8 is arranged in a shield material 7. A plurality of holes 10 are provided to the shield material 7 in the vicinity of the inside of the side wall part of the lid 5 having the probe 6 attached thereto. If the coaxial probe having this structure is used, the open air leaked into a vacuum container 9 from the gap between the shield material 7 and the core wire 8 is discharged through the holes 10. By this method, the open air is prevented from directly impinging against the low temp. specimen.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：通过防止样品表面泄漏的空气直接撞击样品，通过除去试样表面的湿气，从而高精度地测量高频电气特性，通过向同轴探头的屏蔽材料。构成：低温浴3和样品4布置在低温的台架1上。探头6和探针6安装在盖5上，芯线8设置在屏蔽材料7中。多个孔10设置在屏蔽材料7的靠近侧壁部分的内侧具有附接到其上的探针6的盖子5。如果使用具有这种结构的同轴探针，则从屏蔽材料7和芯线8之间的间隙泄漏到真空容器9中的露天孔通过孔10排出。通过这种方法，可以直接防止露天冲击低温标本。

82. 发明专利

JPS6196796A Multilayer circuit board 失效
公开(公告)号：JPS6196796A
公开(公告)日：1986-05-15
申请号：JP21634684
申请日：1984-10-17
申请人： Hitachi Ltd
发明人： MURATA AKIRA , TANAKA MINORU , HIROTA KAZUO
IPC分类号： H05K3/46 , H05K3/40

83. 发明专利

JPS6081613A MATCHING DEVICE OF WATER 失效
公开(公告)号：JPS6081613A
公开(公告)日：1985-05-09
申请号：JP18840283
申请日：1983-10-11
申请人： HITACHI LTD
发明人： NAKAJIMA NAOTO , TANAKA MINORU , AIUCHI SUSUMU , KAWARADA MASAYUKI
IPC分类号： H01L21/68 , G03F9/00 , G05D3/12 , H01L21/67
摘要： PURPOSE:To prevent wafer from chipping or the like and to improve the yield of an LSI chip by detecting an outer edge position on the periphery of the wafer contactlessly and matching the orienteering flat direction and the position of a turning center of the wafer with the prescribed direction and position. CONSTITUTION:A DELTAtheta stage to be vibrated around the z axis is put on a stage to be moved in the X and Y axis directions and then a theta stage 36 to be rotated one revolution or more is arranged on the DELTAtheta stage so that their turning axes coincide with each other. A wafer outer edge position detector 42 consisting of a lamp 43, a lens 44, a mirror 45, a cylindrical lens 46, and a line image sensor 47 is arranged on the theta stage 36 and the detected value of the detector 42 is stored and calculated. The outer edge part of the wafer 41 is detected at three points e.g. except the orienteering flat part and the eccentricity to the stage 36 of the wafer 41 is detected from said detected result. The eccentric value is matched with the direction of the orienterring flat of the wafer and then matched with the movement of an XY table.

84. 发明专利

JPS6067916A MICROSCOPE DEVICE 失效
公开(公告)号：JPS6067916A
公开(公告)日：1985-04-18
申请号：JP17430883
申请日：1983-09-22
申请人： HITACHI LTD
发明人： KUBOTA HITOSHI , TANAKA MINORU , AIUCHI SUSUMU , HARA YASUHIKO
IPC分类号： G02B21/10
摘要： PURPOSE:To prevent a position shift due to a temperature rise and obtain bright lighting for a dark visual field by projecting light from a light source for dark visual field lighting which is installed on the extension of the optical axis of an objective lens through two rotary parabolic mirrors provided facing each other. CONSTITUTION:The light from the light source lamp 12 is reflected by the 1st rotary parabolic mirror 14 to obtain cylindrical parallel luminous flux, which is further reflected by the 2nd rotary parabolic miror 15 to illuminate the circumference of the visual fiedl of the objective lens 16 slantingly. Reflected light from an object 17 of observation is magnified by the objective lens 16, changed in direction by 90 deg. through a reflecting mirror 20, and passes through holes 18b and 21a, and the light is bent upward at right angles through a half-mirror 24, and magnified through an image forming lens 27 to form its image on a photoelectric converter 28. When vertical lighting is employed in combination with the dark visual field lighting, a lamp 25 for light visual field lighting is used and light passed through the half-mirror 24 and reflecting mirror 20 is guided into the objective lens 16 to illuminate the object 17 of observation.

85. 发明专利

JPS5993873A METHOD AND DEVICE FOR SETTING CLEARANCE BETWEEN SUBSTRATE AND MASK 失效
公开(公告)号：JPS5993873A
公开(公告)日：1984-05-30
申请号：JP20193282
申请日：1982-11-19
申请人： HITACHI LTD
发明人： KUBOTA HITOSHI , TANAKA MINORU , AIUCHI SUSUMU
IPC分类号： C23C14/04
摘要： PURPOSE:To set securely a titled clearance and to improve the yield of a product and working efficiency by pressing a mask to the conductive thin film of a substrate, and positioning both in parallel then moving the mask parallel in the direction where it separates from the substrate. CONSTITUTION:Conductive thin films 4a, 4b, 4c are provided by a vacuum deposition method, etc. in the position below a substrate 4 (on the side of a shielding mask 3a) where the circumference in the peripheral part is trisected. The mask 3a is first moved by a driving means 38, and the contact of the mask 3a with the films 4a, etc is detected by a detection means 39. A control device 36 stops a control motor 33a, etc. upon receiving of the detection signal from the means 39, thereby positioning the substrate 4 and the mask 3a in parallel. The device 36 operates the motor 33a, etc. simultaneously to move the mask 3a in parallel by the set value indicated by a clearance setter 37, thereby setting the prescribed clearance.

86. 发明专利

JPS58207371A Vapor deposition source for vacuum deposition 失效
标题翻译：蒸气沉积源用于真空沉积
公开(公告)号：JPS58207371A
公开(公告)日：1983-12-02
申请号：JP8792482
申请日：1982-05-26
申请人： Hitachi Ltd
发明人： KUBOTA HITOSHI , TANAKA MINORU , AIUCHI SUSUMU
IPC分类号： C23C14/24 , C23C14/30
CPC分类号： C23C14/30 , C23C14/24
摘要： PURPOSE:To enable the vapor deposition of plural vapor deposition materials on a substrate freely to a uniform thickness in a vacuum deposition device, by instaling crucibles for contg. the vapor deposition materials rotatably with respect to the substrate to be vapor deposited thereon with said materials. CONSTITUTION:A substrate as a material to be vapor deposited thereon with vapor deposition materials is placed in a vacuum vessel for vapor depoition, and a rotary table 23 installed on a revolving shaft 27 is disposed below the same. A vapor deposition source provided with plural crucibles 6a contg. vapor deposition materials 6 and having a filament 7 for irradiation of an electron beam is installed on the table 23. In the stage of vapor deposition, the crucibles 6a are rotated by the operation of a motor 32 so that the crucible contg. the required material 6 is positioned in the position where the electron beam is to be irradiated. While the table 23 is rotated by driving a motor 39, the material 6 is melted and evaporated by the electron beam so as to be vapor deposited on the substrate. The crucibles contg. the vapor deposition materials are rotated while the substrate is held fixed, whereby the vapor deposition materials are vapor deposited on the substrate to a uniform thickness.
摘要翻译：目的：为了使真空沉积装置中的多个气相沉积材料在基板上自由沉积到均匀的厚度，可以通过安装坩埚来进行。气相沉积材料相对于基底可旋转地被其上沉积有所述材料。构成：将作为气相沉积材料的基板作为气相沉积材料放置在真空容器中进行蒸汽吸收，并且安装在旋转轴27上的旋转台23设置在其下方。设置有多个坩埚6a的气相沉积源气相沉积材料6并具有用于照射电子束的细丝7安装在工作台23上。在蒸镀阶段，坩埚6a通过电动机32的操作而转动，所需材料6位于要照射电子束的位置。当通过驱动马达39使台23旋转时，材料6被电子束熔化并蒸发，以便气化沉积在基底上。坩埚气相沉积材料在保持固定基板的同时旋转，由此气相沉积材料在基板上气相沉积到均匀的厚度。

87. 发明专利

JPS5881855A STRUCTURE OF CAR 失效
公开(公告)号：JPS5881855A
公开(公告)日：1983-05-17
申请号：JP17968981
申请日：1981-11-11
申请人： HITACHI LTD
发明人： TODORI SEIJIROU , TANAKA MINORU
IPC分类号： B61D17/06 , B61D17/08 , B62D25/02 , B62D27/02 , B62D29/02 , B62D31/02
摘要： In a construction of a car structure wherein a plurality of strength members each formed with an outdoor-side flange and an indoor-side flange are connected together and an outer plate member is connected to the outdoor-side flanges of the strength members, a joint member is provided which joint member includes outdoor-side and indoor-side flanges of the strength members and a web continuously connecting the flanges together three-dimensionally. The use of the joint member for connecting the strength members together facilitates production of the car structure and increases strength thereof.

88. 发明专利

JPS5594565A WINDING DEVICE FOR STATOR COIL OF MOTOR 失效
公开(公告)号：JPS5594565A
公开(公告)日：1980-07-18
申请号：JP135879
申请日：1979-01-12
申请人： HITACHI LTD
发明人： TANAKA MINORU , ITOU FUMIKAZU , SAITOU YUTAKA , KOBAYASHI KOUJI , SASAKI AKIYOSHI , AKUTSU NORIO
IPC分类号： H02K15/04 , H02K15/06
摘要： PURPOSE:To automatize the process from winding to insertion amd to improve the working efficiency by directly forming the coil on the winding head that has a blade for inserting the coil and by inserting the coil into the slot together with a wedge that is automatically fed. CONSTITUTION:The spool is composed of two blades at least of plural main blades 28, which are annularly arranged, and the auxiliary plate 35 provided to the outside of the main blades, the flyer of the winding means D is turned around it to form the coil. The indexings are performed by the required number of times by the driving gear C, the desired coils are all formed, the subblade 31 is ascended to from the coil inserting tool together with the main blade 28, and the auxiliary plate 35 is removed. The wedge of a fixed length is inserted between the blades by the wedge feeder G, while the inserting means F is operated to insert the coil and wedge into the stator 7 on the holder E simultaneously.

89. 发明专利

JPS5587962A DEVICE FOR MEASURING VOLTAGE VERSUS CURRENT CHARACTERISTIC 失效
公开(公告)号：JPS5587962A
公开(公告)日：1980-07-03
申请号：JP15983978
申请日：1978-12-27
申请人： HITACHI LTD
发明人： TAKAKITSU MASANORI , TANAKA MINORU
IPC分类号： G01R31/26
摘要： PURPOSE:To accurately and simply measure characteristics in wide applied voltage range by discharging a capacitor charged in advance and applying the voltage across the terminals of the discharging capacitor to an element to be measured. CONSTITUTION:A resistor 10 and a capacitor 9 connected in parallel with a semiconductor 1 to be measured such as a diode or the like are connected through a switch 11 to a variable DC power supply 2. When the switch 11 is opened, the charged capacitor 9 is discharged through the semiconductor 1 and the resistor 10. At this time the terminal voltage and current of the semiconductor 1 are measured by logarithmic converters 7, 8. Thus, the applied voltage lowering in exponential function can be reproduced in wide range continuously to thus measure accurately the voltage versus current characteristics of the element 1 to be measured.

90. 发明专利

JPS52118262A METHOD OF CONNECTING ELEMENT SUBSTRATE 失效
公开(公告)号：JPS52118262A
公开(公告)日：1977-10-04
申请号：JP3453076
申请日：1976-03-31
申请人： HITACHI LTD
发明人： MURATA AKIRA , TANAKA MINORU , ISHI ICHIROU
IPC分类号： H05K3/34 , H05K13/00

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式