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71. 发明专利

JP4627986B2 Dental sandblasting equipment 有权
公开(公告)号：JP4627986B2
公开(公告)日：2011-02-09
申请号：JP2003516400
申请日：2002-08-01
申请人：メディバンスインストルメンツリミテッド
发明人：グラント、シドニー
IPC分类号： A61C3/02 , A61C17/02 , A61C3/025 , B24C5/02 , B24C7/00
CPC分类号： B24C11/005 , A61C3/025 , B24C5/02 , B24C7/0046

73. 发明专利

JP2009285802A Synthetic resin abrasive material for blasting 有权
标题翻译：合成树脂抛光材料
公开(公告)号：JP2009285802A
公开(公告)日：2009-12-10
申请号：JP2008142527
申请日：2008-05-30
申请人： Sekisui Plastics Co Ltd , 積水化成品工業株式会社
发明人： HARADA RYOSUKE
IPC分类号： B24C11/00 , C08J5/14 , C08L33/08
CPC分类号： B24C11/005
摘要： PROBLEM TO BE SOLVED: To provide a synthetic resin abrasive material having a dispersing stability, and an impact resistance, and adjusting an abrasive force.
SOLUTION: The synthetic resin abrasive material is derived from a monomer mixture containing a (meta) acrylate-based monomer containing ether group and hydroxyl group or ester group and hydroxyl group, and vinyl-based monomer other than the (meta) acrylate-based monomer. The monomer mixture contains 100 pts.wt vinyl-based monomer, and 0.1-20 pts.wt (meta) acrylate-based monomer, and is spherical polymer particles.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有分散稳定性和耐冲击性并调节研磨力的合成树脂研磨材料。解决方案：合成树脂研磨材料衍生自含有（甲基）丙烯酸酯的单体含有醚基和羟基或酯基和羟基的单体混合物，以及（甲基）丙烯酸酯以外的乙烯基类单体的单体。单体混合物含有100重量份的乙烯基单体和0.1-20重量份（甲基）丙烯酸酯基单体，并且是球形聚合物颗粒。版权所有（C）2010，JPO＆INPIT

74. 发明专利

JP2009202307A Grinding method for rolling and sliding device member and rolling and sliding device member 审中-公开
标题翻译：滚动和滑动装置构件的研磨方法和滚动和滑动装置构件
公开(公告)号：JP2009202307A
公开(公告)日：2009-09-10
申请号：JP2008048721
申请日：2008-02-28
申请人： Nsk Ltd , 日本精工株式会社
发明人： UCHIDA HIROYUKI , SAITO TAKESHI
IPC分类号： B24C3/32 , B24C11/00 , F16C29/00 , F16C33/34 , F16C33/64 , F16C33/66 , F16H25/22
CPC分类号： B24C11/005
摘要： PROBLEM TO BE SOLVED: To provide a grinding method for a rolling and sliding device member and the rolling and sliding device member for maintaining satisfactory effect of oil accumulation, preventing an object to be brought into contact with the member from being damaged, and reducing manufacturing cost.
SOLUTION: This grinding method comprises a first grinding process for colliding first grinding grains formed by hard fine grains against an object to be ground, and a second grinding process for colliding second grinding grains formed by an elastic substance and containing abrasive grains against the object to be ground.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题为了提供一种用于滚动和滑动装置构件和滚动和滑动装置构件的研磨方法，用于保持令人满意的积聚效果，防止物体与构件接触而损坏，并降低制造成本。解决方案：该研磨方法包括：用于将由硬细晶粒形成的第一研磨颗粒与待研磨物体相碰撞的第一研磨工艺，以及用于将由弹性体形成的第二研磨颗粒与包含磨粒相撞的第二研磨工艺与待研磨的物体。版权所有（C）2009，JPO＆INPIT

75. 发明专利

JP2009000766A Grinding and cleaning material, its manufacturing method, and method of polishing using the material 有权
标题翻译：研磨和清洁材料，其制造方法和使用材料的抛光方法
公开(公告)号：JP2009000766A
公开(公告)日：2009-01-08
申请号：JP2007162846
申请日：2007-06-20
申请人： Fuji Kihan:Kk , 株式会社不二機販
发明人： MIYASAKA YOSHIO
IPC分类号： B24C11/00
CPC分类号： B24C11/005 , B24C1/083 , B24C1/086 , B24C11/00
摘要： PROBLEM TO BE SOLVED: To provide a grinding and cleaning material usable for finish polishing a surface of an object to be treated into a mirror-finished surface or the like, with the generation of little static electricity, little adhesion of smears to the object and reduced fracture ratio, and having reduced environmental burden in disposal.
SOLUTION: The grinding and cleaning material is made of: an elastic material which mainly contains soluble nitrogen yielded from a rhizome of amorphophallus konjac and mainly containing mannan and has a moisture content of 10-30%; and abrasive grains of #220 or less blended in the elastic material with a ratio of 1-30% in weight percent, carried by the surface of the elastic material and/or buried in the elastic material, and has a particle diameter of 88-1,190 μm as a whole.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供可用于将待处理物体的表面精加工成镜面抛光表面等的研磨和清洁材料，由于产生很少的静电，涂层的附着力小对象和断裂率降低，处理环境负担减轻。解决方案：研磨清洗材料由主要含有魔芋根茎的主要含有可溶性氮的弹性材料制成，主要含有甘露聚糖，含水量为10-30％; 在弹性材料中共混有＃220以下的磨粒，比例为弹性材料表面承载的/或埋入弹性材料中的重量百分比为1-30％，粒径为88〜整体为1,190μm。版权所有（C）2009，JPO＆INPIT

76. 发明专利

JP2008253259A Gas-driven type particle delivery device 审中-公开
标题翻译：气体驱动型颗粒递送装置
公开(公告)号：JP2008253259A
公开(公告)日：2008-10-23
申请号：JP2008068314
申请日：2008-03-17
申请人： Powderject Vaccines Inc , パウダージェクトバクシーンズ,インコーポレイテッド
发明人： MCCABE DENNIS E , HEINZEN RICHARD J
IPC分类号： C12M1/00 , A61K38/00 , A61K38/22 , A61K48/00 , B05B7/10 , B05B7/14 , B24C5/04 , C12M1/36 , C12M3/00
CPC分类号： B24C11/005 , B24C5/04 , C12M35/00
摘要： PROBLEM TO BE SOLVED: To provide a device for delivering a substance into cells by a particle-mediating delivery technique.
SOLUTION: The device for delivering particles to target cells or target tissues involves a body having an acceleration passage formed in the body and having an entrance and an exit; and a rotating flow element disposed in the acceleration passage and giving a rotation movement to a gas flow passing through the rotating flow element.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供通过粒子介导递送技术将物质递送到细胞中的装置。解决方案：用于将颗粒递送到靶细胞或靶组织的装置涉及具有形成在体内并具有入口和出口的加速通道的主体; 以及旋转流动元件，其设置在所述加速通道中并且给通过所述旋转流动元件的气流提供旋转运动。版权所有（C）2009，JPO＆INPIT

77. 发明专利

JP4117013B2 Gas-driven particle delivery device 有权
公开(公告)号：JP4117013B2
公开(公告)日：2008-07-09
申请号：JP2007167027
申请日：2007-06-25
申请人：パウダージェクトバクシーンズ,インコーポレイテッド
发明人：イー．マックケイブデニス , ジェイ．ハインゼンリチャード
IPC分类号： C12M1/00 , C12N15/09 , B05B7/10 , B05B7/14 , B24C5/04 , C12M1/04 , C12M1/36 , C12M3/00
CPC分类号： B24C11/005 , B24C5/04 , C12M35/00

78. 发明专利

JP2008127398A Mask coating material and mask material 审中-公开
标题翻译：掩模涂料和掩模材料
公开(公告)号：JP2008127398A
公开(公告)日：2008-06-05
申请号：JP2006309922
申请日：2006-11-16
申请人： Takatomo Sangyo:Kk , 株式会社高友産業
发明人： TAKAGISHI SUSUMU , TATEISHI KENICHI
IPC分类号： C09D201/00 , B24C1/04 , C09D5/02 , C09D5/20 , C09D7/12 , C09D123/08 , C09D131/04 , C09D133/00
CPC分类号： B24C11/005
摘要： PROBLEM TO BE SOLVED: To obtain a mask coating material in which a diagram can be drawn on a coating film surface, which has an excellent cuttability in cutting with a cutter, etc., stands a sandblast processing pressure and integrally releases the whole mask surface after processing.
SOLUTION: The mask coating material comprises 20-75 pts.wt. of an elastomer to be a base material, 20-50 pts.wt. of an elastomer to be a reinforcing material and 5-60 pts.wt. of a pigment. The mask coating material does not cause the stickiness of a coating film to a cutter during cutting and easily releases a mask after processing.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题为了获得在切割机等切割时具有优异的切割性的涂膜表面上可以绘制图案的掩模涂料，其具有喷砂处理压力，并且整体地释放整个面膜表面经过加工。
解决方案：掩模涂层材料包含20-75重量份的弹性体作为基材，20-50重量份的弹性体作为增强材料和5-60重量份的颜料。掩模涂布材料在切割期间不会引起涂膜对切割器的粘性，并且在加工后容易地释放掩模。版权所有（C）2008，JPO＆INPIT

79. 发明专利

JP2007173785A Equipment and method for slurry cleaning etching chamber 有权
标题翻译：浆液清洗室的设备和方法
公开(公告)号：JP2007173785A
公开(公告)日：2007-07-05
申请号：JP2006307392
申请日：2006-11-14
申请人： Boc Group Inc:The , ザ・ビーオーシー・グループ・インコーポレーテッドThe Boc Group Incorporated
发明人： DAVIS IAN MARTIN , LAUBE DAVID P
IPC分类号： H01L21/304
CPC分类号： B24C5/04 , B24C3/325 , B24C7/0038 , B24C11/005 , H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide cleaning equipment and a method for removing debrisments effectively from a surface of semiconductor etching chamber.
SOLUTION: The equipment has an atomization head 22 which includes an entrance port 4 of atomized flow object, an entrance port 6 of abrasive slurry, and an exit port 8 of atomized abrasive slurry. However, in an aspect 200, an internal flow-passage includes a convergence-emission nozzles 24, 28 and a throat portion 26 profiled in more streamline. The throat portion 26 in this aspect includes an inlet hole or opening 16 for the abrasive slurry. The abrasive slurry is introduced in the throat portion 26 by a negative pressure generated by a flow of flowing fluid. The abrasive slurry can be pulled out from one or more abrasive slurry containers 20, and the head 22 can be equipped with one or more fluid connections to one or more flowing fluid supply sources 18.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供从半导体蚀刻室的表面有效地去除碎屑的清洁设备和方法。解决方案：设备具有雾化头22，雾化头22包括雾化流动物体的入口4，磨料浆料的入口6和雾化磨料浆料的出口8。然而，在一方面200中，内部流动通道包括会聚发射喷嘴24,28和更流线形成的喉部26。在该方面，喉部26包括用于磨料浆料的入口孔或开口16。研磨浆料由流动的流体流产生的负压引入到喉部26中。研磨浆料可以从一个或多个磨料浆料容器20中拉出，并且头部22可配备有一个或多个流体连接到一个或多个流动的流体供应源18.版权所有（C）2007，JPO＆INPIT

80. 发明专利

JP2006150585A Liquid honing machine and liquid honing method 有权
标题翻译：液体珩磨机和液体嗅觉方法
公开(公告)号：JP2006150585A
公开(公告)日：2006-06-15
申请号：JP2005317840
申请日：2005-11-01
申请人： Showa Denko Kk , 昭和電工株式会社
发明人： HISADA NOBUHIKO
IPC分类号： B24C9/00 , B08B1/04 , B08B3/02 , B08B3/04 , B08B5/00 , B08B9/02 , B24C3/00 , B24C3/10 , B24C3/18
CPC分类号： B24C11/005
摘要： PROBLEM TO BE SOLVED: To prevent pollution of a cleaning zone in a liquid honing machine having a honing zone for performing liquid honing of a work and a cleaning zone for cleaning the work subjected to liquid honing adjacent to each other in a housing isolated from the outer air. SOLUTION: Between a honing zone 5 and a cleaning zone 6 in a housing 4 of a liquid honing machine 1, there is provided a partition wall 7 for preventing atmospheric gas in the honing zone 5 from flowing into the cleaning zone 6. Furthermore, in the housing 4 is disposed an in-liquid conveyance device 10 for conveying the work 2 that has been subjected to liquid honing in the honing zone 5 from the honing zone 5 to the cleaning zone 6, where the work 2 is conveyed while being immersed in a liquid 72 in a conveyance tank 11. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了防止在具有用于对工件进行液体珩磨的珩磨区域的液体珩磨机中的清洁区域的污染和用于清洁在壳体中彼此相邻的液体珩磨的工件的清洁区域与外界隔绝。解决方案：在珩磨区域5和液体珩磨机1的壳体4中的清洁区域6之间设置有用于防止珩磨区域5中的大气气体流入清洁区域6的分隔壁7。此外，在壳体4中设置有液体输送装置10，用于将在珩磨区域5中进行了珩磨处理5的液体珩磨的工件2从珩磨区域5输送到清洁区域6，浸没在输送槽11中的液体72中。版权所有（C）2006，JPO＆NCIPI

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