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71. 发明专利

JPS59119205A Sample position measuring method 失效
标题翻译：样本位置测量方法
公开(公告)号：JPS59119205A
公开(公告)日：1984-07-10
申请号：JP23282282
申请日：1982-12-25
申请人： Toshiba Corp
发明人： TOUJIYOU TOORU , SUGIHARA KAZUYOSHI
IPC分类号： G01C3/06 , G01B11/00 , G01C3/00 , G03F9/00
CPC分类号： G03F9/70
摘要： PURPOSE:To improve measurement precision by setting the diameter of a beam converged onto a surface to be measured in a slit or spot shape within a specific range, and measuring the position of a sample from the detection signal of a position detector for an image of reflection. CONSTITUTION:A surface to be inspected of a sample 21 is placed on an X-Y table with its inspected surface down and light from a light source 22 is converged through a condenser lens 23 to illuminate the sample 21. Its transmitted light is image-formed on the photodetection surface of a photodetecting element 26 for pattern inspection through objectives 25a, 25b, and 25c provided to the upper part of an optical lens barrel 24. Pattern information obtained by the photodetecting element 26 is compared with designed pattern information to inspect whether a pattern defect exists or not. At this time, an inequality ( I ) holds, where K is the maximum movement rate of the center of gravity of reflected light from the sample suface based upon the variation ratio of the reflection factor in the sample surface, epsilon is the allowable error of position measurement, and (d) is the slit width of the light beam incident to the sample surface or spot diameter.
摘要翻译：目的：通过将聚光到要测量的表面上的光束的直径设定在特定范围内的狭缝或光斑形状来提高测量精度，并且从位置检测器的检测信号测量样品的位置，反射。构成：将待检查样品21的表面放置在XY台上，其检查面向下，来自光源22的光会聚到聚光透镜23以照射样品21.其透射光成像在光检测元件26的光检测表面，用于通过设置在光学镜筒24的上部的物镜25a，25b和25c进行图案检查。由光电检测元件26获得的图案信息与设计的图案信息进行比较，以检查图案缺陷存在与否。此时，不等式（I）成立，其中K是来自样品表面的反射光的重心的最大移动速率，基于样品表面的反射系数的变化率，ε是容许误差位置测量，（d）入射到样品表面的光束的狭缝宽度或光斑直径。

72. 发明专利

JPS5936928A Electron beam transferring apparatus 失效
标题翻译：电子束传输装置
公开(公告)号：JPS5936928A
公开(公告)日：1984-02-29
申请号：JP14705182
申请日：1982-08-25
申请人： Toshiba Corp
发明人： MORI ICHIROU , SUGIHARA KAZUYOSHI , TOUJIYOU TOORU , SHINOZAKI TOSHIAKI
IPC分类号： H01L21/027 , H01L21/30
CPC分类号： H01L21/30
摘要： PURPOSE:To remarkably improve productivity and prevent deterioration of a photoelectric mask by providing a film forming chamber for depositing a photoelectric film to the photoelectric surface of photoelectric mask and by transferring the photoelectric mask to the transferring chamber without being exposed to the atmosphere. CONSTITUTION:A spare chamber 22 which houses and holds a photoelectric mask 5 and sample 3 is provided in a transfer chamber 1 through the first gate valve 21. A film forming chamber 34 for depositing a photoelectric film to the photoelectric surface of mask 5 is also provided in a spare chamber 22 through the second gate valve 33. The first and second transfer mechanism 31 which transfer the mask 5 and sample 3 between the duplication chamber 1 and the spare chamber 22 are provided within the spare chamber 22. The third transfer mechanism 39 which transfers the mask 5 between the spare chamber 22 and the film forming chamber 34 is provided within the film forming chamber 34. Thereby, the mask on which a photoelectric film is deposited in the film forming chamber 3 can be transferred to the duplication chamber 1 without being exposed to the atmosphere.
摘要翻译：目的：通过提供一种用于将光电膜沉积到光电掩模的光电表面的成膜室，并且将光电掩模转印到转印室而不暴露于大气中，从而显着提高生产率并防止光电掩模的劣化。构成：容纳并保持光电掩模5和样品3的备用室22通过第一闸阀21设置在传送室1中。用于将光电膜沉积到掩模5的光电表面的成膜室34也是通过第二闸阀33设置在备用室22中。在复制室1和备用室22之间传送掩模5和样品3的第一和第二传送机构31设置在备用室22内。第三传送机构在成膜室34内设置有将掩模5在备用室22和成膜室34之间进行传送的部件39，从而能够将成膜室3内的光电膜沉积的掩模转印到复制室 1不暴露在大气中。

73. 发明专利

JPS5922340A Electrostatic chucking device 失效
标题翻译：静电切割装置
公开(公告)号：JPS5922340A
公开(公告)日：1984-02-04
申请号：JP13242682
申请日：1982-07-29
申请人： Toshiba Corp
发明人： SUGIHARA KAZUYOSHI , TABATA MITSUO , TOUJIYOU TOORU
IPC分类号： H01L21/68 , H01L21/683
CPC分类号： H01L21/68 , H01L21/6831
摘要： PURPOSE:To prevent air from shutting up between a sample and an electrostatic chucking plate, and to enable to hold and to fix even the sample having a warp with favorable flatness by a method wherein holes or grooves, etc., for letting out of air are provided to the electrostatic chucking plate. CONSTITUTION:The penetrating holes 7 of a plural number to penetrate an electrode 4 and the insulative dielectric layer 5 of an electrostatic chucking plate 2 are arranged at the fixed interval in the neighborhood of the central part of the plate 2. On the upper face of the electrostatically chucking plate 2, namely on the insulative dielectric layer 5, the sample of semiconductor wafer, etc., is put, and the sample is held to be fixed by applying a DC voltage between the sample thereof and an electrode 4. When the wafer having the warp is to be chucked according to the construction like this, because air in the closed space formed between the wafer and the chucking plate is exhausted to the outside through the penetrating holes 7, the wafer having the warp can be held to be fixed surely with favorable flatness.
摘要翻译：目的：为了防止空气在样品和静电吸盘之间关闭，并且通过其中用于放出空气的孔或凹槽等的方法，能够使具有良好平坦度的具有翘曲的经纱的夹持和固定被提供给静电吸盘。构成：穿过电极4的多个贯穿孔7和静电吸盘2的绝缘电介质层5以固定间隔布置在板2的中心附近。在上表面放置静电夹盘2，即绝缘介电层5上的半导体晶片等的样品，并通过在其样品和电极4之间施加直流电压来将样品保持固定。当由于通过贯通孔7将形成在晶片和夹持板之间的封闭空间的空气排出到外部，因此根据这样的结构来夹持具有翘曲的晶片，可以将具有翘曲的晶片保持为确定地具有良好的平整度。

74. 发明专利

JPS5913341A Carrier mechanism of sample 失效
标题翻译：载体机制
公开(公告)号：JPS5913341A
公开(公告)日：1984-01-24
申请号：JP12120282
申请日：1982-07-14
申请人： Toshiba Corp
发明人： TOUJIYOU TOORU , SUGIHARA KAZUYOSHI , TABATA MITSUO
IPC分类号： B23Q3/18 , G03F7/20 , H01L21/027 , H01L21/66 , H01L21/677 , H01L21/68 , H01L21/683
CPC分类号： G03F7/7075 , H01L21/67778 , H01L21/68 , H01L21/6838
摘要： PURPOSE:To simplify the mechanism and structure of a carrier system by utilizing the force of vacuum when the sample such as a wafer is transported and utilizing the force of air and pushing the sample when the sample is positioned or detached. CONSTITUTION:One part is formed in vacuum chuck structure as shown in a broken line in an arm 5 for carrying, and the arm adsorbs one part of a cassette, is moved on a rail 7, in which roller bearings are arranged, and is forwarded on a device. With the cassette, one part of the sample held in it is made collide with a stopper 4, it is stopped at a predetermined position, and it is placed on vertically movable mechanisms 8. The cassette can be detached rapidly by ejecting air from the vacuum chuck section of the arm 5. When the vertically movable mechanisms 8 are dropped, the cassette drops, the lower surface of the sample and a reference surface 9 on the device are brought into contact, and the sample is held by a vacuum chuck constitution 10. When the cassette is extracted, the vacuum chuck 10 is brought to an OFF state, the vacuum chuck of the arm 5 is operated, and the cassette is returned in the direction of a magazine 1. Accordingly, the cassette collides with a stopper 11, and stops.
摘要翻译：目的：通过在样品（如晶片）输送时利用真空力，利用空气的力量并在样品定位或分离时推动样品，简化载体系统的机理和结构。构成：一部分形成在真空卡盘结构中，如用于承载的臂5中的虚线所示，并且臂吸附盒的一部分，在布置有滚子轴承的轨道7上移动，并被转发在设备上对于盒子，保持在其中的样品的一部分与止动件4碰撞，它被停止在预定位置，并且被放置在可垂直移动的机构8上。通过从真空中喷射空气可以快速拆卸盒当垂直移动机构8下降时，盒子下降，样品的下表面和装置上的参考表面9接触，并且样品被真空吸盘构造10保持当盒子被抽出时，真空吸盘10处于OFF状态，臂5的真空吸盘被操作，并且盒沿盒1的方向返回。因此，盒子与挡块11碰撞，并停止。

75. 发明专利

JPS5773936A Cassette holder for electron beam exposure 失效
标题翻译：电子束曝光用CASSETTE HOLDER
公开(公告)号：JPS5773936A
公开(公告)日：1982-05-08
申请号：JP15030580
申请日：1980-10-27
申请人： Toshiba Corp
发明人： TOUJIYOU TOORU , SUGIHARA KAZUYOSHI
IPC分类号： H01L21/027 , H01J37/34
CPC分类号： H01J37/3435
摘要： PURPOSE:To enable a cassette to be accurately positioned, and be secured and held certainly and steadily, by settin the position by pushing the cassette horizontally on a table, and releasing the positioning mechanism at the same time as, or after the opertion of securing mechanism of pushing vertically. CONSTITUTION:Sides 3a and 3b of a Cassette 3 which holds and secures a sample 2 are attached to stoppers 4 and 5 installed on a table 1. The cassette is positioned by being pushed on the sides with a steel ball 8 by a spring 9. A holder 23 (also 33) of a holding mechanism 20 (a holding mechanism 30 is furnished on the left side) is lifted from the table 1 by a pin 24 as a fulcrum. After positioning, the cassette 3 is pushed and secured with steel balls 21 and 31 furnished with springs by pushing down the holder 23 (also 33). At this moment, an end point 40a of a pawl 40 fixed at the holder 23 pushes the steel vall 8 back, and positioning mechanism is released. By this method, cassettes can be positioned accurately with less friction, and steadily secured with less relative displacement to the side directions of the cassette table.
摘要翻译：目的：通过将盒子水平地放在桌子上，通过将盒子水平放置在桌子上，并使其固定并固定，使盒子能够准确定位并固定，并在固定操作的同时或之后释放定位机构纵向推动机制。构成：将保持和固定样品2的盒3的侧面3a和3b连接到安装在桌子1上的止挡件4和5上。盒子通过弹簧9用钢球8推压在侧面上来定位。保持机构20（在左侧设置有保持机构30）的保持件23（也称为33）通过销24作为支点从工作台1提升。在定位之后，通过向下推动保持器23（也称为33），通过带有弹簧的钢球21和31来推动和固定盒3。此时，固定在保持架23上的棘爪40的端点40a向后推动钢球8，并且定位机构被释放。通过这种方法，盒可以以较少的摩擦准确地定位，并且以较小的与盒式台的侧面方向的相对位移稳定地固定。

76. 发明专利

JPS5759329A Device for electron beam exposure 失效
标题翻译：电子束曝光装置
公开(公告)号：JPS5759329A
公开(公告)日：1982-04-09
申请号：JP13485180
申请日：1980-09-27
申请人： Toshiba Corp
发明人： TOUJIYOU TOORU , SUGIHARA KAZUYOSHI
IPC分类号： H01L21/027 , H01J37/34 , H01L21/30
CPC分类号： H01J37/3435
摘要： PURPOSE:To prevent the breakdown of the subject device by a method wherein a position detecting section, to be used for detection of a feeder with which the cassette retaining a sample is carried, is provided and the detection signal of the detecting section is used as an interlocking signal to be used in sections other than a driving system which drives the feeder. CONSTITUTION:The cassette 14 located in a magazine 13 is carried one by one into a patterning chamber 4 by the feeder 16 which will be shifted and driven in leftward and rightward directions by a feeder driving system 15 and placed at the prescribed position on an X-Y table. A position detecting device 17 is provided in the vicinity of the feeder 16 and detects whether or not the feeder 16 is located at the prescribed position. This detecting signal is outputted, as an interlocking signal, to driving systems 7, 10 and 12 through the intermediaries of a controlling board 18 and a cassette transfer controlling section 19, and each driving system can be operated only when an ON position is given. Through these procedures, the breakdown of the subject device due to an accident and an erroneous operation can be prevented.
摘要翻译：目的：为了防止主体装置的故障，其中提供了用于检测保持样本的盒的馈送器的位置检测部分，并将检测部分的检测信号用作一个互锁信号，用于除驱动进给器的驱动系统以外的部分。构成：位于盒13中的盒14由馈送器16一个一个地携带到图案化室4中，馈送器16将通过馈送器驱动系统15在左右方向上移动和驱动，并被放置在XY上的规定位置表。位置检测装置17设置在馈送器16的附近，并且检测馈送器16是否位于规定位置。该检测信号作为互锁信号通过控制板18和盒传送控制部分19的中间体输出到驱动系统7,10和12，并且每个驱动系统只能在给定ON位置时被操作。通过这些程序，可以防止由于事故而导致的被摄体装置的故障和错误的操作。

77. 发明专利

JP2002088478A FILM DEPOSITION METHOD 审中-公开
公开(公告)号：JP2002088478A
公开(公告)日：2002-03-27
申请号：JP2001215906
申请日：2001-07-16
申请人： TOSHIBA CORP
发明人： NAKAMURA HIROKO , KOMANO HARUKI , KARIYA MITSUYO , INOUE SOICHI , SUGIHARA KAZUYOSHI , MORI ICHIRO , HORIOKA KEIJI , MIYOSHI MOTOSUKE , WATANABE TORU , OKANO HARUO , OKUMURA KATSUYA , TAKIGAWA TADAHIRO , YAMAZAKI YUICHIRO
IPC分类号： C23C16/40 , C23C16/48 , G03F1/29 , G03F1/30 , G03F1/72 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a film deposition method in which a defect repair process for structures by which both of projecting defects and recessed defects can flatly be repaired in accordance with the surface of a base board can be utilized. SOLUTION: This film deposition method includes a process in which, by FIB assist deposition in which a material having an Si-O-Si bond and an Si-H bond is fed to the surface of a structure, and further, a desired part in the surface fed with the above material is irradiated with a focused ion beam, a silicon oxide film is deposited.

78. 发明专利

JP2000040649A EXPOSURE METHOD AND POSITION ALIGNMENT MARK 失效
公开(公告)号：JP2000040649A
公开(公告)日：2000-02-08
申请号：JP20780198
申请日：1998-07-23
申请人： TOSHIBA CORP
发明人： KATO YOSHIMITSU , SUGIHARA KAZUYOSHI , OKUMURA KATSUYA , UMAGOE TOSHIYUKI , NIIYAMA HIROMI , NAKASUGI TETSUO
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure method capable of restraining decrease of superposition precision which is caused by pattern distortion due to difference of scanning direction of a light slit of a scanning transfer type aligner, in an exposure method using the scanning transfer type aligner and an EB aligner. SOLUTION: A distortion coefficient of each scanning direction in scanning transfer type aligner is calculated (step S1). An overall distortion coefficient is calculated by superposing the above distortion coefficient and a distortion coefficient of the EB aligner. Correction obtained from the overall distortion coefficient is considered, and exposure is performed by superposing an EB exposure pattern on an optical exposure pattern.

79. 发明专利

JPH11297597A MATERIAL AND METHOD FOR PATTERN FORMING 失效
公开(公告)号：JPH11297597A
公开(公告)日：1999-10-29
申请号：JP9953898
申请日：1998-04-10
申请人： TOSHIBA CORP
发明人： NAKASUGI TETSUO , SAITO SATOSHI , SATO KAZUO , SUGIHARA KAZUYOSHI
IPC分类号： G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a material and a method capable of forming a resist pattern having high sensitivity with respect to both light and charged particle beams, as well as maintain a good shape during alignment using either light or charged particle beams. SOLUTION: This pattern forming material contains a solubility-changeable compound that changes the solubility with an alkaline solution by using acid, a first acid generating agent that generates acid through the irradiation of exposure light used in the photolithography process, and a second acid generating agent that generates acid by irradiation of a charged particle beam. As a result, the cross-section shape of the resist pattern formed by light irradiation can be kept in a rectangular shape and a high sensitivity to the charged particle beam can be obtained.

80. 发明专利

JPH1027749A CHARGED PARTICLE BEAM LITHOGRAPHY METHOD 失效
公开(公告)号：JPH1027749A
公开(公告)日：1998-01-27
申请号：JP19852396
申请日：1996-07-10
申请人： TOSHIBA CORP
发明人： SUGIHARA KAZUYOSHI , SUNAOSHI HITOSHI , ANDO KOJI
IPC分类号： G03F7/20 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To make feasible of the pattern formation without fail from a large to a fine dimensions. SOLUTION: Within an electron beam lithography method controlling the dimension of the electron beams by the first and second molded apertures 103, 105 and a deflection amplifier 130 to draw a pattern on a specimen 9 by the variable molded beams, the relative curve of a beam current value and a beam dimension is processed by scanning the image of the aperture 103 on the aperture 105 to process the gain and offset values of the deflection amplifier 130 within the linear range wherein th actual dimension fluctuates linearly for the definition of the tentative origin next, line beams are scanned in the orthogonal diection to the width direction at the tentative original position to process the relative curve of the beam curent value and the beam dimension together with the beam width wherein the partial relative curve is in contact with the zero beam current so as to correct the difference between the latter and former offset values for the readjustment of the deflection amplifier 130 to redefine the true origin.

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