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62. 发明专利

JP3860706B2 Processing method of the combustion exhaust gas 有权
公开(公告)号：JP3860706B2
公开(公告)日：2006-12-20
申请号：JP2000104904
申请日：2000-04-06
申请人：触媒化成工業株式会社
发明人：雅昭内田 , 健一清野 , 一博西井 , 健太郎足立
IPC分类号： B01D53/94 , C07D319/24 , B01D53/86 , B01J23/28 , B01J32/00 , C07B35/06 , C07B37/06 , C07C25/18

63. 发明专利

JP2006263649A Organic halogen compound decomposition 有权
标题翻译：有机卤化物分解
公开(公告)号：JP2006263649A
公开(公告)日：2006-10-05
申请号：JP2005088255
申请日：2005-03-25
申请人： Hitachi Zosen Corp , 日立造船株式会社
发明人： HAMANO SHUJI , SASAKI KATSUYA , UEDA KOZO , IWAMOTO TOMOHITO , UMEMURA SHOZO
IPC分类号： B09C1/06 , B01D53/86 , B09B3/00 , C07B35/06 , C07B37/06 , C07C23/12 , C07C23/46 , C07D319/24
摘要： PROBLEM TO BE SOLVED: To provide an organic halogen compound processing method by which the amount of exhaust gas discharged film a kiln can be reduced and the energy for processing the organic halogen compound can be reduced as a result and the burden on cooling after recombustion and on a dust collector is made small. SOLUTION: The organic halogen compound processing method includes a first process of heating a material to be processed which contains the organic halogen compound at 400 to 700°C in a low oxygen atmosphere of ≤5% in oxygen concentration by a heater 1 to volatilize the organic halogen compound, and a second process of injecting oxygen into gas containing the organic halogen compound volatilized from the material to be processed by an oxidation cracking unit 3 and heating the material to be processed by bringing the same into contact with an inorganic solid for promoting oxidative decomposition of the organic halogen compound to perform the oxidative decomposition of the organic halogen compound. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种有机卤素化合物处理方法，通过该方法可以减少废气排出膜的窑的量，并且可以减少加工有机卤素化合物的能量，并且降低冷却负担重组后，在集尘器上做得很小。解决方案：有机卤素化合物处理方法包括在400〜700℃，在氧浓度不足5％的低氧气氛中加热含有有机卤素化合物的被处理材料的加热器1的第一工序挥发有机卤素化合物，以及将氧气注入含有由氧化裂解装置3从被处理材料挥发的有机卤素化合物的气体中，并通过使其与无机物质接触来加热待处理材料的第二种方法固体，用于促进有机卤素化合物的氧化分解，以进行有机卤素化合物的氧化分解。版权所有（C）2007，JPO＆INPIT

64. 发明专利

JP3822303B2 Decomposition method and apparatus for decomposing organic compounds 失效
公开(公告)号：JP3822303B2
公开(公告)日：2006-09-20
申请号：JP2807197
申请日：1997-02-12
申请人：クォークシステムズ株式会社 , 株式会社ワコム電創
发明人：勝中村
IPC分类号： B01D53/70 , B01D53/72 , C02F1/32 , B01J19/12 , C02F1/58 , C07B35/06 , C07B37/06 , C07B61/00 , C07C19/01 , C07C25/18 , H01J65/00

65. 发明专利

JP2006231241A Hydrothermal decomposition apparatus and method for discharging residue 审中-公开
标题翻译：水热分解装置和排放残留物的方法
公开(公告)号：JP2006231241A
公开(公告)日：2006-09-07
申请号：JP2005051560
申请日：2005-02-25
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： TAKEI KOICHI , YOSHIDA AKITO , SHINODA KATSUHIKO
IPC分类号： B01J3/02 , A62D3/20 , A62D101/22 , B01J3/00 , B09B3/00 , C07B35/06 , C07C25/18
摘要： PROBLEM TO BE SOLVED: To provide a residue discharge apparatus for safely discharging residues precipitated in a reaction vessel of a hydrothermal treatment apparatus.
SOLUTION: The hydrothermal decomposition apparatus 1 is a hydrothermal decomposition apparatus equipped with a reaction vessel 101 for hydrothermally treating PCB and a substance containing PCB at a temperature as high as 300°C or higher and a pressure as high as 22 MPa or higher. A residue discharge apparatus 3 for discharging the residues from the reaction vessel 101 in high-temperature and high-pressure state is installed in the apparatus 1 while being connected to the bottom part of the reaction vessel 101.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于安全地排出在水热处理装置的反应容器中沉淀的残渣的残渣排放装置。解决方案：水热分解装置1是一种水热分解装置，其装备有用于热处理PCB的反应容器101和含有PCB的物质，其温度高达300℃或更高，压力高达22MPa，或更高。在连接到反应容器101的底部的同时，在装置1中安装用于将高温高压状态下的反应容器101中残留物排出的残渣排出装置3.（C） 2006年，JPO＆NCIPI

66. 发明专利

JP3818936B2 Processing unit 有权
公开(公告)号：JP3818936B2
公开(公告)日：2006-09-06
申请号：JP2002097657
申请日：2002-03-29
申请人：株式会社豊栄商会
发明人：芳昭横山
IPC分类号： B09B3/00 , A62D3/40 , A62D101/08 , A62D101/22 , B01D53/70 , C07B35/06 , C07B37/06 , C07C25/18 , F23J15/02

67. 发明专利

JP2006218392A Method and apparatus for cleaning contaminated matter 审中-公开
标题翻译：清洁污染物的方法和装置
公开(公告)号：JP2006218392A
公开(公告)日：2006-08-24
申请号：JP2005034107
申请日：2005-02-10
申请人： Kobelco Eco-Solutions Co Ltd , 株式会社神鋼環境ソリューション
发明人： MURAKAMI YOSHIAKI , NAGANO TATSUKI
IPC分类号： B09C1/06 , A62D3/34 , A62D3/40 , A62D101/22 , A62D101/28 , B01D11/04 , B01D53/68 , B01D53/70 , B01D53/77 , C07B35/06 , C07C23/12 , C07C23/46 , C07C25/12 , C07C25/18 , C07C25/20 , C07D319/24
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning contaminated matter, by which the amount of an exhausted acidic gas and the cleaning cost can be reduced and in which there is little risk that a cleaned matter is made alkaline.
SOLUTION: The method for cleaning the contaminated matter includes a reduction heating process for reducing and heating the contaminated matter contaminated with organic halogen compounds and an exhaust gas treating process for cleaning an exhaust gas formed by the reduction heating process. The exhaust gas treating process comprises an oil-cleaning step for allowing undecomposed organic halogen compounds in the exhaust gas to be absorbed in oil by bringing the gas into contact with the oil, a decomposition step for decomposing the organic halogen compounds in the oil by adding an alkali metal to the oil used in the oil-cleaning step, and a hydration step for allowing the alkali metal and alkali metal halides to be absorbed in water by adding water to the oil subjected to the decomposition process. The exhaust gas treating process further has a washing step for allowing an acidic gas being a decomposition product in the exhaust gas to be absorbed in water by bringing the gas into contact with water, and the water used in the washing step is used as water to be added to the oil in the hydration step.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种清洁污染物质的方法，通过该方法可以减少排出的酸性气体的量和清洁成本，并且其中清洁物质变成碱性的风险很小。解决方案：用于清洁污染物质的方法包括用于减少和加热被有机卤素化合物污染的污染物的还原加热方法和用于清洁由还原加热过程形成的废气的废气处理方法。废气处理方法包括使排气中未分解的有机卤素化合物通过使气体与油接触而吸收在油中的油清洗步骤，用于通过添加将分解油中的有机卤素化合物的分解步骤用于油洗步骤中的油的碱金属，以及通过向经过分解处理的油中加入水使碱金属和碱金属卤化物吸收在水中的水合步骤。排气处理工序还具有通过使气体与水接触而使废气中的分解产物的酸性气体被吸收在水中的洗涤步骤，并且将洗涤步骤中使用的水用作水在水合步骤中加入油中。版权所有（C）2006，JPO＆NCIPI

68. 发明专利

JP2006212354A Detoxification treatment method and detoxification processor for organic halogen compound 有权
标题翻译：有机卤化物的脱氧处理方法和脱氧处理剂
公开(公告)号：JP2006212354A
公开(公告)日：2006-08-17
申请号：JP2005031137
申请日：2005-02-07
申请人： Hiroshima Industrial Promotion Organization , 財団法人ひろしま産業振興機構
发明人： MITOMA KOJI , EGASHIRA NAOYOSHI , KAKINAMI TAKAAKI
IPC分类号： A62D3/00 , A62D3/30 , A62D3/34 , A62D3/37 , A62D101/22 , A62D101/28 , C07B35/06 , C07C25/18 , C07C43/225 , C07D319/24
摘要： PROBLEM TO BE SOLVED: To provide a detoxification treatment method of an organic halogen compound with high decomposition rate, capable of decomposition under mild operation conditions with less number of processes, and a detoxification treating device in a simple structure at a low cost. SOLUTION: The organic halogen compound, a protic solvent, a reduction catalyst and a metal to be at least partially dissolved in the protic solvent and having reduction force by electronic movement are mixed and the dehalogenation and/or reduction treatment of the organic halogen compound are performed without introducing a hydrogen source from the outside at all. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：提供一种具有高分解速率的有机卤素化合物的解毒处理方法，能够在较少的工艺条件下在温和的操作条件下分解，并且以低成本的简单结构的解毒处理装置。解决方案：将有机卤素化合物，质子溶剂，还原催化剂和至少部分溶解在质子溶剂中并具有通过电子运动的还原力的金属混合，并且有机物的脱卤和/或还原处理卤素化合物完全不从外部引入氢源。版权所有（C）2006，JPO＆NCIPI

69. 发明专利

JP2006192115A Method of decomposing halogenated aromatic compound included in medium with high-reactive hydrogen 有权
标题翻译：分解含有高反应性氢的中等含量的芳族化合物的方法
公开(公告)号：JP2006192115A
公开(公告)日：2006-07-27
申请号：JP2005007297
申请日：2005-01-14
申请人： Neos Co Ltd , 株式会社ネオス
发明人： MATSUMOTO HITOSHI , KATO EIICHI
IPC分类号： C07B35/06 , A62D3/30 , A62D3/34 , A62D101/22 , A62D101/28 , B01J25/02 , C07D319/24
摘要： PROBLEM TO BE SOLVED: To establish a chemically safe method of decomposing a halogenated aromatic compound, capable of substantially completely decomposing the halogenated aromatic compound including PCB or the like without requiring a process of treating a by-product of the decomposition or without generating additional harmful matters (by-products), and controlling the rate of decomposition of a main solvent.
SOLUTION: The method of decomposing the halogenated aromatic compound is to decompose the halogenated aromatic compound by contacting a medium including the halogenated aromatic compound, a strong alkaline substance and a substance to be decomposed by the strong alkaline substance to generate hydride ions with a catalyst and a heat-resistant and alkaline-resistant polar solvent at the temperature from the normal temperature to 250°C.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了建立能够基本上完全分解包括PCB等的卤代芳族化合物的卤化芳族化合物的化学安全的方法，而不需要处理分解或不分解副产物的方法产生额外的有害物质（副产物），并控制主溶剂的分解速率。解决方案：分解卤代芳族化合物的方法是通过使包含卤代芳族化合物，强碱性物质和被强碱性物质分解的物质的介质接触来分解卤代芳族化合物，以产生氢化物离子，催化剂和耐热和耐碱极性溶剂，在常温至250℃的温度下进行。版权所有（C）2006，JPO＆NCIPI

70. 发明专利

JP2006122866A Treatment method and treatment apparatus of gaseous halogen compound 审中-公开
标题翻译：气相色谱法处理方法及处理装置
公开(公告)号：JP2006122866A
公开(公告)日：2006-05-18
申请号：JP2004317746
申请日：2004-11-01
申请人： Oriental Kiden Kk , オリエンタル機電株式会社
发明人： OISHI TSUYOSHI , HOSOKAWA SHUNSUKE , YAMAMOTO TOSHIAKI
IPC分类号： B01D53/70 , A01M13/00 , A01M17/00 , C07B35/06 , C07B37/06 , C07C19/075 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a treatment method and a treatment apparatus for a gaseous halogen compound which are capable of detoxicating a gaseous halogen compound such as methyl bromide, lessening the load on global environments, and decreasing the treatment cost, and by which a treatment facility can be made sufficiently compact. SOLUTION: The treatment method involves steps of decomposing a halogen compound by bringing a gas current containing the halogen compound into contact with electric discharge plasma and forming a salt of the halogen and a metal for halogen fixation by bringing a gas current containing the decomposition product produced in the decomposition step into contact with a chemical solution containing the metal ion. The treatment apparatus 1 comprises an electric discharge plasma reactor 2 for causing reaction of the gas current containing the gaseous halogen compound with electric discharge plasma generated in the reactor and a scrubber 3 for bringing the gas current after the reaction in the electric discharge plasma reactor into contact with the chemical solution containing the metal ion. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够对甲基溴等气态卤素化合物进行脱毒的气态卤素化合物的处理方法和处理装置，减轻对全球环境的负荷，降低处理成本，以及由此可以使处理设备足够紧凑。解决方案：处理方法包括通过使含有卤素化合物的气流与放电等离子体接触并形成卤素的盐和卤素固定的金属来分解卤素化合物的步骤，通过使含有在分解步骤中产生的分解产物与含有金属离子的化学溶液接触。处理装置1包括：放电等离子体反应器2，用于使含有气态卤素化合物的气流与在反应器中产生的放电等离子体反应;以及洗涤器3，用于将放电等离子体反应器中的反应后的气流引入与含有金属离子的化学溶液接触。版权所有（C）2006，JPO＆NCIPI

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