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    • 62. 发明专利
    • TEXTURING METHOD AND DEVICE
    • JP2001209928A
    • 2001-08-03
    • JP2000016622
    • 2000-01-26
    • RIKAGAKU KENKYUSHOSHOWA DENKO KK
    • OMORI HITOSHIHAYASHI IMINITO NOBUHIDEMORIYA NORIO
    • G11B5/84
    • PROBLEM TO BE SOLVED: To provide a texturing method and a device which can be installed in a clean room together with preceding and following process equipment with very little occurrence of the soil, and whose processing efficiency is high com pared with loose abrasive grain, and can perform the stable texturing processing. SOLUTION: The texturing is applied to a substrate surface by forcing the cylindrical surface of a tool on the substrate surface, and making the tool and the substrate move relatively along the substrate surface, rotationally driving a disk-like substrate 1 centering on the axial center, and rotationally driving the cylinder-like tool 12 centering on the axial center parallel to the substrate surface, and cleaning the cylindrical surface of the tool and the substrate surface. The cylinder-like tool 12 is used as an anode through a power feeding body 14, uses as a cathode the circular electrode 16 opposed to the cylindrical surface of the cylinder-like tool, supplies conductive working liquid 7 between the cylinder-like tool and the circular electrode, applies the electrolysis dressing, and cleans the cylindrical surface of the tool.
    • 64. 发明专利
    • COHERENT LIGHT SOURCE DEVICE
    • JP2001201597A
    • 2001-07-27
    • JP2000009363
    • 2000-01-18
    • RIKAGAKU KENKYUSHO
    • KUMAGAI HIROSHIMIDORIKAWA KATSUMI
    • G21K1/00
    • PROBLEM TO BE SOLVED: To provide a coherent light source device used for the movement control of atomic beams of various atoms or the isotope control of various elements. SOLUTION: This device comprises a first coherent light source for generating a first coherent light having a prescribed wavelength λ1, a second coherent light source for generating a second coherent light having a prescribed wavelength λ2, and a resonator for receiving the first coherent light generated by the first coherent light source and the second coherent light generated by the second coherent light source and resonating the first and second coherent lights, respectively, to generate and emit a coherent light having a wavelength λx. The equation of 1/λ1+1/λ2=1/λx is established between the wavelength λ1 and the wavelength λ2, the first coherent light satisfies conditions of the wavelength λ1, single vertical mode, constant frequency, single horizontal mode and high output, and the second coherent light satisfies conditions of the wavelength λ2, single vertical mode, variable frequency, single horizontal mode, and high output.
    • 65. 发明专利
    • ACM SENSOR AND MANUFACTURING METHOD THEREFOR
    • JP2001201451A
    • 2001-07-27
    • JP2000011147
    • 2000-01-20
    • RIKAGAKU KENKYUSHONEXSYS CORP
    • OMORI HITOSHIYAMAGATA YUTAKAMORIYASU KIYOSHIUEHARA YOSHIHIROTSUJIKAWA SHIGEOSHINOHARA TADASHIASAMI MUNEAKI
    • G01N17/04
    • PROBLEM TO BE SOLVED: To provide an ACM sensor whose service life is long, which is of high sensitivity, in which an irregularity in an output is small, in which a yield in its manufacture is high and whose cost can be lowered, and to provide its manufacturing method. SOLUTION: The manufacturing method is composed of a pretreatment process 30, in which the anchor force on the surface of a substrate composed of a conductive material is enhances. The manufacturing method is composed of an insulating-film thermal spray process 32, in which an insulating material is thermally sprayed to the surface of the substrate so as to form an insulating film. The manufacturing method is composed of a conductive-film thermal spray process 34, in which the conductive material different from that of the substrate is thermally sprayed to the surface of the insulating film so as to form a conductive film. The manufacturing method is composed of a planarizing process 36, in which the surface of the conductive film is ground to be smooth. The manufacturing method is composed of a slit-working process 38 in which the conductive film, and the insulating film are ground and removed in a slit shape. In the planarizing process and/or the silt-working process, an ELID grinding method in which a grinding operation is performed, while a conductive whetstone is dressed electrolytically is used.