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    • 61. 发明专利
    • Polyimidebenzoxazole film and method for producing the same
    • 聚酰苯并噻唑薄膜及其制造方法
    • JP2005307044A
    • 2005-11-04
    • JP2004127079
    • 2004-04-22
    • Toyobo Co Ltd東洋紡績株式会社
    • KAWAHARA KEIZOYASUI JUNTSUTSUMI MASAYUKIMAEDA SATOSHI
    • C08J5/18B29C41/24B29K79/00B29L7/00C08G73/22H05K1/03
    • PROBLEM TO BE SOLVED: To provide a polyimidebenzoxazole film hardly causing warp or the like when a printed wiring board is constituted by laminating a copper layer or the like thereon; and to provide a method for producing the film.
      SOLUTION: The polyimidebenzoxazole film comprises a polyimidebenzoxazole obtained by reacting aromatic diamines having a benzoxazole structure with anhydrides of aromatic tetracarboxylic acids, and has 12-20 ppm/°C coefficient of linear expansion in face-expansion direction, and 5-12 GPa tensile modulus in the face-expansion direction. The film is obtained by reacting the aromatic diamines with the anhydrides of the aromatic tetracarboxylic acids in an organic solvent to provide a polyamic acid solution, coating the solution on a supporter, drying the coated product to provide a polyamic acid film having 40-55 wt.% remaining solvent rate, and heating the polyamic acid film.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:当通过在其上层叠铜层等构成印刷线路板时,提供几乎不引起翘曲等的聚酰亚胺苯并恶唑膜; 并提供一种制备该膜的方法。 解决方案:聚酰亚胺苯并恶唑膜包括通过使具有苯并恶唑结构的芳族二胺与芳族四羧酸的酸酐反应获得的聚酰亚胺苯并恶唑,并且在面扩展方向上具有12-20ppm /℃的线性膨胀系数,以及5-12 GPa在面膨胀方向的拉伸模量。 通过使芳族二胺与芳族四羧酸的酸酐在有机溶剂中反应得到聚酰胺酸溶液,将该溶液涂布在支持体上,干燥涂布品,得到具有40〜55重量%的聚酰胺酸膜 %剩余溶剂速率,并加热聚酰胺酸膜。 版权所有(C)2006,JPO&NCIPI
    • 67. 发明专利
    • Easily adhesive stretched film of syndiotactic polystyrene
    • 易溶性聚苯乙烯胶粘剂薄膜
    • JP2003334905A
    • 2003-11-25
    • JP2002143487
    • 2002-05-17
    • Toyobo Co Ltd東洋紡績株式会社
    • TSUTSUMI MASAYUKIKOBAYASHI HISATOYOSHIDA SHIGETOYAMAGUCHI SHINSUKEKAWAHARA KEIZO
    • B32B27/30B29C55/02B29K25/00B29L7/00B29L9/00B32B27/36
    • PROBLEM TO BE SOLVED: To provide an easily adhesive stretched film of a syndiotactic polystyrene which shows excellent adhesive properties between a film and an adhesive modified layer, and has excellent economical efficiency, recycling properties and environmental adaptability during manufacturing.
      SOLUTION: This easily adhesive stretched film of a syndiotactic polystyrene is obtained by laminating an adhesiveness modified layer formed of a water- dispersible copolymer polyester with a glass transition temperature of 30°C or lower, on at least one side of the stretched film composed of a styrene polymer substantially having a syndiotactic structure. Especially the adhesiveness modified layer is preferably formed by applying an aqueous dispersion of a copolyester to an unstretched film or a uniaxially stretched film, and uniaxially or biaxially orienting the film once or more before thermally treating it.
      COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供间同立构聚苯乙烯的容易粘合的拉伸膜,其在膜和粘合剂改性层之间显示出优异的粘合性,并且在制造过程中具有优异的经济效率,再循环性能和环境适应性。 解决方案:间同立构聚苯乙烯的这种容易粘合的拉伸膜是通过将玻璃化转变温度为30℃或更低的水分散性共聚物聚酯形成的粘合性改性层在拉伸的至少一面层压 由基本上具有间同立构结构的苯乙烯聚合物构成的膜。 特别地,粘合性改性层优选通过将共聚酯的水性分散体施加到未拉伸膜或单轴拉伸膜,并且在对其进行热处理之前一次或多次单轴或双轴取向而形成。 版权所有(C)2004,JPO
    • 70. 发明专利
    • Polyimide film
    • 聚酰亚胺膜
    • JP2010209245A
    • 2010-09-24
    • JP2009058081
    • 2009-03-11
    • Toyobo Co Ltd東洋紡績株式会社
    • TSUTSUMI MASAYUKIMATSUOKA TAKESHI
    • C08J5/18C08G73/10
    • PROBLEM TO BE SOLVED: To provide a light shielding polyimide film excellent in heat resistance, dimensional stability, and surface smoothness.
      SOLUTION: The polyimide film, which has a film thickness of 2-50 μm and exhibits 30% or less of light transmittance of the polyimide film in a visible light region with a wavelength of 450-700 nm, has a residue of pyromellitic acid as a residue of aromatic tetracarboxylic acids and a residue of an aromatic diamine having benzoxazole structure as a residue of aromatic diamines.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供耐热性,尺寸稳定性和表面平滑性优异的遮光性聚酰亚胺膜。 < P>解决方案:波长450-700nm的可见光区域中,聚酰亚胺膜的膜厚为2-50μm,聚酰亚胺膜的透光率为30%以下的聚酰亚胺膜的残留物为 作为芳族四羧酸的残基的1,2,4,5-苯四酸和具有苯并恶唑结构的芳族二胺的残基作为芳族二胺的残基。 版权所有(C)2010,JPO&INPIT