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61. 发明专利

JP2006342325A PHOTOSENSITIVE RESIN COMPOSITION FOR DISPLAY DEVICE SPACER AND PHOTOSENSITIVE ELEMENT 审中-公开
公开(公告)号：JP2006342325A
公开(公告)日：2006-12-21
申请号：JP2006078872
申请日：2006-03-22
申请人： HITACHI CHEMICAL CO LTD
发明人： NOJIRI TAKESHI , MUKAI IKUO , YOSHIDA TAKESHI
IPC分类号： C08F2/44 , C08F265/00 , G03F7/004 , G03F7/033 , G03F7/075 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a display device spacer producing a display device making suppression of display unevenness caused by plastic deformation compatible with the suppression of the display unevenness caused by deterioration of adhesiveness according to an improvement in hardness or mechanical strength, affording good display quality without the display unevenness and having good yield. SOLUTION: The photosensitive resin composition for the display device spacer comprises (a) a binder polymer, (b) a photopolymerizable unsaturated compound having at least one ethylenically unsaturated group in one molecule, (c) a photopolymerization initiator producing free radicals with actinic rays and (d) a silyl group-containing organic compound having at least one hydrolyzable group-containing silyl group in one molecule. The content of the component (d) is 0.01-30 pts.wt. based on 100 pts.wt. of the total amount of the components (a) and (b). COPYRIGHT: (C)2007,JPO&INPIT

62. 发明专利

JP2001260219A PRODUCING METHOD FOR LIGHT DIFFUSION PLATE, AND THE LIGHT DIFFUSION PLATE OBTAINED THEREBY 失效
公开(公告)号：JP2001260219A
公开(公告)日：2001-09-25
申请号：JP2000081677
申请日：2000-03-17
申请人： HITACHI CHEMICAL CO LTD
发明人： TSURUOKA YASUO , YOSHIDA TAKESHI , SHIMAZAKI TOSHIKATSU , TAKANE NOBUAKI , KIZAWA KEIKO
IPC分类号： G02B5/02 , B29C59/02 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide both a producing method for a light diffusion plate, in which a plurality of diffusion reflection plates with reflection characteristics are efficiently and easily produced from a kind of transfer original mold according to use of a reflection type LCD from a reflection plate with intensive specular properties to a diffusion plate with intensive diffusion properties, and the light diffusion plate. SOLUTION: The producing method for the light diffusion plate contains a process forming the thin film layer of a photo-setting resin composition on the base material, a process pressing an original mold, in which an uneven shape face is formed, on the thin film layer and a process making the uneven shape of the thin film layer of an exposure part to a step of 5-95% of the uneven shape of the original mold by controlling exposing amount onto the thin film layer and performing exposure.

63. 发明专利

JP2001133609A DIFFUSED REFLECTION PLATE, MANUFACTURING METHOD THEREFOR, BASE FILM USED FOR THE SAME AND TRANSFER FILM 失效
公开(公告)号：JP2001133609A
公开(公告)日：2001-05-18
申请号：JP31044499
申请日：1999-10-29
申请人： HITACHI CHEMICAL CO LTD
发明人： SHIMAZAKI TOSHIKATSU , YOSHIDA TAKESHI , TSURUOKA YASUO , TAKANE NOBUAKI , KIZAWA KEIKO
IPC分类号： G02B5/02 , G02B5/08 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a diffused reflection plate which is easy to flatten in a reflective LCD(liquid crystal display) manufacturing process, its transferring original mold and its manufacturing method, a transferring film made by using it and the manufacturing method for the diffused reflection plate using them in the diffused reflection plate used in the manufacture of the diffused reflection plate for a reflective LCD with superior reflection characteristics or the like. SOLUTION: In this diffused reflection plate, having a surface shape composed of densely crowded regular fine shapes, fine shapes are formed with pyramid shaped holes or holes with pyramid and prism shapes existing in a part of their space. Thereby external light, other than those with the secular reflection angles is reflected so as to make the bright diffused reflection plate. By using the diffused reflection plate, thin layer thickness is realized in a flattening layer coating process for the manufacture of a reflective LCD and the generation of uneven coating is hardly caused.

64. 发明专利

JP2000321406A TRANSFER FILM AND PRODUCTION OF DIFFUSION REFLECTION PLATE 失效
公开(公告)号：JP2000321406A
公开(公告)日：2000-11-24
申请号：JP2000063321
申请日：2000-03-03
申请人： HITACHI CHEMICAL CO LTD
发明人： KIZAWA KEIKO , YOSHIDA TAKESHI , TSURUOKA YASUO , TAKANE NOBUAKI
IPC分类号： G02B5/02 , G02B5/08
摘要： PROBLEM TO BE SOLVED: To embody a transfer film which is used for production of a diffusion reflection plate capable of diffusing and reflecting light and a process for producing the diffusion reflection plate using the transfer film. SOLUTION: The transfer film is formed of a laminated structure consisting of a base film 4, a primer coat layer 6 and a negative photosensitive rugged surface forming precursor thin film. The active ray transmittance of the primer coat layer 6 and the base film 4 is specified to >=10%. The diffusion reflection plate is produced by transferring the negative photosensitive rugged surface forming precursor thin film onto a diffusion reflection substrate, then peeling the base film 4 and the primer coat layer 6 after exposure. As a result, the diffusion reflection plate used for a diffusion reflection plate for a reflection LCD having a good reflection characteristic, etc., may be efficiently and stably produced.

65. 发明专利

JP2000047199A TRANSFER FILM AND MANUFACTURE OF DIFFUSE REFLECTOR PLATE 失效
公开(公告)号：JP2000047199A
公开(公告)日：2000-02-18
申请号：JP21693998
申请日：1998-07-31
申请人： HITACHI CHEMICAL CO LTD
发明人： TAKANE NOBUAKI , TSURUOKA YASUO , YOSHIDA TAKESHI , FUNAHATA KAZUYUKI
IPC分类号： G02F1/1333 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a transfer film used for manufacturing a diffuse reflector plate for a reflective LCD or the like having fine reflective characteristics. SOLUTION: Sandblasted polyethylene terephthalate is used as a base film 4 which is coated with a solution for forming a thin film layer, dried to form a thin film layer 2 and covered by a polyethylene film as a cover film 5 to obtain a transfer film. By stripping off the cover film of the transfer film, lamination is carried out so as to bring the thin film layer into contact with a glass substrate and a substrate laminated with a glass substrate, the thin film layer and polyethylene terephthalate film (PET film) is obtained. After irradiating with a ray with which the thin film layer reacts thereon by an exposing device and stripping off PET film from the substrate, projecting and recessing parts due to sandblast processing are transferred on the thin film layer. The projecting and recessing shape shows fine light diffusing properties.

66. 发明专利

JPH11248917A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH11248917A
公开(公告)日：1999-09-17
申请号：JP4642398
申请日：1998-02-27
申请人： HITACHI CHEMICAL CO LTD
发明人： TOMONO HIDEKUNI , YAMAGUCHI MASATOSHI , SUGIMOTO YASUSHI , YOSHIDA TAKESHI
IPC分类号： G02B5/00 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide the manufacture of the color filter which improves the flatness of the color filter without being affected by the thickness of a light shield layer as a substrate, prevents adjacent pixels from flawing on coming into contact with an exposing machine stage or conveyance system without being exposed, and also prevents a white defect due to a foreign body on the reverse surface of a substrate. SOLUTION: On a transparent substrate 2 provided with a grating type light shield layer 1, a colored layer 3a as a pixel base material is arranged while a protection layer 19 is installed on the colored layer and on the opposite surface side from the surface of the transparent substrate 2 where the grating type light shield layer 1 is provided, a photomask 17 having a dot opening pattern is arranged and positioned so that the pattern of the photomask 17 meets the dot specific opening part; and the opposite surface side from the surface of the transparent substrate 2 where the light shield layer 1 is provided is exposed, the protection layer 19 is removed, and the colored layer is developed to form a pixel at the specific opening part of the light shield layer 1. This process is repeated as many times as specified.

67. 发明专利

JPH11160523A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH11160523A
公开(公告)日：1999-06-18
申请号：JP32843997
申请日：1997-11-28
申请人： HITACHI CHEMICAL CO LTD
发明人： YAMAGUCHI MASATOSHI , TOMONO HIDEKUNI , SUGIMOTO YASUSHI , YOSHIDA TAKESHI
IPC分类号： G03F7/004 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide the manufacture of the color filter which is free of a residue to an adjacent pixel and color mixture. SOLUTION: This color filter has a process for forming a pixel section film 1 of specific BM, etc., on a light-transmissive substrate 2, forming photosensitive resin colored layers 3a-1, 19, and 15, arranging a mask 17 having a specific opening part on the opposite surface of the light-transmissive substrate 2 from the surface where the pixel section film 1 is formed, irradiating the photosensitive resin colored layers 3a-1, 19, and 15 with an active light beam from the reverse surface of the light-transmissive substrate 2 through the mask opening part, and forming specific pixels through development is performed a specific number of times and the γ value of the photosensitive resin is 45 to 90 deg.. Consequently, the color filter is insensitive to light traveling round to below a photomask light shield part owing to the diffraction of the light and the occurrence of a residue to an adjacent pixel can be prevented.

68. 发明专利

JPH11160521A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH11160521A
公开(公告)日：1999-06-18
申请号：JP32843797
申请日：1997-11-28
申请人： HITACHI CHEMICAL CO LTD
发明人： YAMAGUCHI MASATOSHI , TOMONO HIDEKUNI , SUGIMOTO YASUSHI , YOSHIDA TAKESHI
IPC分类号： G03F7/004 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide the manufacture of the color filter which is free of a residue to an adjacent pixel and color mixture. SOLUTION: This manufacture of a color filter has a process for forming a pixel section film 1 of specific BM, etc., on a light-transmissive substrate 2, forming photosensitive resin colored layers 3a-1, 19, and 15, arranging a mask 17 having a specific opening part on the opposite surface of the light- transmissive substrate 2 from the surface where the pixel section film 1 is formed, irradiating the photosensitive resin colored layers 3a-1, 19, and 15 with an active light beam from the reverse surface of the light-transmissive substrate 2 through the mask opening part, and forming specific pixels through development is performed a specific number of times and the γ value of the photosensitive resin is 55 to 90 deg.. Consequently, the color filter is insensitive to light traveling round to below a photomask light shield part owing to the diffraction of the light and the occurrence of a residue to an adjacent pixel can be prevented.

69. 发明专利

JPH11160520A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH11160520A
公开(公告)日：1999-06-18
申请号：JP32843697
申请日：1997-11-28
申请人： HITACHI CHEMICAL CO LTD
发明人： YAMAGUCHI MASATOSHI , TOMONO HIDEKUNI , SUGIMOTO YASUSHI , YOSHIDA TAKESHI
IPC分类号： G03F7/004 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide the manufacture of the color filter which is free of a residue to an adjacent pixel and color mixture. SOLUTION: This manufacture of a color filter has a process for forming a pixel section film 1 of specific BM, etc., on a light-transmissive substrate 2, forming photosensitive resin colored layers 3a-1, 19, and 15, arranging a mask 17 having a specific opening part on the opposite surface of the light- transmissive substrate 2 from the surface where the pixel section film 1 is formed, irradiating the photosensitive resin colored layers 3a-1, 19, and 15 with an active light beam from the reverse surface of the light-transmissive substrate 2 through the mask opening part, and forming specific pixels through development is performed a specific number of times and the γ value of the photosensitive resin is 60 to 90 deg.. Consequently, the color filter is insensitive to light traveling round to below a photomask light shield part owing to the diffraction of the light and the occurrence of a residue to an adjacent pixel can be prevented.

70. 发明专利

JPH11160516A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH11160516A
公开(公告)日：1999-06-18
申请号：JP32843297
申请日：1997-11-28
申请人： HITACHI CHEMICAL CO LTD
发明人： YAMAGUCHI MASATOSHI , TOMONO HIDEKUNI , SUGIMOTO YASUSHI , YOSHIDA TAKESHI
IPC分类号： G03F7/004 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide the manufacture of the color filter which is free of a residue to an adjacent pixel and color mixture. SOLUTION: This is the manufacture of a color filter wherein a process for forming a pixel section film 1 of specific BM, etc., on a light-transmissive substrate 2, forming photosensitive resin colored layers 3a-1, 19, and 15, arranging a mask 17 having a specific opening part on the opposite surface of the light-transmissive substrate 2 from the surface where the pixel section film 1 is formed, irradiating the photosensitive resin colored layers 3a-1, 19, and 15 with an active light beam from the reverse surface of the light-transmissive substrate 2 through the mask opening part, and forming specific pixels through development is performed a specific number of times and the γ value of the photosensitive resin is 80 to 90 deg.. Consequently, the color filter is insensitive to light traveling round to below a photomask light shield part owing to the diffraction of the light and the production of a residue to an adjacent pixel can be prevented.

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