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61. 发明专利

JP2012184436A BLEND OF STYRENIC BLOCK COPOLYMER AND PROPYLENE-α OLEFIN COPOLYMER 有权
标题翻译：苯乙烯共聚物和丙烯-α烯烃共聚物的共混物
公开(公告)号：JP2012184436A
公开(公告)日：2012-09-27
申请号：JP2012120356
申请日：2012-05-28
申请人： Dow Global Technologies Llc , ダウグローバルテクノロジーズエルエルシー
发明人： CHANG ANDY C
IPC分类号： C08L23/14 , C08F4/76 , C08F210/06 , C08L53/00
CPC分类号： C08L23/142 , C08F210/06 , C08L23/14 , C08L23/16 , C08L53/00 , C08L53/02 , C08L53/025 , C08L2314/02 , C08L2666/04 , C08L2666/24 , C08L2666/06 , C08L2666/02 , C08F210/16 , C08F2500/15 , C08F2500/20 , C08F2500/11
摘要： PROBLEM TO BE SOLVED: To provide a thermoplastic elastomer composition which is excellent in elasticity and flexibility, while at the same time being readily processible using typical polyolefin processing equipment.SOLUTION: The present invention relates to the thermoplastic elastomer composition comprising: a propylene-α olefin copolymer (a) having at least 70 wt.% of units derived from propylene, and 10-25 wt.% of units derived from ethylene or a C4-C10 α olefin, the propylene-α olefin copolymer exhibiting a heat of fusion of less than 37 Joules/gram and a melt flow rate of from 0.1 to 100 gram/10 minutes; and a styrenic block copolymer (b), wherein the weight ratio of the propylene-α olefin copolymer (a) to the styrenic block copolymer (b) is from 3:7 to 7:3. The composition exhibits: a 2% secant tensile modulus of less than 20 MPa; elongation at break of at least 900%; tensile strength of at least 5 MPa; and a relative immediate residual strain of less than 2X, wherein X is the residual strain exhibited by component (b) alone after the initial application of the 400% strain.
摘要翻译：待解决的问题：提供弹性和柔性优异的热塑性弹性体组合物，同时使用典型的聚烯烃加工设备容易加工。解决方案：本发明涉及热塑性弹性体组合物，其包含：丙烯-α烯烃共聚物（a），其具有至少70重量％的衍生自丙烯的单元和10-25重量％的衍生自乙烯的单元或C 4 -C 10α-烯烃，丙烯-α烯烃共聚物的熔融热量小于37焦耳/克，熔体流动速率为0.1至100克/ 10分钟; 和苯乙烯类嵌段共聚物（b），其中丙烯-α烯烃共聚物（a）与苯乙烯类嵌段共聚物（b）的重量比为3:7〜7:3。该组合物显示：小于20MPa的2％正割拉伸模量; 断裂伸长率至少为900％; 拉伸强度至少5 MPa; 和小于2X的相对立即残留应变，其中X是初始施用400％菌株后单独组分（b）显示的残余应变。版权所有（C）2012，JPO＆INPIT

62. 发明专利

JP2012158760A Curable flame retardant epoxy composition 有权
标题翻译：可固化阻燃环氧组合物
公开(公告)号：JP2012158760A
公开(公告)日：2012-08-23
申请号：JP2012073543
申请日：2012-03-28
申请人： Dow Global Technologies Llc , Univ Of Minnesota , ダウグローバルテクノロジーズエルエルシー , ユニバーシティオブミネソタ
发明人： BATES FRANK S , DEAN JENNIFER M , PHAM HA Q , VERGHESE NIKHIL E
IPC分类号： C08L63/00 , C08G59/40 , C08J5/24 , C08L33/06 , C08L33/10 , C08L53/00 , C08L59/00 , C08L71/02 , H05K1/03
CPC分类号： C08L59/00 , C08G2650/58 , C08L33/068 , C08L33/10 , C08L63/00 , C08L71/02 , H05K1/0326 , H05K1/0373 , H05K2201/0212 , Y10S428/901 , Y10T428/24994 , Y10T428/2971 , Y10T428/31511 , Y10T428/31515 , Y10T428/31522 , Y10T428/31529 , C08L2666/22 , C08L2666/24
摘要： PROBLEM TO BE SOLVED: To improve fracture toughness (fracture resistance) and flame resistance of a cured product of a curable flame retardant epoxy composition.SOLUTION: A curable flame retardant epoxy resin composition comprises: (a) at least one flame retardant epoxy resin; (b) at least one amphiphilic block copolymer; and (c) a curing agent. Such components are present in the curable composition in the appropriate amounts and ratios such that, upon curing, the block copolymer self-assembles into a nano structure morphology, such as a worm-like micelle morphology. The resulting cured product made from the composition has a remarkably increased high fracture resistance; and allows the use of flame retardant epoxies in applications where fracture resistance is an issue.
摘要翻译：要解决的问题：提高可固化阻燃环氧组合物的固化产物的断裂韧性（耐断裂性）和阻燃性。解决方案：可固化阻燃环氧树脂组合物包含：（a）至少一种阻燃环氧树脂; （b）至少一种两亲嵌段共聚物; 和（c）固化剂。这些组分以适当的量和比例存在于可固化组合物中，使得在固化时，嵌段共聚物自组装成纳米结构形态，例如蠕虫状胶束形态。所得到的由该组合物制成的固化物具有显着提高的高抗断裂性; 并且在耐断裂性问题的应用中允许使用阻燃环氧树脂。版权所有（C）2012，JPO＆INPIT

63. 发明专利

JP2012149252A Polymer, photoresist composition, and method of forming photolithographic pattern 有权
标题翻译：聚合物，光电组合物和形成光刻图案的方法
公开(公告)号：JP2012149252A
公开(公告)日：2012-08-09
申请号：JP2012000210
申请日：2012-01-04
申请人： Dow Global Technologies Llc , Rohm & Haas Electronic Materials Llc , ダウグローバルテクノロジーズエルエルシー , ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー.
发明人： BAE YOUNG CHEOL , THOMAS H PETERSON , LIU YI , PARK JONG KEUN , LEE SEUNG HYUN , CARDOLACCIA THOMAS
IPC分类号： C08F220/28 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/11 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： PROBLEM TO BE SOLVED: To provide an improved polymer and photoresist composition in which the formation of a fine pattern in an electronic device production is enabled, and at least one of problems (separately described) relating to a newest technology can be avoided or remarkably improved, and to develop a photolithographic method for negative tone development.SOLUTION: The polymer includes a unit comprising a particular acetal moiety and a unit comprising a lactone moiety. The photoresist composition containing such a polymer, a substrate coated with the photoresist composition and the method of forming a photolithographic pattern are disclosed. The polymer, composition, method and coated substrate find particular applicability in the manufacture of a semiconductor device.
摘要翻译：要解决的问题：提供改进的聚合物和光致抗蚀剂组合物，其中可以在电子设备生产中形成精细图案，并且可以避免与最新技术相关的问题（单独描述）中的至少一个或显着改进，并开发用于负色调发展的光刻方法。解决方案：聚合物包括包含特定缩醛部分的单元和包含内酯部分的单元。公开了含有这种聚合物的光致抗蚀剂组合物，涂有光致抗蚀剂组合物的基材和形成光刻图案的方法。聚合物，组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。版权所有（C）2012，JPO＆INPIT

64. 发明专利

JP2012140620A Polymerizable photoacid generator 有权
标题翻译：聚合光电发生器
公开(公告)号：JP2012140620A
公开(公告)日：2012-07-26
申请号：JP2011287304
申请日：2011-12-28
申请人： Dow Global Technologies Llc , Rohm & Haas Electronic Materials Llc , ダウグローバルテクノロジーズエルエルシー , ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー.
发明人： THACKERAY JAMES W , COLEY SUZANNE M , JAIN VIPUL , ONGAYI OWENDI , CAMERON JAMES F , LABEAUME PAUL J , MADKOUR AHMAD E
IPC分类号： C08F220/12 , C07C25/18 , C07C309/12 , C07C309/49 , C07C381/12 , C09K3/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , C07C309/12 , C07C309/42 , C07C381/12 , C07D333/76 , C08F220/38 , G03F7/0046 , G03F7/0397 , G03F7/20 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： PROBLEM TO BE SOLVED: To provide novel photoacid generator compounds polymerizable into a photoresist polymer, and to provide a photoresist composition which includes the polymerizable photoacid generator.SOLUTION: A compound has formula (I) (wherein Q is a halogenated or non-halogenated 2-30C olefin-containing group; A is a fluorine-substituted 1-30C alkylene group, a fluorine-substituted 3-30C cycloalkylene group, a fluorine-substituted 6-30C arylene group, or a fluorine-substituted 7-30C alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and Gis a specific cation).
摘要翻译：要解决的问题：提供可聚合到光致抗蚀剂聚合物中的新型光酸产生剂化合物，并提供包含可聚合光致酸产生剂的光致抗蚀剂组合物。解决方案：化合物具有式（I）（其中Q是含卤素或非卤代的含2-30C烯烃的基团; A是氟取代的1-30C亚烷基，氟取代的3-30C亚环烷基基团，氟取代的6-30C亚芳基或氟取代的7-30C亚烷基亚芳基，Z是包含磺酸酯，磺酰胺或磺酰亚胺的阴离子基团， / SP>是一个特定的阳离子）。版权所有（C）2012，JPO＆INPIT

65. 发明专利

JP2012140426A Method of preparing photoacid-generating monomer 有权
标题翻译：制备光生代单体的方法
公开(公告)号：JP2012140426A
公开(公告)日：2012-07-26
申请号：JP2011287313
申请日：2011-12-28
申请人： Dow Global Technologies Llc , Rohm & Haas Electronic Materials Llc , ダウグローバルテクノロジーズエルエルシー , ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー.
发明人： COLEY SUZANNE M , TIMMERS FRANCIS J , DAVID R WILSON
IPC分类号： C07C303/32 , C07C309/12 , C07C381/12 , C08F12/30 , C08F20/38
CPC分类号： G03F7/0045 , C07C303/32 , C07C381/12 , C08F220/38 , C08F228/00 , G03F7/0046 , G03F7/0382 , G03F7/0392 , C07C309/12
摘要： PROBLEM TO BE SOLVED: To provide a method of preparing a polymerizable photoacid-generating monomer in a short step.SOLUTION: A cation salt obtained by reacting a sultone of formula (I) (wherein each R is independently F, 1C-10C alkyl, fluoro-substituted 1C-10C alkyl, 1C-10C cycloalkyl or fluoro-substituted 1C-10C cycloalkyl with the proviso that at least one R is F; n is an integer of 0-10 and m is an integer of 1 to 4+2n) with a polymerizable group-containing nucleophilic reagent is substituted with a second cation.
摘要翻译：要解决的问题：提供一种在短时间内制备可聚合光致酸性单体的方法。解决方案：通过使式（I）的磺内酯（其中每个R独立地为F，1C-10C烷基，氟取代的1C-10C烷基，1C-10C环烷基或氟取代的1C-10C 环烷基，条件是至少一个R为F; n为0-10的整数，m为1至4 + 2n的整数）与含可聚合基团的亲核试剂取代为第二阳离子。版权所有（C）2012，JPO＆INPIT

66. 发明专利

JP2012140403A Synergistic combination of glyphosate compound and tbz 有权
标题翻译：谷氨酸盐化合物和TBZ的协同组合
公开(公告)号：JP2012140403A
公开(公告)日：2012-07-26
申请号：JP2011247062
申请日：2011-11-11
申请人： Dow Global Technologies Llc , ダウグローバルテクノロジーズエルエルシー
发明人： SIANAWATI EMERENTIANA , BALIJEPALLI SUDHAKAR
IPC分类号： A01N57/20 , A01N43/78 , A01P3/00 , A01P13/00
CPC分类号： A01N57/20 , A01N43/78 , A01N59/16 , A01N2300/00
摘要： PROBLEM TO BE SOLVED: To provide additional combinations of antimicrobial compounds with relatively low impact on health and/or the environment.SOLUTION: A synergistic antimicrobial composition containing a glyphosate compound and thiabendazole is provided. Preferably, the glyphosate compound contains zinc glyphosate. Further, the preferred weight ratio of TBZ to glyphosate compound is 0.1:1 to 10:1.
摘要翻译：要解决的问题：提供对健康和/或环境影响较小的抗微生物化合物的其他组合。提供了含有草甘膦化合物和噻菌灵的协同抗菌组合物。优选地，草甘膦化合物含有草甘膦锌。此外，TBZ与草甘膦化合物的优选重量比为0.1:1至10:1。版权所有（C）2012，JPO＆INPIT

67. 发明专利

JP2012136707A Dispersion of preformed polymer in polyol 有权
标题翻译：多元醇中预聚合聚合物的分散
公开(公告)号：JP2012136707A
公开(公告)日：2012-07-19
申请号：JP2012056283
申请日：2012-03-13
申请人： Dow Global Technologies Llc , ダウグローバルテクノロジーズエルエルシー
发明人： LUNDGARD RICHARD A , JAKUBOWSKI JAMES J , PATE JAMES E III , KIRCHHOFF ROBERT A , PRIESTER RALPH D JR , LIDY WERNER A
IPC分类号： C08J3/02 , C08J3/20 , C08F8/30 , C08G18/08 , C08G18/48 , C08G101/00 , C08J3/09 , C08J9/00 , C08L23/04 , C08L23/10 , C08L23/26 , C08L25/00 , C08L57/00 , C08L75/04
CPC分类号： C08J9/0061 , C08G18/0876 , C08G2101/00 , C08J3/09 , C08J2375/04 , C08J2423/00 , C08L75/04 , C08L31/00 , C08L23/00
摘要： PROBLEM TO BE SOLVED: To provide a process for preparing a stable dispersion of a preformed polymer in a polyol in a single mixer.SOLUTION: The preformed polymer is mixed under sufficient heat and shear to reduce its particle size to a desired size in the presence of a polyol. The stable dispersions of polymers in polyols and polyurethane formulations containing the stable dispersions made by the process are provided.
摘要翻译：要解决的问题：提供在单一混合器中制备预聚物在多元醇中的稳定分散体的方法。解决方案：将预成型聚合物在足够的热和剪切下混合，以在多元醇存在下将其粒度降低至所需尺寸。提供聚合物在多元醇中的稳定分散体和含有由该方法制备的稳定分散体的聚氨酯制剂。版权所有（C）2012，JPO＆INPIT

68. 发明专利

JP2012136508A Low voc polyamine 有权
标题翻译：低VOC聚胺
公开(公告)号：JP2012136508A
公开(公告)日：2012-07-19
申请号：JP2011254494
申请日：2011-11-22
申请人： Angus Chemical Co , Dow Global Technologies Llc , アンガスケミカルカンパニー , ダウグローバルテクノロジーズエルエルシー
发明人： IAN A TOMLINSON , ASGHAR A PEERA , GLENN NELSON ROBINSON
IPC分类号： C07C215/18 , C07C213/02 , C07D295/08 , C07D295/12 , C09D7/12 , C09D201/00
CPC分类号： C07D295/084 , C07C215/14
摘要： PROBLEM TO BE SOLVED: To provide a new polyamine compound useful for pH adjustment in a coating composition and other uses.SOLUTION: The compound is represented by formula (I) (wherein Rs are each methyl or ethyl; Rs are each hydrogen, methyl, CHC(NH)(R)(CHOH) or Rs are mutually bonded to form difunctional 2-6C alkyl; X is a difunctional group selected from the group consisting of 2-20C alkyl, 5-20C cycloalkyl, 6-10C aryl, 8-20C arylalkyl, 4-20C heteroalkyl and 10-20C arylheteroalkyl).
摘要翻译：要解决的问题：提供用于涂料组合物和其它用途中的pH调节的新的多胺化合物。解决方案：化合物由式（I）表示（其中R 1各自为甲基或乙基; R 2 2 （NH 2 ）（R 1 ）（CH 2 OH）或R 2 相互键合形成双官能2-6C烷基; X 是选自2-20C烷基，5-20C环烷基，6-10C芳基，8-20C芳烷基，4-20C杂烷基和10-20C芳基杂烷基的二官能团。版权所有（C）2012，JPO＆INPIT

69. 发明专利

JP2012106990A Synergistic antimicrobial composition of 1,2-benzisothiazolin-3-one and tris(hydroxymethyl)nitromethane 有权
标题翻译： 1,2-二苯并三唑-3-酮和三（二羟基甲基）硝基酮的协同抗微生物组合物
公开(公告)号：JP2012106990A
公开(公告)日：2012-06-07
申请号：JP2011222431
申请日：2011-10-07
申请人： Dow Global Technologies Llc , ダウグローバルテクノロジーズエルエルシー
发明人： YIN BEI
IPC分类号： A01N43/80 , A01N25/02 , A01N33/18 , A01P3/00
CPC分类号： A01N43/80 , A01N33/20 , A01N2300/00
摘要： PROBLEM TO BE SOLVED: To provide a method for controlling microorganism in oil and gas field injection, produced fluids, fracturing fluids and functional fluids, oil and gas wells, oil and gas operation, separation, storage and transportation systems, and various systems of industrial water.SOLUTION: There is provided a synergistic antimicrobial composition containing 1,2-benzisothiazolin-3-one and tris(hydroxymethyl)nitromethane.

70. 发明专利

JP2012103679A Photoresist composition and method for forming photolithographic pattern 审中-公开
标题翻译：光刻胶组合物和形成光刻图案的方法
公开(公告)号：JP2012103679A
公开(公告)日：2012-05-31
申请号：JP2011195533
申请日：2011-09-08
申请人： Dow Global Technologies Llc , Rohm & Haas Electronic Materials Llc , ダウグローバルテクノロジーズエルエルシー , ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー.
发明人： YANG CHOL-BAE , THOMAS CARDOLACCIA , SUN JIBIN , ARRIOLA DANIEL J , FRAZIER KEVIN A
IPC分类号： G03F7/038 , C08F20/26 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041 , G03F7/325
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition useful in forming a photolithographic pattern by a negative tone development process, a method for forming a photolithographic pattern, and a substrate coated with the photoresist composition.SOLUTION: The present invention relates to a photoresist composition and a photo lithography method allowing formation of a fine pattern by using a negative tone development process. The photoresist composition contains a copolymer formed from a monomer a part of which contains a certain acetal moiety. The preferred composition and method of the present invention provide reduction of thickness loss in photo lithography treatment and improvement of a pattern collapse margin. For the composition, the method and a coated substrate, special applicability has been found in manufacturing a semiconductor device.
摘要翻译：要解决的问题：提供一种用于通过负色调显影方法形成光刻图案的光致抗蚀剂组合物，形成光刻图案的方法和涂覆有光致抗蚀剂组合物的基材。解决方案：本发明涉及通过使用负色调显影处理形成精细图案的光致抗蚀剂组合物和光刻方法。光致抗蚀剂组合物含有由单体形成的共聚物，其一部分含有某一缩醛部分。本发明的优选组合物和方法提供减小光刻处理中的厚度损失并改善图案塌陷边缘。对于组合物，方法和涂覆的基材，在制造半导体器件中已经发现了特殊的适用性。版权所有（C）2012，JPO＆INPIT

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