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41. 发明专利

JP2000272932A AMORPHOUS SILICA MOLDED PRODUCT AND ITS PRODUCTION 失效
公开(公告)号：JP2000272932A
公开(公告)日：2000-10-03
申请号：JP7934399
申请日：1999-03-24
申请人： MITSUBISHI CHEM CORP
发明人： NOGAMI MASAYUKI , TSURITA YASUSHI
IPC分类号： C03B8/02 , C01B33/152 , C03B19/06 , C03C3/097
摘要： PROBLEM TO BE SOLVED: To produce an amorphous silica molded product having high proton conductance and chemical durability and sparingly lowering membrane strength, etc., even at a higher temperature by including a specific amount of phosphorus pentoxide and by specifying the conductance at a specific temperature so as to have a specific value or a larger one. SOLUTION: This molded product has a composition comprising >=10 mol% phosphorus pentoxide (preferably 10-50 mol% phosphorus pentoxide and 90-50 mol% silica), and has >=10 mS/cm conductance at 50 deg.C and preferably >=10 m2/g specific surface area. The molded product is preferably produced by mixing a silica raw material (e.g. tetramethoxysilane) with a phosphorus raw material (e.g. trimethoxyphosphoric acid), by adding water, by leaving the mixture as it is at room temperature to cause gelation, by heating it up to 100-1,000 deg.C. The form of the molded product is membrane-like, film-like, sheet-like or the like and the thickness is 0.01-20 mm. The molded product has high proton conductance at a temperature ranging from room temperature to 200 deg.C and is stable even at >=100 deg.C.

42. 发明专利

JP2000143228A HIGH OIL ABSORPTION SILICA GEL AND ITS PRODUCTION 失效
公开(公告)号：JP2000143228A
公开(公告)日：2000-05-23
申请号：JP31240098
申请日：1998-11-02
申请人： DOKAI CHEMICAL IND CO LTD , ASAHI GLASS CO LTD
发明人： MORI HIROO , KUSAKA MAKOTO , INOUE MAKI
IPC分类号： C01B33/14 , C01B33/152
摘要： PROBLEM TO BE SOLVED: To suppress the deterioration of characteristics caused by re-drying after dipping in water by emulsifying an alkali silicate aq. solution containing the specific quantity of >=1 kinds of anions in an organic solvent and gelating by carbon dioxide to give high specific surface area. SOLUTION: Equal to or above one kind of alkali metal salts or an alkaline earth metal salts are added into the alkali silicate aq. solution of sodium silicate or the like containing 3-20 wt.% silicic acid expressed in terms of SiO2 to incorporate >=1 kinds of chloride ion, sulfuric ion, nitric ion, fluoride ion, the content of which is controlled to 0.1-0.5 equivalent per 1 mol SiO2. The produced high oil absorption silica gel has 1-100 nm fine pore diameter 1.2-3.5 ml fine pore volume, 50-1000 m2/g specific surface area and >=300 ml/100 g oil absorption and when 1 wt.% high oil absorption silica gel is further dispersed in water having

43. 发明专利

JP3016520B2 失效
公开(公告)号：JP3016520B2
公开(公告)日：2000-03-06
申请号：JP2918891
申请日：1991-01-31
IPC分类号： C01B33/152 , C03B8/02 , C03B19/12 , C08G77/04 , C08G77/06 , C08L83/02 , C08L83/04 , C09K9/00 , G02F1/35 , G02F1/355 , G02F1/361

44. 发明专利

JP3005678B2 失效
公开(公告)号：JP3005678B2
公开(公告)日：2000-01-31
申请号：JP29101598
申请日：1998-10-13
IPC分类号： B01J35/10 , C01B33/12 , C01B33/152

45. 发明专利

JPH11268923A PRODUCTION OF SILICA GEL, SYNTHETIC QUARTZ GLASS POWDER AND QUARTZ GLASS MOLDING 失效
公开(公告)号：JPH11268923A
公开(公告)日：1999-10-05
申请号：JP11456098
申请日：1998-04-24
申请人： MITSUBISHI CHEM CORP
发明人： KINDA YASUSHI , SHIMA KOJI
IPC分类号： C03B8/02 , C01B33/152 , C01B33/158 , C03B20/00 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide a method for industrially, readily and stably producing high-purity silica gel, synthetic quartz glass powder and quartz glass molding. SOLUTION: This method for producing silica gel comprises treating silica gel obtained by subjecting an almoxysilane to hydrolysis and gelling by a basic solution. This method for producing synthetic quartz glass powder comprises drying and baking silica gel obtained by the above method. This method for producing quartz glass molding comprises melt-forming synthetic quartz glass powder obtained by the above method.

46. 发明专利

JPH10297914A PRODUCTION OF BOTH SILICA GEL PARTICLE AND SYNTHETIC QUALTZ 失效
公开(公告)号：JPH10297914A
公开(公告)日：1998-11-10
申请号：JP10583997
申请日：1997-04-23
申请人： MITSUBISHI CHEM CORP
发明人： YAMAGUCHI YUKIO , YOSHIE KENICHI , SAIDA SOICHIRO
IPC分类号： B01J2/04 , C01B33/152 , C01B33/16 , C03B8/02 , C03B20/00
摘要： PROBLEM TO BE SOLVED: To produce gel particles remaining no carbon after baking, containing no impurity mixed therein and having a particle diameter within a desired range by optimizing the mixing composition according to the pH of water when mixing the water with a silicon alkoxide and spraying the resultant liquid into an atmosphere at a specified temperature when spray-drying the liquid. SOLUTION: A silicon alkoxide as a raw material is preferably a hydrolyzable tetrafunctional alkoxysilane, e.g. tetramethoxysilane or tetraethoxysilane because the amount of the residual carbon can be reduced. Hydrolytic reaction is performed in a mixed system of water and the alkoxide and the preferable molar ratio of the silicon alkoxide to water varies with pH of water. The molar ratio of the silicon alkoxide to water is (20:1) to (40:1) and pH is controlled by using hydrochloric acid, acetic acid, etc., when the pH is =7. The atmospheric temperature for spraying is set at 50-350 deg.C and the sol liquid dissolved in an alcohol is sprayed thereinto.

47. 发明专利

JPH101319A PRODUCTION OF GLASS 失效
公开(公告)号：JPH101319A
公开(公告)日：1998-01-06
申请号：JP14934596
申请日：1996-06-11
申请人： OLYMPUS OPTICAL CO
发明人： FUKUOKA TAKANAO
IPC分类号： C01B33/152 , C03B8/02 , C03B19/12 , C03C1/00
摘要： PROBLEM TO BE SOLVED: To obtain glass free from striated defect by a sol-gel method by uniformly holding colloid particle density in a sol, in the production of glass by the sol-gal method. SOLUTION: In the production method of glass by the sol-gel method, while the colloid particle density in the sol is uniformly maintained in a gelatin process of the sol, the sol is gelated. When the sol is poured into a gelating container at a surrounding temp., the temp. of the sol poured into the gelating container is different from the temp. of the gelating container. In order to equalize those temps. the temp. of the sol or the container is adjusted to be equal, Then the container in which the sol is poured in placed at the equal temp. thus to allow the sol to gelate. The temps, of the sol and the gelating container are preferably equal but is the temp. difference between the sol and the gelating container is in the range of not cauing fluidity due to the temp. difference that is, temp. difference between the sol and the gelating container of within 7 deg.C, it is acceptable and any problem does not occur.

48. 发明专利

JP2628594B2 失效
公开(公告)号：JP2628594B2
公开(公告)日：1997-07-09
申请号：JP5568894
申请日：1994-03-25
IPC分类号： C01B33/152 , C03B8/02 , C03C1/00

49. 发明专利

JPH09142828A PRODUCTION OF HIGHLY PURE SANDY SYNTHETIC SILICA, AND PRODUCTION OF HIGHLY PURE SYNTHETIC QUARTZ GLASS MOLDED PRODUCT 失效
公开(公告)号：JPH09142828A
公开(公告)日：1997-06-03
申请号：JP30921595
申请日：1995-11-28
申请人： MITSUBISHI CHEM CORP
发明人： TAKAZAWA AKIHIRO , OISHI SHOJI , ISHIKAWA FUMIYA , TANABE YASUO
IPC分类号： C03B8/02 , C01B33/152 , C01B33/158 , C03B19/10 , C03B19/12 , C03B20/00
摘要： PROBLEM TO BE SOLVED: To produce highly pure sandy synthetic silica having the same or higher purity as that produced by an oxyhydrogen flame medium method. SOLUTION: This method for producing the highly pure sandy synthetic silica by a liquid phase reaction comprises producing a gel from the solution or dispersion of a raw material, drying the gel and calcining the dried gel. Therein, the dried gel is fed into the calcination process followed to the drying process through a flexible cylinder having a binding or unbinding means.

50. 发明专利

JPH09118514A PRODUCTION OF SYNTHETIC QUARTZ GLASS POWDER 失效
公开(公告)号：JPH09118514A
公开(公告)日：1997-05-06
申请号：JP28072895
申请日：1995-10-27
申请人： MITSUBISHI CHEM CORP
发明人： KATSUKI TAKANOBU , SUGURO YOSHIO , OISHI SHOJI
IPC分类号： C01B33/152 , C01B33/18
摘要： PROBLEM TO BE SOLVED: To provide a synthetic quartz glass suitable for a raw material of a high purity quartz glass product. SOLUTION: In the production of the synthetic quartz glass powder by firing the powder of a silica gel obtained by hydrolyzing an alkoxysilane, the contents in a reaction vessel are started to be stirred after one of an alkoxysilane or water is fed and >=90wt.% of the other to be fed is finished to be fed within 15min thereafter. The reaction vessel has preferably a physical stirring means such as a ribbon type stirring vane in the inside part.

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