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41. 发明专利

JPH0555523B2 失效
公开(公告)号：JPH0555523B2
公开(公告)日：1993-08-17
申请号：JP15753084
申请日：1984-07-30
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , SHIMOMURA TADAO , KOBAYASHI HIROYA
IPC分类号： C08F20/00 , C08F20/38 , C08F220/06 , C08F220/38 , C08F220/40

42. 发明专利

JPH01272676A COMPOSITION FOR PHOTOPOLYMERIZABLE PRESSURE-SENSITIVE ADHESIVE AND PRESSURE-SENSITIVE ADHERENT ARTICLE USING THE SAME COMPOSITION 失效
公开(公告)号：JPH01272676A
公开(公告)日：1989-10-31
申请号：JP10124488
申请日：1988-04-26
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , BABA AKIKAZU , FURUKAWA SHINICHI , ARITA YOSHIHIRO , IZUMIBAYASHI MASUJI
IPC分类号： C09J7/02 , C08F2/44 , C08F2/46 , C08F2/48 , C08F20/00 , C08F20/14 , C09J4/02
摘要： PURPOSE:To obtain the subject composition supplying a film containing no photopolymerization initiator, curing in a short time by irradiation of active energy ray, having no color and excellent weatherability, by mixing specific (co)polymer and photopolymerizable monomer in a specific ratio. CONSTITUTION:(B) A photopolymerizable monomer (preferably 100-1000 molecular weight, 8-12 solubility parameter, >=100 deg.C boiling point) is added preferably to water-base dispersion of (A) a (co)polymer obtained by (co)polymerization of polymerizable monomer component containing >=10 wt.% methacrylate-base monomer and/or methyl acrylate having >=10 average molecular weight,

43. 发明专利

JPS63270702A PHOTOCURABLE COMPOSITION 失效
公开(公告)号：JPS63270702A
公开(公告)日：1988-11-08
申请号：JP31511587
申请日：1987-12-15
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , ARITA YOSHIHIRO , YOSHIDA MASATOSHI , IZUMIBAYASHI MASUJI
IPC分类号： C08F2/44 , C08F2/48 , C09D4/00 , C09D5/00 , C09J133/00 , C09J151/00
摘要： PURPOSE:To provide an inexpensive photocurable composition which does not contain a photopolymerization initiator and gives cured film excellent in weathering resistance, etc., by blending a polymer comprising a methacrylate monomer component and/or methyl acrylate component above a certain proportion with a photopolymerizable monomer in a predetermined weight ratio. CONSTITUTION:A polymerizable monomer component comprising a methacrylate monomer and/or methyl acrylate in a rate of 10wt.% or more based on the polymerizable monomer component is (co)polymerized to produce a (co)polymer having an average molecular weight of 10,000 or over. Then, the (co)polymer and a photopolymerizable monomer (e.g., diethylene glycol diacrylate) are mixed in a weight ratio of 40-98wt.%:60-2wt.% in terms of solid content to obtain the aimed photocurable composition. This photocurable composition, though being free from a photopolymerization initiator, can be cured to form film by irradiation with, for example, ultraviolet light.

44. 发明专利

JPS63105984A ANTICORROSIVE FOR METAL 失效
公开(公告)号：JPS63105984A
公开(公告)日：1988-05-11
申请号：JP24952486
申请日：1986-10-22
申请人： NIPPON CATALYTIC CHEM IND
发明人： KOBAYASHI HIROYA , TSUBAKIMOTO TSUNEO , MIYAKE KOJI
IPC分类号： C23F11/173
摘要： PURPOSE:To improve the biodegradation resistance, the corrosion preventing performance in a highly concd. state and the compatibility with chemicals such as multivalent metallic salts by copolymerizing a mixture of acrylic ester, unsatd. sulfonic acid and unsatd. carboxylic acid monomers each represented by a specified general formula in a specified mixing ratio. CONSTITUTION:A (meth)acrylic ester monomer (A) represented by formula I is mixed with an unsatd. sulfonic acid monomer (B) represented by formula II, an unsatd. carboxylic acid monomer (C) represented by formula III, and other polymerizable monomer (D) in (0.2-40):(10-85):(10-85):(0-40) molar ratio of A:B:C:D. In the formulae I-III, each of R and R is H or CH3, each of R and R is 2-4C alkylene, R is H, 1-5C alkyl, phenyl, alkylphenyl having one to three 1-9C alkyl groups as substituents or benzyl, n=1-100 on the average, Z is O or NH, each of M and M is H, an alkali metal, an alkaline earth metal, NH4 or an amine salt, R is H, CH3 or COOM and R is H, CH3 or CH2COOM . The monomer mixture is copolymerized and the resulting water soluble copolymer is added to an anticorrosive.

45. 发明专利

JPS62266140A SALT TOLERANT WATER ABSORBENT 失效
公开(公告)号：JPS62266140A
公开(公告)日：1987-11-18
申请号：JP10851586
申请日：1986-05-14
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , SHIMOMURA TADAO , KOBAYASHI HIROYA , OKAMURA KAZUHIRO
IPC分类号： B01J20/26 , A61F13/49 , A61F13/53 , C08F20/10 , C08F20/26 , C08F20/52 , C08F220/12 , C08F220/18 , C08F220/30 , C08F220/58 , C08F290/00 , C08F299/02
摘要： PURPOSE:To prevent the lowering in the absorbing capacity of a salt tolerant water absorbent, by polymerizing a mixture consisting of a specific methacrylic ester monomer, a sulfonic acid group-containing unsaturated monomer and other polymerizable monomer in a specific ratio in the presence of a crosslinking agent. CONSTITUTION:A monomer mixture of 3-95mol% of a methacrylic ester monomer represented by formula (wherein R is hydrogen or a methyl group, X is a 2-4C alkylene group, Y is hydrogen, a 1-5C alkyl group, a phenyl group or an alkylphenyl group having 1-3 alkyl groups each having 1-9 carbon atoms as substituents and n is a number of 1-100 on the average), 5-97mol% of a sulfonic acid group-containing unsaturated monomer and 0-50mol% of other polymerizable monomer is prepared and polymerized in the presence of a crosslinking agent to prepare a crosslinked polymer used as a salt tolerant water absorbent.

46. 发明专利

JPS62149336A WATER ABSORBENT 失效
公开(公告)号：JPS62149336A
公开(公告)日：1987-07-03
申请号：JP29081985
申请日：1985-12-25
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , SHIMOMURA TADAO , KOBAYASHI HIROYA
IPC分类号： B01J20/26 , C08F8/00
摘要： PURPOSE:To enhance the uniformly of the titled water absorbent in a thermoplastic resin by mixing the epoxy compd. having a >=5 C hydrophobic group into the water-absorptive resin powder having a carboxyl, allowing the mixture to react, and making the surface of the powder hydrophobic. CONSTITUTION:The epoxy compd. having a >=5 C hydrophobic group or the liq. mixture of the above-mentioned epoxy compd. and an org. solvent is sprayed or dripped on the water-absorptive powder having a carboxyl, and both materials are mixed. The mixture is heated at about 50-250 deg.C in a dryer or a heating furnace to make the surface of the water-absorptive powder hydrophobic, and the water absorbent is obtained. A cross-linked copolymer of a monomer contg. a sulfonic group-methacrylic acid-an alkaline metal methacrylate is used as the water-absorptive resin, and 1,2-epoxy heptane, 1,2-epoxy octane, etc., can be used as the epoxy compd. having a >=5 C hydrophobic group.

47. 发明专利

JPS62138427A RADIOSENSITIZER 失效
公开(公告)号：JPS62138427A
公开(公告)日：1987-06-22
申请号：JP27797585
申请日：1985-12-12
申请人： ADEKA ARGUS CHEMICAL CO LTD , NIPPON CATALYTIC CHEM IND , UNIV KYOTO
发明人： KAGITANI TSUTOMU , MINAGAWA MOTONOBU , NAKAHARA YUTAKA , KIMURA RIYOUJI , TSUBAKIMOTO TSUNEO , OSHIUMI RYOICHI , SAKANO KOICHI
IPC分类号： C07D249/14 , A61K31/14 , A61K31/41 , A61P35/00 , A61P43/00
摘要： PURPOSE:A radiosensitizer, containing a specific 3-nitro-1,2,4-triazole compound as an active ingredient, capable of remarkably increasing the sensitivity of hypoxic cells to radiation and increasing the radiotherapeutic effect with low toxicity. CONSTITUTION:A radiosensitizer containing a 3-nitro-1,2,4-triazole compound expressed by the formula {X is halogen, group expressed by the formula -CO-R1 [R1 is a group of -OR2 or -N(R3)R4]; R2 and R3 are H, alkyl, etc.; R4 is a group of R3, etc.; R is H, alkyl, hydroxyalkyl, etc.}. Examples of a specific compound include 2-(3'-nitro-5'-bromo-1',2',4'-triazol-1'-yl)acetic acid ethanolamide, etc. The compound expressed by the formula is capable of promoting inactivation of intractable hypoxic cells present in malignant tumor by irradiation.

48. 发明专利

JPS62127349A LOW-SHRINKAGE THERMOSETTING RESIN COMPOSITION 失效
公开(公告)号：JPS62127349A
公开(公告)日：1987-06-09
申请号：JP26498785
申请日：1985-11-27
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , SANO SADANORI , MINAMI KENJI , URASHIMA NOBUAKI
IPC分类号： C08K9/08 , C08L59/00 , C08L61/20 , C08L101/00
摘要： PURPOSE:To provide the titled compsn. which has excellent shelf stability and low shrinkage and gives cured moldings having excellent surface smoothness and gloss, by blending fine particles of a specified crosslinked polymer with a thermosetting resin. CONSTITUTION:100pts.wt. mixture of a polymerizable vinyl monomer and a crosslinking monomer having at least two polymerizable double bonds is suspension-polymerized in the presence of 0.1-15pts.wt. PVA in an aq. medium at a solid concn. of 10-70wt% to obtain a suspension (a). Separately, 1mol of an amino compd. is reacted with 1.2-6.0mol of formaldehyde at a pH of 5-12 and at 30-150 deg.C to obtain an amino compd./formaldehyde precondensate (b). The component (a) is mixed with 1-100pts.wt. component (b) and an acid catalyst (c). The mixture is heat-treated at 40-100 deg.C for 1-5hr and fine particles of the resulting crosslinked polymer (A) are separated from the suspension and dried. 1-40wt% component A is blended with a radical-polymerizable thermosetting resin (B) composed of a compd. having a polymerizable unsaturated group and a MW of 200 or above and a polymerizable monomer.

49. 发明专利

JPS62120354A PRODUCTION OF HIGH-PURITY SULFOALKYL (METH)ACRYLATE SALT 失效
公开(公告)号：JPS62120354A
公开(公告)日：1987-06-01
申请号：JP25773685
申请日：1985-11-19
申请人： NIPPON CATALYTIC CHEM IND
发明人： TSUBAKIMOTO TSUNEO , SHIMOMURA TADAO , KOBAYASHI HIROYA
IPC分类号： C08F20/38 , B01J31/00 , B01J31/02 , C07B61/00 , C07C67/00 , C07C301/00 , C07C303/22 , C07C303/32 , C07C309/12
摘要： PURPOSE:The esterification reaction between a hydroxyalkanesulfonate salt and (meth)acrylic acid is carried out using a hydroxyalkanesulfonic acid as a catalyst to produce the titled compound of high purity in no need of purification of the product. CONSTITUTION:(A) A hydroxyalkanesulfonate of formula I (R -R are H, methyl, ethyl; X is 1-3 valent metal, ammonium, substituted ammonium) is esterified with (B) (meth)acrylic acid in the presence of a catalyst of hydroxyalkanesulfonic acid of formula II, in an inert organic solvent of xylene to give the objective compound of formula III (R is H, methyl). The catalyst of formula II is an acid form of the compound of formula I, prepared by ion- exchange reaction, and the amount is 3-30mol% based on the compound of formula I.

50. 发明专利

JPS61167616A RADIATION-SENSITIZING AGENT 失效
公开(公告)号：JPS61167616A
公开(公告)日：1986-07-29
申请号：JP851485
申请日：1985-01-22
申请人： ADEKA ARGUS CHEMICAL CO LTD , NIPPON CATALYTIC CHEM IND
发明人： KAGITANI TSUTOMU , MINAGAWA MOTONOBU , NAKAHARA YUTAKA , KIMURA RIYOUJI , TSUBAKIMOTO TSUNEO , OSHIUMI RYOICHI , SAKANO KOICHI
IPC分类号： A61K31/425 , A61K31/445 , A61K31/495 , A61K31/535 , A61P35/00 , A61P43/00 , C07D277/58
摘要： PURPOSE:To provide the titled sensitizer containing a nitrothiazole compound as an active component. CONSTITUTION:A radiation-sensitizing agent effective to promote the inactivation of refractory hypoxic cel existing in malignant tumor is produced by using the compound of formula {R is halogen or -N(R1)-R2 [R1 is H, alkyl, hydroxyalkyl, alkyl having ether bond, etc.; R2 is R1, acryl or -R3-N(R4)-R5 (R3 is alkylene; R4 is R1; R5 is R1 or acyl); R1 and R2 or R4 and R5 may together form an alkylene, etc.]} as an active component. Dose of the compound is 20-3,000mg for oral drug, 0.5-500mg for injection and 20-200mg for suppository.

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