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41. 发明专利

JP2008133379A Zirconium oxide-containing resin composition and molded form thereof 有权
标题翻译：含氧化锆含树脂组合物及其成型体
公开(公告)号：JP2008133379A
公开(公告)日：2008-06-12
申请号：JP2006321105
申请日：2006-11-29
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： YAMADA MASAHIRO , FUJIKI TAKESHI , MURASE HIROAKI , KAWASAKI SHINICHI , FUKUI TOSHIMI , YAMAKI SAORI
IPC分类号： C08L33/06 , C08F2/44 , C08K3/22
摘要： PROBLEM TO BE SOLVED: To provide a resin composition slight in discoloration and excellent in both transparency and refractive index even if containing an inorganic particle ingredient, and to provide a molded form made from this resin composition. SOLUTION: The resin composition comprises a fluorene skeleton-bearing resin and an inorganic particle ingredient essentially comprising a zirconium oxide component 30 nm or smaller in an average particle size. In this resin composition, the resin may be a photopolymerizable resin such as a fluorene skeleton-bearing (meth)acrylate, and the zirconium oxide component accounts for 30-100 wt.% of the inorganic particle ingredient. The refractive index of the molded form made from this resin composition is 1.6-1.85. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：即使含有无机颗粒成分，也提供轻微的变色和透明度和折射率都优异的树脂组合物，并提供由该树脂组合物制成的模塑形式。解决方案：树脂组合物包含芴骨架树脂和基本上包含平均粒径为30nm或更小的氧化锆组分的无机颗粒组分。在该树脂组合物中，树脂可以是具有芴骨架（甲基）丙烯酸酯的光聚合性树脂，氧化锆组分占无机颗粒成分的30-100重量％。由该树脂组合物制成的模制品的折射率为1.6-1.85。版权所有（C）2008，JPO＆INPIT

42. 发明专利

JP2007077190A Polysilane having high refractive index 有权
$Polysilane having high refractive index$
标题翻译：具有高折射率的多晶硅
公开(公告)号：JP2007077190A
公开(公告)日：2007-03-29
申请号：JP2005263731
申请日：2005-09-12
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： SAKAMOTO HIRONORI , MURASE HIROAKI , FUJIKI TAKESHI
IPC分类号： C08G77/60
摘要： PROBLEM TO BE SOLVED: To provide a polysilane having extremely high refractive index and excellent solubility to solvents, compatibility to resins and film-forming property. SOLUTION: The polysilane comprises an aryltrihalosilane unit and one or more other halosilane units selected from a monohalosilane unit and a dihalosilane unit. The polysilane is produced by reacting an aryltrihalosilane compound with other halosilane compound in an aprotic solvent in the presence of (i) a catalyst composed solely of a metallic magnesium component or (ii) a catalyst system composed of a combination of a metallic magnesium component and a lithium halide or a halide of a polyvalent metal. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有极高折射率和对溶剂的优异溶解性，与树脂的相容性和成膜性的聚硅烷。解决方案：聚硅烷包括芳基三卤硅烷单元和一个或多个选自单卤代硅烷单元和二卤代硅烷单元的其它卤代硅烷单元。聚硅烷是通过使芳基三卤代硅烷化合物与其它卤代硅烷化合物在非质子传递溶剂中反应制备的，所述方法是在（i）仅由金属镁组分组成的催化剂的存在下或（ii）由金属镁组分和卤化锂或多价金属的卤化物。版权所有（C）2007，JPO＆INPIT

43. 发明专利

JP2006188620A Method for producing polysilanes 有权
标题翻译：生产多晶硅的方法
公开(公告)号：JP2006188620A
公开(公告)日：2006-07-20
申请号：JP2005002332
申请日：2005-01-07
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： MURASE HIROAKI , SAKAMOTO HIRONORI , FUJIKI TAKESHI , KAWASAKI SHINICHI , KASHIWAMURA SHIGEFUMI , ISHIFUNE MANABU
IPC分类号： C08G77/60 , C07F7/08 , C25B3/10 , C25B9/00 , C25B11/12 , C25B15/08
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a polysilane, by which the polysilane can efficiently be produced even in a flow system without relating to the kind of an electrode material, while easily controlling a reaction temperature and the mol. wt. of the polysilane.
SOLUTION: This method for producing the polysilane, comprising subjecting a halosilane compound to an electrode reaction, is characterized by continuously feeding a mixture comprising the halosilane compound, magnesium ion (as a magnesium halide or the like), a perchlorate (an alkali metal perchlorate or the like) as a support electrolyte, and an aprotic solvent into a flow type microreactor, and applying a direct electric current to the mixture. In the electrode reaction, a material (carbon material or the like) not eluted by the application of an electric current may be used as at least an anode material.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：为了提供聚硅烷的制造方法，即使在不涉及电极材料的种类的情况下，也可以在流动系统中有效地制造聚硅烷，同时容易地控制反应温度和摩尔比。重量。的聚硅烷。解决方案：该制备聚硅烷的方法，包括使卤代硅烷化合物进行电极反应，其特征在于连续地供给包含卤代硅烷化合物，镁离子（卤化镁等），高氯酸盐碱金属高氯酸盐等）作为载体电解质，将非质子溶剂加入到流动型微反应器中，并向混合物中施加直流电流。在电极反应中，作为至少阳极材料，可以使用不通过施加电流而洗脱的材料（碳材料等）。版权所有（C）2006，JPO＆NCIPI

44. 发明专利

JP2006059937A Insulating film and composition therefor 审中-公开
标题翻译：绝缘膜及其组合物
公开(公告)号：JP2006059937A
公开(公告)日：2006-03-02
申请号：JP2004238900
申请日：2004-08-18
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , SAKAMOTO HIRONORI , KAWASAKI SHINICHI , MURASE HIROAKI , YAMADA MITSUAKI , YAMAKI SHIGERU , TSUKAMOTO KEIJI
IPC分类号： H01L21/316 , C08L83/16 , H01L21/312 , H01L21/768 , H01L23/522
摘要： PROBLEM TO BE SOLVED: To provide a composition for an insulating film capable of forming an insulating film excellent in dielectric characteristics and heat resistance.
SOLUTION: The composition for insulating film consists of polyrane and polysilazane. The rate of polyrane and polysilazane (weight ratio) may be nearly polyrane/polysilazane=5/95-95/5. The polyrane may consist of poly alkyl aryl silanes (especially poly C
1-6 alkyl C
6-20 aryl silane). The insulating film formed with such a composition excels in dielectric characteristics. Specific inductive capacity may be 3.1 or less for instance when measured at the frequency of 1 MHz.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供能够形成绝缘性和耐热性优异的绝缘膜的绝缘膜用组合物。
解决方案：绝缘膜组合物由聚酰胺和聚硅氮烷组成。聚酰胺和聚硅氮烷的重量比（重量比）可能几乎是聚酰胺/聚硅氮烷= 5 / 95-95 / 5。聚酰胺可以由聚烷基芳基硅烷（特别是聚C 1 -C 6烷基C 6 -C 12芳基硅烷）组成。用这种组合物形成的绝缘膜具有优异的电介质特性。例如当以1MHz的频率测量时，比电感容量可以是3.1或更小。版权所有（C）2006，JPO＆NCIPI

45. 发明专利

JP2005187661A Fluorene-based resin composition and its shaped article 有权
标题翻译：基于氟的树脂组合物及其成型品
公开(公告)号：JP2005187661A
公开(公告)日：2005-07-14
申请号：JP2003431423
申请日：2003-12-25
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： KAWASAKI SHINICHI , TANAKA MASASHI , MURASE HIROAKI , FUJIKI TAKESHI , KOBORI KANA , YAMADA MITSUAKI
IPC分类号： C08L101/02 , C08K5/36
摘要： PROBLEM TO BE SOLVED: To provide a resin composition capable of further improving the excellent characteristics possessed by 9,9-bisphenyl fluorene skeleton (in particular, optical characteristics such as high refractive index, etc.). SOLUTION: This resin composition comprises a resin component comprised of a compound having a fluorene skeleton expressed by formula (1) and a sulfur-containing compound, where in the formula, R 1 -R 4 each represents a non-reactive group or a reactive group; k1 and k2 each indicates an integer of 1-5; m1 and m2 are the same or different and each indicates 0 or an integer of 1-4. The sulfur-containing compound includes mercapto-arenes, alkylthio-arenes, arylthio-carboxylic acids, arylthio(meth)acrylates, diarylsulfides, diaryldisulfides, alkyl-aryl sulfones, arene-sulfonyl halides, etc. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够进一步提高9,9-双苯芴骨架（特别是高折射率等光学特性）所具有的优异特性的树脂组合物。解决方案：该树脂组合物包含由具有由式（1）表示的芴骨架的化合物和含硫化合物组成的树脂组分，其中在式中，R 1 -R < SP> 4 各自表示非反应性基团或反应性基团; k1和k2各自表示1-5的整数; m1和m2相同或不同，分别表示0或1-4的整数。含硫化合物包括巯基芳烃，烷硫基芳烃，芳硫基羧酸，芳硫基（甲基）丙烯酸酯，二芳基硫醚，二芳基二硫化物，烷基芳基砜，芳烃磺酰卤等。版权所有（C）2005 ，JPO＆NCIPI

46. 发明专利

JP2005115111A Composition for protective film of color filter 审中-公开
标题翻译：彩色滤光片保护膜组合物
公开(公告)号：JP2005115111A
公开(公告)日：2005-04-28
申请号：JP2003350395
申请日：2003-10-09
申请人： Nagase Chemtex Corp , Osaka Gas Co Ltd , ナガセケムテックス株式会社 , 大阪瓦斯株式会社
发明人： MORITA TAKAYUKI , KITANO KEI , AOKI NOBUAKI , MURASE HIROAKI , FUJIKI TAKESHI , SAKAMOTO HIRONORI
IPC分类号： G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a composition for a protective film of a color film which is excellent in flatness and in which a temperature at the time of preparing the protective film is low. SOLUTION: The composition for the protective film of the color film comprises a polysilane compound(A) having two or more silanol groups per molecule, an epoxy compound(B) having two or more epoxy groups per molecule, and cation polymerization initiator(C), the color filter protective film which is constituted by hardening the composition for the protective film of the color filter, and a color filter which has the color filter protective film. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供一种平坦度优异且保护膜制备时的温度低的彩色膜保护膜用组合物。解决方案：彩色膜保护膜用组合物包含每分子具有两个以上硅烷醇基的聚硅烷化合物（A），每分子具有两个以上环氧基的环氧化合物（B）和阳离子聚合引发剂（C）中，通过使滤色器的保护膜的组合物硬化而构成的滤色器保护膜和具有滤色器保护膜的滤色器。版权所有（C）2005，JPO＆NCIPI

47. 发明专利

JP2005089422A Fluorenedicarboxylic acid ester and photosensitive resin composition 有权
标题翻译：氟代羧酸酯和光敏树脂组合物
公开(公告)号：JP2005089422A
公开(公告)日：2005-04-07
申请号：JP2003328519
申请日：2003-09-19
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： MURASE HIROAKI , OGATA KAZUYUKI , FUJIKI TAKESHI , SAKAMOTO HIRONORI , KAWASAKI SHINICHI , YAMADA MITSUAKI
IPC分类号： G03F7/039 , C07B61/00 , C07C67/343 , C07C67/347 , C07C69/616 , H01L21/027
CPC分类号： Y02P20/55
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of remarkably improving the sensitivity and resolution of a resist. SOLUTION: The photosensitive resin composition is composed of a new fluorenedicarboxylic acid ester expressed by formula (1), a base resin and a photosensitizing agent (photoacid generator, etc.). In formula (1), R 1 and R 2 are each independently an alkyl; R 3 is a bivalent hydrocarbon group which may have a substituent; R 4 is a protective group for carboxy group; and m and n are each independently an integer of 0-4. The group R 3 is not an arylene group, the protective group R 4 may be a hydrophobic protective group and the hydrophobic protective group may be eliminated by the action of an acid (e.g. an acid generated from the photoacid generator) to form a carboxy group. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够显着提高抗蚀剂的灵敏度和分辨率的感光性树脂组合物。光敏树脂组合物由式（1）表示的新的氟代二羧酸酯，基础树脂和光敏剂（光酸发生剂等）组成。在式（1）中，R 1和R 2彼此独立地为烷基; R 3是可以具有取代基的二价烃基; R 4 是羧基的保护基; m和n各自独立地为0-4的整数。基团R 3 不是亚芳基，保护基R 4可以是疏水性保护基，并且可以通过酸的作用除去疏水性保护基（例如由光酸产生剂产生的酸）以形成羧基。版权所有（C）2005，JPO＆NCIPI

48. 发明专利

JP2005036139A Copolysilane and method for producing the same 有权
标题翻译：共聚物及其制造方法
公开(公告)号：JP2005036139A
公开(公告)日：2005-02-10
申请号：JP2003276086
申请日：2003-07-17
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： SAKAMOTO HIRONORI , MURASE HIROAKI , FUJIKI TAKESHI , TANAKA MASASHI
IPC分类号： C08G77/60
摘要： PROBLEM TO BE SOLVED: To provide a copolysilane having improved characteristics of polydiphenylsilane; and to provide a method for producing the copolysilane. SOLUTION: The copolysilane (a cyclic copolysilane or the like) is produced by reacting diphenyldichlorosilane with at least one kind (e.g. methylphenyldichlorosilane) selected from other halosilanes (e.g. dichlorosilane, trichlorosilane, tetrachlorosilane and monochlorosilane) in the presence of a magnesium metal component, a lithium compound and a metal halide in nonprotonic solvent. The copolysilane has excellent solubility in a solvent, transparency and compatibility with a resin, and also has a high refractive index and high water repellency. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有改进的聚二苯基硅烷特性的共聚硅烷; 并提供共聚硅烷的制造方法。解决方案：在镁金属存在下，二苯基二氯硅烷与选自其它卤代硅烷（例如二氯硅烷，三氯硅烷，四氯硅烷和一氯硅烷）中的至少一种（例如甲基苯基二氯硅烷）反应制备共聚硅烷（环状共聚硅烷等）组分，锂化合物和金属卤化物在非质子溶剂中。共聚硅烷在溶剂中具有优异的溶解性，透明性和与树脂的相容性，并且还具有高折射率和高斥水性。版权所有（C）2005，JPO＆NCIPI

49. 发明专利

JP2004333865A Photo-acid initiator and photopolymerizable resin composition containing the same 审中-公开
公开(公告)号：JP2004333865A
公开(公告)日：2004-11-25
申请号：JP2003129495
申请日：2003-05-07
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： SHIRAI MASAMITSU , OKAMURA HARUYUKI , KAWASAKI SHINICHI , FUJIKI TAKESHI , TANAKA MASASHI , MURASE HIROAKI , SAKAMOTO HIRONORI , YAMADA MITSUAKI
IPC分类号： G03F7/031 , C07D335/18 , C08G59/68 , G03F7/038 , G03F7/075
摘要： PROBLEM TO BE SOLVED: To provide a photopolymerizable resin composition composition which can be hardened with small light quantity and which shows increased heat resistance, dimensional stability and moisture resistance of its hardened product. SOLUTION: The photopolymerizable resin composition is prepared to contain a photo-acid initiator (A) expressed by general formula (I) and a photo-cation polymerizable resin (B). The composition is applied onto a substrate, exposed along a pattern, and developed by heating, and the pattern can be formed with high accuracy. In formula (I), R 1 and R 2 may be same or different and each represents an alkyl group, R 3 is same or different and represents an alkyl group or a halogen atom, n1 and n2 are same or different and each represents an integer 0 to 4, and n3 represents an integer 0 to 5. COPYRIGHT: (C)2005,JPO&NCIPI

50. 发明专利

JP2004035821A Fluorene-containing resin 有权
公开(公告)号：JP2004035821A
公开(公告)日：2004-02-05
申请号：JP2002197406
申请日：2002-07-05
申请人： Nagase Chemtex Corp , Osaka Gas Co Ltd , ナガセケムテックス株式会社 , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , SAKAMOTO HIRONORI , MORITA TAKAYUKI , HOSOMI TETSUYA , TAMAKOSHI HIDEAKI
IPC分类号： C08F290/06 , C08G59/06 , C08G59/17 , C08G59/30
摘要： PROBLEM TO BE SOLVED: To provide a thermosetting or photo-curable resin capable of forming a cured material having a high refractive index, excellent heat resistance and electric characteristics, and also excellent in patterning property. SOLUTION: This specific epoxy resin and an epoxy acrylate resin having a fluorene skeleton and an alkali dissolvable irradiation polymerizable unsaturated resin containing fluorene are provided. COPYRIGHT: (C)2004,JPO

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