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41. 发明专利

JP2014120650A Electronic exposure apparatus 审中-公开
标题翻译：电子曝光装置
公开(公告)号：JP2014120650A
公开(公告)日：2014-06-30
申请号：JP2012275598
申请日：2012-12-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： MURAKAMI TAKESHI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide an electronic exposure device in which the time required for stage movement or stage establishment can be reduced significantly, while enhancing the throughput.SOLUTION: An electronic exposure device 1 includes a surface pattern electron generation part 2 for generating electrons in planar pattern, surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation part 2, a mapping projection unit 9 for projection mapping electrons generated from the surface pattern electron generation part 2 to the imaging position on the exposed surface of an exposed member S, and an imaging condition control unit 10 for controlling the imaging condition of the mapping projection unit 9. The surface pattern electron generation part 2 is divided into a plurality of electron generation regions (regions A, B) depending on the distance from the central axis of the surface pattern electron generation part 2. The surface pattern control unit 3 generates electrons at different timing for each electron generation region, and the imaging condition control unit 10 sets a different imaging condition for each electron generation region.
摘要翻译：要解决的问题：提供一种电子曝光装置，其中可以显着降低舞台移动或舞台建立所需的时间，同时提高产量。解决方案：电子曝光装置1包括用于产生电子的表面图案电子产生部分2 在平面图案中，用于控制从表面图案电子产生部分2产生的电子图案的表面图案控制单元3，用于将从表面图案电子产生部分2产生的电子投射到曝光的成像位置的映射投影单元9 暴露部件S的表面和用于控制映射投影单元9的成像条件的成像条件控制单元10.表面图案形成电子产生部分2被分成多个电子产生区域（区域A，B），这取决于距离表面图案电子产生部分2的中心轴的距离每个电子发生区域的不同时刻的表面图形控制部3生成电子，摄像条件控制部10对每个电子生成区域设定不同的成像条件。

42. 发明专利

JP2012253007A Inspection device 有权
标题翻译：检查装置
公开(公告)号：JP2012253007A
公开(公告)日：2012-12-20
申请号：JP2012015875
申请日：2012-01-27
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , NAITO YOSHIHIKO , TAIMA YASUSHI , KARIMATA TSUTOMU , HAYASHI TAKEHIDE , TSUKAMOTO KIWAMU , KOHAMA TATSUYA , KOBAYASHI NOBORU
IPC分类号： H01J37/244 , G01N23/225 , G01N23/227 , H01J37/09 , H01J37/29 , H01L21/66
CPC分类号： H01J37/09 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： PROBLEM TO BE SOLVED: To provide an inspection method and an inspection device capable of improving an inspection accuracy to be applied to a design rule of 5-30 nm.SOLUTION: An inspection device has: beam generation means generating any one of a charged particle and an electromagnetic wave as a beam; a primary optical system introducing the beam to an inspection target held in a working chamber to irradiate the inspection target with the beam; a secondary optical system having a movable type numerical aperture, and a first detector detecting a secondary charged particle generated from the inspection target and passed through the numerical aperture; an image processing system forming an image based on the secondary charged particle detected by the first detector; and a second detector provided between the movable type numerical aperture and the first detector, and detecting a position and shape at a crossover position of the secondary charged particle generated form the inspection target.
摘要翻译：要解决的问题：提供能够提高应用于5-30nm的设计规则的检查精度的检查方法和检查装置。解决方案：检查装置具有：波束产生装置，其产生带电粒子和电磁波中的任何一个作为波束; 将光束引入到保持在工作室中的检查对象物的主光学系统，用该光束照射检查对象物; 具有可动型数值孔径的次级光学系统，以及第一检测器，检测从检查对象物产生的并通过数值孔径的二次带电粒子; 图像处理系统，其基于由所述第一检测器检测到的所述次级带电粒子形成图像; 以及第二检测器，设置在可动型数值孔径和第一检测器之间，并且检测从检查对象产生的二次带电粒子的交叉位置处的位置和形状。版权所有（C）2013，JPO＆INPIT

43. 发明专利

JP2012119694A Inspection apparatus with charged particle beam and device manufacturing method using the same 有权
标题翻译：具有充电颗粒束的检查装置和使用其的装置制造方法
公开(公告)号：JP2012119694A
公开(公告)日：2012-06-21
申请号：JP2011283102
申请日：2011-12-26
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMICHI SHINJI , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： H01L21/66 , H01J37/22 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a technology enabling an SEM device to accelerate inspection speed.SOLUTION: Device manufacturing method using the inspection apparatus with charged particle beam comprises the steps of: moving a stage so that a lower left corner of a first search die in a lower part of a wafer is positioned nearly at a center of a camera, and obtaining a pattern matching template image; when a second search die is in a right adjacent side of the first search die, and a third search die is in an upper adjacent side of the second search die, moving the stage and conducting automatic pattern matching using the template image so that exact coordinate values of patterns for the second search die and the third search die are obtained; calculating moving amount of motion to an upper adjacent die with reference to a relationship between the second search die pattern matching coordinate and the third search die pattern matching coordinate and moving the stage to a coordinate where a pattern of an upper adjacent die to the first search die is expected to exist; and conducting the pattern matching using the template image so that an exact coordinate value of a searching pattern is repeatedly updated and obtained. Consequently, accuracy is improved.
摘要翻译：要解决的问题：提供使SEM装置能够加快检测速度的技术。＆lt; P＆gt;解决方案：使用带有带电粒子束的检查装置的装置制造方法包括以下步骤：移动台，使得晶片下部的第一搜索管芯的左下角几乎位于晶片的中心相机，并获得模式匹配模板图像; 当第二搜索模具位于第一搜索模具的右侧，并且第三搜索模具位于第二搜索模具的上部相邻侧时，移动平台并使用模板图像进行自动模式匹配，使得精确坐标获得第二搜索模具和第三搜索模具的图案的值; 参考第二搜索模具匹配坐标和第三搜索模具匹配坐标之间的关系，将移动的运动量计算到上部相邻模具，并将平台移动到上部相邻模具的图案到第一次搜索的坐标死亡预计会存在; 并使用模板图像进行图案匹配，使得重复地更新并获得搜索图案的精确坐标值。因此，精度提高。版权所有（C）2012，JPO＆INPIT

44. 发明专利

JP2012064567A Electron beam inspection device having foreign substance attachment prevention function, and method 有权
标题翻译：具有外部物质附着防护功能的电子束检查装置及方法
公开(公告)号：JP2012064567A
公开(公告)日：2012-03-29
申请号：JP2011169040
申请日：2011-08-02
申请人： Ebara Corp , 株式会社荏原製作所
发明人： WATANABE KENJI , HATAKEYAMA MASAKI , NAITO YOSHIHIKO , KOHAMA TATSUYA , TERAO KENJI , MURAKAMI TAKESHI , HAYASHI TAKEHIDE , TSUKAMOTO KIWAMU , SOFUGAWA TAKUJI , KIMURA NORIO
IPC分类号： H01J37/20 , H01J37/28 , H01J37/29 , H01L21/66
CPC分类号： H01J37/22 , H01J37/265 , H01J37/29 , H01J2237/004 , H01J2237/022 , H01J2237/24495 , H01J2237/24564 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide an electron beam inspection device capable of preventing the attachment of a foreign substance on a sample surface.SOLUTION: A stage 100 with a sample 200 disposed is installed inside a vacuum chamber 112 capable of vacuum evacuation, and a dust collection electrode 122 is disposed in a position surrounding the periphery of the sample 200. To the dust collection electrode 122, a voltage having an identical polarity to a voltage applied to the sample 200 with an equal absolute value or higher is applied. By this, the foreign substance such as a particle is attached to the dust collection electrode 122 and therefore the attachment of the foreign substance to the sample surface can be reduced. In place of using the dust collection electrode, a recess may be formed on a wall face of the vacuum chamber surrounding the stage or a metallic flat plate of mesh structure, to which a prescribed voltage is to be applied, may be laid on the wall face. Also, by the disposition of a gap control plate 124, having a through hole 124a at the center, upward of the sample 200 and the dust collection electrode 122, the foreign substance attachment can be further reduced.
摘要翻译：要解决的问题：提供能够防止异物附着在样品表面上的电子束检查装置。解决方案：将具有样品200的台架100安装在能够真空抽真空的真空室112的内部，并且集尘电极122设置在围绕样品200周围的位置。向集尘电极122 施加与施加到具有相等绝对值或更高的绝对值的样品200的电压具有相同极性的电压。由此，将颗粒等异物附着在集尘电极122上，能够减少异物与样品表面的附着。代替使用集尘电极，可以在围绕台架的真空室的壁面上形成凹槽，或者可以在其上施加规定电压的网状结构的金属平板面对。此外，通过设置具有中心的通孔124a的间隙控制板124和样品200的上方以及集尘电极122，可以进一步减少异物附着。版权所有（C）2012，JPO＆INPIT

45. 发明专利

JP2011242406A Apparatus and method for inspecting sample surface 有权
标题翻译：检测样品表面的装置和方法
公开(公告)号：JP2011242406A
公开(公告)日：2011-12-01
申请号：JP2011173620
申请日：2011-08-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HATAKEYAMA MASAKI , WATANABE KENJI , MURAKAMI TAKESHI , SATAKE TORU , NOJI NOBUHARU
IPC分类号： G01N23/227 , G01N23/225 , G03F1/08 , G03F7/16 , H01L21/66
CPC分类号： G03F7/162 , G01N23/225 , H01J37/285 , H01J2237/204 , H01J2237/2812 , H01J2237/2814 , H01J2237/2855 , H01J2237/2857
摘要： PROBLEM TO BE SOLVED: To provide an efficient inspection system for a sample surface.SOLUTION: The system includes a surface flattening mechanism flattening the surface of a sample, a resistance film coating mechanism forming a resistance film on the sample, and a surface inspecting mechanism evaluating the sample surface. The surface inspecting mechanism includes a UV ray source 30, an optical system guiding electromagnetic waves oblique to the sample surface, a mapping optical system 40 guiding electrons emitted from the sample surface to a direction perpendicular to the sample surface, a detector 50, and an image forming/signal processing circuit 60. The mapping optical system includes three lens systems 41 to 43 and an aperture 44. An X-ray source may be used instead of the UV ray source. Otherwise, a device for guiding an electron beam generated from an electron beam source onto a sample surface may be disposed, and the sample surface may be irradiated with one or both of electromagnetic waves and electron beams by driving one or both of an electromagnetic wave irradiating device and an electron beam irradiating device.
摘要翻译：要解决的问题：为样品表面提供有效的检测系统。解决方案：该系统包括使样品表面平坦化的表面平坦化机构，在样品上形成电阻膜的电阻膜涂覆机构和评价样品表面的表面检查机构。表面检查机构包括：紫外线源30，引导与样品表面倾斜的电磁波的光学系统;将从样品表面发射的电子引导到垂直于样品表面的方向的映射光学系统40;检测器50; 图像形成/信号处理电路60.映射光学系统包括三个透镜系统41至43和孔44.可以使用X射线源代替紫外线源。否则，可以设置用于将从电子束源产生的电子束引导到样品表面上的装置，并且可以通过驱动电磁波照射中的一种或两种来照射样品表面中的一种或两种电磁波和电子束装置和电子束照射装置。版权所有（C）2012，JPO＆INPIT

46. 发明专利

JP2010237200A Method and device for observing specimen, and method and device for inspecting specimen using the same 有权
标题翻译：用于观察样本的方法和装置，以及使用其来检查样本的方法和装置
公开(公告)号：JP2010237200A
公开(公告)日：2010-10-21
申请号：JP2010054436
申请日：2010-03-11
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HATAKEYAMA MASAKI , WATANABE KENJI , NAITO YOSHIHIKO , MURAKAMI TAKESHI
IPC分类号： G01N23/225 , H01J37/09 , H01J37/20 , H01J37/22 , H01J37/24 , H01J37/28 , H01J37/29 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a method and device for observing a specimen allowing a minute pattern to be observed. SOLUTION: According to this method for observing a specimen, the pattern of the specimen is observed by using an electron beam. In this method, the electron beam is applied to the specimen to detect mirror electrons arising therefrom by the application of the electron beam, and an image of the specimen is generated from the detected mirror electrons. In a step of applying the electron beam, an electron beam is applied to the specimen with the landing energy LE of the electron beam adjusted so that applied electrons U-turn in a recess pattern to act as mirror electrons when the electron beam is applied thereto in a recess pattern with edges on both sides. A suitable condition therefor is LEA≤LE≤LEB+5[eV]. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供用于观察允许观察到微小图案的样本的方法和装置。解决方案：根据这种用于观察样品的方法，通过使用电子束观察样品的图案。在该方法中，通过施加电子束，将电子束施加到样本上以检测由其产生的镜像电子，并且从检测到的镜电子产生样本的图像。在施加电子束的步骤中，电子束被施加到样品上，电子束的着陆能量LE被调节，使得当电子束被施加到电子束时，施加的电子以凹陷图案U形转动成镜电子在两边具有边缘的凹槽图案中。适合的条件是LEA≤LE≤LEB+ 5 [eV]。版权所有（C）2011，JPO＆INPIT

47. 发明专利

JP2009002968A Sample surface inspection apparatus and method 审中-公开
标题翻译：样品表面检查装置和方法
公开(公告)号：JP2009002968A
公开(公告)日：2009-01-08
申请号：JP2008247231
申请日：2008-09-26
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HATAKEYAMA MASAKI , WATANABE KENJI , MURAKAMI TAKESHI , SATAKE TORU , NOMICHI SHINJI
IPC分类号： G01N23/225 , G03F7/16 , H01L21/66
CPC分类号： G03F7/162 , G01N23/225 , H01J37/285 , H01J2237/204 , H01J2237/2812 , H01J2237/2814 , H01J2237/2855 , H01J2237/2857
摘要： PROBLEM TO BE SOLVED: To provide a surface inspection apparatus for inspecting the surface of a sample.
SOLUTION: An apparatus for evaluating the surface of the sample comprises an electromagnetic wave irradiation device comprising an ultraviolet ray generation source 30 and a device to guide ultraviolet rays generated from the generation source to the surface of the sample S, a detector 50 which detects electrons emitted from the surface of the sample irradiated with electromagnetic waves and outputs as an electric or optical signal, and an image forming/signal processing part 60 which processes the electric or optical signal output from the detector in order to evaluate the surface of the sample. An X-ray source may be used instead of the ultraviolet source. It is also possible to prepare an apparatus which guides an electron beam generated from an electron beam source to the surface of the sample, drive any or both of the electromagnetic wave irradiation device and an electron irradiation device, and irradiate any or both of the electromagnetic waves or the electron beam to the surface of the sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检查样品表面的表面检查装置。解决方案：用于评估样品表面的装置包括电磁波照射装置，其包括紫外线产生源30和将从发生源产生的紫外线引导到样品S的表面的装置，检测器50 其检测从电磁波照射的样品的表面发射的电子，并作为电信号或光信号输出;以及图像形成/信号处理部60，其处理从检测器输出的电信号或光信号，以评估例子。可以使用X射线源代替紫外线源。也可以制备将从电子束源产生的电子束引导到样品的表面，驱动电磁波照射装置和电子照射装置中的任一个或两者的装置，并且照射电磁波或电子束到样品表面。版权所有（C）2009，JPO＆INPIT

48. 发明专利

JP2008130501A Mapping type electron microscope reducing geometrical aberrations and space-charge effects 有权
标题翻译：映射型电子显微镜减少几何异常和空间效应
公开(公告)号：JP2008130501A
公开(公告)日：2008-06-05
申请号：JP2006317140
申请日：2006-11-24
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NIN TAKEAKI , MURAKAMI TAKESHI
IPC分类号： H01J37/29
CPC分类号： H01J37/153 , H01J37/04 , H01J2237/04924 , H01J2237/1538
摘要： PROBLEM TO BE SOLVED: To provide a mapping type electron microscope in where a projection imaging optical system is provided with a zooming transfer lens system for improving the geometrical aberrations in low-magnification imaging and space-charge effect in the zooming range.
SOLUTION: The mapping type electron microscope includes an illuminating system which irradiates a primary electron beam onto a sample, and the projection imaging optical system 24 which guides a secondary beam irradiated from the sample to a detection system, and the projection imaging optical system 24 is provided with the transfer lens system 24b, having a first zooming lens 6a and a second zooming lens 6b. The first zooming lens 6a has a plurality of electrodes, of which a prescribed electrode is made thick and is supplied with a positive voltage to form a space 10, having zero electric field intensity and high positive potential between the first zooming lens 6a and the second zooming lens 6b; and in the zooming range, a crossover C2 by the first zooming lens 6a is formed in the space 10.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种映射型电子显微镜，其中投影成像光学系统设置有用于改善在放大范围内的低倍率成像和空间电荷效应中的几何像差的变焦转印透镜系统。解决方案：映射型电子显微镜包括将一次电子束照射到样品上的照明系统和将从样品照射的次级光束引导到检测系统的投影成像光学系统24，以及投影成像光学系统24设置有具有第一变焦透镜6a和第二变焦透镜6b的转印透镜系统24b。第一变焦透镜6a具有多个电极，其中规定的电极变厚并且被提供正电压以形成空间10，第一变焦透镜6a和第二变焦透镜6a之间具有零电场强度和高正电位变焦透镜6b; 并且在变焦范围中，在空间10中形成由第一变焦透镜6a形成的交叉C2。（C）2008，JPO＆INPIT

49. 发明专利

JP2008097902A Electron beam equipment and astigmatism adjustment method using the same 有权
标题翻译：电子束设备和使用该方法的异步调整方法
公开(公告)号：JP2008097902A
公开(公告)日：2008-04-24
申请号：JP2006276058
申请日：2006-10-10
申请人： Ebara Corp , 株式会社荏原製作所
发明人： WATANABE KENJI , MURAKAMI TAKESHI , TAJIMA RYO , HATAKEYAMA MASAKI , TSUNEOKA MASATOSHI
IPC分类号： H01J37/153 , H01J37/21
摘要： PROBLEM TO BE SOLVED: To adjust astigmatism rapidly with a simple algorithm by utilizing the auto focus evaluation value of an image acquired from a pattern formed in a sample.
SOLUTION: The electron beam equipment observes and evaluates the sample by applying electron beams to the sample W, and detecting secondary electrons, such as electrons, reflection electrons, and backscattering electrons, radiated from the sample. The electron beam equipment has an astigmatism adjustment means 17 for adjusting the astigmatism of electron beams and gives a correction voltage for maximizing the focus evaluation value obtained from the image of a pattern formed in the sample W to the astigmatism adjustment means 17. The astigmatism adjustment means 17 is a multi-pole having a plurality of pairs of electrodes or coils that oppose with the light axis of electron beams as a center.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过利用从样品中形成的图案获取的图像的自动聚焦评估值，通过简单的算法快速调节像散。解决方案：电子束设备通过对样品W施加电子束来观察和评估样品，并检测从样品辐射的二次电子，如电子，反射电子和反向散射电子。电子束设备具有用于调整电子束的像散的像散调节装置17，并且给出用于使从样品W中形成的图案的图像获得的聚焦评估值最大化到像散调节装置17的校正电压。散光调节装置17是具有多个以电子束的光轴为中心的电极或线圈对的多极。版权所有（C）2008，JPO＆INPIT

50. 发明专利

JP2007147648A Defect inspection method and substrate inspection device 审中-公开
标题翻译：缺陷检查方法和基板检查装置
公开(公告)号：JP2007147648A
公开(公告)日：2007-06-14
申请号：JP2007031703
申请日：2007-02-13
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KANEUMA TOSHIFUMI , SATAKE TORU , KARIMATA TSUTOMU , WATANABE KENJI , NOMICHI SHINJI , MURAKAMI TAKESHI , HATAKEYAMA MASAKI , NAKASUJI MAMORU , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , H01J37/18 , H01J37/20 , H01L21/66 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate inspection device capable of inspecting defects of a sample with good throughput and high accuracy. SOLUTION: The substrate inspection device 1 comprises a working chamber 30 in vacuum state, an electron-optical device 70 equipped with an LaB 6 electron source, a loader housing 40, which carries out/in a wafer to/from the working chamber, and a mini-environment device 20, which is connected to the working chamber and in which atmosphere is controlled. A loader housing 40 comprises a first loading chamber connected to the mini-environment device 20, a second loading chamber connected to the working chamber, a first shutter device 27 that selectively prevents communication between the first and second loading chambers, and a second shutter device 45 that selectively prevents communication between the second loading chamber and the working chamber. A vacuum exhaust pipe and a vent pipe for inert gas are connected to the first and second loading chambers, respectively. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够以良好的生产量和高精度检查样品的缺陷的基板检查装置。解决方案：基板检查装置1包括处于真空状态的工作室30，装有LaB <6>电子源的电子 - 光学装置70，装载机壳体40，其执行/进入与工作室相连的晶片，以及连接到工作室并且控制大气的微型环境设备20。装载机壳体40包括连接到迷你环境装置20的第一装载室，连接到工作室的第二装载室，选择性地防止第一和第二装载室之间的连通的第一挡板装置27和第二挡板装置 45，其选择性地防止第二装载室和工作室之间的连通。真空排气管和惰性气体排放管分别连接到第一和第二装载室。版权所有（C）2007，JPO＆INPIT

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