会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 35. 发明专利
    • FERROELECTRIC STORAGE DEVICE AND MANUFACTURE THEREOF
    • JPH11168193A
    • 1999-06-22
    • JP33329197
    • 1997-12-03
    • NEC CORP
    • SHINOHARA SOTA
    • H01L29/40H01G4/06H01L21/8242H01L21/8246H01L21/8247H01L27/105H01L27/108H01L27/115H01L29/788H01L29/792
    • PROBLEM TO BE SOLVED: To raise the data rewrite life of a ferroelectric storage device and the reliability of the storage holding characteristic of the device by a method, wherein the upper electrode of the device is constituted of an alloy containing a noble metal and a group VIII element oxide. SOLUTION: A ferroelectric storage device is constituted of a structure, wherein a ferroelectric capacitor element 21 is connected with a field-effect transistor 4 which is a memory cell transistor, as a unit memory cell and the device is constituted of a P-type Si substrate 1, the field-effect transistor 4, an interlayer insulating film 7, the ferroelectric capacitor element 21 and a protective film 22. The element 21 has a constitution, wherein the element 21 comprises a lower electrode 23, an upper electrode 24 and a ferroelectric film 12 held between these electrodes 23 and 24. The electrode 24 is constituted of an alloy containing a noble metal and a group VIII element oxide, more specifically, one kind of a material or more than two kinds of materials selected from among an alloy containing platinum and an iridium oxide, an alloy containing platinum and a palladium oxide, an alloy containing platinum and a ruthenium oxide and an alloy containing platinum and an osmium oxide.
    • 39. 发明专利
    • CAPACITOR AND MANUFACTURE THEREOF
    • JPH1083935A
    • 1998-03-31
    • JP26029396
    • 1996-09-09
    • TAIYO YUDEN KK
    • AOYANAGI TAKUJITATSUNO TETSUO
    • H01G4/12H01G2/12H01G4/005H01G4/06H01G4/228H01G4/248H01G4/252H01G4/38H01G13/00
    • PROBLEM TO BE SOLVED: To make it possible to form gaps of a constant width with high accuracy even by the so-called dip coating that both ends of a capacitor element are dipped in a conductive paste to coat the conductive paste on both ends of the element and moreover, to prevent the exterior diameter of an insulating coating from being made large and also to make it possible to obtain the high value of the electrostatic capacitance of a capacitor. SOLUTION: A capacitor is formed into such a structure that such step parts 15 and 16 as to fall in both sides of parts, which form gaps 13 provided in a capacitor element 11, are formed and when a conductive paste is performed a dip coating, the coating of the paste is stopped in the parts by the fall-in of these step parts 15 and 16. By adhering a conductor film also on these step parts 15 and 16, the edges of electrodes 12 and 12, which consist of the conductor film, not only are butted to each other holding the gaps 13 between them but also opposed electrodes are formed on the parts of the step parts 15 and 16 in the electrodes 12 and 12, whereby the higher value of the electrostatic capacitance of the capacitor is obtained. Moreover, when a resin is applied on the parts for forming an insulating coating 14, this resin intrudes into the step parts 15 and 16. As a result, the external diameter of the insulating coating 14 is not made large extremely.