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31. 发明专利

JP4098690B2 Scanning probe microscope 有权
公开(公告)号：JP4098690B2
公开(公告)日：2008-06-11
申请号：JP2003315133
申请日：2003-09-08
申请人：日本電子株式会社
发明人：貴昭天草
IPC分类号： G01B21/30 , G01Q30/08 , G01Q30/10 , G01Q30/16 , G01Q30/20

32. 发明专利

JP3937206B2 Position controller 有权
公开(公告)号：JP3937206B2
公开(公告)日：2007-06-27
申请号：JP26047699
申请日：1999-09-14
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：成計小田原
IPC分类号： G01Q10/02 , G01Q30/08 , G01Q30/10 , G01Q30/20

33. 发明专利

JP3872352B2 Scanning probe microscope 有权
公开(公告)号：JP3872352B2
公开(公告)日：2007-01-24
申请号：JP2002020621
申请日：2002-01-29
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：和徳安藤
IPC分类号： G01K1/14 , G01K7/02 , G01K7/16 , G01N19/00 , G01Q30/08 , G01Q30/10 , G01Q30/12 , G01Q30/16 , G01Q30/20 , G01Q60/24 , G01Q60/26 , G01Q60/58

34. 发明专利

JP2006226707A X-Y TABLE AND SCANNING PROBE MICROSCOPE 审中-公开
公开(公告)号：JP2006226707A
公开(公告)日：2006-08-31
申请号：JP2005037617
申请日：2005-02-15
申请人： JEOL LTD
发明人： KAWAI EIJI
IPC分类号： G01B21/30 , G01Q10/04 , G01Q30/10 , G01Q30/16
摘要： PROBLEM TO BE SOLVED: To solve the problem wherein an operation stroke is reduced greatly, compared with the case at a room temperature, when a sample stage is driven by a piezo element at a low temperature below a liquid nitrogen temperature. SOLUTION: This X-Y table, which is an X-Y table movable in the X-direction and the Y-direction which are orthogonal to each other, is equipped with an elastically expansible/contractible body abutting on at least one side in each direction of the X-direction and the Y-direction of the X-Y table and elastically expanded/contracted by a gas pressure, and has a characteristic wherein the X-Y table is moved by expansion/contraction of the elastically expansible/contractible body caused by the gas pressure. COPYRIGHT: (C)2006,JPO&NCIPI

35. 发明专利

JP2006167866A Apparatus and method for microfabrication 有权
标题翻译：微生物装置和方法
公开(公告)号：JP2006167866A
公开(公告)日：2006-06-29
申请号：JP2004364003
申请日：2004-12-16
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： IMAI HIROMI , ANDO KAZUNORI , YASUTAKE MASATOSHI
IPC分类号： B82B3/00 , C25D11/00 , C25D21/12 , G01Q30/10 , G01Q30/12 , G01Q60/60 , G01Q80/00 , G01Q90/00 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for microfabrication, by which apparatus and method, the pattern formation for an oxidation film and the confirmation of oxidation conditions can be carried out at the same time so that the labor and time can be reduced and the production efficiency can be improved.
SOLUTION: The microfabrication apparatus 1 comprises a voltage applying means 6 for applying a voltage to a sample 2, a scanning means 7 for relatively moving the sample 2 and a probe 3 in the X and Y directions, a humidity regulating means 8 for regulating the humidity around the sample 2, a Faraday current detecting means 9 for detecting the Faraday current due to an oxidation chemical reaction, a detecting section 10 for preliminarily detecting the Faraday current in connection with the lapse of time, a setting section 11 for preliminarily setting an operating point where the oxidation film has a required volume based on the Faraday current connected with the lapse of time, and a control section 12 for changing at least one of the change of the applied voltage under a constant scanning speed or the change of the scanning speed under a constant applied voltage by controlling at least one of the voltage applying means 6 and the scanning means 7 such that the Faraday current becomes constant at the operating point.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种微细加工的装置和方法，通过该装置和方法，可以同时进行氧化膜的图案形成和氧化条件的确认，从而使劳动和可以减少时间并提高生产效率。解决方案：微加工装置1包括用于向样品2施加电压的电压施加装置6，用于在X和Y方向上相对移动样品2和探针3的扫描装置7，湿度调节装置8 用于调节样品2周围的湿度的法拉第电流检测装置9，用于检测由于氧化化学反应引起的法拉第电流的法拉第电流检测装置9，用于与时间的关系预先检测法拉第电流的检测部分10，用于基于与时间相关的法拉第电流预先设定氧化膜具有所需体积的工作点，以及控制部分12，用于在恒定的扫描速度或变化下改变施加电压的变化中的至少一个通过控制电压施加装置6和扫描装置7中的至少一个使得法拉第电流变为在工作点不变。版权所有（C）2006，JPO＆NCIPI

36. 发明专利

JP2005530125A Reproducible scanning probe microscope for scanning the chip or sample a plurality plate with an optical microscope of the transparent interface of the far region 审中-公开
公开(公告)号：JP2005530125A
公开(公告)日：2005-10-06
申请号：JP2003524047
申请日：2002-08-27
申请人：アーロン・ルイスAaron LEWIS , ナノニクス・イメージング・リミテッドNanonics Imaging, Ltd.
发明人：アーロン・ルイス , アナトリー・コミッサール , アレキサンダー・ラトナー , ヒシャム・タハ
IPC分类号： G01Q10/04 , G01Q20/00 , G01Q30/02 , G01Q30/10 , G01Q60/38 , G01Q70/02 , G01N13/10
CPC分类号： G01Q70/02 , G01Q20/02 , G01Q30/025 , G01Q30/10 , G01Q60/38
摘要：この発明はスキャンされるプローブ顕微鏡に関し、チップをスキャンする一つのプレート(１２．１)および、サンプルをスキャンする第２のプレート(１２．２)を含み、スキャンされるプローブ顕微鏡の光軸は、標準の光学顕微鏡への組み込みを自由に許可する。

37. 发明专利

JP2004239765A Scanning probe microscope 审中-公开
公开(公告)号：JP2004239765A
公开(公告)日：2004-08-26
申请号：JP2003029661
申请日：2003-02-06
申请人： Seiko Instruments Inc , セイコーインスツルメンツ株式会社
发明人： ANDO KAZUNORI , SHIRAKAWABE YOSHIHARU , TAKAHASHI HIROSHI , HASUMURA SATOSHI
IPC分类号： G01B21/30 , G01Q10/00 , G01Q20/04 , G01Q30/08 , G01Q30/10 , G01Q30/12 , G01Q30/16 , G01Q30/20 , G01Q60/24 , G01N13/10 , G12B21/24
摘要： PROBLEM TO BE SOLVED: To prevent ice from deposition-growing on a sample face to accurately measure an inherent shape and property of the sample face, when cooling a sample to be measured.
SOLUTION: This scanning probe microscope is provided with a cantilever attaching means 12 for attaching a cantilever, and a periphery cooling means 15 for cooling a peripheral environment of the sample. In the microscope, a cantilever displacement detecting means 2 is provided in the cantilever 1, and the periphery cooling means 15 is constituted to have no cut-out part.
COPYRIGHT: (C)2004,JPO&NCIPI

38. 发明专利

JP2004517335A How to manipulate a small amount of liquid and equipment 有权
公开(公告)号：JP2004517335A
公开(公告)日：2004-06-10
申请号：JP2002557516
申请日：2001-12-12
申请人：アドヴァリティクスアーゲー
发明人：アヒムヴィクスフォート , クリストフガウアー , ヤーゲンスクリーバ
IPC分类号： G01N35/00 , B01J19/00 , B01L3/00 , B81B1/00 , G01N35/02 , G01N35/10 , G01Q30/10 , G01Q80/00
CPC分类号： B01L3/50273 , B01L2300/0816 , B01L2300/0819 , B01L2300/089 , B01L2400/0415 , B01L2400/0427 , B01L2400/0433 , B01L2400/0439 , B01L2400/0442 , B01L2400/0496 , Y10T436/2575
摘要： The invention relates to a device for manipulating small quantities of liquid on a solid body surface with at least one defined holding area with wetting properties other than the surroundings, whose material is such that the liquid to be manipulated preferably stays in the holding area, whereby the holding area has at least one constriction zone which cannot be overcome by the liquid due to its surface tension in the normal state, and whereby at least one device for generating an external force is provided substantially in the direction of the at least one constriction zone. The invention also relates to a corresponding method for manipulating small quantities of liquid on solid body surfaces and a method for generating a defined quantity of liquid using the method according to the present invention.

39. 发明专利

JP2004058267A Tertiary structure body composed of silicon fine thread, method for manufacturing structure, and device using structure 审中-公开
公开(公告)号：JP2004058267A
公开(公告)日：2004-02-26
申请号：JP2003151255
申请日：2003-05-28
申请人： Japan Science & Technology Corp , 科学技術振興事業団
发明人： KAWAKATSU HIDEKI , KOBAYASHI MASARU
IPC分类号： G01G3/16 , B01J20/28 , B81B1/00 , B81C1/00 , B82B1/00 , B82B3/00 , G01K7/16 , G01L1/10 , G01N1/00 , G01Q30/10 , G01Q30/20 , G01Q60/24 , G01Q60/38 , G01Q60/54 , G01R33/02 , G01N13/16 , G12B21/08
CPC分类号： G01Q70/06 , G01Q60/38 , Y10S438/947
摘要： PROBLEM TO BE SOLVED: To provide a tertiary structure body composed of reliable fine silicon thread, a method for manufacturing the structure and a device using the structure. SOLUTION: Wire 2 of nano or micron order is formed by carrying out wet etching on the tertiary structure body composed of silicon fine thread in use of crystallinity of single crystal material. COPYRIGHT: (C)2004,JPO

40. 发明专利

JP3494889B2 Focused ion beam processing apparatus 失效
公开(公告)号：JP3494889B2
公开(公告)日：2004-02-09
申请号：JP15472098
申请日：1998-06-03
申请人：セイコーインスツルメンツ株式会社
发明人：喜弘小山 , 和男相田
IPC分类号： H01J37/30 , G01Q30/10 , G01Q30/16 , H01J37/305 , H01L21/302 , H01L21/3205 , H01L23/52
CPC分类号： H01J37/3056 , H01J2237/31744

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