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    • 38. 发明专利
    • Positive photoresist composition
    • 积极的光电组成
    • JP2005107131A
    • 2005-04-21
    • JP2003340033
    • 2003-09-30
    • Tokyo Ohka Kogyo Co Ltd東京応化工業株式会社
    • MORIO KIMITAKAKATO TETSUYA
    • G03F7/004C08G77/445G03F7/022G03F7/023G03F7/075
    • PROBLEM TO BE SOLVED: To provide a positive photoresist composition capable of attaining at least one, preferably all of the following objectives; prevention of the occurrence of haze and unevenness when the top of a highly reflective metal film is coated with a photoresist composition, improvement of uniformity of film thickness by preventing the occurrence of drop marks in a coating method by spinning after central dropping, improvement of uniformity of film thickness by preventing the occurrence of streaks in a discharge nozzle system coating method. SOLUTION: The positive photoresist composition comprises (A) an alkali-soluble novolac resin, (C) a naphthoquinonediazido-containing compound, (D) an organic solvent and (E) a polyester modified polydialkylsiloxane surfactant including a specified repeating unit. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供能够获得至少一个,优选全部以下目的的正性光致抗蚀剂组合物; 防止在高反射性金属膜的顶部涂覆有光致抗蚀剂组合物时发生雾度和不均匀性,通过防止在中心滴落后纺丝的涂布方法中出现滴落痕迹而提高膜厚均匀性,提高均匀性 通过防止在排出喷嘴系统涂覆方法中发生条纹的膜厚度。 正光致抗蚀剂组合物包含(A)碱溶性酚醛清漆树脂,(C)含萘醌二叠氮化合物,(D)有机溶剂和(E)包含特定重复单元的聚酯改性聚二烷基硅氧烷表面活性剂。 版权所有(C)2005,JPO&NCIPI