会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 33. 发明专利
    • Salt and resist composition
    • 盐和组合物
    • JP2013032339A
    • 2013-02-14
    • JP2012143833
    • 2012-06-27
    • Sumitomo Chemical Co Ltd住友化学株式会社
    • ICHIKAWA KOJIADACHI YUKAKOMIYAGAWA TAKAYUKI
    • C07D309/12C07C381/12C07D335/02C08F20/10G03F7/004G03F7/039H01L21/027
    • PROBLEM TO BE SOLVED: To provide salts suitable for resist compositions having a good focus margin (DOF) in production of a resist pattern and resist compositions.SOLUTION: The salts are of formula (I), wherein Qand Qare independently a fluorine atom, etc.; Lis a single bond or a 1-17C divalent aliphatic saturated group; Xis an oxygen atom or a sulfur atom; Ris a hydroxy group or a 1-6C alkyl group; l is an integer of 0-3; m is an integer of 0-3; n is an integer of 1-3; Zis an organic cation. Also provided is a resist composition which contains the salt(s) and a resin being insoluble or slightly soluble in an aqueous solution of an alkali and capable of dissolving in an aqueous solution of an alkali under the action of an acid.
    • 要解决的问题:提供适合于抗蚀剂图案和抗蚀剂组合物生产中具有良好聚焦余量(DOF)的抗蚀剂组合物的盐。 解决方案:盐具有式(I),其中Q 1 和Q 2 分别是氟原子, 等等。; L 1 是单键或1-17C二价脂族饱和基团; X 1 是氧原子或硫原子; R 1 是羟基或1-6C烷基; l是0-3的整数; m为0-3的整数; n为1-3的整数; Z + 是有机阳离子。 还提供了一种抗蚀剂组合物,其含有一种或多种不溶于或微溶于碱的水溶液且能够在酸的作用下溶解于碱的水溶液中的树脂。 版权所有(C)2013,JPO&INPIT