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31. 发明专利

JP3122276B2 失效
公开(公告)号：JP3122276B2
公开(公告)日：2001-01-09
申请号：JP5056493
申请日：1993-03-11
IPC分类号： B01D53/52 , B01D53/50 , B01D53/54 , C10J3/46 , F01K23/06 , F01K23/10 , F02C3/28 , F02C6/18

32. 发明专利

JP2000288345A NF3 TREATMENT METHOD 失效
公开(公告)号：JP2000288345A
公开(公告)日：2000-10-17
申请号：JP10199799
申请日：1999-04-09
申请人： CENTRAL GLASS CO LTD
发明人： ISHIBASHI TAKAYUKI , NAKAGAWA SHINSUKE
IPC分类号： B01D53/34 , B01D53/54 , B01D53/68 , B01D53/82 , B01J8/02
摘要： PROBLEM TO BE SOLVED: To provide a method for treating a gas containing NF3 used as a dry etching gas and a cleaning gas in LSI, TFT, solar cell, and electrophotographic processes. SOLUTION: In an injury removing reaction of NF3, a reactor 1 is employed to carry out stirring and mixing treatment and the reactor 1 contains a metal such as Si, B, W, Mo, V, Se, Te, Ge, or the like or its non-oxidative solid compound and is provided with a gas flow guiding cylinder 5 for efficiently circulating or diffusing a gas flow generated by a stirring blade 3 in the inner space of the reactor 1. The average flow rate of the gas flow circulated or diffused in the gas flow guiding cylinder 5 is controlled to be 0.5 m/min or higher.

33. 发明专利

JP3006717B2 失效
公开(公告)号：JP3006717B2
公开(公告)日：2000-02-07
申请号：JP18218390
申请日：1990-07-09
IPC分类号： B01D53/54 , B01D53/00 , B01D53/34 , B01D53/68

34. 发明专利

JP2959610B2 Absorbent of acid gases 失效
公开(公告)号：JP2959610B2
公开(公告)日：1999-10-06
申请号：JP26476493
申请日：1993-10-22
申请人：三菱重工業株式会社 , 日本乳化剤株式会社
发明人： ASAKO SHINICHI , SHINJO RYOSUKE
IPC分类号： B01D53/14 , B01D53/34 , B01D53/52 , B01D53/54 , B01D53/62 , C09K3/00

35. 发明专利

JPH1147551A DECOMPOSITION PROCESS FOR NITROGEN FLUORIDE AND REACTION AGENT FOR DECOMPOSITION 失效
公开(公告)号：JPH1147551A
公开(公告)日：1999-02-23
申请号：JP22572397
申请日：1997-08-07
申请人： DOWA MINING CO , DOWA IRON POWDER CO LTD , SHOWA DENKO KK
发明人： IZUMIKAWA CHIAKI , TEZUKA KAZUMASA , ITO KAZUTO , ATOBE HITOSHI , KANEKO TORAICHI
IPC分类号： B01D53/34 , B01D53/54 , B01D53/68
摘要： PROBLEM TO BE SOLVED: To efficiently decompose nitrogen fluoride harmful to the environment and make the same harmless by a simple process. SOLUTION: A solid reaction agent containing single substance carbon, one or more kinds of alkaline earth metals, or in some cases, also one or more kinds of alkaline metals is brought into contact with gaseous nitrogen fluoride at 200 deg.C or above, and a fluorine component in the nitrogen fluoride is fixed on the reaction agent.

36. 发明专利

JP2812833B2 失效
公开(公告)号：JP2812833B2
公开(公告)日：1998-10-22
申请号：JP4346692
申请日：1992-02-28
IPC分类号： B01D53/30 , B01D53/46 , B01D53/54 , B01D53/68 , C01B21/083

37. 发明专利

JPH10132241A METHOD FOR DISPOSING OF WASTE LIQUID OR EXHAUST GAS 失效
公开(公告)号：JPH10132241A
公开(公告)日：1998-05-22
申请号：JP28643396
申请日：1996-10-29
申请人： ASAHI CHEMICAL IND
发明人： OTA HITOSHI , KURIHARA SHIGERU
IPC分类号： F23G5/46 , B01D53/54 , B01J19/00 , F23G5/16 , F23G7/04 , F23G7/06 , F23J15/00
摘要： PROBLEM TO BE SOLVED: To provide a method for disposing of waste liquid containing cyanide or cyanide and ammonium sulfate to be discharged from a petrochemistry manufacturing process. SOLUTION: The method for disposing of waste liquid or exhaust gas comprises the steps of injecting the liquid or gas containing at least cyanide, ammonium, ammonium hydrogensulfate or ammonium sulfate into a first combustion furnace held at 800 to 1100 deg.C, simultaneously introducing oxygen-containing gas at an air ratio of 1.05 to 3, and burning or decomposing to dispose it at residence time of 0.3 to 10sec. And, the method also comprises the steps of supplying disposed matter into a first combustion furnace and a second combustion furnace at 800 to 1100 deg.C partitioned by a partial partition wall from the first furnace, burning it at residual oxygen amount of l0vol.% or more for resident time of 0.3 to 10sec, and providing a desulfurizing step as needed.

38. 发明专利

JPH10128069A TREATMENT OF WASTE GAS 失效
公开(公告)号：JPH10128069A
公开(公告)日：1998-05-19
申请号：JP29394296
申请日：1996-11-06
申请人： BABCOCK HITACHI KK
发明人： FUJITA KAZUNORI
IPC分类号： B01D53/34 , B01D46/02 , B01D53/54 , B01D53/86 , B01D53/94
摘要： PROBLEM TO BE SOLVED: To prevent the deterioration of a catalyst in a functional bag filter by blowing an alumina or silica fine particle to an upstream flue of a bag house, in which the functional bag filter carrying an activated material for removing a harmful component is housed. SOLUTION: A waste gas of a municipal waste incineration furnace is introduced through the flue 9, and at first, slaked lime is blown into the flue 9 from a slaked lime storage tank 5 by a powder feed device 4. Next, an ammonia water is blown into the flue 9 from an ammonia water storage tank 6 by a pump 7. Finally, the alumina or silica fine particle is blown into the flue 9 from an alumina of silica fine particle storage tank 3 by the powder feed device 4. The waste gas is introduced into the bag house 1 and a harmful material such as smoke dust, hydrogen chloride is removed by the activated material contained in the functional bag filter 2 and the slaked lime blown into the flue 9. The smoke dust, the slaked lime and the alumina or silica fine particle stuck to the functional bag filter 2 are stripped off and discharged to a smoke dust storage tank 8 from a hopper part of the bag house 1.

39. 发明专利

JPH1085555A REMOVAL OF AND DEVICE FOR HARMFUL SUBSTANCE FROM EXHAUST GAS IN SEMICONDUCTOR MANUFACTURING 失效
公开(公告)号：JPH1085555A
公开(公告)日：1998-04-07
申请号：JP26529796
申请日：1996-09-12
申请人： KANKEN TECHNO KK
发明人： IMAMURA KEIJI
IPC分类号： B01D53/34 , B01D53/54 , B01D53/68 , B01D53/77 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To reduce the volume of generated PFC to eliminate its harmful effects and at the same time, inhibit the high temperature corrosion attributed to a byproduct F2 by heating a water-insoluble and heat-decomposable gas contained in an exhaust gas generated from the semiconductor cleaning process after the removal by water wash of a hydrolytic gas contained in the exhaust gas and removing by water wash the generated metal corrosive and hydrolytic gas. SOLUTION: First, an exhaust gas generated from the semiconductor cleaning process using a semiconductor manufacturing device is diluted to a specified concentration with an inert gas. Then the diluted exhaust gas is introduced into an inlet scrubber 8 to spray atomized cleaning water from a shower nozzle 8a. Consequently, a hydrolytic gas and/or a water-soluble gas are removed by water wash through a gas and liquid contact. After that, the water-washed exhaust gas is guided to a heat-reaction part 2 to be heated with a heater 5, and as a result, a water-insoluble, heat-decomposable gas is thermally decomposed. Next, the decomposed gas is guided to an outlet scrubber 9 to bring the decomposed gas to come into contact with a cleaning water from a shower nozzle 9a. Thus a metal-corrosive and hydrolytic gas and/or a water-soluble gas which are contained in a byproduct gas generated by heat decomposition are removed by water wash. The device is permanently used after the removal of the corrosive component.

40. 发明专利

JPH1024219A WASTE GAS DENITRATING METHOD 失效
公开(公告)号：JPH1024219A
公开(公告)日：1998-01-27
申请号：JP18200996
申请日：1996-07-11
申请人： MITSUBISHI HEAVY IND LTD , OSAKA GAS CO LTD
发明人： MOCHIDA ISAO , YASUTAKE AKINORI , SETOGUCHI TOSHIHIKO , KOBAYASHI TAKAFURU , NAKAMURA HITOSHI
IPC分类号： B01D53/56 , B01D53/54 , B01D53/86 , B01D53/94
摘要： PROBLEM TO BE SOLVED: To provide a waste combustion gas denitrating method suitable for measures on waste gas being at low temperature such as on startup of a combustion plant or for denitration of waste gas in a low temperature part. SOLUTION: In a method of passing waste combustion gas through an ammonia reducing denitration device 2 to denitrate it, a bypass in which a low temperature denitration device 8 is installed is formed on the downstream side of the ammonia reducing denitration device 2 in a waste gas flow passage. When waste gas is at low temperature, it is passed through the bypass to denitrate it by the low temperature denitration device 8, and when the ammonia-reducing denitration device 2 sufficiently functions, denitration is performed by the ammonia reducing denitration device 2, and while a bypass valve is closed, the catalyst in the low temperature denitration device 8 is regenerated. And plural lines of low temperature denitration devices are installed in parallel in a part of the waste gas flow passage in which waste gas is at room temperature to 200 deg.C, and they are switched in order to perform denitration and catalyst regeneration.

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