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31. 发明专利

JP2008270158A Anisotropic conductive member, and its manufacturing method 有权
标题翻译：各向异性导电构件及其制造方法
公开(公告)号：JP2008270158A
公开(公告)日：2008-11-06
申请号：JP2007318661
申请日：2007-12-10
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： HOTTA YOSHINORI , TAIMA TAKASHI , HATANAKA YUSUKE
IPC分类号： H01R11/01 , H01B5/16 , H01B13/00 , H01R43/00
摘要： PROBLEM TO BE SOLVED: To provide an anisotropic conductive member capable of drastically improving installation density of conductive paths, and usable as an electrical connection member, an inspecting connector or the like of an electronic component such as a semiconductor element even in the present in which the enhancement of integration has further advanced; and its manufacturing method. SOLUTION: This anisotropic conductive member is structured such that a plurality of conductive paths formed out of a conductive member are formed in an insulating base material to pass in a mutually insulated state through the insulating base material in its thickness direction, and in a state where one end of each conductive path is exposed on one-side surface of the insulating base material and the other end of each conductive path is exposed on the other-side surface of the insulating base material. In the anisotropic conductive member, the conductive paths have a density of at least 2 million paths/mm 2 , and the insulating base material is a structure composed of an anodized coating film of an aluminum substrate having regularly arranged micropores therein. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：为了提供能够显着提高导电路径的安装密度的各向异性导电构件，并且可用作电连接构件，诸如半导体元件的电子部件的检查连接器等，即使在目前加强一体化进一步发展; 及其制造方法。解决方案：这种各向异性导电构件被构造成使得由导电构件形成的多个导电路径形成在绝缘基材中，以相互绝缘的状态通过绝缘基材在其厚度方向上通过，并且每个导电路径的一端露出在绝缘基材的一侧表面上并且每个导电路径的另一端暴露在绝缘基材的另一侧表面上的状态。在各向异性导电构件中，导电路径具有至少200万路径/ mm 2的密度，绝缘基材是由具有规则排列的铝基板的阳极氧化涂膜组成的结构其中的微孔。版权所有（C）2009，JPO＆INPIT

32. 发明专利

JP2007231339A Method for producing fine structure, and fine structure 有权
标题翻译：生产细小结构的方法和细微结构
公开(公告)号：JP2007231339A
公开(公告)日：2007-09-13
申请号：JP2006052825
申请日：2006-02-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： HATANAKA YUSUKE , TOMITA TADAFUMI , HOTTA YOSHINORI , UESUGI AKIO
IPC分类号： C25D11/16 , B01J35/10 , B82B1/00 , B82B3/00 , C23G1/12 , C25D11/04
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a structure having regularly arrayed recesses without using a compound of highly toxic hexavalent chromic acid compound. SOLUTION: The method for producing the fine structure having micropores on its surface comprises the steps of: preparing an aluminum member comprising an aluminum substrate and an anodic oxide film containing micropores formed on the surface of the aluminum substrate; removing the film by using an alumina-dissolving solution which contains at least one compound selected from the group consisting of nitric acid, chromium hydroxide, phosphoric acid, a zirconium compound, a titanium compound, a lithium salt, a cerium salt, a magnesium salt, sodium silicofluoride, zinc fluoride, a manganese compound, a molybdenum compound, a magnesium compound and a simple halogen, contains no chromic compound, and dissolves alumina but dissolves no aluminum; and subsequently anodizing the aluminum. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：待解决的问题：提供一种制备具有规则排列的凹槽的结构的方法，而不使用高毒性六价铬酸化合物的化合物。解决方案：在其表面上具有微孔的精细结构的制造方法包括以下步骤：制备包括铝基板的铝构件和在铝基板的表面上形成有微孔的阳极氧化膜; 通过使用含有至少一种选自硝酸，氢氧化铬，磷酸，锆化合物，钛化合物，锂盐，铈盐，镁盐的化合物的氧化铝溶解溶液除去膜，氟化硅钠，氟化锌，锰化合物，钼化合物，镁化合物和单卤素，不含铬化合物，并溶解氧化铝而不溶解铝; 随后阳极氧化铝。版权所有（C）2007，JPO＆INPIT

33. 发明专利

JP2007231336A Method for producing fine structure, and fine structure 有权
标题翻译：生产细小结构的方法和细微结构
公开(公告)号：JP2007231336A
公开(公告)日：2007-09-13
申请号：JP2006052758
申请日：2006-02-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： HATANAKA YUSUKE , TOMITA TADAFUMI , HOTTA YOSHINORI , UESUGI AKIO
IPC分类号： C25D11/12 , B82B1/00 , B82B3/00 , C25D11/04 , C25D11/16
CPC分类号： C25D11/20 , C25D11/12 , C25D11/24 , Y10T428/12042 , Y10T428/12056 , Y10T428/249953 , Y10T428/24997 , Y10T428/249974
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a structure having regularly arrayed recesses, in a short period of time. SOLUTION: The method for producing the fine structure having micropores on its surface comprises the steps of: preparing an aluminum member comprising an aluminum substrate and an anodic oxide film having micropores existing on the surface of the aluminum substrate; subjecting the aluminum member to a regulation treatment at least one time, which comprises carrying out the first film-dissolving treatment of dissolving 0.001 to 20 mass% of the anodic oxide film and carrying out an anodizing treatment after the first film-dissolving treatment; and subsequently subjecting the aluminum member to the second film-dissolving treatment of dissolving the anodic oxide film. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种在短时间内制造具有规则排列的凹部的结构的方法。解决方案：在其表面上具有微孔的精细结构的制造方法包括以下步骤：制备包含铝基板的铝构件和在铝基板的表面上存在微孔的阳极氧化膜; 对铝构件进行至少一次的调节处理，包括进行第一次溶解处理，将0.001〜20质量％的阳极氧化膜溶解并进行第一次溶解处理后的阳极氧化处理; 然后对铝构件进行第二次溶解溶解阳极氧化膜的溶解处理。版权所有（C）2007，JPO＆INPIT

34. 发明专利

JP2007231335A Fine structure body and manufacturing method therefor 审中-公开
标题翻译：精细结构体及其制造方法
公开(公告)号：JP2007231335A
公开(公告)日：2007-09-13
申请号：JP2006052757
申请日：2006-02-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： HATANAKA YUSUKE , HOTTA YOSHINORI
IPC分类号： C25D11/04 , B81B1/00 , B82B1/00 , B82B3/00 , C25D11/18 , H01L51/42 , H02N6/00
CPC分类号： Y02E10/549 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To provide a fine structure body which is superior in such energy transferability as to be able to convert light energy to electric energy, and to provide a manufacturing method therefor. SOLUTION: The fine structure body has micropores, in which 50% or more of the micropores are regularly arrayed, and has at least (A) a donor of visible-light absorptive energy and (B) an energy receptor. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够将能量转换成电能的能量转移性优异的精细结构体，并提供其制造方法。解决方案：精细结构体具有微孔，其中规则排列有50％或更多的微孔，并且具有至少（A）可见光吸收能量的供体和（B）能量受体。版权所有（C）2007，JPO＆INPIT

35. 发明专利

JP2007055231A Method of manufacturing support for lithographic printing plate 审中-公开
标题翻译：制造印刷版的支持方法
公开(公告)号：JP2007055231A
公开(公告)日：2007-03-08
申请号：JP2006094040
申请日：2006-03-30
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： NISHINO ATSUO , HOTTA YOSHINORI , UESUGI AKIO
IPC分类号： B41N3/03 , B41N1/08 , B41N3/04 , C25D11/16 , C25F3/04 , G03F7/00 , G03F7/09
摘要： PROBLEM TO BE SOLVED: To offer a method of manufacturing a support for a lithographic printing plate which can acquire a lithographic printing original plate excellent in plate wear, smudging resistance, and cleaner resistance. SOLUTION: Disclosed is a method of manufacturing a lithographic printing plate support wherein an aluminum plate 1 is subjected at least to, in order, a mechanical graining treatment in which the aluminum plate 1 is grained to a mean surface roughness R a of 0.25 to 0.40 μm using brushes 2, 4 and a slurry liquid 3 containing an abrasive, an electrochemical graining treatment in which the aluminum plate 1 is grained using an alternating current in an aqueous solution containing nitric acid, and an alkali etching treatment in which the aluminum plate 1 is etched in an aqueous alkali solution, thereby acquiring the lithographic printing plate support having a mean surface roughness R a after the alkali etching treatment of 0.41 to 0.6 μm. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够获得平板印刷原版的平版印刷版的支撑体的方法，该平版印刷原版具有优异的板磨损性，抗污染性和清洁性。解决方案：公开了一种制备平版印刷版支撑件的方法，其中铝板1依次经受机械砂纹处理，其中铝板1被磨平至平均表面粗糙度R SB 使用刷子2,4和含有研磨剂的浆液3的0.25〜0.40μm的，使用交替电流在含有硝酸的水溶液中使铝板1粒化的电化学粗化处理，以及在碱性水溶液中蚀刻铝板1的碱蚀刻处理，从而获得0.41〜0.6μm的碱蚀刻处理后的平均表面粗糙度R a 的平版印刷版支撑体。版权所有（C）2007，JPO＆INPIT

36. 发明专利

JP2007030146A Method for manufacturing nanostructure 审中-公开
标题翻译：制造纳米结构的方法
公开(公告)号：JP2007030146A
公开(公告)日：2007-02-08
申请号：JP2005221625
申请日：2005-07-29
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TOMITA TADAFUMI , HOTTA YOSHINORI , UESUGI AKIO
IPC分类号： B82B3/00 , B82B1/00 , C25D11/04 , C25D11/16 , C25D11/18
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure which is regulated in a wide area and can be applied to electromagnetic devices such as an optical device and a magnetic device in a simple process by removing visible scratches appearing on a high purity aluminum plate to obtain a mirror surface and then anodizing the surface to improve the surface flatness of the anodized nanostructure.
SOLUTION: The method for manufacturing a nanostructure having micropores on the surface is carried out by subjecting an aluminum substrate having ≥99.9% purity to at least mechanical polishing to obtain ≤0.1 μm arithmetic average roughness Ra and ≥60% surface gloss, and then anodizing.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种制造在广泛范围内调节的结构的方法，并且可以以简单的方法将其应用于诸如光学装置和磁性装置的电磁装置，通过除去出现在高纯度铝板获得镜面，然后阳极氧化表面，以改善阳极氧化纳米结构的表面平整度。解决方案：通过使具有≥99.9％纯度的铝基材进行至少机械抛光以获得≤0.1μm的算术平均粗糙度Ra和≥60％的表面光泽来进行表面上具有微孔的纳米结构的制造方法，然后阳极氧化。版权所有（C）2007，JPO＆INPIT

37. 发明专利

JP2015032401A ガス電子増倍器およびガス電子増倍装置有权
标题翻译：气体电子乘法器和气体电子乘法器件
公开(公告)号：JP2015032401A
公开(公告)日：2015-02-16
申请号：JP2013159978
申请日：2013-07-31
申请人：富士フイルム株式会社 , Fujifilm Corp
发明人： HOTTA YOSHINORI
IPC分类号： H01J47/06
CPC分类号： H01J47/02
摘要：【課題】分解能を向上することができるガス電子増倍器およびガス電子増倍装置を提供する。【解決手段】アルミニウムの陽極酸化膜からなり、厚さ方向に貫通する複数の貫通孔を有する絶縁層と、絶縁層を挟持し、複数の貫通孔内に電場を発生させる一対の電極層とを備え、複数の貫通孔は、直径が20nm〜400nmで且つピッチが40nm〜500nmであり、開口面積率が30%以上であるガス電子増倍器。【選択図】図1
摘要翻译：要解决的问题：提供一种能够提高分辨率的气体电子倍增器和气体电子倍增装置。解决方案：一种气体电子倍增器，包括：由铝阳极氧化膜制成的绝缘层，并且具有穿透穿过的多个通孔在其厚度方向上; 以及保持绝缘层并在通孔内产生电场的一对电极层。通孔的直径为20-400nm，间距为40-500nm，开口面积比为30％以上。

38. 发明专利

JP2013145833A Reflection substrate for led light-emitting element and led package 审中-公开
标题翻译： LED发光元件和LED封装的反射基板
公开(公告)号：JP2013145833A
公开(公告)日：2013-07-25
申请号：JP2012006174
申请日：2012-01-16
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： HOTTA YOSHINORI
IPC分类号： H01L33/60
CPC分类号： H01L33/60 , H01L33/62 , H01L2224/48091 , H01L2224/73265 , H01L2924/10253 , H01L2924/181 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： PROBLEM TO BE SOLVED: To provide a reflection substrate for an led light-emitting element and an LED package, capable of maintaining high luminous efficiency, and excellent in wiring formation.SOLUTION: The reflection substrate for an LED light-emitting element comprises a surface to which the LED light-emitting element is mounted. In the surface, a surface other than a portion where at least the LED light-emitting element is mounted has arithmetic average roughness Ra of 0.01 to 0.20 μm, and an average interval Psm of irregularities is 10 to 20 μm.
摘要翻译：要解决的问题：提供一种能够保持高发光效率和优异的布线形成的LED发光元件和LED封装的反射基板。解决方案：用于LED发光元件的反射基板包括表面 LED发光元件被安装到其上。在表面上，至少安装有LED发光元件的部分以外的表面的算术平均粗糙度Ra为0.01〜0.20μm，凹凸的平均间隔Psm为10〜20μm。

39. 发明专利

JP2012201915A Metal-filled structure 审中-公开
标题翻译：金属填充结构
公开(公告)号：JP2012201915A
公开(公告)日：2012-10-22
申请号：JP2011066233
申请日：2011-03-24
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： YAMASHITA KOSUKE , HOTTA YOSHINORI
IPC分类号： C25D11/20
摘要： PROBLEM TO BE SOLVED: To provide a metal-filled structure that is an anisotropic conductive member excellent in light transmissivity or excellent in heat transfer properties and heat dissipation properties and that is applicable to various applications.SOLUTION: The metal-filled structure includes: a portion having a through-hole A penetrating in the thickness direction with an average diameter of 10-1,000 nm; and a portion having a through-hole B penetrating in the thickness direction with an average diameter of 100 nm-1 mm, in a structure comprising an inorganic insulating substrate, wherein the ratio of the average diameter of the through-hole A to the average diameter of the through-hole B is 5 or more, the density of the through-hole A is 1×10to 1×10pieces/mm, the depth of the through-hole A is 50-1,000 μm, and a part of or all of any one of the through-hole A and the through-hole B or a part of or all of both of the through-hole A and the through-hole B are filled with metal.
摘要翻译：要解决的问题：提供一种金属填充结构，其是具有优异的透光性或优异的传热性能和散热性能的各向异性导电构件，并且可应用于各种应用。解决方案：金属填充结构包括：具有贯穿厚度方向的平均直径为10-1000nm的通孔A的部分; 在具有无机绝缘基板的结构中，具有在厚度方向上贯穿平均直径为100nm-1mm的通孔B的部分，其中通孔A的平均直径与平均直径之比通孔B的直径为5以上，通孔A的密度为1×10 6 〜1×10 10 件/ mm 2 ，通孔A的深度为50-1,000μm，并且通孔A中的任一个的一部分或全部并且通孔B或者通孔A和通孔B中的一部分或全部被金属填充。版权所有（C）2013，JPO＆INPIT

40. 发明专利

JP2012140708A Microstructure and manufacturing method 审中-公开
标题翻译：微结构与制造方法
公开(公告)号：JP2012140708A
公开(公告)日：2012-07-26
申请号：JP2012015549
申请日：2012-01-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： HATANAKA YUSUKE , HOTTA YOSHINORI
IPC分类号： C25D11/04 , B01D71/02 , B82Y40/00 , C25D11/12 , C25D11/18
摘要： PROBLEM TO BE SOLVED: To provide a porous aluminum membrane filter excellent in acid resistance, alkali resistance and also a filtration flow rate; to provide a microstructure suitable for the porous aluminum membrane filter; and to provide a method for manufacturing the microstructure.SOLUTION: The method for manufacturing the microstructure obtains the microstructure having micropores on the surface thereof, by performing in this order: (A) a step of forming at least an oxide film 14 having the micropore 16 by anodization, on the surface of an aluminum substrate 12; and (B) a step of heating the oxide film 14 formed by the (A) at 50°C or higher for at least 10 minutes.

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