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    • 21. 发明专利
    • Cvd apparatus
    • CVD装置
    • JP2012023313A
    • 2012-02-02
    • JP2010162148
    • 2010-07-16
    • Nippon Telegr & Teleph Corp 日本電信電話株式会社
    • OIKAWA KIRYOABE ATSUSHIITOU MIKITAKAKOMINATO TOSHIMI
    • H01L21/31C23C16/44
    • PROBLEM TO BE SOLVED: To provide a CVD apparatus which reduces a cleaning frequency of the inside of a chamber necessary for maintaining high quality deposition thereby improving an operation rate.SOLUTION: A CVD apparatus 100 comprises a chamber 1, a material gas supply device 2 for supplying a material gas into the chamber 1 and a waste gas processing device 12 for exhausting a waste gas from the chamber 1. A heating stage 6 provided in the chamber 1 has a mechanism for holding a substrate 5 and a heater cover 10 is provided around the heating stage 6 for inhibiting the heating stage 6 from corrosion by the waste gas or adhesion of a reaction product in the waste gas. The heater cover 10 has a plurality of gas eject ports 16 for ejecting a seal gas to create a seal gas layer that is a layer of an inert gas not reacting with the material gas between a surface of the heater cover 10 and the waste gas within a range of 30 mm from a circumference of the substrate 5 and thereby reducing an amount of deposit on the heater cover 10.
    • 要解决的问题:提供一种降低维持高质量沉积所必需的室内清洗频率的CVD装置,从而提高操作速率。 解决方案:CVD装置100包括室1,用于将材料气体供应到室1中的原料气体供应装置2和用于从室1排出废气的废气处理装置12.加热级6 在室1中设置有用于保持基板5的机构,并且在加热台6的周围设置加热器盖10,用于抑制加热台6被废气腐蚀或废气中的反应产物的粘附。 加热器盖10具有多个气体喷射口16,用于喷射密封气体以形成密封气体层,该密封气体层是与加热器盖10的表面和废气之间的材料气体不反应的惰性气体层 距离基板5的周长30mm的范围,从而减少加热器盖10上的沉积量。(C)2012年,JPO和INPIT
    • 22. 发明专利
    • Method for manufacturing optical waveguide circuit having laminate core and optical signal processing device including the optical waveguide circuit
    • 用于制造具有层状核的光波导电路的方法和包括光波导电路的光信号处理装置
    • JP2011253012A
    • 2011-12-15
    • JP2010126110
    • 2010-06-01
    • Nippon Telegr & Teleph Corp 日本電信電話株式会社
    • MORI ATSUSHIKOMINATO TOSHIMIITO MASAYUKIABE ATSUSHIITOU MIKITAKAWATANABE TOSHIO
    • G02B6/13G02B6/12G02B6/122G02B26/08G02F1/31
    • PROBLEM TO BE SOLVED: To solve the problem that a conventional three-dimensional lamination type waveguide circuit is complicated in the overall formation process, the problem of long term reliability in the formation of a stack structure using an organic adhesive, and also the problem in that a circuit having uniform accuracy over each of layers cannot be formed due to low softening temperature of a cladding material.SOLUTION: In the method for manufacturing an optical waveguide circuit according to the present invention, a core layer having two ore more sub layers laid in an order of an under clad, a core, an intermediate clad, and a core on a substrate is exposed to light using a photomask, and glass films including the multi-layer core layer are etched all at once, thereby forming an optical waveguide. The invention is characterized in that the optical waveguide circuits of the same structure are formed by three-dimensionally processing all at once. Further, a stackable structure in which the over-clad layers of two lamination type AWGs formed by the above-described method are made to face each other makes it possible for more equivalent layers stacked over one another.
    • 解决的问题为了解决传统的三维叠层型波导电路在整体形成过程中复杂的问题,使用有机粘合剂形成叠层结构的长期可靠性的问题,以及 由于包层材料的软化温度低,不能形成具有各层均匀的精度的电路的问题。 解决方案:在根据本发明的光波导电路的制造方法中,具有两层以上次层的芯层以下包层,芯,中间包层和芯的顺序铺设在芯层上 使用光掩模将基板曝光,并且包括多层芯层的玻璃膜一次蚀刻,从而形成光波导。 本发明的特征在于,同一结构的光波导电路一次三维处理形成。 此外,通过使用上述方法形成的两层叠型AWG的上覆层彼此相对的可堆叠结构使得彼此堆叠的更多等效层成为可能。 版权所有(C)2012,JPO&INPIT
    • 23. 发明专利
    • Device and method for adjusting refractive index of flat type optical circuit
    • 用于调整平面型光电路的折射率的装置和方法
    • JP2007079461A
    • 2007-03-29
    • JP2005270543
    • 2005-09-16
    • Nippon Telegr & Teleph Corp 日本電信電話株式会社
    • NASU YUUKAIKAMITOKU MASAKIABE ATSUSHI
    • G02B6/13
    • PROBLEM TO BE SOLVED: To provide a refractive index adjusting device which can adjust a refractive index and can control a generation amount of birefringence with a simple configuration of the device by efficiently irradiating the center of the core part with ultraviolet rays condensed to a spot diameter suitable for an optical waveguide of a flat type optical circuit. SOLUTION: Miniaturization and simplification of an optical system of the refractive index adjusting device can be attained by using a single condensing lens for condensing the ultraviolet rays, uptaking fluorescence, and monitoring a condensed position. The spot diameter of the ultraviolet rays in the core part can be controlled by controlling a beam diameter and a beam divergence angle by an ultraviolet beam controller while fixing a visible light focus for monitoring the circuit face at the time of adjustment. An irradiating position with the ultraviolet rays is optimally controlled according to a spectrum level of the fluorescence. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种折射率调节装置,其能够通过以下方式简化配置来调节折射率,并且可以通过以下方式简化配置来控制双折射的产生量:通过有效地照射核心部分的中心, 适合于平面型光电路的光波导的光斑直径。 解决方案:通过使用用于冷凝紫外线,吸收荧光和监测冷凝位置的单个聚光透镜,可以实现折射率调节装置的光学系统的小型化和简化。 核心部分中的紫外线的光斑直径可以通过在固定用于在调节时监测电路面的可见光聚焦的同时通过紫外线束控制器控制光束直径和光束发散角来控制。 根据荧光的光谱水平优化地控制具有紫外线的照射位置。 版权所有(C)2007,JPO&INPIT
    • 25. 发明专利
    • 性能可変回折格子
    • 性能可变的衍射光栅
    • JP2014215518A
    • 2014-11-17
    • JP2013094064
    • 2013-04-26
    • 日本電信電話株式会社Nippon Telegr & Teleph Corp
    • MAGARI KATSUAKIABE ATSUSHITAKENOUCHI HIROKAZU
    • G02B5/18G02B6/122
    • G02B5/18G02B6/12
    • 【課題】反射率と反射波長帯域を変化させることが可能な性能可変回折格子を提供すること。【解決手段】性能可変回折格子は、基板上に平坦に堆積された堆積物上に形成されており、形成された基板の一部に、幅X、長さL、深さdの屈折液充填用溝12、13が掘られており、その間に幅Wのテラス部11が残された形状となっている。屈折液充填用溝13は周期的な鋸歯状型になっており、テラス部11の一部に入り込んでいる。屈折液充填用溝12、13は、任意の屈折率を持つ液体を充填可能であり、充填する液体の屈折率を変えることにより回折格子の基本特性である反射率と反射波長帯域を任意に変化させることができる。【選択図】図1
    • 要解决的问题:提供能够改变反射率和反射波长带的性能可变的衍射光栅。解决方案:在平滑地沉积在基板上的沉积物上形成性能可变的衍射光栅,以及折射液体充电槽12 并且在光栅形成基板的一部分上形成宽度X,长度L和深度d的13,并且在其间留有宽度为W的台阶部11。 具有周期性锯齿形状的折射充液槽13进入露台部分11的部分。折射液体填充槽12和13可以被填充具有任选折射率的液体,反射率和反射波长带是基本的 衍射光栅的特性可以通过改变要充电的液体的折射率来任意变化。
    • 26. 发明专利
    • Optical waveguide and manufacturing method thereof
    • 光波导及其制造方法
    • JP2013171261A
    • 2013-09-02
    • JP2012036835
    • 2012-02-22
    • Nippon Telegr & Teleph Corp 日本電信電話株式会社
    • ITO MASAYUKIABE ATSUSHIITOU MIKITAKA
    • G02B6/122G02B6/13
    • PROBLEM TO BE SOLVED: To provide an optical waveguide formed by depositing a stable core film which can prevent occurence of film peeling and cracks and has large compressive stress, using SiO-GeOas a base material for a core, which is proven in manufacturing an optical waveguide with extremely low loss, and also to provide a method for manufacturing the same.SOLUTION: The method for manufacturing the optical waveguide comprises: depositing a SiOunder cladding layer on a Si substrate; depositing 5%-ΔSiO-SnO-GeOfilm as a core film; performing heat-treatment for film quality stabilization of the core film; processing the core film into an optical waveguide pattern core; depositing an over cladding layer; and performing heat-treatment. When doping SnO, or HfOinstead of SnO, or both of SnOand HfOto SiO-GeOglass, SnOis required to be 30 mol% or less, and HfOis required to be 8.3 mol% or less in order to prevent crystallization in the waveguide from occurring and to prevent a propagation loss from exceeding 0.1 dB/cm.
    • 要解决的问题:为了提供通过沉积稳定的芯膜形成的光波导,其可以防止膜剥离和裂纹的发生,并且具有大的压缩应力,使用SiO-GeOas作为芯的基材,这在制造光学 波导具有极低的损耗,并且还提供其制造方法。解决方案:制造光波导的方法包括:在Si衬底上沉积氧化物覆层; 沉积5%的SiO 2 SnO-GeO膜作为芯膜; 对芯膜的膜质量稳定进行热处理; 将芯膜加工成光波导图案芯; 沉积上敷层; 并进行热处理。 当将SnO或SnO和HfO的HfO掺杂到SiO-GeO玻璃上时,SnO要求为30摩尔%以下,HfO为8.3摩尔%以下,以防止波导中的结晶发生, 防止传播损耗超过0.1 dB / cm。
    • 27. 发明专利
    • Cvd device
    • CVD装置
    • JP2011146434A
    • 2011-07-28
    • JP2010004151
    • 2010-01-12
    • Nippon Telegr & Teleph Corp 日本電信電話株式会社
    • OIKAWA KIRYOITO MASATAKAABE ATSUSHI
    • H01L21/31C23C16/455
    • PROBLEM TO BE SOLVED: To provide a CVD device that performs film deposition of high quality by stabilizing a gas flow at the periphery of a substrate in a chamber in the CVD device and homogenizing the component and the thickness of a film to be deposited. SOLUTION: A partition 11 for homogenizing an exhaust gas flow velocity is installed between a heating stage and a gas head, and exhaust ports 7 and 8 to spray the flow of a material gas from the gas head to a substrate without fluctuations. Consequently, the CVD device that can perform homogeneous film deposition can be obtained. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:为了提供一种CVD装置,其通过使CVD装置中的室中的基板的周围的气流稳定化并使膜的成分和膜的厚度均匀化来进行高质量的膜沉积 沉积。 解决方案:用于使废气流速均匀化的分隔件11安装在加热台和气体头之间,以及排气口7和8,以将材料气体从气头喷射到衬底而不发生波动。 因此,可以获得能够进行均匀的膜沉积的CVD装置。 版权所有(C)2011,JPO&INPIT
    • 28. 发明专利
    • Method and mask for adjusting wavelength characteristic of arrayed waveguide grating
    • 用于调整阵列波长光栅波长特性的方法和面板
    • JP2006243011A
    • 2006-09-14
    • JP2005054514
    • 2005-02-28
    • Nippon Telegr & Teleph Corp 日本電信電話株式会社
    • KAMITOKU MASAKINASU YUUKAIABE ATSUSHI
    • G02B6/13G02B6/12
    • PROBLEM TO BE SOLVED: To adjust a wavelength characteristic of an arrayed waveguide grating (AWG) by a simple method. SOLUTION: Expressing the effective waveguide of the arrayed waveguide grating by Na, and numbering the waveguides as i (i=-N to N, N=Na/2), a phase adjusting mask 200 with an aperture 201 satisfying a cubic function L3(i)=a3×m 3 +a2×m 2 +a1×m+a0 (however, m=i/N) is manufactured. The aperture of this mask is superposed on the arrayed waveguides and is irradiated with ultraviolet rays and thereby a refractive index of each waveguide is varied according to the shapes of the cubic function L3(i). Characteristics of an inclination of the AWG transmission spectrum, chromatic dispersion, and a central wavelength become adjustable individually by properly setting the coefficients of the function Li3(i). Also, adjustment amounts of these characteristics can be controlled by changing exposure time of the ultraviolet rays. Thus, it becomes possible to correct dispersion of individual elements using a common mask and to manufacture highly accurate elements with a good yield. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:通过简单的方法调整阵列波导光栅(AWG)的波长特性。 解决方案:通过Na表示阵列波导光栅的有效波导,并将波导编号为i(i = -N至N,N = Na / 2),相位调整掩模200,孔径201满足立方 功能L3(i)= a3×m 3 + a2×m 2 + a1×m + a0(然而,m = i / N)。 该掩模的孔径叠加在阵列波导上,并用紫外线照射,由此每个波导的折射率根据三次函数L3(i)的形状而变化。 通过适当地设置函数Li3(i)的系数,AWG透射光谱,色散和中心波长的倾斜度的特性变得单独调节。 此外,可以通过改变紫外线的曝光时间来控制这些特性的调整量。 因此,可以使用公共掩模来校正各个元件的分散,并且以良好的收率制造高精度的元件。 版权所有(C)2006,JPO&NCIPI