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21. 发明专利

JP2010188321A Cleaning method, object to be cleaned and cleaning device 审中-公开
标题翻译：清洁方法，清洁和清洁装置
公开(公告)号：JP2010188321A
公开(公告)日：2010-09-02
申请号：JP2009037957
申请日：2009-02-20
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： MIYAMOTO MAKOTO , YAMAZAKI HISAE , KUROKI HIROSHI , KAMIYAMA TOMOTSUGU
IPC分类号： B08B3/10
摘要： PROBLEM TO BE SOLVED: To inhibit the worsening of cleaning performance or the operating efficiency of a cleaning device due to a large amount of floating and separated soil during an early cleaning operation, in the cleaning device which cleans an object to be cleaned such as components, with the help of bubbles.
SOLUTION: First, floating soil 4 which is afloat on the water surface of cleaning water 2 in a cleaning tank 1 and the cleaning water 2, are allowed to pass through a conduit pipe, and then flow into a first separation tank 16 for separating a large amount of the soil 18. Following this procedure, an on-off valve is controlled by a control part after the almost complete outflow of a large amount of the soil 18, and the cleaning water 2 containing a negligible amount of the soil 18 is allowed to flow into a second separation tank 12. The second separation tank 12 has a partition plate 13 for preventing the soil 18 from flowing into an intake for a circulating water, and further is connected with a microair bubble generator 6 through water piping 15 and a water circulating pump 11, in order to resupply the cleaning water 2 to the cleaning tank 1. Thus, under this constitution, it is possible to store into the first separation tank 16 a large amount of the soil 18 during an early cleaning stage of the cleaning operation characteristic in the cleaning using the microair bubble 3, and ensure the stable operation of the cleaning device.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了在早期清洁操作期间抑制由于大量浮动和分离的污垢而导致的清洁性能的恶化或清洁装置的操作效率，在清洁待清洁物体的清洁装置中如组件，借助气泡。解决方案：首先，在清洗槽1和清洗水2中清洗水2的水面漂浮的浮土4通过导管，然后流入第一分离槽16 用于分离大量土壤18.按照该过程，在大量土壤18几乎完全流出之后，通过控制部分控制开关阀，并且清洁水2含有可忽略量的允许土壤18流入第二分离罐12.第二分离罐12具有隔板13，用于防止土壤18流入循环水的进口，并且还通过水与微型气泡发生器6连接管道15和水循环泵11，以便将清洁水2再次供应到清洗槽1.因此，在这种结构下，可以在早期的第一分离槽16中将大量的土壤18储存清洁使用微气泡3进行清洗时的清洗作业特性，确保清洗装置的稳定运转。版权所有（C）2010，JPO＆INPIT

22. 发明专利

JP2010074102A Method of etching silicon substrate, etchant for silicon substrate and etching device of silicon substrate 审中-公开
标题翻译：硅衬底蚀刻方法，硅衬底蚀刻剂和硅衬底蚀刻装置
公开(公告)号：JP2010074102A
公开(公告)日：2010-04-02
申请号：JP2008243198
申请日：2008-09-22
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： YASUNAGA NOZOMI , MIYAMOTO MAKOTO , KAMIYAMA TOMOTSUGU , HAZUMI KOUICHI , HAMAMOTO SATORU
IPC分类号： H01L21/308 , H01L21/306 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a method of etching a silicon substrate which forms a texture efficiently on the surface of a silicon substrate to make a silicon substrate having a low light reflection rate, and to provide an etchant and an etching device. SOLUTION: The method of etching the silicon substrate includes supplying an etchant on the surface of a silicon substrate and forming uneveness on the surface of the silicon substrate by wet etching. The etchant includes at least one of water, alkaline reagent, and an alcohol derivative of formula (1). Formula (1) is represented by X-(OH) n (X is a saturated or unsaturated hydrocarbon group of a 4-7C, n is an integer of ≥1, and n COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在硅衬底的表面上有效地形成纹理的硅衬底的蚀刻方法，以制造具有低光反射率的硅衬底，并且提供蚀刻剂和蚀刻装置。解决方案：蚀刻硅衬底的方法包括在硅衬底的表面上提供蚀刻剂，并通过湿蚀刻在硅衬底的表面上形成不均匀性。蚀刻剂包括水，碱性试剂和式（1）的醇衍生物中的至少一种。式（1）由X-OH（OH）2表示。（X是4-7C的饱和或不饱和烃基，n是≥1的整数，n

23. 发明专利

JP2010064021A Microbubble generator and method of generating microbubble 有权
标题翻译：微生物发生器和微生物产生方法
公开(公告)号：JP2010064021A
公开(公告)日：2010-03-25
申请号：JP2008233624
申请日：2008-09-11
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： KAMIYAMA TOMOTSUGU , MIYAMOTO MAKOTO , MATSUI HISAE
IPC分类号： B01F3/04 , B01F7/16 , B01F7/18
摘要： PROBLEM TO BE SOLVED: To obtain a microbubble generator, which enables a miniaturization, and at the same time can generate more stably many microbubbles, and a method of generating a microbubble.
SOLUTION: A liquid 2 is pooled in a vessel 1. An agitator body 5 has a holding member 15 and an insert piece 16 which protrudes from the holding member 15 and can be inserted into the liquid 2. A device 6 for driving the agitator body moves the insert piece 16 in a direction which shears a liquid surface 3 by rotating the agitator body 5 while maintaining the state that a part of the insert piece 16 exists in the liquid 2 and the remaining of the insert piece 16 goes out of the liquid surface 3 to the outside of the liquid 2. Microbubbles are generated in the liquid 2 by the movement of the insert piece 16 to the direction which shears the liquid surface 3.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了获得能够小型化并且同时可以产生更稳定的许多微泡的微泡发生器，以及产生微泡的方法。解决方案：将液体2汇集在容器1中。搅拌器主体5具有保持构件15和从保持构件15突出并可插入到液体2中的插入件16.用于驱动的装置6 搅拌器主体通过旋转搅拌器主体5沿着剪切液面3的方向移动插入件16，同时保持插入件16的一部分存在于液体2中，并且插入件16的剩余部分脱离液体表面3到液体2的外部。通过插入件16移动到剪切液面3的方向，在液体2中产生微泡。（C）2010，JPO＆INPIT

24. 发明专利

JP2009285557A Washing device 有权
标题翻译：洗衣设备
公开(公告)号：JP2009285557A
公开(公告)日：2009-12-10
申请号：JP2008139928
申请日：2008-05-28
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： SHIBATA YOHEI , MIYAMOTO MAKOTO , HINOMOTO NOBUHIDE
IPC分类号： B08B3/10 , C23G3/00
摘要： PROBLEM TO BE SOLVED: To provide a washing device which has the low possibility causing failure, is inexpensive and has high uniformity of washing.
SOLUTION: A plurality of injectors 5B, 5L, 5R, 5T can generate streams containing air bubbles BB in washing liquid 7 and are arranged around a conveyor 3 such that the streams go toward the conveyor 3.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有低可能性导致故障的清洗装置，便宜并具有高的洗涤均匀性。解决方案：多个喷射器5B，5L，5R，5T可以产生在洗涤液体7中含有气泡BB的流，并且布置在输送机3周围，使得流朝向输送机3。 C）2010，JPO＆INPIT

25. 发明专利

JP2009142782A Cleaning apparatus 有权
标题翻译：清洁装置
公开(公告)号：JP2009142782A
公开(公告)日：2009-07-02
申请号：JP2007324778
申请日：2007-12-17
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： HINOMOTO NOBUHIDE , MIZOGAMI YOSUKE , MIYAMOTO MAKOTO , SHIBATA YOHEI
IPC分类号： B08B3/04 , C23G5/04
摘要： PROBLEM TO BE SOLVED: To reduce cost required for treatment of cleaning water after cleaning, by increasing cleaning efficiency and reducing usage of cleaning water itself causing the environmental load.
SOLUTION: A plurality of injectors W1 are distributedly set on the bottom of a cleaning tank W, and a cleaning basket B containing cleaning objects is set in the cleaning tank W. When a jet-receiving basket face B2 of the cleaning basket B becomes parallel to the bottom of the cleaning tank W by the rotation of the cleaning basket B, many of the cleaning objects gather on the one face, so that gas/liquid mixture is jetted toward the jet-receiving basket face B2 from the injectors W1.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了降低清洁后处理清洁水所需的成本，通过提高清洁效率和减少清洁水本身引起环境负荷的用途。解决方案：多个喷射器W1分布地设置在清洗槽W的底部，并且在清洁槽W中设置包含清洁物体的清洁筐B.当清洁筐的喷射接收筐面B2 B通过清洗筐B的旋转变得平行于清洗槽W的底部，许多清洁物体聚集在一个面上，使得气体/液体混合物从喷射器向喷射接收筐面B2喷射 W1。版权所有（C）2009，JPO＆INPIT

26. 发明专利

JP2009039318A Washing machine 有权
标题翻译：洗衣机
公开(公告)号：JP2009039318A
公开(公告)日：2009-02-26
申请号：JP2007207569
申请日：2007-08-09
申请人： Mitsubishi Electric Corp , Nippon Kentetsu Co Ltd , 三菱電機株式会社 , 日本建鐵株式会社
发明人： ANDO HIROSHI , KOMAE SOTA , IBARADA NAOKI , KOUUCHI YUMIKO , ISHII TAKAKO , MISUMI NAHO , MIYAMOTO MAKOTO , ISHIKAWA NORIHIKO
IPC分类号： D06F33/02
摘要： PROBLEM TO BE SOLVED: To provide a washing machine making it possible to simply and inexpensively wash all of tubs including parts above the maximum level normally not washed at washing with a smaller volume of water.
SOLUTION: The washing machine is provided with a water tub able to store/drain washing water, a washing/spin-drying tub rotatably disposed inside the water tub, a rotary drive means for rotating the washing tub, a water supply means for supplying water to the washing tub and a control means for controlling the drive means and the water supply means. The control means makes the supply means supply water to the washing tub and the drive means rotate the washing tub to generate a water flow of the washing water inside the washing tub to make it bubble up between the washing tub and the water tub to wash all of the tubs.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种洗衣机，使得可以简单且廉价地洗涤包括在较小体积的水洗涤的通常不被洗涤的最高水平以上的部件的所有桶。解决方案：洗衣机设置有能够储存/排出洗涤水的水桶，可旋转地设置在水桶内的洗涤/旋转干燥桶，用于旋转洗涤桶的旋转驱动装置，供水装置用于向洗涤桶供水;以及控制装置，用于控制驱动装置和供水装置。控制装置使得供应装置向洗涤桶供水，驱动装置旋转洗涤桶以产生洗涤桶内的洗涤水的水流，使其在洗涤桶和水桶之间起泡以洗涤所有的浴缸。版权所有（C）2009，JPO＆INPIT

27. 发明专利

JP2005296786A Washing device 审中-公开
标题翻译：洗衣设备
公开(公告)号：JP2005296786A
公开(公告)日：2005-10-27
申请号：JP2004116277
申请日：2004-04-12
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： SAITO TEIJI , MIYAMOTO MAKOTO , KAMIYAMA TOMOTSUGU , ARAKANE ATSUSHI
IPC分类号： B08B3/10 , C23G3/00
摘要： PROBLEM TO BE SOLVED: To provide a washing device that is capable of exactly performing the washing with bubbles of the material to be washed by surely contacting the bubbles with the material to be washed. SOLUTION: The washing device is provided with a washing tank 1 to store the washing solution, a vessel 2 for the material to be washed which is arranged in the washing tank 1 and stores the material to be washed and a bubble generating part 3 installed at the structural member constituting the washing tank 1 and supplies the bubbles from the inner face of the washing tank structural member. The inner face of the washing tank structural member which installs the bubble generating part 3 and the outer face of the vessel 2 for the material to be washed extending along the inner face part of the washing tank constituting member are faced to each other in a predetermined interval g. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种洗涤装置，其能够通过将气泡与待洗涤物质确保接触来精确地进行洗涤材料的气泡的洗涤。洗涤装置设置有洗涤槽1，用于存储洗涤溶液，用于待洗涤物质的容器2，其被布置在洗涤槽1中并储存待洗涤的材料和气泡发生部分 3安装在构成清洗槽1的结构件上，并从洗涤槽结构件的内表面供应气泡。安装发泡部3的清洗槽结构部件的内面和沿着洗涤槽构成部件的内面部延伸的被洗涤材料的容器2的外表面以预定的方式相互面对间隔g。版权所有（C）2006，JPO＆NCIPI

28. 发明专利

JP2005228790A Resist removal method, resist-removing apparatus, and semiconductor wafer 审中-公开
标题翻译：电阻去除方法，电阻去除装置和半导体波形
公开(公告)号：JP2005228790A
公开(公告)日：2005-08-25
申请号：JP2004033373
申请日：2004-02-10
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： NAKAI TAKAFUMI , NODA SEIJI , MIYAMOTO MAKOTO , ARAKANE ATSUSHI , SAITO TEIJI , KAMIYAMA TOMOTSUGU
IPC分类号： H01L21/3065 , H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a resist removal method and a resist remover which has process time, independently of the thickness of a surface hardened layer of resist and removes the resist, without residues.
SOLUTION: The method of removing a resist 2, having a surface hardened layer 2a formed on a semiconductor wafer 1, comprises a cracking generation step of generating cracking resist patterns of the resist 2 at a temperature of 180°C or lower as many as one or more cracks 3 located within 1 μm from one end of each resist pattern, and a resist-removing step of removing the resist 2 with the caused cracks 3 at a temperature of 100°C or lower.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有处理时间的抗蚀剂去除方法和抗蚀剂去除剂，其独立于抗蚀剂的表面硬化层的厚度并除去抗蚀剂，而没有残留物。解决方案：除去形成在半导体晶片1上的表面硬化层2a的抗蚀剂2的方法包括：裂解产生步骤，在180℃或更低的温度下产生抗蚀剂2的抗裂图案，如许多作为一个或多个裂纹3位于距离每个抗蚀剂图案的一端1μm以内，以及抗蚀剂去除步骤，在100℃或更低的温度下用所产生的裂纹3除去抗蚀剂2。版权所有（C）2005，JPO＆NCIPI

29. 发明专利

JP2005138022A Bubble generation method and bubble generator 审中-公开
标题翻译：泡沫发生方法和泡沫发生器
公开(公告)号：JP2005138022A
公开(公告)日：2005-06-02
申请号：JP2003377016
申请日：2003-11-06
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： KAMIYAMA TOMOTSUGU , MIYAMOTO MAKOTO , NODA SEIJI
IPC分类号： B01F3/04 , B01F11/00
摘要： PROBLEM TO BE SOLVED: To provide a bubble generation method capable of obtaining a liquid containing fine bubbles at high density, and a bubble generator. SOLUTION: In the bubble generation method, the liquid is retained so as to be contacted with a solid and a blow with a degree not destroying the solid is imparted to the solid with the bubbles present in the liquid. The bubble generator is provided with a container 1 having the liquid containing the bubbles at the inside; and a hitting means 2 for hitting a part of a wall of the container to the degree not destroying the above wall. Further, water containing a substance having a hydrophilic group and a hydrophobic group in a molecule is used as the liquid. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够以高密度获得含有微小气泡的液体的气泡生成方法和气泡发生器。解决方案：在气泡生成方法中，液体被保持为与固体接触，并且具有不破坏固体的程度的吹气被赋予具有存在于液体中的气泡的固体。气泡发生器设置有容纳在内部的含有气泡的液体的容器1; 以及用于以不破坏上述壁的程度击打容器的壁的一部分的击打装置2。此外，使用含有分子中具有亲水基团和疏水基团的物质的水作为液体。版权所有（C）2005，JPO＆NCIPI

30. 发明专利

JP2004335847A Method for manufacturing semiconductor integrated circuit wafer 审中-公开
公开(公告)号：JP2004335847A
公开(公告)日：2004-11-25
申请号：JP2003131558
申请日：2003-05-09
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： MIYAMOTO MAKOTO , OYA IZUMI , KUZUMOTO MASAKI
IPC分类号： H01L21/768 , H01L21/316 , H01L23/522
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor integrated circuit wafer having an SiOC (Carbon Doped Silicon Oxide) film as its interlayer insulating film, low in dielectric constant, excellent in adhesion to a metallic film, and free of deterioration or deformation when subjected to CMP.
SOLUTION: The method for manufacturing a semiconductor integrated circuit wafer having an SiOC film as its interlayer insulator film 12 includes a process of forming a modified layer 13 on the surface of the SiOC film. The formation of the modified layer 13 on the surface of the SiOC film is accomplished by the application of ultraviolet rays or by the supply of an oxidizing gas or liquid 20.
COPYRIGHT: (C)2005,JPO&NCIPI

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