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21. 发明专利

JP2000053947A ABRASIVE MATERIAL 失效
公开(公告)号：JP2000053947A
公开(公告)日：2000-02-22
申请号：JP23861798
申请日：1998-08-25
申请人： MITSUI CHEMICALS INC
发明人： WACHI HIROKO , YASUTAKE TAKESHI , HARADA ISAO
IPC分类号： B24B37/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To obtain an abrasive material having a high grinding rate and more improved machining accuracy than a conventional machining accuracy by adding a specific metal ion to a slurry composed of solid particles and water. SOLUTION: This abrasive material is obtained by adding (C) a metal ion having a smaller ionization tendency than a magnesium ion to a slurry (an acrylic emulsion) composed of (A) solid particles (e.g. solid oxide such as SiO2, or the like, an acrylic emulsion resin, or the like) and (B) water. The average particle diameter of the primary particles of the component A is preferably 0.01-3 μm. The amount of the component B mixed is preferably 30-300 pts.wt. based on 100 pts.wt. of the component A. The component C is preferably a metal ion having a smaller ionization tendency than a metal to be polished and a copper ion is preferably used when the material to be polished is aluminum. In order to make the component C exist in the form of the metal ion in the slurry before polishing, the pH of the slurry is adjusted to weak acidity to an alkali range. The concentration of the component C is preferably 1-1,000 wt.ppm. A dispersant is added to improve dispersibility of the abrasive material.

22. 发明专利

JPH11128675A REMOVAL OF CHLORINE OR CHLORINE COMPOUND AND APPARATUS THEREFOR 失效
公开(公告)号：JPH11128675A
公开(公告)日：1999-05-18
申请号：JP30257897
申请日：1997-11-05
申请人： MITSUI CHEMICALS INC
发明人： JINBO TAKASHI , YASUTAKE TAKESHI , HARADA ISAO , WACHI HIROKO
IPC分类号： B01D53/68 , B01D53/70 , B01D53/86 , C01B7/01
摘要： PROBLEM TO BE SOLVED: To efficiently treat gaseous chlorine used as etching gas in the production of a semiconductor by allowing chlorine- or chlorine compd.-contg. waste gas to react with hydrogen. SOLUTION: Chlorine- or chlorine compd.-contg. waste gas such as waste gas from a super-LSI etching device is made harmless by reaction with hydrogen. This reaction is effectively carried out in the presence of a catalyst contg. a component selected from among Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, Ir, etc. In a removing apparatus 7, chlorine- or chlorine compd.-contg. waste gas 1 is heated with a preheater 2 and hydrogen 3 as a reducing agent is regulated to a prescribed flow rate and mixed with the waste gas 1 leaving the preheater 2. This gaseous mixture is supplied to a reactor 5, hydrogen chloride is formed by decomposition and the mixture is introduced into a hydrogen chloride treating tube 6, where the hydrogen chloride is removed with an adsorbent.

23. 发明专利

JP2012001800A Electrolytic cell 有权
标题翻译：电解槽
公开(公告)号：JP2012001800A
公开(公告)日：2012-01-05
申请号：JP2010140626
申请日：2010-06-21
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： WACHI HIROKO , SADAMOTO MITSURU
IPC分类号： C25B9/00 , C25B1/06
CPC分类号： Y02E60/366
摘要： PROBLEM TO BE SOLVED: To provide an electrolytic cell in which flexibility in a structural design is high, and which is suitable to outdoor installation.SOLUTION: The electrolytic cell 100 includes: a pair of electrodes 30 in which the first planar electrode 10 and the second planar electrode 20 are arranged so as to be confronted each other; and a solution feed part 40 of feeding an electrolytic solution S to a space between the pair of the electrodes 30, wherein the electrolytic cell electrolyzes the electrolytic solution to generate a gas. Then, in the electrolytic cell 100, the pair of the electrodes 30 has flexibility to be curved or to be bendable in a direction perpendicular to a plane. In the electrolytic cell 100, each insulating solution-retaining sheet 50 is held between the pair of the electrodes 30 in which the first electrode 10 and the second electrode 20 are arranged so as to face each other.
摘要翻译：要解决的问题：提供一种结构设计中的柔性高，适用于户外安装的电解槽。解决方案：电解槽100包括：一对电极30，其中第一平面电极10和第二平面电极20彼此相对布置; 以及将电解液S供给到一对电极30之间的空间的溶液供给部40，其中电解槽电解电解液以产生气体。然后，在电解槽100中，一对电极30具有弯曲的柔性，或者能够在垂直于平面的方向上弯曲。在电解槽100中，每个绝缘溶液保持片50被保持在一对彼此面对的第一电极10和第二电极20之间的电极30之间。版权所有（C）2012，JPO＆INPIT

24. 发明专利

JP2011047027A Functional grain and method for producing the same using plasma treatment 审中-公开
标题翻译：功能颗粒及使用等离子体处理生产其的方法
公开(公告)号：JP2011047027A
公开(公告)日：2011-03-10
申请号：JP2009198913
申请日：2009-08-28
申请人： Mitsui Chemicals Inc , Sophia School Corp , 三井化学株式会社 , 学校法人上智学院
发明人： HAYASHISHITA HIDEJI , YANAGIMOTO YASUSHI , ODAKAWA KENJI , USUI HIDEO , WACHI HIROKO , SADAMOTO MITSURU , KOKOMA MASUHIRO
IPC分类号： C23C18/20 , C23C18/16 , C23C18/31
摘要： PROBLEM TO BE SOLVED: To produce fine polyethylene grains whose surfaces are uniformly plated with a metal.
SOLUTION: The method for producing a functional grain comprises: a first step where polyethylene grains with the average grain size of 1 to 100 μm are prepared; a second step where the grains are brought into contact with plasma under the pressure in the vicinity of the atmospheric pressure; and a third step where the polyethylene grains treated by the second step (hereinafter referred to as the grains to be treated) are dispersed into a solvent, and electroless plating treatment is performed.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：生产表面均匀镀金属的细聚乙烯颗粒。＆lt; P＆gt;解决方案：功能粒子的制造方法包括：准备平均粒径为1〜100μm的聚乙烯粒子的第1工序; 在大气压附近的压力下使晶粒与等离子体接触的第二步骤; 和第三步骤，其中通过第二步骤处理的聚乙烯颗粒（以下称为待处理的颗粒）分散在溶剂中，进行化学镀处理。版权所有（C）2011，JPO＆INPIT

25. 发明专利

JP2004168931A Abrasive 审中-公开
公开(公告)号：JP2004168931A
公开(公告)日：2004-06-17
申请号：JP2002337939
申请日：2002-11-21
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： WACHI HIROKO , KONDO KIYOTAKA
IPC分类号： B24B37/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an abrasive free from scratch and dishing troubles and generating removable abrasive residue. SOLUTION: The abrasive contains organic fine particles having a functional group to form a ligand of a metal and having a Tg (glass transition temperature) of ≤80°C, an oxidizing agent and water. COPYRIGHT: (C)2004,JPO

26. 发明专利

JP2003347290A Metal diffusion barrier film and manufacturing method therefor 有权
标题翻译：金属扩散阻挡膜及其制造方法
公开(公告)号：JP2003347290A
公开(公告)日：2003-12-05
申请号：JP2002151089
申请日：2002-05-24
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： NAKAMURA SETSUKO , KURASAWA TATSUHIRO , SHINDO KIYOTAKA , WACHI HIROKO
IPC分类号： C08G77/60 , H01L21/312 , H01L21/768 , H01L23/522
摘要： PROBLEM TO BE SOLVED: To provide a metal diffusion barrier film which has both a low dielectric constant and a metal diffusion barrier property, can reduce wiring resistance, and has a superior filming property and a method for forming the film.
SOLUTION: Disclosed in the metal diffusion barrier film containing a silicon- containing resin containing a repetitive unit represented by a formula (1): -Si(R
1 R
2 )-R
3 - among repetitive units. In the formula (1), R
1 , R
2 are alkyl groups which may independently have hydrogen atoms and substituents whose carbon numbers are 1 to 30, alkenyl groups which may have substituents whose carbon numbers are 1 to 30, alkynyl groups which may have substituents whose carbon numbers are 1 to 30, or aromatic groups which may have substituents, and R
3 is -C≡C-, -CH
2 - which may have a substituent bonded to at least one -C≡C-, an alkylene group which may have a substituent which is bonded to at least one -C≡C- and whose carbon number is 2 to 30, an alkenylen group which may have a substituent which is bonded to at least one -C≡C- and whose carbon number is 2 to 30, an alkynylen group which may have a substituent which is bonded to at least one -C≡C- and whose carbon number is 2 to 30, or a bivalent aromatic group which may have a substituent which is bonded to at least -C≡C-.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题为了提供具有低介电常数和金属扩散阻挡性能的金属扩散阻挡膜，可以降低布线电阻，并且具有优异的成膜性能和形成膜的方法。解决方案：在包含含有由式（1）表示的重复单元的含硅树脂的金属扩散阻挡膜中公开：-Si（R SB 1 R SB <2 >） - R 3 - 在重复单元中。在式（1）中，R 1，R 2，R SB 2是可以独立地具有氢原子的烷基和碳数为1至30的取代基，可以具有碳数为1〜30的取代基，碳原子数为1〜30的取代基的炔基或可具有取代基的芳香族基，R 3为-S≡C-，-CH 可以具有与至少一个-C≡C-键合的取代基，可以具有与至少一个-C≡C-键合的取代基的亚烷基，其碳数为 2-30，可以具有与至少一个-C≡C-并且碳数为2〜30键合的取代基的烯基，可以具有与至少一个-C ≡C-，其碳数为2〜30，或者可以具有与至少-C≡C-键合的取代基的二价芳基。版权所有（C）2004，JPO

27. 发明专利

JP2003238689A METHOD FOR PURIFYING ORGANOSILICON POLYMER 审中-公开
公开(公告)号：JP2003238689A
公开(公告)日：2003-08-27
申请号：JP2002044130
申请日：2002-02-21
申请人： MITSUI CHEMICALS INC
发明人： WACHI HIROKO , SHINDO KIYOTAKA , NAKAMURA SETSUKO , ARITSUKA MAKOTO
IPC分类号： C08G77/60 , C08G77/34
摘要： PROBLEM TO BE SOLVED: To remove metallic impurities from an organosilicon polymer because it contains metallic impurities, such as Cu, Mg, Fe, and Cr, originating in the raw materials and the catalyst and the apparatuses used in its production process. SOLUTION: The method for purifying an organosilicon polymer comprises the step of dissolving the organosilicon polymer in a water-insoluble solvent and adding a solution containing an aqueous polybasic (at least dibasic) organic acid solution to the solution; the step of settling the resultant mixture after agitation to separate it into a water phase and an oil phase; and the step of removing the water phase. COPYRIGHT: (C)2003,JPO

28. 发明专利

JP2000119638A SLURRY FOR ABRASION OF TUNGSTEN-CONTAINING MEMBER AND ABRASION METHOD 失效
公开(公告)号：JP2000119638A
公开(公告)日：2000-04-25
申请号：JP29686298
申请日：1998-10-19
申请人： MITSUI CHEMICALS INC
发明人： YASUTAKE TAKESHI , SHIMAOKA TAKASHI , WACHI HIROKO
IPC分类号： B24B37/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To obtain a slurry, which is able to abrade a tungsten-containing member quickly and in high quality, by mixing an aqueous slurry obtained by addition of solid particles and a metal (ion) of a specified group of the periodic table with hydrogen peroxide. SOLUTION: This slurry is obtained by mixing an aqueous slurry obtained by addition of one or more types of solid particles of materials, which are preferably selected from aluminum oxide, silicon dioxide, manganese dioxide and cerium dioxide and wherein the particle size preferably ranges from 10 to 500 nm, and one or more of metals or metal ions belonging to the groups 8 to 11 of the periodic table, with hydrogen peroxide. The metal or metal ion is preferably selected from iron, an iron ion, palladium, a palladium ion, platinum, a platinum ion, copper, a copper ion, silver and a silver ion. It is preferred that the concentration of the solid particles ranges about 1 to 20%, the concentration of hydrogen peroxide ranges about 3 to 20%, and the concentration of the metal or metal ion ranges about 0.5 to 100 ppm.

29. 发明专利

JPH1157409A METHOD FOR ELIMINATING HARMFUL EFFECTS OF NITROGEN TRIFLUORIDE AND HARMFUL EFFECTS ELIMINATION DEVICE 失效
公开(公告)号：JPH1157409A
公开(公告)日：1999-03-02
申请号：JP22985397
申请日：1997-08-26
申请人： MITSUI CHEMICALS INC
发明人： JINBO TAKASHI , YASUTAKE TAKESHI , HARADA ISAO , WACHI HIROKO
IPC分类号： B01D53/34 , B01D53/68 , B01D53/86
摘要： PROBLEM TO BE SOLVED: To eliminate fear that a reaction line might be blocked by providing an adsorption installation filled with an adsorbent in the downstream of a reactor in which a catalyst is packed and maintaining a space between the outlet of the reactor and the inlet of the adsorption installation through adsorbing and removing a fluorocompound to be produced by a chemical reaction, at a specific temperature or higher. SOLUTION: Nitrogen is supplied from an additional supply line 14 for dilution nitrogen and is added to an exhaust gas containing NF3 to enter from an exhaust gas line 6 through a flow control device 15 and an additional supply line 16 for dilution nitrogen. In addition, hydrogen is supplied from a reductive gas supply line 17 and then is added to the exhaust gas containing NF3 through a flow control device 18 and a reductive gas supply line 19. Further, a fluorocompound produced from a mixture of nitrogen and hydrogen by an NF3 reduction reactor 7 is adsorbed and removed by an absorbent packed in an adsorption installation 12 provided in the downstream of the reactor 7. In this case, the space between the outlet of the reactor 7 and the inlet of the adsorption installation 12 is maintained at a temperature of 150 deg.C or higher.

30. 发明专利

JPH1147555A DETOXIFICATION PROCESS FOR NITROGEN TRIFLUORIDE AND DETOXIFICATION CATALYST 失效
公开(公告)号：JPH1147555A
公开(公告)日：1999-02-23
申请号：JP21976197
申请日：1997-08-01
申请人： MITSUI CHEMICALS INC
发明人： JINBO TAKASHI , YASUTAKE TAKESHI , HARADA ISAO , WACHI HIROKO
IPC分类号： B01D53/86 , B01J27/12
摘要： PROBLEM TO BE SOLVED: To treat NF3 safely and efficiently for a long period of time. SOLUTION: Exhaust gas containing nitrogen trifluoride is reacted with hydrogen in the presence of a catalyst containing a first component selected out of the first group composed of Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, Ir, Pt and Au and the second component composed of at least one kind of alkaline metal fluoride and alkaline earth metal fluoride. Also a catalyst of pretreating nitrogen trifluoride containing the first component selected out of a group composed of Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, Ir, Pt and Au and the second component composed of at least one kind of alkaline metal fluoride and alkaline earth metal fluoride is prepared.

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