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21. 发明专利

JP2005161230A Method and apparatus for washing 有权
标题翻译：洗涤方法和装置
公开(公告)号：JP2005161230A
公开(公告)日：2005-06-23
申请号：JP2003405349
申请日：2003-12-04
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： MIYAMOTO MAKOTO , KAMIYAMA TOMOTSUGU , NODA SEIJI , SAITO TEIJI , ARAKANE ATSUSHI
IPC分类号： B08B3/10 , C23G3/00
摘要： PROBLEM TO BE SOLVED: To provide a washing method for enabling efficient washing utilizing an upward movement of an air bubble in a washing liquid, and a washing apparatus.
SOLUTION: In the washing method and the washing apparatus for injecting the washing liquid (c) in a washing tank 1, and innumerable air bubbles (b) collide with a substance to be washed such as a component 2 dipped in the washing liquid (c) to perform washing, the washed substance such as the component 2 in the washing tank 1 falls in the washing liquid (c), collides with the innumerable air bubbles (b) moving downward to upward, and washes while displacing a vertical position of the substance to be washed such as the component 2 upward to downward.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种可以利用洗涤液体中的气泡的向上运动以及洗涤装置来实现有效洗涤的洗涤方法。解决方案：在洗涤方法和用于将洗涤液（c）注入洗涤槽1中的洗涤装置和无数个气泡（b）与被洗涤物质（例如浸在洗涤物中的组分2）相撞液体（c）进行洗涤，洗涤槽1内的洗涤物质如成分2落入洗涤液（c）中，与无数的气泡（b）向下移动向上移动，同时移动垂直要清洗的物质如组分2的位置向上到下。版权所有（C）2005，JPO＆NCIPI

22. 发明专利

JP2005136439A Substrate treatment method 审中-公开
标题翻译：基板处理方法
公开(公告)号：JP2005136439A
公开(公告)日：2005-05-26
申请号：JP2005014374
申请日：2005-01-21
申请人： Mitsubishi Electric Corp , Shimada Phys & Chem Ind Co Ltd , 三菱電機株式会社 , 島田理化工業株式会社
发明人： KUZUMOTO MASAKI , NODA SEIJI , OYA IZUMI , MIYAMOTO MAKOTO , HORIBE HIDEO , KATAOKA TATSUO , OISHI TETSUSHI
IPC分类号： B08B3/08 , B08B3/10 , H01L21/027 , H01L21/304 , H01L21/308
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment method and a device where the device can be markedly improved in the treatment speed, by controlling the volume ratio of ozone to water vapor of the wet ozone-control gas fed to the substrate. SOLUTION: A substrate treating device treats an object of treatment, by supplying the wet ozone-containing gas wetted by a treating solution to the object of treatment on the surface of the substrate 2 in a treatment chamber 1 through a header 5 which is arranged so as to face the surface of the substrate 2. The wet ozone-containing gas includes a more amount of the vapor of the treatment solution than a saturated vapor amount at the temperature of the substrate 2 in another space, which is provided separately from the treatment chamber 1. The temperature of the wet ozone-containing gas is controlled to be 5 to 15°C higher than the temperature of the substrate. A spacing of the substrate 2 and the header 5 is 1 to 20 mm. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种基板处理方法和其中可以通过控制供给到基板的湿臭氧层控制气体的臭氧与水蒸气的体积比来显着提高处理速度的装置。解决方案：基板处理装置通过头5将处理室1中的处理溶液润湿的含湿臭氧气体供给到处理室1中的基板2的表面上，处理对象物布置成面对基板2的表面。含湿臭氧的气体包括比另一空间中的基板2的温度下的饱和蒸汽量更多的处理溶液的蒸气，其分开设置湿态含臭氧气体的温度被控制在比衬底温度高5至15℃的温度。基板2和集管5的间隔为1〜20mm。版权所有（C）2005，JPO＆NCIPI

23. 发明专利

JP2004296463A Cleaning method and cleaning device 审中-公开
标题翻译：清洁方法和清洁装置
公开(公告)号：JP2004296463A
公开(公告)日：2004-10-21
申请号：JP2003082602
申请日：2003-03-25
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： MIYAMOTO MAKOTO , FUKADA TETSUO , CHIBAHARA HIROYUKI
IPC分类号： B08B3/08 , B08B3/12 , C23G1/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To clean an electronic material requiring high cleanliness such as a silicon substrate for a semiconductor or a glass substrate for a liquid crystal without causing a possibility of damaging the surface of the electronic material.
SOLUTION: A hydrogen gas dissolving means 20 dissolves a hydrogen gas into ultra-pure water, an H
2 O
2 adding means 30 adds hydrogen peroxide to the water, and a cleaning unit 50 cleans an object 80 to be cleaned while irradiating an obtained cleaning liquid with an ultrasound by an ultrasound applying means 40. Preferably, the ultra-pure water is degassed by a degassing means 10. Further, the pH of the cleaning water is preferably adjusted by a pH adjusting means. Also, the cleaning is performed while supplying an H
2 O
2 decomposing agent from an H
2 O
2 decomposing agent supplying means.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：清洁需要高清洁度的电子材料，例如用于半导体的硅衬底或用于液晶的玻璃衬底，而不会导致损坏电子材料的表面的可能性。解决方案：氢气溶解装置20将氢气溶解在超纯水中，加入装置30向水中加入过氧化氢，并且清洁单元50通过超声波施加装置40用超声波照射所获得的清洁液体来清洁待清洁的物体80.优选地，超纯水通过脱气装置10脱气。此外，清洁的pH 优选通过pH调节装置调节水。另外，在从H 2 SBB分解试剂中分离出H 2 SBB分解剂的同时进行清洗。代理商供应装置。版权所有（C）2005，JPO＆NCIPI

24. 发明专利

JPH06302805A ELECTRONIC ELEMENT, ITS INTEGRATED ELECTRONIC ELEMENT AND THEIR USAGE METHOD 失效
公开(公告)号：JPH06302805A
公开(公告)日：1994-10-28
申请号：JP11113993
申请日：1993-04-15
申请人： MITSUBISHI ELECTRIC CORP
发明人： KAMIYAMA TOMOTSUGU , MIYAMOTO MAKOTO , ISODA SATORU , HANASATO YOSHIO , NISHIKAWA TOMOSHI
IPC分类号： H01L51/05 , G11B9/14 , H01L49/00 , H01L51/30 , H01L29/28
摘要： PURPOSE:To provide an electronic element which can be operated at high speed and integrated at ultrahigh density, to provide its integrated electronic element and to provide a usage method which is suitable of the elements. CONSTITUTION:A rotary body 21 having molecules or functional groups which come to an excitation state by being irradiated with either electromagnetic waves or a charged particle beam is arranged on a substrate 23 so as to be rotatable, and at least one out of stationary bodies 22a to 22d having molecules or function groups which receive at least one out of energy and electrons from the rotary body 21 is arranged near the rotary body 21.

25. 发明专利

JPH06184738A FORMATION OF CARBON THIN FILM, ITS MODIFYING METHOD, ELECTRONIC DEVICE FORMED BY USING THIS MODIFYING METHOD AS WELL AS X-RAY MULTILAYER FILM MIRROR AND ITS PRODUCTION 失效
公开(公告)号：JPH06184738A
公开(公告)日：1994-07-05
申请号：JP2970093
申请日：1993-01-27
申请人： MITSUBISHI ELECTRIC CORP
发明人： HANASATO YOSHIO , MIYAMOTO MAKOTO , NISHIKAWA TOMOSHI , ISODA SATORU , AKIYAMA KOICHI , NAKAHARA TAKEHIKO
IPC分类号： C01B31/02 , C23C14/32 , D01F9/127 , G02B5/08 , G21K1/06 , H01L21/203 , H01L29/861 , H01L31/10 , H01L39/12 , H01L29/91
摘要： PURPOSE:To provide the method for formation of the carbon thin film capable of forming a thin film of flat carbon molecules, its modifying method, the electronic device formed by using this method as well as the X-ray multilayer film mirror and its production. CONSTITUTION:The molecules consisting of plural carbon atoms of any shape of polyhedron, cylinder or spiral or the molecules exclusive of these molecules or atoms are ionized >=1 and the ions are accelerated and deposited by evaporation on a substrate 46. The modifying method consists subjecting the above- mentioned carbon thin film to ion implantation or to a heat treatment together with the ion implantation. The above-mentioned carbon thin film is fullerenes or carbon nanotube.

26. 发明专利

JPH06165933A NITROGEN OXIDE SELECTIVELY ADSORBING MATERIAL REACTION CONTROL METHOD THEREFOR AND DEVICE FOR DETECTING, ADSORPTION-REMOVING AND DECOMPOSING GAS USING THEM 失效
公开(公告)号：JPH06165933A
公开(公告)日：1994-06-14
申请号：JP5861393
申请日：1993-03-18
申请人： MITSUBISHI ELECTRIC CORP
发明人： KAMIYA TOSHIYUKI , HANASATO YOSHIO , ISODA SATORU , MIYAMOTO MAKOTO , OTA NAOMI
IPC分类号： B01D53/56 , B01D53/34 , B01D53/81 , B01J20/22 , G01N5/02 , G01N27/12
摘要： PURPOSE:To obtain a nitrogen oxide selectively adsorbing material having high selectivity and adsorption performance, to obtain a detecting element having high sensitivity and high selectivity and a high-speed adsorptive removing device at a high rate and with high efficiency for gaseous nitrogen oxide, and to obtain a high speed responsive gas detecting element excellent in long-term stability and sensitively and a high efficiency adsorptively removing and decomposition device. CONSTITUTION:As a nitrogen oxide selectively adsorbing material of a gaseous nitrogen oxide detecting element and a gaseous nitrogen oxide adsorptively removing device, ruthenium complex and chromium complex having ligands of any one or more of porphyrin, phthalocyanine and pyridine derivatives are used. A gas selective adsorption film 16 is formed on a surface acoustic wave element 17 and the gas concentration is measured from a change in frequency accompanying gas adsorption. The adsorption film 16 is irradiated with light 26 to accelerate the absorptive and desorptive speed. The element and the device are operated by controlling the light irradiation and temperature to efficiently control the adsorption and desorption/decomposition speed at the adsorption film.

27. 发明专利

JP2010188321A Cleaning method, object to be cleaned and cleaning device 审中-公开
标题翻译：清洁方法，清洁和清洁装置
公开(公告)号：JP2010188321A
公开(公告)日：2010-09-02
申请号：JP2009037957
申请日：2009-02-20
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： MIYAMOTO MAKOTO , YAMAZAKI HISAE , KUROKI HIROSHI , KAMIYAMA TOMOTSUGU
IPC分类号： B08B3/10
摘要： PROBLEM TO BE SOLVED: To inhibit the worsening of cleaning performance or the operating efficiency of a cleaning device due to a large amount of floating and separated soil during an early cleaning operation, in the cleaning device which cleans an object to be cleaned such as components, with the help of bubbles.
SOLUTION: First, floating soil 4 which is afloat on the water surface of cleaning water 2 in a cleaning tank 1 and the cleaning water 2, are allowed to pass through a conduit pipe, and then flow into a first separation tank 16 for separating a large amount of the soil 18. Following this procedure, an on-off valve is controlled by a control part after the almost complete outflow of a large amount of the soil 18, and the cleaning water 2 containing a negligible amount of the soil 18 is allowed to flow into a second separation tank 12. The second separation tank 12 has a partition plate 13 for preventing the soil 18 from flowing into an intake for a circulating water, and further is connected with a microair bubble generator 6 through water piping 15 and a water circulating pump 11, in order to resupply the cleaning water 2 to the cleaning tank 1. Thus, under this constitution, it is possible to store into the first separation tank 16 a large amount of the soil 18 during an early cleaning stage of the cleaning operation characteristic in the cleaning using the microair bubble 3, and ensure the stable operation of the cleaning device.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了在早期清洁操作期间抑制由于大量浮动和分离的污垢而导致的清洁性能的恶化或清洁装置的操作效率，在清洁待清洁物体的清洁装置中如组件，借助气泡。解决方案：首先，在清洗槽1和清洗水2中清洗水2的水面漂浮的浮土4通过导管，然后流入第一分离槽16 用于分离大量土壤18.按照该过程，在大量土壤18几乎完全流出之后，通过控制部分控制开关阀，并且清洁水2含有可忽略量的允许土壤18流入第二分离罐12.第二分离罐12具有隔板13，用于防止土壤18流入循环水的进口，并且还通过水与微型气泡发生器6连接管道15和水循环泵11，以便将清洁水2再次供应到清洗槽1.因此，在这种结构下，可以在早期的第一分离槽16中将大量的土壤18储存清洁使用微气泡3进行清洗时的清洗作业特性，确保清洗装置的稳定运转。版权所有（C）2010，JPO＆INPIT

28. 发明专利

JP2010074102A Method of etching silicon substrate, etchant for silicon substrate and etching device of silicon substrate 审中-公开
标题翻译：硅衬底蚀刻方法，硅衬底蚀刻剂和硅衬底蚀刻装置
公开(公告)号：JP2010074102A
公开(公告)日：2010-04-02
申请号：JP2008243198
申请日：2008-09-22
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： YASUNAGA NOZOMI , MIYAMOTO MAKOTO , KAMIYAMA TOMOTSUGU , HAZUMI KOUICHI , HAMAMOTO SATORU
IPC分类号： H01L21/308 , H01L21/306 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a method of etching a silicon substrate which forms a texture efficiently on the surface of a silicon substrate to make a silicon substrate having a low light reflection rate, and to provide an etchant and an etching device. SOLUTION: The method of etching the silicon substrate includes supplying an etchant on the surface of a silicon substrate and forming uneveness on the surface of the silicon substrate by wet etching. The etchant includes at least one of water, alkaline reagent, and an alcohol derivative of formula (1). Formula (1) is represented by X-(OH) n (X is a saturated or unsaturated hydrocarbon group of a 4-7C, n is an integer of ≥1, and n COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在硅衬底的表面上有效地形成纹理的硅衬底的蚀刻方法，以制造具有低光反射率的硅衬底，并且提供蚀刻剂和蚀刻装置。解决方案：蚀刻硅衬底的方法包括在硅衬底的表面上提供蚀刻剂，并通过湿蚀刻在硅衬底的表面上形成不均匀性。蚀刻剂包括水，碱性试剂和式（1）的醇衍生物中的至少一种。式（1）由X-OH（OH）2表示。（X是4-7C的饱和或不饱和烃基，n是≥1的整数，n

29. 发明专利

JP2010064021A Microbubble generator and method of generating microbubble 有权
标题翻译：微生物发生器和微生物产生方法
公开(公告)号：JP2010064021A
公开(公告)日：2010-03-25
申请号：JP2008233624
申请日：2008-09-11
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： KAMIYAMA TOMOTSUGU , MIYAMOTO MAKOTO , MATSUI HISAE
IPC分类号： B01F3/04 , B01F7/16 , B01F7/18
摘要： PROBLEM TO BE SOLVED: To obtain a microbubble generator, which enables a miniaturization, and at the same time can generate more stably many microbubbles, and a method of generating a microbubble.
SOLUTION: A liquid 2 is pooled in a vessel 1. An agitator body 5 has a holding member 15 and an insert piece 16 which protrudes from the holding member 15 and can be inserted into the liquid 2. A device 6 for driving the agitator body moves the insert piece 16 in a direction which shears a liquid surface 3 by rotating the agitator body 5 while maintaining the state that a part of the insert piece 16 exists in the liquid 2 and the remaining of the insert piece 16 goes out of the liquid surface 3 to the outside of the liquid 2. Microbubbles are generated in the liquid 2 by the movement of the insert piece 16 to the direction which shears the liquid surface 3.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了获得能够小型化并且同时可以产生更稳定的许多微泡的微泡发生器，以及产生微泡的方法。解决方案：将液体2汇集在容器1中。搅拌器主体5具有保持构件15和从保持构件15突出并可插入到液体2中的插入件16.用于驱动的装置6 搅拌器主体通过旋转搅拌器主体5沿着剪切液面3的方向移动插入件16，同时保持插入件16的一部分存在于液体2中，并且插入件16的剩余部分脱离液体表面3到液体2的外部。通过插入件16移动到剪切液面3的方向，在液体2中产生微泡。（C）2010，JPO＆INPIT

30. 发明专利

JP2009285557A Washing device 有权
标题翻译：洗衣设备
公开(公告)号：JP2009285557A
公开(公告)日：2009-12-10
申请号：JP2008139928
申请日：2008-05-28
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： SHIBATA YOHEI , MIYAMOTO MAKOTO , HINOMOTO NOBUHIDE
IPC分类号： B08B3/10 , C23G3/00
摘要： PROBLEM TO BE SOLVED: To provide a washing device which has the low possibility causing failure, is inexpensive and has high uniformity of washing.
SOLUTION: A plurality of injectors 5B, 5L, 5R, 5T can generate streams containing air bubbles BB in washing liquid 7 and are arranged around a conveyor 3 such that the streams go toward the conveyor 3.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有低可能性导致故障的清洗装置，便宜并具有高的洗涤均匀性。解决方案：多个喷射器5B，5L，5R，5T可以产生在洗涤液体7中含有气泡BB的流，并且布置在输送机3周围，使得流朝向输送机3。 C）2010，JPO＆INPIT

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