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    • 21. 发明专利
    • JPH05299500A
    • 1993-11-12
    • JP10311192
    • 1992-04-22
    • KOBE STEEL LTD
    • MORIOKA OSAMU
    • H01L21/301H01L21/78
    • PURPOSE:To cut a silicon substrate W along a desired cutting line with a fine width of cutting allowance and stably execute contamination-free dry cutting. CONSTITUTION:A silicon substrate W is placed on a substrate placing board 2 in a vacuum vessel 1 coupled with a vacuum pump 7 and this silicon substrate W is irradiated with a laser beam B emitted from a laser oscillator 9 by focusing such laser beam into a fine beam with a beam irradiation tube 3. Simultaneously, the chlorine gas G supplied from a gas bombe 11 is narrowed by an injection nozzle 4 and is blown to a beam irradiation part. A silicon substrate material at the beam irradiation part and chlorine gas are activated with beam energy to generate ion and radical and execute chemical reaction therebetween. Thereby, the silicon substrate material at the beam irradiation part is radiated within a vacuum vessel 1 as a low-pressure gas of reaction biproduct to cut the silicon substrate W.
    • 22. 发明专利
    • RESONANCE FREQUENCY ADJUSTING DEVICE FOR HIGH FREQUENCY ACCELERATION CAVITY
    • JPH05190299A
    • 1993-07-30
    • JP283592
    • 1992-01-10
    • KOBE STEEL LTD
    • KUSAKA TAKUYAWASA YASUHIROMORIOKA OSAMUMUROO YOUJI
    • H05H7/18H05H9/00H05H13/04
    • PURPOSE:To provide a resonance frequency adjusting device for a high frequency acceleration cavity of susppressing a higher order resonance mode and reducing an influence of the resonance frequency adjusting device relating to the high frequency acceleration cavity. CONSTITUTION:A coaxial line 19 is constituted of a movable main shaft 2 for driving a metal unit 6 advanced and retracted in a high frequency acceleration cavity 16 and an outer cylinder 4 for coaxially coating this main shaft. A frequency of higher order resonance mode having field strength in a resonance frequency adjusting device 1 of the higher order resonance mode with the metal unit 6 as a rod antenna is guided into the coaxial line 19, placed in a power terminal end device 14 from a branch coaxial line 9 and consumed. The higher order resonance mode is not easily accumulated in the high frequency acceleration cavity 16 to reduce an influence given to a charged particle in the high frequency acceleration cavity 16. By matching line impedance of the coaxial line 19, line impedance of the branch coaxial line 9 and impedance of the power terminal end device 14, a change of input impedance of a total unit of the resonance frequency adjusting device 1 as viewed from the high frequency acceleration cavity 16 is decreased, and also an influence a resonance frequency of the high frequency acceleration cavity 16 is decreased.
    • 23. 发明专利
    • COAXIAL WAVE GUIDE STRUCTURE
    • JPH05135704A
    • 1993-06-01
    • JP29439991
    • 1991-11-11
    • KOBE STEEL LTD
    • MORIOKA OSAMUKUSAKA TAKUYA
    • H01J23/40H01P1/08
    • PURPOSE:To improve the economy of a coaxial wave guide structure and the easiness of the adjusting work by individually and freely adjusting the protrusion lengths of the first outer conductor and the second outer conductor into a rectangular wave guide via the action of two reciprocating systems. CONSTITUTION:When the operation handle 2e of the first reciprocating system 2 is rotated, an inner conductor 7 is reciprocated against an angular wave guide 1 via a support member 2c by the rotation of a support member reciprocating ball screw 2b. The second outer conductor 9 is moved in an outer conductor end section 10, and the protrusion length L2 of the outer conductor 9 into the wave guide 1 can be freely changed. The first outer conductor 4 is also reciprocated in the same direction as the conductor 7 via the second reciprocating system 3, its protrusion length L1 into the wave guide 1 is changed, when the operation handle 3c of the system 3 is rotated, the length L1 can be freely changed by the expansion or shrinkage of an expansion pipe 4b. The distance G between the tip of the conductor 4 and a ceramic disk window 8 can be freely changed.
    • 26. 发明专利
    • GAS-LIQUID DISPERSING DEVICE FOR PLATE FIN TYPE HEAT EXCHANGER
    • JPS5886398A
    • 1983-05-23
    • JP18512981
    • 1981-11-17
    • KOBE STEEL LTD
    • YAMADA KANEOMORIOKA OSAMU
    • F28F3/00F25J3/00F28F9/22F28F27/02
    • PURPOSE:To make it possible to grasp accurately the actual state of dispersion of a gas and a liquid by the titled device of simple structure by a method wherein the gas and the liquid are supplied in their own phases respectively and are dispersed by respective dispersing fins. CONSTITUTION:A heat medium entered a header 32 from an inlet is dispersed uniformly in the direction of the width of a group of effective fins 26 for the heat medium as it is guided by a group of distribution fins 29. Then the dispersed heat medium flows upward among the effective fins 26 to enter a group of upper distribution fins 28 and flows outside from the header 32. On the other hand, the gas entered a header 33 flows horizontally among a group of gas dispersing fins 35 within a dispersing core 22 to enter a group of two-phase flow dispersing fins 28 communicating with the fins 35. At the same time, the gas which has entered a header 34 from an inlet flows obliquely upward as it is guided by a group of liquid dispersing fins 36 and enters the two-phase flow distribution fins 28 where it joins the gas to make a two-phase flow of a gas- liquid mixture, so that a heat exchange operation between the mixture and a layer of the heat medium is performed.
    • 30. 发明专利
    • PLASMA TREATMENT APPARATUS
    • JPH05326415A
    • 1993-12-10
    • JP1533592
    • 1992-01-30
    • KOBE STEEL LTDTDK CORP
    • YUKI TAKAHIROMORIOKA OSAMU
    • H01L21/203H01L21/205H01L21/302H01L21/3065
    • PURPOSE:To form an ECR plane which is parallel to the face of a sample and to increase the uniformity and the anisotropy of ions, radicals and the like which are generated by means of an ECR plasma by a method wherein a yoke which has been former to be a prescribed shape and which is composed of a magnetic material is arranged in a magnetic field which is generated by a pair of permanent magnets. CONSTITUTION:The air inside a vacuum container 1 in which a sample 4 is mounted on an electrode 3 is evacuated a treatment gas G is introduced from a gas introduction port 1a after that, an RF is applied to the electrode 3 by means of a high-frequency power supply 5 to supply an electric field and microwaves are introduced via a waveguide 7. Thereby, the treatment gas G is changed to a plasma clue to an interaction with a magnetic field which is applied by means of a pair of permanent magnets 6, 6'; a plasma treatment such as a CVD treatment, an etching treatment or the like is executed by use of ions, radicals and the like in the plasma. At this time, a ring- shaped yoke 8 whose cross section is step-shaped is arranged and installed at the upper part of the permanent magnet 6' and directly under the electrode 3; it is made to act as a kind of magnetic lens; vectors of lines of magnetic force at the upper part of the yoke 8 are arranged to be parallel and advanced straight.