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    • 22. 发明专利
    • METHOD FOR FORMING PROTRUSION ELECTRODE
    • JP2003100792A
    • 2003-04-04
    • JP2001295249
    • 2001-09-27
    • CITIZEN WATCH CO LTD
    • TERAJIMA KAZUHIKO
    • H01L21/60
    • PROBLEM TO BE SOLVED: To solve the problem that variations in height of protrusion electrodes occurs, by displacement of a screen mask or by attachment of a brazing material to the mask, when forming protrusion electrodes having electrode intervals of a semiconductor substrate or a circuit substrate which are made fine by screen printing. SOLUTION: Thick film photosensitive resin to cover pad electrodes is coated on the surface of the substrate so that a film thickness is nearly uniform. Then, by a photo lithography method, a thick film photosensitive resin pattern is formed which makes exposing holes to surfaces of the pad electrodes have the same volumes, and also makes areas of the pad electrodes exposed in the exposing holes equal. Further, the exposed holes are fully filled with a paste form brazing material up to their edges by the screen printing method. Next, the brazing material is melted, so that at least top edges of the material become round to form protrusion electrodes, and the thick film photosensitive resin pattern is removed.
    • 29. 发明专利
    • MANUFACTURE OF SEMICONDUCTOR DEVICE
    • JPH10256304A
    • 1998-09-25
    • JP5286597
    • 1997-03-07
    • CITIZEN WATCH CO LTD
    • TERAJIMA KAZUHIKO
    • H01L21/60
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device wherein large-sized semiconductor integrated circuit chips can be mounted without breakage of a conductive bonding agent layer and without separation of the layer from a substrate electrode in the course of curing a conductive bonding agent. SOLUTION: After a conductive bonding agent 5 having rubbery elasticity is cured, if a shearing stress is imposed thereon caused by the difference of the thermal expansion coefficient between a semiconductor integrated circuit chip 1 and an insulating substrate 2 as they are cooling, no separation or breakage of the bonding agent layer is induced because the conductive bonding agent 5 relaxes the shearing stress. Further, since the conductive bonding agent 5 does not prevent a longitudinal stress caused by adoption of a sealing resin having a great degree of shrinkage on curing, projecting electrodes 3 and substrate electrodes 4 are mechanically contacted through conductive particles in the conductive bonding agent 5 to ensure excellent electrical connection.